KR101583693B1 - Ito 스퍼터링 타깃재 및 그 제조 방법 - Google Patents

Ito 스퍼터링 타깃재 및 그 제조 방법 Download PDF

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KR101583693B1
KR101583693B1 KR1020157033563A KR20157033563A KR101583693B1 KR 101583693 B1 KR101583693 B1 KR 101583693B1 KR 1020157033563 A KR1020157033563 A KR 1020157033563A KR 20157033563 A KR20157033563 A KR 20157033563A KR 101583693 B1 KR101583693 B1 KR 101583693B1
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ito
sintered body
powder
target material
sputtering target
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KR1020157033563A
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KR20150139623A (ko
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교스케 데라무라
도모야 다케우치
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미쓰이금속광업주식회사
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    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64Burning or sintering processes
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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    • C04B35/453Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
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    • C04B35/626Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/086Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
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    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
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    • C04B2235/50Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
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  • Chemical & Material Sciences (AREA)
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  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
KR1020157033563A 2014-02-18 2015-01-30 Ito 스퍼터링 타깃재 및 그 제조 방법 KR101583693B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014028543 2014-02-18
JPJP-P-2014-028543 2014-02-18
PCT/JP2015/052688 WO2015125588A1 (fr) 2014-02-18 2015-01-30 Matériau cible ito pour pulvérisation cathodique et son procédé de production

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KR20150139623A KR20150139623A (ko) 2015-12-11
KR101583693B1 true KR101583693B1 (ko) 2016-01-08

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JP (1) JP5816394B1 (fr)
KR (1) KR101583693B1 (fr)
CN (2) CN105308002A (fr)
TW (1) TWI522332B (fr)
WO (1) WO2015125588A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6291593B2 (ja) * 2014-11-07 2018-03-14 Jx金属株式会社 Itoスパッタリングターゲット及びその製造方法並びにito透明導電膜の製造方法
KR20170142169A (ko) * 2015-04-30 2017-12-27 미쓰이금속광업주식회사 Ito 스퍼터링 타깃재
CN110257782B (zh) * 2016-03-28 2021-12-21 Jx金属株式会社 圆筒型溅射靶及其制造方法
JP6756283B2 (ja) * 2016-04-12 2020-09-16 三菱マテリアル株式会社 円筒型スパッタリングターゲット
JP2018178251A (ja) * 2017-04-07 2018-11-15 三菱マテリアル株式会社 円筒型スパッタリングターゲット及びその製造方法
CN113149614A (zh) * 2021-05-28 2021-07-23 通威太阳能(合肥)有限公司 一种烧结体、靶材及其制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007231381A (ja) 2006-03-01 2007-09-13 Tosoh Corp Itoスパッタリングターゲットおよびその製造方法
JP2010150611A (ja) 2008-12-25 2010-07-08 Tosoh Corp 透明導電膜用焼結体及びスパッタリングターゲット並びにその製造方法
JP2011080116A (ja) 2009-10-07 2011-04-21 Mitsui Mining & Smelting Co Ltd Itoスパッタリングターゲットおよびその製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3503759B2 (ja) * 1993-12-14 2004-03-08 日立金属株式会社 インジウム・スズ酸化物膜用スパッタリング用ターゲットおよびその製造方法
JP4961672B2 (ja) 2004-03-05 2012-06-27 東ソー株式会社 円筒形スパッタリングターゲット並びにセラミックス焼結体及びその製造方法
JP2009040621A (ja) * 2007-08-06 2009-02-26 Mitsui Mining & Smelting Co Ltd Ito焼結体およびitoスパッタリングターゲット
JP2012126937A (ja) 2010-12-13 2012-07-05 Sumitomo Metal Mining Co Ltd Itoスパッタリングターゲットとその製造方法
CN102718499B (zh) * 2012-07-10 2014-02-26 国家钽铌特种金属材料工程技术研究中心 一种含In4Sn3O12相ITO溅射靶的制造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007231381A (ja) 2006-03-01 2007-09-13 Tosoh Corp Itoスパッタリングターゲットおよびその製造方法
JP2010150611A (ja) 2008-12-25 2010-07-08 Tosoh Corp 透明導電膜用焼結体及びスパッタリングターゲット並びにその製造方法
JP2011080116A (ja) 2009-10-07 2011-04-21 Mitsui Mining & Smelting Co Ltd Itoスパッタリングターゲットおよびその製造方法

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Publication number Publication date
CN107253855A (zh) 2017-10-17
CN105308002A (zh) 2016-02-03
JPWO2015125588A1 (ja) 2017-03-30
WO2015125588A1 (fr) 2015-08-27
KR20150139623A (ko) 2015-12-11
TW201534572A (zh) 2015-09-16
TWI522332B (zh) 2016-02-21
JP5816394B1 (ja) 2015-11-18

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