KR101542638B1 - 나노입자, 비닐단량체 및 실리콘의 공중합체 - Google Patents

나노입자, 비닐단량체 및 실리콘의 공중합체 Download PDF

Info

Publication number
KR101542638B1
KR101542638B1 KR1020107016460A KR20107016460A KR101542638B1 KR 101542638 B1 KR101542638 B1 KR 101542638B1 KR 1020107016460 A KR1020107016460 A KR 1020107016460A KR 20107016460 A KR20107016460 A KR 20107016460A KR 101542638 B1 KR101542638 B1 KR 101542638B1
Authority
KR
South Korea
Prior art keywords
delete delete
nanoparticles
meth
coating composition
acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020107016460A
Other languages
English (en)
Korean (ko)
Other versions
KR20100114046A (ko
Inventor
라메시 씨 쿠마
타운 엘 맥켄지
잉-유 루
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쓰리엠 이노베이티브 프로퍼티즈 캄파니 filed Critical 쓰리엠 이노베이티브 프로퍼티즈 캄파니
Publication of KR20100114046A publication Critical patent/KR20100114046A/ko
Application granted granted Critical
Publication of KR101542638B1 publication Critical patent/KR101542638B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
    • C09D143/04—Homopolymers or copolymers of monomers containing silicon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F292/00—Macromolecular compounds obtained by polymerising monomers on to inorganic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C08F230/085—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/12—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes
    • C08F283/126—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes on to polysiloxanes being the result of polycondensation and radical polymerisation reactions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/068—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42—Block-or graft-polymers containing polysiloxane sequences
    • C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J151/00—Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
    • C09J151/08—Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C09J151/085—Adhesives based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds on to polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/40—Adhesives in the form of films or foils characterised by release liners
    • C09J7/401—Adhesives in the form of films or foils characterised by release liners characterised by the release coating composition
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/40—Adhesives in the form of films or foils characterised by release liners
    • C09J7/405—Adhesives in the form of films or foils characterised by release liners characterised by the substrate of the release liner
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2400/00—Presence of inorganic and organic materials
    • C09J2400/10—Presence of inorganic materials
    • C09J2400/16—Metal
    • C09J2400/163—Metal in the substrate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2400/00—Presence of inorganic and organic materials
    • C09J2400/20—Presence of organic materials
    • C09J2400/22—Presence of unspecified polymer
    • C09J2400/226—Presence of unspecified polymer in the substrate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2400/00—Presence of inorganic and organic materials
    • C09J2400/20—Presence of organic materials
    • C09J2400/26—Presence of textile or fabric
    • C09J2400/263—Presence of textile or fabric in the substrate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2400/00—Presence of inorganic and organic materials
    • C09J2400/20—Presence of organic materials
    • C09J2400/28—Presence of paper
    • C09J2400/283—Presence of paper in the substrate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2429/00—Presence of polyvinyl alcohol
    • C09J2429/005—Presence of polyvinyl alcohol in the release coating
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2433/00—Presence of (meth)acrylic polymer
    • C09J2433/005—Presence of (meth)acrylic polymer in the release coating
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2483/00—Presence of polysiloxane
    • C09J2483/005—Presence of polysiloxane in the release coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2848—Three or more layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/20—Coated or impregnated woven, knit, or nonwoven fabric which is not [a] associated with another preformed layer or fiber layer or, [b] with respect to woven and knit, characterized, respectively, by a particular or differential weave or knit, wherein the coating or impregnation is neither a foamed material nor a free metal or alloy layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020107016460A 2007-12-28 2008-12-19 나노입자, 비닐단량체 및 실리콘의 공중합체 Expired - Fee Related KR101542638B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US1747407P 2007-12-28 2007-12-28
US61/017,474 2007-12-28

Publications (2)

Publication Number Publication Date
KR20100114046A KR20100114046A (ko) 2010-10-22
KR101542638B1 true KR101542638B1 (ko) 2015-08-06

Family

ID=40825033

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107016460A Expired - Fee Related KR101542638B1 (ko) 2007-12-28 2008-12-19 나노입자, 비닐단량체 및 실리콘의 공중합체

Country Status (6)

Country Link
US (1) US8492496B2 (https=)
EP (1) EP2238182B1 (https=)
JP (1) JP2011508811A (https=)
KR (1) KR101542638B1 (https=)
CN (1) CN101910224B (https=)
WO (1) WO2009086079A2 (https=)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102241899B (zh) 2010-05-11 2014-05-14 3M创新有限公司 涂料组合物，改性基体表面的方法和制品
CN101948561A (zh) * 2010-09-10 2011-01-19 中山大桥化工集团有限公司 一种涂料用有机无机硅杂化树脂及其制备方法
DE102010062054A1 (de) * 2010-11-26 2012-05-31 Wacker Chemie Ag Wässriges Hybridbindemittel für Fugenmörtel
JP2015508436A (ja) * 2011-12-22 2015-03-19 スリーエム イノベイティブ プロパティズ カンパニー 重合した（メタ）アクリル化シリコーンを含む剥離層を有する接着剤物品
KR101407617B1 (ko) * 2012-04-25 2014-06-27 주식회사 엘지화학 자기 치유 능력이 있는 열경화성 코팅 조성물, 코팅 필름 및 코팅 필름의 제조 방법
US9645416B2 (en) * 2012-05-14 2017-05-09 Merck Patent Gmbh Particles for electrophoretic displays
EP2850489B1 (en) 2012-05-14 2016-11-09 Merck Patent GmbH Particles for electrophoretic displays
US9651846B2 (en) 2012-05-14 2017-05-16 Merck Patent Gmbh Particles for electrophoretic displays
EP2850116B1 (en) 2012-05-14 2018-04-18 Merck Patent GmbH Particles for electrophoretic displays
EP2850136B1 (en) 2012-05-14 2016-05-04 Merck Patent GmbH Particles for electrophoretic displays
US9494808B2 (en) 2012-05-14 2016-11-15 Merck Patent Gmbh Particles for electrophoretic displays
US20140213717A1 (en) * 2013-01-28 2014-07-31 Wacker Chemical Corporation Water repellant wood stains with improved weatherability
US9120916B1 (en) * 2014-06-12 2015-09-01 Ppg Industries Ohio, Inc. Acrylic polymers, curable film-forming compositions prepared therefrom, and method of mitigating dirt build-up on a substrate
EP3023467B1 (de) 2014-11-20 2017-05-10 BYK-Chemie GmbH Formmasse, thermoplast oder beschichtungsmittel enthaltend polysiloxane als anti-adhäsive und schmutzabweisende zusätze
US10522771B2 (en) * 2014-12-01 2019-12-31 Samsung Electronics Co., Ltd. Composition, electronic device, and thin film transistor
KR102407114B1 (ko) * 2015-05-29 2022-06-08 삼성전자주식회사 절연액, 절연체, 박막 트랜지스터 및 전자 소자
JP7101615B2 (ja) 2015-08-31 2022-07-15 ビイク－ヒエミー ゲゼルシャフト ミツト ベシユレンクテル ハフツング ポリシロキサンマクロモノマー単位を有するコポリマー、該コポリマーの製造方法、ならびに該コポリマーの、コーティング組成物およびポリマー成形コンパウンドにおける使用
EP3344704B1 (en) 2015-08-31 2019-07-31 BYK-Chemie GmbH Copolymers containing polyether-polysiloxane macromonomer units, process of their preparation and their use in coating compositions and polymeric moulding compounds
KR102380151B1 (ko) 2015-08-31 2022-03-28 삼성전자주식회사 박막 트랜지스터, 및 이를 포함하는 전자 장치
EP3658601B1 (en) 2017-07-26 2021-09-08 BYK-Chemie GmbH Polymer having polyether and polysiloxane segments
KR102381661B1 (ko) 2018-06-05 2022-04-01 비와이케이-케미 게엠베하 폴리에테르 폴리에스테르 세그먼트 및 폴리실록산 세그먼트를 갖는 중합체
CN109666111B (zh) * 2018-12-27 2021-03-23 浙江东进新材料有限公司 一种纳米SiO2/有机硅改性丙烯酸酯乳液
CN109734853A (zh) * 2019-01-02 2019-05-10 中国工程物理研究院化工材料研究所 一种聚丙烯酸缩水甘油酯表面改性二氧化硅纳米粒子制备方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006072408A1 (de) 2005-01-05 2006-07-13 Wacker Chemie Ag Nanopartikelhaltige organocopolymere

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2801185A (en) * 1952-05-16 1957-07-30 Du Pont Silica hydrosol powder
USRE24906E (en) 1955-11-18 1960-12-13 Pressure-sensitive adhesive sheet material
US3842059A (en) * 1971-02-22 1974-10-15 M Chiang Acrylate and methacrylate terminated polystyrene macromolecular monomers having a substantially uniform molecular weight distribution
US3786116A (en) * 1972-08-21 1974-01-15 Cpc International Inc Chemically joined,phase separated thermoplastic graft copolymers
JPS5242527A (en) * 1975-10-01 1977-04-02 Shin Etsu Chem Co Ltd Additives for paint
US4046795A (en) * 1975-11-10 1977-09-06 Sws Silicones Corporation Process for preparing thiofunctional polysiloxane polymers
US4522958A (en) * 1983-09-06 1985-06-11 Ppg Industries, Inc. High-solids coating composition for improved rheology control containing chemically modified inorganic microparticles
CA1233290A (en) 1984-11-30 1988-02-23 General Electric Company Ultraviolet radiation-curable silicone release compositions
US4728571A (en) * 1985-07-19 1988-03-01 Minnesota Mining And Manufacturing Company Polysiloxane-grafted copolymer release coating sheets and adhesive tapes
ES2110391T3 (es) 1986-06-20 1998-02-16 Minnesota Mining & Mfg Copolimero de bloques, metodo para preparar el mismo, precursores de diamina del mismo metodo, metodo para preparar tales diaminas y productos finales que comprenden el copolimero de bloques.
US4783490A (en) * 1987-07-31 1988-11-08 General Electric Company Radiation active silicon compounds having amide limited mercaptan functional groups
US5032460A (en) * 1989-08-14 1991-07-16 Minnesota Mining And Manufacturing Company Method of making vinyl-silicone copolymers using mercapto functional silicone chain-transfer agents and release coatings made therewith
US5057619A (en) * 1989-08-14 1991-10-15 Minnesota Mining And Manufacturing Co. Siloxane iniferter compounds, block copolymers made therewith and a method of making the block copolymers
US5202190A (en) * 1989-08-14 1993-04-13 Minnesota Mining And Manufacturing Company Method of making vinyl-silicone copolymers using mercapto functional silicone chain-transfer agents and release coatings made therewith
US5648407A (en) * 1995-05-16 1997-07-15 Minnesota Mining And Manufacturing Company Curable resin sols and fiber-reinforced composites derived therefrom
WO2003022935A1 (en) * 2001-09-11 2003-03-20 3M Innovative Properties Company Smudge resistant nanocomposite hardcoats and methods for making same
JP2005133026A (ja) * 2003-10-31 2005-05-26 Lintec Corp コーティング用組成物、ハードコートフィルムおよび光ディスク
KR20070001262A (ko) * 2004-04-06 2007-01-03 바스프 악티엔게젤샤프트 ＺｎＯ 나노입자를 포함하는 미용 제제
EP1781724B1 (en) * 2004-07-14 2009-07-08 3M Innovative Properties Company Dental compositions containing carbosilane polymers
JP5000303B2 (ja) 2004-09-27 2012-08-15 新日鐵化学株式会社 シリカ含有シリコーン樹脂組成物及びその成形体
US20060134362A1 (en) * 2004-12-17 2006-06-22 3M Innovative Properties Company Optically clear pressure sensitive adhesive
JP4703180B2 (ja) 2004-12-28 2011-06-15 リンテック株式会社 コーティング用組成物、ハードコートフィルムおよび光記録媒体
US7241437B2 (en) * 2004-12-30 2007-07-10 3M Innovative Properties Company Zirconia particles
US7264872B2 (en) 2004-12-30 2007-09-04 3M Innovative Properties Company Durable high index nanocomposites for AR coatings
JP4549363B2 (ja) 2007-05-18 2010-09-22 株式会社リコー 電気泳動粒子及びこれを利用した画像表示装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006072408A1 (de) 2005-01-05 2006-07-13 Wacker Chemie Ag Nanopartikelhaltige organocopolymere

Also Published As

Publication number Publication date
EP2238182B1 (en) 2012-08-15
KR20100114046A (ko) 2010-10-22
WO2009086079A2 (en) 2009-07-09
CN101910224A (zh) 2010-12-08
CN101910224B (zh) 2012-11-14
US20100323570A1 (en) 2010-12-23
WO2009086079A3 (en) 2009-10-08
US8492496B2 (en) 2013-07-23
EP2238182A4 (en) 2011-05-04
EP2238182A2 (en) 2010-10-13
JP2011508811A (ja) 2011-03-17

Similar Documents

Publication Publication Date Title
KR101542638B1 (ko) 나노입자, 비닐단량체 및 실리콘의 공중합체
KR101542637B1 (ko) 나노입자, 비닐단량체 및 실리콘의 공중합체
JP5541939B2 (ja) アクリル系粘着剤樹脂組成物およびそれを用いた粘着シート又は粘着テープ
CN102858806B (zh) 制备杂化颗粒的方法
CN110240863A (zh) 一种改性氧化石墨烯/聚硅氧烷复合涂层材料及其制备方法和应用
KR101625697B1 (ko) 무기 나노입자 및 이로부터 제조된 중합체 복합물
JP5827369B2 (ja) ポリマーおよびナノ粒子から作製されるハイブリッド粒子
US10822532B2 (en) Silicone-based pressure-sensitive adhesive
US20070196658A1 (en) Curable composition containing surface-modified particles
CN100478363C (zh) 包含表面改性粒子的可固化组合物
Khlifa et al. Synthesis, dynamic mechanical properties of poly (styrene-co-acrylonitrile) grafting silica nanocomposites
JP2009541550A (ja) アルコキシシリル官能性オリゴマーおよび表面改質粒子
JP4228431B2 (ja) 水分散性シリコーン組成物の製造方法
KR100838614B1 (ko) 표면-변형 입자를 함유하는 경화형 조성물
Arrighi et al. Synthesis, Dynamic Mechanical Properties of Poly (Styrene-co-Acrylonitrile) Grafting Silica Nanocomposites
KR100809994B1 (ko) 표면-변형 입자를 포함하는 경화성 조성물
JPS63227670A (ja) シリコ−ン系コ−テイング剤の製造方法

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20180628

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20190801

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20190801

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000