KR101542022B1 - 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 관찰 방법 - Google Patents

하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 관찰 방법 Download PDF

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KR101542022B1
KR101542022B1 KR1020147004411A KR20147004411A KR101542022B1 KR 101542022 B1 KR101542022 B1 KR 101542022B1 KR 1020147004411 A KR1020147004411 A KR 1020147004411A KR 20147004411 A KR20147004411 A KR 20147004411A KR 101542022 B1 KR101542022 B1 KR 101542022B1
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South Korea
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housing
thin film
charged particle
sample
particle beam
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KR1020147004411A
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Korean (ko)
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KR20140048999A (ko
Inventor
유스께 오미나미
도모히사 오따끼
스께히로 이또
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가부시키가이샤 히다치 하이테크놀로지즈
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020147004411A 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 관찰 방법 Active KR101542022B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2011-205499 2011-09-21
JP2011205499A JP5707286B2 (ja) 2011-09-21 2011-09-21 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法。
PCT/JP2012/067035 WO2013042425A1 (ja) 2011-09-21 2012-07-04 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020157010657A Division KR20150052355A (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법

Publications (2)

Publication Number Publication Date
KR20140048999A KR20140048999A (ko) 2014-04-24
KR101542022B1 true KR101542022B1 (ko) 2015-08-04

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KR1020147004411A Active KR101542022B1 (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 관찰 방법
KR1020157032618A Expired - Fee Related KR101589426B1 (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법
KR1020157010657A Ceased KR20150052355A (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020157032618A Expired - Fee Related KR101589426B1 (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법
KR1020157010657A Ceased KR20150052355A (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법

Country Status (6)

Country Link
US (2) US9165741B2 (https=)
JP (1) JP5707286B2 (https=)
KR (3) KR101542022B1 (https=)
CN (1) CN103782364B (https=)
DE (1) DE112012003182B4 (https=)
WO (1) WO2013042425A1 (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法
JP6207824B2 (ja) * 2012-10-01 2017-10-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置、隔膜の位置調整方法および隔膜位置調整ジグ
CN105103262B (zh) * 2013-04-12 2017-10-10 株式会社日立高新技术 带电粒子束装置以及过滤部件
WO2015025545A1 (ja) * 2013-08-23 2015-02-26 株式会社 日立ハイテクノロジーズ 隔膜取付部材および荷電粒子線装置
GB201317026D0 (en) * 2013-09-25 2013-11-06 Oxford Instr Nanotechnology Tools Ltd X-ray analysis in air
JP6047508B2 (ja) * 2014-01-27 2016-12-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP2016213155A (ja) * 2015-05-13 2016-12-15 大日本印刷株式会社 試料収容セル
KR101682521B1 (ko) * 2015-05-15 2016-12-06 참엔지니어링(주) 시료 관찰 장치, 커버 어셈블리 및 시료 관찰 방법
KR101723922B1 (ko) * 2015-05-15 2017-04-10 참엔지니어링(주) 시료 관찰 장치 및 커버 어셈블리
JP6097863B2 (ja) * 2016-05-16 2017-03-15 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
KR102149947B1 (ko) * 2017-04-27 2020-09-02 킹 압둘라 유니버시티 오브 사이언스 앤드 테크놀로지 투과 전자 현미경 샘플 정렬 시스템 및 방법
KR101954328B1 (ko) * 2017-05-16 2019-03-06 (주)코셈 고분해능 주사전자현미경
KR102207711B1 (ko) * 2018-12-28 2021-01-26 참엔지니어링(주) 시료 관찰 장치 및 방법
JP7259891B2 (ja) 2021-06-23 2023-04-18 株式会社Ｎｈｖコーポレーション 電子線照射装置及び電子線照射装置のメンテナンス方法
KR102854784B1 (ko) * 2025-05-15 2025-09-03 (주)코셈 대기압 전자현미경의 bse 이미지를 이용하여 다중창 초박막과 샘플 사이의 안전거리를 감지 및 제어하는 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
US20080308731A1 (en) 2007-01-31 2008-12-18 Jeol Ltd. Specimen Holder, Specimen Inspection Apparatus, Specimen Inspection Method, and Method of Fabricating Specimen Holder

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5142461A (https=) * 1974-10-09 1976-04-10 Ryoji Takahashi
JPH0538526Y2 (https=) * 1987-08-28 1993-09-29
JPH02138900A (ja) * 1988-11-18 1990-05-28 Nikon Corp 電子線透過窓
JPH05234552A (ja) 1992-02-21 1993-09-10 Elionix Kk 走査電子顕微鏡
JPH06242299A (ja) * 1993-02-18 1994-09-02 Nissin High Voltage Co Ltd 照射窓
JP2889147B2 (ja) * 1995-03-01 1999-05-10 株式会社神戸製鋼所 大気圧下測定用イオンビーム分析装置のイオンビーム出口窓
EP1369897A3 (en) * 1996-03-04 2005-01-19 Canon Kabushiki Kaisha Electron beam exposure apparatus and method, and device manufacturing method
DE69721529D1 (de) 1996-06-12 2003-06-05 Ushio Internat Technologies In Monolithische Anode geeignet für Aufnahme in eine aktinische Strahlungsquelle und Herstellungsverfahren einer solchen Anode
JPH1064467A (ja) 1996-08-23 1998-03-06 Toshiba Corp 電子顕微鏡
JP2004170353A (ja) * 2002-11-22 2004-06-17 Toshiba Corp 電子線照射装置とその照射方法
JP4560321B2 (ja) * 2004-03-31 2010-10-13 株式会社Sen ウエハスキャン装置
US7740247B2 (en) * 2005-05-06 2010-06-22 Advanced Ion Beam Technology, Inc. Compound sliding seal unit suitable for atmosphere to vacuum applications
DE102007021897A1 (de) 2007-05-10 2008-11-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zum Durchführen von thermischen und nicht-thermischen Elektronenstrahlprozessen
JP5253800B2 (ja) 2007-12-26 2013-07-31 日本電子株式会社 試料保持体及び観察・検査方法並びに観察・検査装置
CN101388317B (zh) * 2008-03-21 2010-08-25 汉民微测科技(北京)有限公司 扫描电子显微镜
WO2010001399A1 (en) * 2008-07-03 2010-01-07 B-Nano A scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
US20080308731A1 (en) 2007-01-31 2008-12-18 Jeol Ltd. Specimen Holder, Specimen Inspection Apparatus, Specimen Inspection Method, and Method of Fabricating Specimen Holder

Also Published As

Publication number Publication date
JP2013069443A (ja) 2013-04-18
DE112012003182T5 (de) 2014-04-17
JP5707286B2 (ja) 2015-04-30
US9165741B2 (en) 2015-10-20
KR20140048999A (ko) 2014-04-24
KR101589426B1 (ko) 2016-01-29
CN103782364A (zh) 2014-05-07
US9673020B2 (en) 2017-06-06
KR20150052355A (ko) 2015-05-13
KR20150133299A (ko) 2015-11-27
US20140151553A1 (en) 2014-06-05
WO2013042425A1 (ja) 2013-03-28
US20150380208A1 (en) 2015-12-31
CN103782364B (zh) 2016-04-27
DE112012003182B4 (de) 2021-06-10

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