KR101478832B1 - 다수의 투영 렌즈를 구비한 투영 조명 장치 - Google Patents

다수의 투영 렌즈를 구비한 투영 조명 장치 Download PDF

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Publication number
KR101478832B1
KR101478832B1 KR20077030366A KR20077030366A KR101478832B1 KR 101478832 B1 KR101478832 B1 KR 101478832B1 KR 20077030366 A KR20077030366 A KR 20077030366A KR 20077030366 A KR20077030366 A KR 20077030366A KR 101478832 B1 KR101478832 B1 KR 101478832B1
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South Korea
Prior art keywords
projection objective
subsystem
projection
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image
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KR20077030366A
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Korean (ko)
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KR20080022125A (ko
Inventor
아우렐리안 도독
발헬름 울리히
하이코 펠트만
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR20077030366A 2005-07-01 2006-06-28 다수의 투영 렌즈를 구비한 투영 조명 장치 Expired - Fee Related KR101478832B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102005030839.2 2005-07-01
DE102005030839A DE102005030839A1 (de) 2005-07-01 2005-07-01 Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven
PCT/EP2006/063663 WO2007003563A1 (de) 2005-07-01 2006-06-28 Projektionsbelichtungsanlage mit einer mehrzahl von projektionsobjektiven

Related Child Applications (1)

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KR1020127008773A Division KR101407797B1 (ko) 2005-07-01 2006-06-28 다수의 투영 렌즈를 구비한 투영 조명 장치

Publications (2)

Publication Number Publication Date
KR20080022125A KR20080022125A (ko) 2008-03-10
KR101478832B1 true KR101478832B1 (ko) 2015-01-02

Family

ID=36955990

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Application Number Title Priority Date Filing Date
KR1020127008773A Expired - Fee Related KR101407797B1 (ko) 2005-07-01 2006-06-28 다수의 투영 렌즈를 구비한 투영 조명 장치
KR20077030366A Expired - Fee Related KR101478832B1 (ko) 2005-07-01 2006-06-28 다수의 투영 렌즈를 구비한 투영 조명 장치

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Application Number Title Priority Date Filing Date
KR1020127008773A Expired - Fee Related KR101407797B1 (ko) 2005-07-01 2006-06-28 다수의 투영 렌즈를 구비한 투영 조명 장치

Country Status (4)

Country Link
JP (2) JP6116788B2 (enExample)
KR (2) KR101407797B1 (enExample)
DE (1) DE102005030839A1 (enExample)
WO (1) WO2007003563A1 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101532824B1 (ko) 2003-04-09 2015-07-01 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI609409B (zh) 2003-10-28 2017-12-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI609410B (zh) 2004-02-06 2017-12-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
KR20170089028A (ko) 2005-05-12 2017-08-02 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 디바이스 제조 방법
US20080165333A1 (en) * 2007-01-04 2008-07-10 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
US8130364B2 (en) 2007-01-04 2012-03-06 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
WO2009050976A1 (en) 2007-10-16 2009-04-23 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
WO2009050977A1 (en) 2007-10-16 2009-04-23 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
DE102007051669A1 (de) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US8629974B2 (en) 2008-05-20 2014-01-14 Jin Ho Jung Optical component for maskless exposure apparatus
KR100952158B1 (ko) * 2008-05-20 2010-04-09 진 호 정 마스크 리스 노광장치용 마이크로프리즘 어레이
EP2282188B1 (en) 2008-05-28 2015-03-11 Nikon Corporation Illumination optical system and exposure apparatus
JP5782336B2 (ja) * 2011-08-24 2015-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
KR101903941B1 (ko) * 2012-12-18 2018-10-02 가부시키가이샤 니콘 노광 장치, 디바이스 제조 시스템 및 디바이스 제조 방법
JP6738054B2 (ja) * 2019-03-22 2020-08-12 株式会社ニコン 露光装置、並びにディスプレイ及びデバイスの製造方法
JP7623915B2 (ja) * 2021-09-14 2025-01-29 株式会社アドテックエンジニアリング 直描式露光装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1064807A (ja) * 1996-08-19 1998-03-06 Nikon Corp 縮小投影走査型露光装置
JP2001305743A (ja) * 2000-04-19 2001-11-02 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP2005001153A (ja) * 2003-06-10 2005-01-06 Fuji Photo Film Co Ltd 画素位置特定方法、画像ずれ補正方法、および画像形成装置
JP2005037914A (ja) * 2003-07-03 2005-02-10 Fuji Photo Film Co Ltd 画像形成装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL194844C (nl) * 1991-02-08 2003-04-03 Zeiss Carl Fa Catadioptrisch reductie-objectief.
JPH088169A (ja) * 1994-06-23 1996-01-12 Nikon Corp 露光装置
JP3348467B2 (ja) * 1993-06-30 2002-11-20 株式会社ニコン 露光装置及び方法
JP3316710B2 (ja) * 1993-12-22 2002-08-19 株式会社ニコン 露光装置
KR100381629B1 (ko) * 1994-08-16 2003-08-21 가부시키가이샤 니콘 노광장치
TW448487B (en) * 1997-11-22 2001-08-01 Nippon Kogaku Kk Exposure apparatus, exposure method and manufacturing method of device
JP2001154368A (ja) * 1999-11-29 2001-06-08 Nikon Corp 露光装置及び露光方法
JP2002055059A (ja) * 2000-08-10 2002-02-20 Nikon Corp 異物検査装置、露光装置、及び露光方法
JP2001201688A (ja) * 2000-12-05 2001-07-27 Nikon Corp 露光装置及び方法並びに照明装置及び方法
WO2003038479A2 (en) * 2001-10-30 2003-05-08 Optical Research Associates Structures and methods for reducing aberration in optical systems
JP2005512151A (ja) * 2001-12-10 2005-04-28 カール・ツァイス・エスエムティー・アーゲー カタジオプトリック縮小対物レンズ
JP2006047670A (ja) * 2004-08-04 2006-02-16 Nikon Corp 露光装置および露光方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1064807A (ja) * 1996-08-19 1998-03-06 Nikon Corp 縮小投影走査型露光装置
JP2001305743A (ja) * 2000-04-19 2001-11-02 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP2005001153A (ja) * 2003-06-10 2005-01-06 Fuji Photo Film Co Ltd 画素位置特定方法、画像ずれ補正方法、および画像形成装置
JP2005037914A (ja) * 2003-07-03 2005-02-10 Fuji Photo Film Co Ltd 画像形成装置

Also Published As

Publication number Publication date
KR101407797B1 (ko) 2014-06-17
JP2012168550A (ja) 2012-09-06
DE102005030839A1 (de) 2007-01-11
JP6116788B2 (ja) 2017-04-19
KR20120040755A (ko) 2012-04-27
WO2007003563A1 (de) 2007-01-11
JP6063637B2 (ja) 2017-01-18
JP2008545153A (ja) 2008-12-11
KR20080022125A (ko) 2008-03-10

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