JP6116788B2 - 複数の投影対物レンズを備えた投影露光装置 - Google Patents

複数の投影対物レンズを備えた投影露光装置 Download PDF

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Publication number
JP6116788B2
JP6116788B2 JP2008518844A JP2008518844A JP6116788B2 JP 6116788 B2 JP6116788 B2 JP 6116788B2 JP 2008518844 A JP2008518844 A JP 2008518844A JP 2008518844 A JP2008518844 A JP 2008518844A JP 6116788 B2 JP6116788 B2 JP 6116788B2
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Prior art keywords
projection
exposure apparatus
objectives
projection exposure
objective
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Japanese (ja)
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JP2008545153A (ja
JP2008545153A5 (enExample
Inventor
ドドック，アウレリアン
ユーリッヒ，ヴィルヘルム
フェルトマン，ヘイコ
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008518844A 2005-07-01 2006-06-28 複数の投影対物レンズを備えた投影露光装置 Active JP6116788B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102005030839A DE102005030839A1 (de) 2005-07-01 2005-07-01 Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven
DE102005030839.2 2005-07-01
PCT/EP2006/063663 WO2007003563A1 (de) 2005-07-01 2006-06-28 Projektionsbelichtungsanlage mit einer mehrzahl von projektionsobjektiven

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012094123A Division JP6063637B2 (ja) 2005-07-01 2012-04-17 複数の投影対物レンズを備えた投影露光装置

Publications (3)

Publication Number Publication Date
JP2008545153A JP2008545153A (ja) 2008-12-11
JP2008545153A5 JP2008545153A5 (enExample) 2009-07-09
JP6116788B2 true JP6116788B2 (ja) 2017-04-19

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ID=36955990

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JP2008518844A Active JP6116788B2 (ja) 2005-07-01 2006-06-28 複数の投影対物レンズを備えた投影露光装置
JP2012094123A Expired - Fee Related JP6063637B2 (ja) 2005-07-01 2012-04-17 複数の投影対物レンズを備えた投影露光装置

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JP2012094123A Expired - Fee Related JP6063637B2 (ja) 2005-07-01 2012-04-17 複数の投影対物レンズを備えた投影露光装置

Country Status (4)

Country Link
JP (2) JP6116788B2 (enExample)
KR (2) KR101478832B1 (enExample)
DE (1) DE102005030839A1 (enExample)
WO (1) WO2007003563A1 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101547077B1 (ko) 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
KR101762083B1 (ko) 2005-05-12 2017-07-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US8130364B2 (en) * 2007-01-04 2012-03-06 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
US20080165333A1 (en) * 2007-01-04 2008-07-10 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
SG185313A1 (en) 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
CN101681123B (zh) 2007-10-16 2013-06-12 株式会社尼康 照明光学系统、曝光装置以及元件制造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
DE102007051669A1 (de) 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
KR100952158B1 (ko) * 2008-05-20 2010-04-09 진 호 정 마스크 리스 노광장치용 마이크로프리즘 어레이
WO2009142440A2 (ko) * 2008-05-20 2009-11-26 Jung Jin Ho 마스크 리스 노광장치용 광학부품
CN105606344B (zh) 2008-05-28 2019-07-30 株式会社尼康 照明光学系统、照明方法、曝光装置以及曝光方法
JP5782336B2 (ja) * 2011-08-24 2015-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
CN104871091B (zh) 2012-12-18 2017-06-30 株式会社尼康 基板处理装置、器件制造系统及器件制造方法
JP6738054B2 (ja) * 2019-03-22 2020-08-12 株式会社ニコン 露光装置、並びにディスプレイ及びデバイスの製造方法
JP7623915B2 (ja) * 2021-09-14 2025-01-29 株式会社アドテックエンジニアリング 直描式露光装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL194844C (nl) * 1991-02-08 2003-04-03 Zeiss Carl Fa Catadioptrisch reductie-objectief.
JP3348467B2 (ja) * 1993-06-30 2002-11-20 株式会社ニコン 露光装置及び方法
JPH088169A (ja) * 1994-06-23 1996-01-12 Nikon Corp 露光装置
JP3316710B2 (ja) * 1993-12-22 2002-08-19 株式会社ニコン 露光装置
KR100381629B1 (ko) * 1994-08-16 2003-08-21 가부시키가이샤 니콘 노광장치
JPH1064807A (ja) * 1996-08-19 1998-03-06 Nikon Corp 縮小投影走査型露光装置
TW448487B (en) * 1997-11-22 2001-08-01 Nippon Kogaku Kk Exposure apparatus, exposure method and manufacturing method of device
JP2001154368A (ja) * 1999-11-29 2001-06-08 Nikon Corp 露光装置及び露光方法
JP4505666B2 (ja) * 2000-04-19 2010-07-21 株式会社ニコン 露光装置、照明装置及びマイクロデバイスの製造方法
JP2002055059A (ja) * 2000-08-10 2002-02-20 Nikon Corp 異物検査装置、露光装置、及び露光方法
JP2001201688A (ja) * 2000-12-05 2001-07-27 Nikon Corp 露光装置及び方法並びに照明装置及び方法
EP1451619A4 (en) * 2001-10-30 2007-10-03 Asml Netherlands Bv STRUCTURES AND METHOD FOR REDUCING BERRATION IN OPTICAL SYSTEMS
EP1456705A2 (de) * 2001-12-10 2004-09-15 Carl Zeiss SMT AG Katadioptrisches reduktionsobjektiv
JP4322564B2 (ja) * 2003-06-10 2009-09-02 富士フイルム株式会社 画素位置特定方法、画像ずれ補正方法、および画像形成装置
JP4874529B2 (ja) * 2003-07-03 2012-02-15 富士フイルム株式会社 画像形成装置
JP2006047670A (ja) * 2004-08-04 2006-02-16 Nikon Corp 露光装置および露光方法

Also Published As

Publication number Publication date
JP2012168550A (ja) 2012-09-06
WO2007003563A1 (de) 2007-01-11
JP2008545153A (ja) 2008-12-11
DE102005030839A1 (de) 2007-01-11
JP6063637B2 (ja) 2017-01-18
KR20080022125A (ko) 2008-03-10
KR20120040755A (ko) 2012-04-27
KR101407797B1 (ko) 2014-06-17
KR101478832B1 (ko) 2015-01-02

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