KR101465425B1 - 실리콘 단결정의 육성방법 - Google Patents

실리콘 단결정의 육성방법 Download PDF

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Publication number
KR101465425B1
KR101465425B1 KR1020097024707A KR20097024707A KR101465425B1 KR 101465425 B1 KR101465425 B1 KR 101465425B1 KR 1020097024707 A KR1020097024707 A KR 1020097024707A KR 20097024707 A KR20097024707 A KR 20097024707A KR 101465425 B1 KR101465425 B1 KR 101465425B1
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single crystal
carbon
silicon
silicon single
raw material
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Korean (ko)
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KR20100017406A (ko
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료지 호시
스스므 소노카와
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신에쯔 한도타이 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
    • C30B15/04—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt adding doping materials, e.g. for n-p-junction
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
KR1020097024707A 2007-05-30 2008-04-18 실리콘 단결정의 육성방법 Active KR101465425B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2007-142988 2007-05-30
JP2007142988A JP5061728B2 (ja) 2007-05-30 2007-05-30 シリコン単結晶の育成方法
PCT/JP2008/001029 WO2008146443A1 (ja) 2007-05-30 2008-04-18 シリコン単結晶の育成方法

Publications (2)

Publication Number Publication Date
KR20100017406A KR20100017406A (ko) 2010-02-16
KR101465425B1 true KR101465425B1 (ko) 2014-11-26

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ID=40074721

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KR1020097024707A Active KR101465425B1 (ko) 2007-05-30 2008-04-18 실리콘 단결정의 육성방법

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Country Link
US (1) US20100116195A1 (enExample)
JP (1) JP5061728B2 (enExample)
KR (1) KR101465425B1 (enExample)
DE (1) DE112008001201T5 (enExample)
WO (1) WO2008146443A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5510359B2 (ja) * 2011-02-21 2014-06-04 信越半導体株式会社 炭素ドープシリコン単結晶の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58151392A (ja) * 1982-02-26 1983-09-08 Sumitomo Metal Mining Co Ltd かさ比重の大きい酸化物単結晶引上げ用原料の調整方法
JP2002068886A (ja) * 2000-08-31 2002-03-08 Shin Etsu Handotai Co Ltd 半導体単結晶製造装置及び黒鉛部材評価方法
JP2002293691A (ja) * 2001-03-30 2002-10-09 Shin Etsu Handotai Co Ltd シリコン単結晶の製造方法及びシリコン単結晶並びにシリコンウエーハ
JP2003146769A (ja) * 2001-07-11 2003-05-21 Sgl Carbon Ag 多層セラミックス複合体とその製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3980854A (en) * 1974-11-15 1976-09-14 Rca Corporation Graphite susceptor structure for inductively heating semiconductor wafers
JPS6033210A (ja) * 1983-08-02 1985-02-20 Komatsu Denshi Kinzoku Kk 半導体用シリコンの破砕方法
DE4106589C2 (de) * 1991-03-01 1997-04-24 Wacker Siltronic Halbleitermat Kontinuierliches Nachchargierverfahren mit flüssigem Silicium beim Tiegelziehen nach Czochralski
TW429273B (en) * 1996-02-08 2001-04-11 Shinetsu Handotai Kk Method for feeding garnular silicon material, feed pipe used in the method, and method of manufacturing a silicon monocrystal
EP0871233B1 (en) * 1996-07-30 2000-01-12 Sony Corporation Non-aqueous electrolyte secondary battery
JPH11302099A (ja) 1998-04-21 1999-11-02 Sumitomo Metal Ind Ltd シリコン単結晶の製造方法
JPH11312683A (ja) 1998-04-28 1999-11-09 Sumitomo Metal Ind Ltd 半導体単結晶シリコンの製造方法
WO2003005417A2 (en) * 2001-07-05 2003-01-16 Axt, Inc. Method and apparatus for growing semiconductor crystals with a rigid support
KR20030035152A (ko) * 2001-10-30 2003-05-09 주식회사 하이닉스반도체 반도체웨이퍼 제조방법
US20030101924A1 (en) * 2001-11-15 2003-06-05 Memc Electronic Materials, Inc. Intermittent feeding technique for increasing the melting rate of polycrystalline silicon
JP4507690B2 (ja) 2004-05-10 2010-07-21 信越半導体株式会社 シリコン単結晶の製造方法及びシリコン単結晶
JP4992425B2 (ja) * 2004-08-30 2012-08-08 三菱化学株式会社 非水系二次電池用負極材料、非水系二次電池用負極、および非水系二次電池

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58151392A (ja) * 1982-02-26 1983-09-08 Sumitomo Metal Mining Co Ltd かさ比重の大きい酸化物単結晶引上げ用原料の調整方法
JP2002068886A (ja) * 2000-08-31 2002-03-08 Shin Etsu Handotai Co Ltd 半導体単結晶製造装置及び黒鉛部材評価方法
JP2002293691A (ja) * 2001-03-30 2002-10-09 Shin Etsu Handotai Co Ltd シリコン単結晶の製造方法及びシリコン単結晶並びにシリコンウエーハ
JP2003146769A (ja) * 2001-07-11 2003-05-21 Sgl Carbon Ag 多層セラミックス複合体とその製造方法

Also Published As

Publication number Publication date
JP2008297139A (ja) 2008-12-11
DE112008001201T5 (de) 2010-08-05
KR20100017406A (ko) 2010-02-16
US20100116195A1 (en) 2010-05-13
JP5061728B2 (ja) 2012-10-31
WO2008146443A1 (ja) 2008-12-04

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