KR101455614B1 - 초음파 세정방법 - Google Patents

초음파 세정방법 Download PDF

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Publication number
KR101455614B1
KR101455614B1 KR1020097015019A KR20097015019A KR101455614B1 KR 101455614 B1 KR101455614 B1 KR 101455614B1 KR 1020097015019 A KR1020097015019 A KR 1020097015019A KR 20097015019 A KR20097015019 A KR 20097015019A KR 101455614 B1 KR101455614 B1 KR 101455614B1
Authority
KR
South Korea
Prior art keywords
cleaning
ultrasonic
ultrasonic waves
cleaning liquid
cleaned
Prior art date
Application number
KR1020097015019A
Other languages
English (en)
Korean (ko)
Other versions
KR20090116708A (ko
Inventor
히로시 마사키
노부오 쓰마키
테루타카 사하라
요시미쯔 키타다
요이치로 마쓰모토
신 요시자와
Original Assignee
가부시끼가이샤 히다치 세이사꾸쇼
고쿠리츠다이가쿠호우진 도쿄다이가쿠
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시끼가이샤 히다치 세이사꾸쇼, 고쿠리츠다이가쿠호우진 도쿄다이가쿠 filed Critical 가부시끼가이샤 히다치 세이사꾸쇼
Publication of KR20090116708A publication Critical patent/KR20090116708A/ko
Application granted granted Critical
Publication of KR101455614B1 publication Critical patent/KR101455614B1/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/003—Cleaning involving contact with foam
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)
KR1020097015019A 2007-02-07 2008-02-04 초음파 세정방법 KR101455614B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007028438A JP5127257B2 (ja) 2007-02-07 2007-02-07 超音波洗浄方法
JPJP-P-2007-028438 2007-02-07
PCT/JP2008/051736 WO2008096696A1 (fr) 2007-02-07 2008-02-04 Procédé de nettoyage par ultrasons

Publications (2)

Publication Number Publication Date
KR20090116708A KR20090116708A (ko) 2009-11-11
KR101455614B1 true KR101455614B1 (ko) 2014-11-03

Family

ID=39681606

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097015019A KR101455614B1 (ko) 2007-02-07 2008-02-04 초음파 세정방법

Country Status (5)

Country Link
JP (1) JP5127257B2 (fr)
KR (1) KR101455614B1 (fr)
CN (1) CN101605615B (fr)
TW (1) TWI422439B (fr)
WO (1) WO2008096696A1 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101797567A (zh) * 2010-03-24 2010-08-11 北京泰克美科技有限公司 混合波长超声波处理器
CN102662267A (zh) * 2012-04-25 2012-09-12 深圳市华星光电技术有限公司 液晶面板的制作方法
US9151980B2 (en) 2012-04-25 2015-10-06 Shenzhen China Star Optoelectronics Technology Co., Ltd. Method for manufacturing liquid crystal panel
JP2015185813A (ja) * 2014-03-26 2015-10-22 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄方法および基板洗浄装置
JP2016058665A (ja) * 2014-09-12 2016-04-21 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄方法および基板洗浄装置
SG11201804657QA (en) * 2015-12-09 2018-06-28 Acm Res Shanghai Inc Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device
JP7032816B2 (ja) * 2016-09-19 2022-03-09 エーシーエム リサーチ （シャンハイ） インコーポレーテッド 基板の洗浄方法及び洗浄装置
JP7059046B2 (ja) * 2018-02-27 2022-04-25 キヤノン株式会社 型を用いて基板上の組成物を成形する成形装置、および物品の製造方法
CN113695307B (zh) * 2020-05-20 2022-12-02 天津嘉林科医有限公司 一种盛放阿托伐他汀钙的玻璃器皿的清洗方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6115334A (ja) * 1984-07-02 1986-01-23 Tasu Gijutsu Kenkyusho:Kk 超音波洗浄方法
JP2006110418A (ja) * 2004-10-12 2006-04-27 Univ Of Tokyo 超音波洗浄装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2418967Y (zh) * 2000-04-12 2001-02-14 任蓬山 超声波管道除垢器
CN2520221Y (zh) * 2002-01-23 2002-11-13 陈胜军 超声波清洗油桶装置
US20040055621A1 (en) * 2002-09-24 2004-03-25 Air Products And Chemicals, Inc. Processing of semiconductor components with dense processing fluids and ultrasonic energy
CN1712580A (zh) * 2004-06-22 2005-12-28 上海康维科技发展有限公司 一种沾有聚氨酯的过滤片或过滤芯的清洗方法
US7361231B2 (en) * 2005-07-01 2008-04-22 Ekc Technology, Inc. System and method for mid-pressure dense phase gas and ultrasonic cleaning

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6115334A (ja) * 1984-07-02 1986-01-23 Tasu Gijutsu Kenkyusho:Kk 超音波洗浄方法
JP2006110418A (ja) * 2004-10-12 2006-04-27 Univ Of Tokyo 超音波洗浄装置

Also Published As

Publication number Publication date
TW200904555A (en) 2009-02-01
WO2008096696A1 (fr) 2008-08-14
TWI422439B (zh) 2014-01-11
CN101605615B (zh) 2010-12-08
CN101605615A (zh) 2009-12-16
JP5127257B2 (ja) 2013-01-23
JP2008188563A (ja) 2008-08-21
KR20090116708A (ko) 2009-11-11

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E902 Notification of reason for refusal
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