JP5127257B2 - 超音波洗浄方法 - Google Patents

超音波洗浄方法 Download PDF

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Publication number
JP5127257B2
JP5127257B2 JP2007028438A JP2007028438A JP5127257B2 JP 5127257 B2 JP5127257 B2 JP 5127257B2 JP 2007028438 A JP2007028438 A JP 2007028438A JP 2007028438 A JP2007028438 A JP 2007028438A JP 5127257 B2 JP5127257 B2 JP 5127257B2
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JP
Japan
Prior art keywords
cleaning
ultrasonic
cleaning liquid
ultrasonic waves
msec
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007028438A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008188563A (ja
Inventor
広志 正木
伸夫 妻木
輝隆 佐原
由光 北田
洋一郎 松本
晋 吉澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Plant Technologies Ltd
University of Tokyo NUC
Original Assignee
Hitachi Plant Technologies Ltd
University of Tokyo NUC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Plant Technologies Ltd, University of Tokyo NUC filed Critical Hitachi Plant Technologies Ltd
Priority to JP2007028438A priority Critical patent/JP5127257B2/ja
Priority to CN2008800040425A priority patent/CN101605615B/zh
Priority to TW097104361A priority patent/TWI422439B/zh
Priority to PCT/JP2008/051736 priority patent/WO2008096696A1/fr
Priority to KR1020097015019A priority patent/KR101455614B1/ko
Publication of JP2008188563A publication Critical patent/JP2008188563A/ja
Application granted granted Critical
Publication of JP5127257B2 publication Critical patent/JP5127257B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/003—Cleaning involving contact with foam
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)
JP2007028438A 2007-02-07 2007-02-07 超音波洗浄方法 Expired - Fee Related JP5127257B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007028438A JP5127257B2 (ja) 2007-02-07 2007-02-07 超音波洗浄方法
CN2008800040425A CN101605615B (zh) 2007-02-07 2008-02-04 超声波洗涤方法
TW097104361A TWI422439B (zh) 2007-02-07 2008-02-04 Ultrasonic cleaning method
PCT/JP2008/051736 WO2008096696A1 (fr) 2007-02-07 2008-02-04 Procédé de nettoyage par ultrasons
KR1020097015019A KR101455614B1 (ko) 2007-02-07 2008-02-04 초음파 세정방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007028438A JP5127257B2 (ja) 2007-02-07 2007-02-07 超音波洗浄方法

Publications (2)

Publication Number Publication Date
JP2008188563A JP2008188563A (ja) 2008-08-21
JP5127257B2 true JP5127257B2 (ja) 2013-01-23

Family

ID=39681606

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007028438A Expired - Fee Related JP5127257B2 (ja) 2007-02-07 2007-02-07 超音波洗浄方法

Country Status (5)

Country Link
JP (1) JP5127257B2 (fr)
KR (1) KR101455614B1 (fr)
CN (1) CN101605615B (fr)
TW (1) TWI422439B (fr)
WO (1) WO2008096696A1 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101797567A (zh) * 2010-03-24 2010-08-11 北京泰克美科技有限公司 混合波长超声波处理器
US9151980B2 (en) 2012-04-25 2015-10-06 Shenzhen China Star Optoelectronics Technology Co., Ltd. Method for manufacturing liquid crystal panel
CN102662267A (zh) * 2012-04-25 2012-09-12 深圳市华星光电技术有限公司 液晶面板的制作方法
JP2015185813A (ja) * 2014-03-26 2015-10-22 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄方法および基板洗浄装置
JP2016058665A (ja) * 2014-09-12 2016-04-21 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄方法および基板洗浄装置
WO2017096553A1 (fr) * 2015-12-09 2017-06-15 Acm Research (Shanghai) Inc. Procédé et appareil de nettoyage de substrats à l'aide de substances chimiques à haute température, et dispositif ultrasonore
US11103898B2 (en) * 2016-09-19 2021-08-31 Acm Research, Inc. Methods and apparatus for cleaning substrates
JP7059046B2 (ja) * 2018-02-27 2022-04-25 キヤノン株式会社 型を用いて基板上の組成物を成形する成形装置、および物品の製造方法
CN113695307B (zh) * 2020-05-20 2022-12-02 天津嘉林科医有限公司 一种盛放阿托伐他汀钙的玻璃器皿的清洗方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6115334A (ja) * 1984-07-02 1986-01-23 Tasu Gijutsu Kenkyusho:Kk 超音波洗浄方法
CN2418967Y (zh) * 2000-04-12 2001-02-14 任蓬山 超声波管道除垢器
CN2520221Y (zh) * 2002-01-23 2002-11-13 陈胜军 超声波清洗油桶装置
US20040055621A1 (en) * 2002-09-24 2004-03-25 Air Products And Chemicals, Inc. Processing of semiconductor components with dense processing fluids and ultrasonic energy
CN1712580A (zh) * 2004-06-22 2005-12-28 上海康维科技发展有限公司 一种沾有聚氨酯的过滤片或过滤芯的清洗方法
JP4442383B2 (ja) * 2004-10-12 2010-03-31 国立大学法人 東京大学 超音波洗浄装置
US7361231B2 (en) * 2005-07-01 2008-04-22 Ekc Technology, Inc. System and method for mid-pressure dense phase gas and ultrasonic cleaning

Also Published As

Publication number Publication date
KR20090116708A (ko) 2009-11-11
CN101605615B (zh) 2010-12-08
TWI422439B (zh) 2014-01-11
CN101605615A (zh) 2009-12-16
KR101455614B1 (ko) 2014-11-03
JP2008188563A (ja) 2008-08-21
TW200904555A (en) 2009-02-01
WO2008096696A1 (fr) 2008-08-14

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