WO2008096696A1 - Procédé de nettoyage par ultrasons - Google Patents

Procédé de nettoyage par ultrasons Download PDF

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Publication number
WO2008096696A1
WO2008096696A1 PCT/JP2008/051736 JP2008051736W WO2008096696A1 WO 2008096696 A1 WO2008096696 A1 WO 2008096696A1 JP 2008051736 W JP2008051736 W JP 2008051736W WO 2008096696 A1 WO2008096696 A1 WO 2008096696A1
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning
ultrasonic wave
cleaning method
msec
cleaned
Prior art date
Application number
PCT/JP2008/051736
Other languages
English (en)
Japanese (ja)
Inventor
Hiroshi Masaki
Nobuo Tsumaki
Terutaka Sahara
Yoshimitsu Kitada
Youichirou Matsumoto
Shin Yoshizawa
Original Assignee
Hitachi Plant Technologies, Ltd.
The University Of Tokyo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Plant Technologies, Ltd., The University Of Tokyo filed Critical Hitachi Plant Technologies, Ltd.
Priority to CN2008800040425A priority Critical patent/CN101605615B/zh
Priority to KR1020097015019A priority patent/KR101455614B1/ko
Publication of WO2008096696A1 publication Critical patent/WO2008096696A1/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/003—Cleaning involving contact with foam
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)

Abstract

Dans un procédé de nettoyage par ultrasons, une onde ultrasonore est appliquée à un liquide de nettoyage contenant du gaz dissous pour nettoyer un objet. Le procédé répète une étape d'application en continu d'une onde ultrasonore pendant au moins 0,2 msec et une étape de non application de l'onde ultrasonore pendant au moins 0,1 msec à un cycle prédéterminé. Le procédé évite la génération de bulles d'air rugueuses et de grande taille qui inhibent la transmission d'une onde ultrasonore et génèrent de façon efficace une contribution radicale au nettoyage, nettoyant ainsi de façon efficace l'objet à nettoyer.
PCT/JP2008/051736 2007-02-07 2008-02-04 Procédé de nettoyage par ultrasons WO2008096696A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN2008800040425A CN101605615B (zh) 2007-02-07 2008-02-04 超声波洗涤方法
KR1020097015019A KR101455614B1 (ko) 2007-02-07 2008-02-04 초음파 세정방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007028438A JP5127257B2 (ja) 2007-02-07 2007-02-07 超音波洗浄方法
JP2007-028438 2007-10-17

Publications (1)

Publication Number Publication Date
WO2008096696A1 true WO2008096696A1 (fr) 2008-08-14

Family

ID=39681606

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/051736 WO2008096696A1 (fr) 2007-02-07 2008-02-04 Procédé de nettoyage par ultrasons

Country Status (5)

Country Link
JP (1) JP5127257B2 (fr)
KR (1) KR101455614B1 (fr)
CN (1) CN101605615B (fr)
TW (1) TWI422439B (fr)
WO (1) WO2008096696A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3515611A4 (fr) * 2016-09-19 2020-05-13 ACM Research (Shanghai) Inc. Procédés et appareil de nettoyage de substrats
CN113695307A (zh) * 2020-05-20 2021-11-26 天津嘉林科医有限公司 一种盛放阿托伐他汀钙的玻璃器皿的清洗方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101797567A (zh) * 2010-03-24 2010-08-11 北京泰克美科技有限公司 混合波长超声波处理器
CN102662267A (zh) * 2012-04-25 2012-09-12 深圳市华星光电技术有限公司 液晶面板的制作方法
US9151980B2 (en) 2012-04-25 2015-10-06 Shenzhen China Star Optoelectronics Technology Co., Ltd. Method for manufacturing liquid crystal panel
JP2015185813A (ja) * 2014-03-26 2015-10-22 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄方法および基板洗浄装置
JP2016058665A (ja) * 2014-09-12 2016-04-21 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄方法および基板洗浄装置
US11000782B2 (en) * 2015-12-09 2021-05-11 Acm Research (Shanghai) Inc. Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device
JP7059046B2 (ja) * 2018-02-27 2022-04-25 キヤノン株式会社 型を用いて基板上の組成物を成形する成形装置、および物品の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6115334A (ja) * 1984-07-02 1986-01-23 Tasu Gijutsu Kenkyusho:Kk 超音波洗浄方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2418967Y (zh) * 2000-04-12 2001-02-14 任蓬山 超声波管道除垢器
CN2520221Y (zh) * 2002-01-23 2002-11-13 陈胜军 超声波清洗油桶装置
US20040055621A1 (en) * 2002-09-24 2004-03-25 Air Products And Chemicals, Inc. Processing of semiconductor components with dense processing fluids and ultrasonic energy
CN1712580A (zh) * 2004-06-22 2005-12-28 上海康维科技发展有限公司 一种沾有聚氨酯的过滤片或过滤芯的清洗方法
JP4442383B2 (ja) * 2004-10-12 2010-03-31 国立大学法人 東京大学 超音波洗浄装置
US7361231B2 (en) * 2005-07-01 2008-04-22 Ekc Technology, Inc. System and method for mid-pressure dense phase gas and ultrasonic cleaning

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6115334A (ja) * 1984-07-02 1986-01-23 Tasu Gijutsu Kenkyusho:Kk 超音波洗浄方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3515611A4 (fr) * 2016-09-19 2020-05-13 ACM Research (Shanghai) Inc. Procédés et appareil de nettoyage de substrats
CN113695307A (zh) * 2020-05-20 2021-11-26 天津嘉林科医有限公司 一种盛放阿托伐他汀钙的玻璃器皿的清洗方法

Also Published As

Publication number Publication date
JP5127257B2 (ja) 2013-01-23
CN101605615A (zh) 2009-12-16
JP2008188563A (ja) 2008-08-21
TW200904555A (en) 2009-02-01
KR20090116708A (ko) 2009-11-11
CN101605615B (zh) 2010-12-08
KR101455614B1 (ko) 2014-11-03
TWI422439B (zh) 2014-01-11

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