KR101442255B1 - 착색층 형성용 감방사선성 조성물 - Google Patents

착색층 형성용 감방사선성 조성물 Download PDF

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Publication number
KR101442255B1
KR101442255B1 KR1020080022339A KR20080022339A KR101442255B1 KR 101442255 B1 KR101442255 B1 KR 101442255B1 KR 1020080022339 A KR1020080022339 A KR 1020080022339A KR 20080022339 A KR20080022339 A KR 20080022339A KR 101442255 B1 KR101442255 B1 KR 101442255B1
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South Korea
Prior art keywords
radiation
weight
meth
acid
group
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KR1020080022339A
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English (en)
Korean (ko)
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KR20080083585A (ko
Inventor
교우이찌로우 류우
다이고 이찌노헤
Original Assignee
제이에스알 가부시끼가이샤
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Publication of KR20080083585A publication Critical patent/KR20080083585A/ko
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Publication of KR101442255B1 publication Critical patent/KR101442255B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020080022339A 2007-03-12 2008-03-11 착색층 형성용 감방사선성 조성물 KR101442255B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007062014A JP4910792B2 (ja) 2007-03-12 2007-03-12 着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示素子
JPJP-P-2007-00062014 2007-03-12

Publications (2)

Publication Number Publication Date
KR20080083585A KR20080083585A (ko) 2008-09-18
KR101442255B1 true KR101442255B1 (ko) 2014-09-19

Family

ID=39843674

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080022339A KR101442255B1 (ko) 2007-03-12 2008-03-11 착색층 형성용 감방사선성 조성물

Country Status (5)

Country Link
JP (1) JP4910792B2 (zh)
KR (1) KR101442255B1 (zh)
CN (1) CN101266407B (zh)
SG (1) SG146550A1 (zh)
TW (1) TWI456349B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2243622A3 (en) * 2009-04-22 2015-06-03 Canon Kabushiki Kaisha Method for producing optical part
CN102375341B (zh) * 2010-07-30 2016-04-06 日立化成工业株式会社 感光性树脂组合物、元件、抗蚀剂图形和引线框的制造方法、印刷线路板及其制造方法
JP2014048428A (ja) * 2012-08-30 2014-03-17 Jsr Corp 感放射線性組成物、表示素子用硬化膜の形成方法、表示素子用硬化膜及び表示素子
CN110520796A (zh) * 2017-06-20 2019-11-29 株式会社艾迪科 聚合性组合物、黑色矩阵用感光性组合物及黑色柱状间隔物用感光性组合物
CN109324479A (zh) * 2017-08-01 2019-02-12 北京英力科技发展有限公司 一种光刻胶组合物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58157805A (ja) * 1982-02-26 1983-09-20 チバ−ガイギ−・アクチエンゲゼルシヤフト 光硬化性着色組成物
JPH1069079A (ja) * 1996-08-26 1998-03-10 Fuji Photo Film Co Ltd 光重合性組成物、それを用いたカラーフィルター及びその製造方法
JPH1090891A (ja) * 1996-09-10 1998-04-10 Fuji Photo Film Co Ltd 光重合性組成物

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW434456B (en) * 1994-12-30 2001-05-16 Novartis Ag A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate
AU6612796A (en) * 1995-07-19 1997-02-18 Ciba Specialty Chemicals Holding Inc. Heterogeneous photo-initiators, photopolymerisable compositions and their use
JP2004264384A (ja) * 2003-02-28 2004-09-24 Jsr Corp 感放射線性樹脂組成物および液晶表示素子
JP4561101B2 (ja) * 2003-03-06 2010-10-13 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物およびカラーフィルタ
JP4678271B2 (ja) * 2005-09-26 2011-04-27 Ｊｓｒ株式会社 感光性樹脂組成物、液晶表示パネル用保護膜およびスペーサー、それらを具備してなる液晶表示パネル

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58157805A (ja) * 1982-02-26 1983-09-20 チバ−ガイギ−・アクチエンゲゼルシヤフト 光硬化性着色組成物
JPH1069079A (ja) * 1996-08-26 1998-03-10 Fuji Photo Film Co Ltd 光重合性組成物、それを用いたカラーフィルター及びその製造方法
JPH1090891A (ja) * 1996-09-10 1998-04-10 Fuji Photo Film Co Ltd 光重合性組成物

Also Published As

Publication number Publication date
JP2008224964A (ja) 2008-09-25
CN101266407A (zh) 2008-09-17
SG146550A1 (en) 2008-10-30
TWI456349B (zh) 2014-10-11
KR20080083585A (ko) 2008-09-18
CN101266407B (zh) 2014-11-05
JP4910792B2 (ja) 2012-04-04
TW200844661A (en) 2008-11-16

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