TW200844661A - Radiation-sensitive composition for forming colored layer - Google Patents

Radiation-sensitive composition for forming colored layer Download PDF

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TW200844661A
TW200844661A TW097108526A TW97108526A TW200844661A TW 200844661 A TW200844661 A TW 200844661A TW 097108526 A TW097108526 A TW 097108526A TW 97108526 A TW97108526 A TW 97108526A TW 200844661 A TW200844661 A TW 200844661A
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Taiwan
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acid
meth
weight
pigment
methyl
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TW097108526A
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Chinese (zh)
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TWI456349B (en
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Kyouichirou Ryuu
Daigo Ichinohe
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Jsr Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Provided is a radiation-sensitive composition used in the formation of a colored layer of a color filter, which can suppress contamination of a baking furnace, a photomask and the like due to sublimation of a radiation-sensitive polymerization initiator component, and which is free from the formation of foreign bodies in a solution yet also has excellent developability, patterned shape and the like. The radiation-sensitive resin composition for forming the colored layer, contains a colorant (A), an alkali-soluble resin (B), a polyfunctional monomer (C) and a radiation-sensitive polymerization initiator (D) containing as an essential component a compound represented by the following general formula (1)

Description

200844661 九、發明說明 【發明所屬之技術領域】 本發明係關於著色層形成用敏輻射線性組成物，濾色 片及液晶顯示元件，更詳言之，係關於透過型或反射型之 彩色液晶顯示裝置，對彩色成像（imaging)管元件等所使用 之濾色片爲有用的著色層之形成所使用之敏輻射線性組成 物，具有由該敏輻射線性組成物所形成之著色層的濾色片 ’以及具備該濾色片之液晶顯示元件。 【先前技術】 習知，在使用著色敏輻射線性組成物於製造濾色片的 時候，係在基板上或在預先形成設定圖型之遮光層的基板 上，在將著色敏輻射線性組成物塗佈進行乾燥後，將塗膜 於設定之圖型形狀照射輻射線（以下，稱爲「曝光」），予 以顯影，獲得各色像素之形成方法（參照例如專利文獻1， 專利文獻2)爲周知。 又近年來由於液晶顯示面板之大面積化或生產性之提 高等，使得基質玻璃（mother glass)基板之尺寸日益大型 化。但是伴隨基板之大型化，在濾色片之形成時敏輻射線 性組成物中敏輻射線性聚合引發劑成份進行昇華，污染燒 成爐或光罩之問題因會造成生產節奏之降低及生產成本之 上昇故爲吾人所擔憂。 進而在爲本發明人專利申請案之專利文獻3有揭示， 作爲敏輻射線性組成物之敏輻射線性聚合引發劑，藉由使 -4- 200844661 用1-(2-溴-4-嗎啉代苯基苄基-2-二甲基胺基丁烷-1-酮 或1-(3-溴-4-嗎啉代苯基）_2_苄基-2-二甲基胺基丁烷-1-酮 等溴取代乙醯苯系化合物，使敏輻射線性聚合引發劑成份 之昇華所致燒成爐或排氣管（duct)之污染，在重覆使用顯 影液之情形之顯影線（line)中所設之過濾器之堵塞等可予 減低之事項。 [專利文獻1 ]日本特開平2-144502號公報 [專利文獻2 ]日本特開平3-53201號公報 [專利文獻3 ]日本特開200 1 -23 56 1 7號公報 但是，在包含專利文獻3記載之物，在濾色片之形成 所使用習知之敏輻射線性組成物，於防止敏輻射線性聚合 引發劑成份之昇華所致燒成爐或光罩等污染及液中異物發 生之方面並非充分，一倂具備該等特性之敏輻射線性組成 物之開發則被強烈企望。 【發明內容】 [發明欲解決之課題] 本發明之課題，係提供一種可抑制敏輻射線性聚合引 發劑成份之昇華所致燒成爐或光罩等污染，且液中異物不 致產生，而且顯影性，圖型形狀等亦優異，濾色片之著色 層形成所使用之敏輻射線性組成物，具備由該敏輻射線性 組成物所形成之著色層的濾色片及具備該濾色片之液晶顯 示面板。 200844661 [解決課題之手段] 本發明，第一係提供一種含有：（A)著色劑，（B)驗可 溶性樹脂，（C)多官能性單體及（D)下述一般式（1)所示化合 物爲必須成份之敏輻射線性聚合引發劑爲其特徵之者色層 . 形成用敏輻射線性樹脂組成物。 v [化1 ]200844661 IX. INSTRUCTIONS OF THE INVENTION [Technical Field] The present invention relates to a linear composition of sensitive radiation for forming a colored layer, a color filter and a liquid crystal display element, and more particularly, a transmissive or reflective type color liquid crystal display The device, the color filter used for coloring the tube member, etc., is a sensitive radiation linear composition used for the formation of a useful coloring layer, and a color filter having a colored layer formed by the linear composition of the sensitive radiation. 'and a liquid crystal display element having the color filter. [Prior Art] Conventionally, when a coloring sensitive radiation linear composition is used for manufacturing a color filter, a linear composition of a coloring sensitive radiation is applied on a substrate or on a substrate on which a light-shielding layer of a predetermined pattern is formed in advance. After drying the cloth, the coating film is irradiated with radiation (hereinafter referred to as "exposure") in a predetermined pattern shape, and developed to obtain a method of forming each color pixel (see, for example, Patent Document 1, Patent Document 2). In recent years, the size of the mother glass substrate has been increasing in size due to the large area of the liquid crystal display panel or the improvement in productivity. However, with the enlargement of the substrate, the sensitive radiation linear polymerization initiator component in the linear composition of the sensitive radiation is sublimated in the formation of the color filter, and the problem of polluting the firing furnace or the photomask causes a decrease in production rhythm and production cost. It is a worry for us to rise. Further, in Patent Document 3 which is the inventor's patent application, it is disclosed as a linear radiation polymerization initiator for a linear radiation sensitive composition by using 1-(2-bromo-4-morpholino) for -4-200844661 Phenylbenzyl-2-dimethylaminobutan-1-one or 1-(3-bromo-4-morpholinophenyl)_2-benzyl-2-dimethylaminobutane-1 - a bromine-substituted acetophenone-based compound such as a ketone, which causes contamination of a firing furnace or an exhaust pipe by sublimation of a sensitive radiation linear polymerization initiator component, and a development line in the case where a developer is repeatedly used. In the case of the clogging of the filter, the clogging of the filter can be reduced. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei No. 3-144502 (Patent Document 2) In the case of the object described in Patent Document 3, the conventional linear radiation-sensitive composition used in the formation of the color filter is used to prevent the sublimation of the linear polymerization initiator component of the radiation. The pollution of the furnace or the reticle and the occurrence of foreign matter in the liquid are not sufficient, and the development of the linear composition of the sensitive radiation having such characteristics [Problem to be Solved by the Invention] [Problem to be Solved by the Invention] An object of the present invention is to provide a sintering furnace or a reticle that can suppress the sublimation of a linear polymerization initiator component of a radiation sensitive agent, and a foreign matter in the liquid It is not produced, and is excellent in developability, pattern shape, etc., and a color sensitive layer for forming a color layer of a color filter, a color filter having a coloring layer formed of the linear composition of the radiation radiation, and the like Liquid crystal display panel of color filter. 200844661 [Means for Solving the Problem] In the present invention, the first system provides a method comprising: (A) a colorant, (B) a soluble resin, (C) a polyfunctional monomer, and (D) The compound represented by the following general formula (1) is a color layer characterized by a radiation sensitive linear polymerization initiator having an essential component. A linear resin composition for forming a sensitive radiation is formed. v [Chemical Formula 1]

C—C—N ^ Ο CHU --- 〇C—C—N ^ Ο CHU --- 〇

# Ri—(-H2C-^-S# Ri—(-H2C-^-S

Chl· •⑴ [式（1)中，η示2〜12之整數，Ri示氫，羥基，或下述（I)， (II)，或者以（III)各自表示構造之任意基，（III)中n2碳數 1〜1 2之院基，碳數3〜8之環院基’本基（其中’被碳數1 〜6之烷基，碳數1〜6之烷氧基，以至少1個以上所取代）] [化2Chl· (1) [In the formula (1), η represents an integer of 2 to 12, and Ri represents hydrogen, a hydroxyl group, or the following (I), (II), or an arbitrary group represented by each of (III), (III) a base of n2 carbon number 1 to 1 2, a carbon number of 3 to 8 ring-based 'base group (where 'the alkyl group having a carbon number of 1 to 6 and an alkoxy group having a carbon number of 1 to 6 to at least Replaced by more than one))

〇Η II 〇II ：c—c—〇- h2c=c——c—〇- ch3 (I) (II)〇Η II 〇II :c—c—〇- h2c=c——c—〇- ch3 (I) (II)

本發明，第二係提供一種具備由該者色層形成用敏轄 射線性組成物所形成之著色層之濾色片。 -6- 200844661 本發明，第三係提供一種具備該濾色片之液晶顯示面 板。 [發明效果] 本發明之著色層形成用敏輻射線性樹脂組成物，可抑 制敏輻射線性聚合引發劑成份之昇華所致燒成爐或光罩等 之污染，使液中異物不致產生，且在像素圖型及黑色矩陣 圖型之邊緣並不產生渣滓（scum)等，而且可形成無切割不 足的良好像素圖型及黑色矩陣圖型。 因此，本發明之著色層形成用敏輻射線性組成物，在 電子工業領域中以彩色液晶顯示面板用濾色片爲始之各種 濾色片及液晶顯示面板之製造可極爲恰當的使用。 [實施發明之最佳型態] 以下，就本發明加以詳細說明。 著色層形成用敏輻射線性組成物 -(A)著色劑- 本發明中著色劑之色調並無特別限定，可因應所得灑 色片之用途而適且运疋’可爲顏料，染料或天然色奉之任 一種。 對濾色片因高精細著色與耐熱性爲所期望，故本發明 中著色劑方面，以著色性高，且耐熱性高的著色劑，尤其 是耐熱分解性高的著色劑爲佳，通常，可使用顏料，特佳 200844661 爲可使用有機顏料，碳黑。 該有機顏料方面，可舉例如色指數（C.I· ; The Society of Dyers and Colourists 公司發行）中分類爲色素（ Pigment )之化合物，具體言之，如下述之附有色指數 (C.I.)號碼之物。According to a second aspect of the invention, there is provided a color filter comprising a coloring layer formed of the luminescent composition for forming a color layer. -6- 200844661 In the present invention, the third system provides a liquid crystal display panel including the color filter. [Effect of the Invention] The linear radiation-sensitive resin composition for coloring layer formation of the present invention can suppress contamination of a firing furnace or a reticle caused by sublimation of a linear polymerization initiator component of a sensitive radiation, so that foreign matter in the liquid is not generated, and The edges of the pixel pattern and the black matrix pattern do not generate scum or the like, and can form a good pixel pattern and a black matrix pattern without insufficient cutting. Therefore, the linear composition for forming a coloring layer of the coloring layer of the present invention can be suitably used in the production of various color filters and liquid crystal display panels from the color filter for color liquid crystal display panels in the electronic industry. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail. Coloring layer forming sensitive radiation linear composition-(A) coloring agent - The color tone of the coloring agent in the present invention is not particularly limited, and may be adapted to the use of the resulting coloring sheet, which may be a pigment, a dye or a natural color. Any one of them. In the coloring agent of the present invention, a coloring agent having high coloring property and high heat resistance, in particular, a coloring agent having high heat decomposition resistance is preferable, and usually, Pigments can be used. Tejia 200844661 is an organic pigment, carbon black. The organic pigment may, for example, be a compound classified as Pigment in a color index (C.I.; issued by The Society of Dyers and Colourists), specifically, a color index (C.I.) number as described below.

C.I.色素黃1，C.I.色素黃3，C.I.色素黃12，C.I.色素 黃13，C.I·色素黃14，C.I.色素黃15，C.I.色素黃16，C.I· 色素黃17，C.I·色素黃20，C.I.色素黃24，C.I·色素黃31， C.I.色素黃55，C.I.色素黃60，C.I.色素黃61，C.I.色素黃 65，C.I.色素黃71，C.I·色素黃73，C.I·色素黃74，C.I·色 素黃81，C.I·色素黃83，C.I·色素黃93，C.I·色素黃95， C.I.色素黃97，C.I·色素黃98，C.I·色素黃100，C.I·色素 黃101，C.I·色素黃104，C.I·色素黃106，C.I·色素黃108， C.I.色素黃109，C.I.色素黃110，C.I.色素黃113，C.I.色 素黃114，C.I.色素黃116，C.I.色素黃117，C.I·色素黃119 ，C.I.色素黃 120，C.I·色素黃 126，C.I·色素黃 127，C.I. 色素黃128，C.I·色素黃129，C.I·色素黃138，C.I.色素黃 139，C.I.色素黃 150，C.I·色素黃 151，C.I.色素黃 152， C.I.色素黃153，C.I·色素黃154，C.I.色素黃155，C.I.色 素黃156，C.I·色素黃166，C.I·色素黃168，C.I·色素黃175 ，C.I.色素黃180，C.I.色素黃185; C.I.色素橘1，C.I.色素橘5，C.I·色素橘13，C.I.色素 橘14，C.I·色素橘16，C.I·色素橘17，C.I·色素橘24，C.I. 色素橘34，C.I·色素橘36，C.I.色素橘38，C.I·色素橘40, 200844661 C.I.色素橘43，C.I.色素橘46，C.I·色素橘49，C.I.色素橘 51，C.I.色素橘61，C.I.色素橘63，C.I.色素橘64，C.I.色 素橘71，C.I.色素橘73; C.I.色素紫1，C.I.色素紫19， C.I.色素紫23，C.I.色素紫29，C.I.色素紫32，C.I.色素紫 36，C.I.色素紫 38 ;CI Pigment Yellow 1, CI Pigment Yellow 3, CI Pigment Yellow 12, CI Pigment Yellow 13, CI·Yellow Pig 14, CI Pigment Yellow 15, CI Pigment Yellow 16, CI· Pigment Yellow 17, CI·Yellow Pigton 20, CI Pigment Yellow 24, CI·Yellow Yellow 31, CI Pigment Yellow 55, CI Pigment Yellow 60, CI Pigment Yellow 61, CI Pigment Yellow 65, CI Pigment Yellow 71, CI·Yellow Pigment 73, CI·Yellow Piglet 74, CI·Yellow Pigment Yellow 81, CI·Yellow Yellow 83, CI·Yellow Pig 93, CI·Yellow Pigment 95, CI Pigment Yellow 97, CI·Yellow Pigment 98, CI·Yellow Pigment 100, CI·Yellow Pigment 101, CI·Pigment Yellow 104, CI · Pigment Yellow 106, CI·Yellow Yellow 108, CI Pigment Yellow 109, CI Pigment Yellow 110, CI Pigment Yellow 113, CI Pigment Yellow 114, CI Pigment Yellow 116, CI Pigment Yellow 117, CI·Yellow Pigment 119, CI Pigment Yellow 120, CI·pigment yellow 126, CI·pigment yellow 127, CI pigment yellow 128, CI·pigment yellow 129, CI·pigment yellow 138, CI pigment yellow 139, CI pigment yellow 150, CI·pigment yellow 151, CI pigment yellow 152, CI Pigment Yellow 153, CI·Pigment Yellow 154, CI Pigment Yellow 155, CI Pigment Yellow 156, CI·Yellow Pigment 166, CI·Pigment 168, CI·Pigment Yellow 175, CI Pigment Yellow 180, CI Pigment Yellow 185; CI Pigment Orange 1, CI Pigment Orange 5, CI·Color Orange 13, CI Pigment Orange 14, CI·Pigment Orange 16, CI·Pigment Orange 17 , CI · Pigment Orange 24, CI Pigment Orange 34, CI · Pigment Orange 36, CI Pigment Orange 38, CI · Pigment Orange 40, 200844661 CI Pigment Orange 43, CI Pigment Orange 46, CI · Pigment Orange 49, CI Pigment Orange 51 , CI pigment orange 61, CI pigment orange 63, CI pigment orange 64, CI pigment orange 71, CI pigment orange 73; CI pigment purple 1, CI pigment purple 19, CI pigment purple 23, CI pigment purple 29, CI pigment purple 32 , CI pigment purple 36, CI pigment purple 38;

C.I.色素紅1，C.I.色素紅2，C.I.色素紅3，C.I.色素 紅4，C.I.色素紅5，C.I.色素紅6，C.I.色素紅7，C.I.色素 紅8，C.I.色素紅9，C.I.色素紅10，C.I.色素紅11，C.I.色 素紅12，C.I.色素紅14，C.I.色素紅15，C.I.色素紅16， C . I.色素紅1 7，C . I.色素紅1 8，C . I.色素紅1 9，C . I.色素紅 21，C.I.色素紅22，C.I·色素紅23，C.I·色素紅30，C.I.色 素紅3 1，C.I.色素紅32，C.I.色素紅37，C.I.色素紅38， C.I.色素紅40，C.I.色素紅41，C.I.色素紅42，C.I.色素紅 48 : 1，C.I.色素紅48 : 2，C.I.色素紅48 : 3，C.I·色素紅 4 8 : 4，C . I ·色素紅4 9 : 1，C · I.色素紅4 9 : 2，C . I ·色素紅 50: 1，C.I.色素紅52: 1，C.I.色素紅53: 1，C.I·色素紅 5 7，C · I ·色素紅 5 7 : 1，C · I.色素紅 5 7 : 2，C . I.色素紅 5 8 : 2，C.I.色素紅 58 : 4，C.I.色素紅 60 ·· 1，C.I.色素紅 63 ·· 1 ，C · I ·色素紅 6 3 ·_ 2，C . I ·色素紅 6 4 : 1，C · I ·色素紅 8 1 : 1 ，C.I.色素紅 83，C.I·色素紅 88，C.I.色素紅 90 : 1，C.I· 色素紅9 7， C.I.色素紅101，C.I.色素紅102，C.I.色素紅104， C . I ·色素紅1 0 5，C . I.色素紅1 0 6，C . I.色素紅1 0 8，C . I.色 素紅1 1 2，C . I ·色素紅1 1 3，C . I.色素紅1 1 4，C . I.色素紅1 22 200844661CI pigment red 1, CI pigment red 2, CI pigment red 3, CI pigment red 4, CI pigment red 5, CI pigment red 6, CI pigment red 7, CI pigment red 8, CI pigment red 9, CI pigment red 10, CI Pigment Red 11, CI Pigment Red 12, CI Pigment Red 14, CI Pigment Red 15, CI Pigment Red 16, C. I. Pigment Red 1,7, C. I. Pigment Red 1, 8, C. I. Pigment Red 1 9, C. I. Pigment Red 21, CI Pigment Red 22, CI·Pigment Red 23, CI·Pigment Red 30, CI Pigment Red 3 1, CI Pigment Red 32, CI Pigment Red 37, CI Pigment Red 38, CI Pigment Red 40, CI Pigment Red 41, CI Pigment Red 42, CI Pigment Red 48: 1, CI Pigment Red 48: 2, CI Pigment Red 48: 3, CI· Pigment Red 4 8 : 4, C. I · Pigment Red 4 9 : 1, C · I. Pigment Red 4 9 : 2, C . I · Pigment Red 50: 1, CI Pigment Red 52: 1, CI Pigment Red 53: 1, CI · Pigment Red 5 7, C · I · Pigment Red 5 7 : 1, C · I. Pigment Red 5 7 : 2, C . I. Pigment Red 5 8 : 2, CI Pigment Red 58 : 4, CI Pigment Red 60 ·· 1, CI Pigment Red 63 ·· 1 , C · I · Pigment Red 6 3 · _ 2, C . I · Pigment Red 6 4 : 1, C · I · Pigment Red 8 1 : 1 , CI Pigment Red 83, CI·Pigment Red 88, CI Pigment Red 90: 1, CI· Pigment Red 9 7, CI Pigment Red 101, CI Pigment Red 102, CI Pigment Red 104, C. I · Pigment Red 1 0 5, C. I. Pigment Red 1 0 6, C. I. Pigment Red 1 0 8, C. I. Pigment Red 1 1 2, C. I · Pigment Red 1 1 3, C. I. Pigment Red 1 1 4, C . I. Pigment Red 1 22 200844661

’ C.I.色素紅 123，C.I·色素紅 144，C.I.色素紅 146，C.I. 色素紅149，C.I.色素紅150，C.I·色素紅151，C.I.色素紅 166，C.I.色素紅 168，C.I.色素紅 170，C.I·色素紅 171， C.I·色素紅172，C.I.色素紅174，C.I·色素紅175，C.I.色 素紅1 7 6，C . I ·色素紅1 7 7，C · I ·色素紅1 7 8，C . I.色素紅1 7 9 ，C · I ·色素紅 1 8 0，C · I ·色素紅 1 8 5，C · I ·色素紅 1 8 7，C . I. 色素紅188，C.I.色素紅190，C.I.色素紅193，C.I.色素紅 194，C.I·色素紅 202，C.I.色素紅 206，C.I.色素紅 207， C.I.色素紅208，C.I·色素紅209，C.I·色素紅215，C.I.色 素紅216，C.I.色素紅220，C.I.色素紅224，C.I.色素紅226 ，C.I.色素紅 242，C.I·色素紅 243，C.I.色素紅 245，C.I. 色素紅254，C.I·色素紅255，C.I.色素紅264，C.I_色素紅 265 ； C.I·色素藍15，C.I.色素藍15: 3，C.I.色素藍15: 4, C.I.色素藍15 : 6，C.I.色素藍60 ; C.I.色素綠7，C.I.色素綠36 ; C.I.色素褐23，C.I.色素褐25 ; C.I.色素黑1，C.I.色素黑7。 該等有機顏料可以例如硫酸再結晶法，溶劑洗淨法或 該等組合等予以精製作使用。 又，無機顏料方面，可舉例如氧化鈦，硫酸鋇，碳酸 錦，鋅白，硫酸錯，黃色鉛，鋅黃（zinc yellow)，氧化鐵 紅（紅色氧化鐵（ΙΠ))，鎘紅，青藍（ultramarine)、普魯士 藍（Prussian [deep] blue)，氧化鉻綠，鈷綠，琥珀 -10- 200844661 (ambers)，鈦黑’合成鐵黑，碳黑等。 本發明中，該有機顏料及無機顏料，可各自單獨使用 或混合2種以上使用，又可倂用有機顏料與無機顏料，而 在形成像素之際’較佳爲使用1種以上有機顏料，又在形 成黑色矩陣之際’較佳爲使用2種以上之有機顏料及/或碳 本發明中，該各顏料可依期望，使其粒子表面以聚合 物作改質使用。在改質顏料粒子表面之聚合物方面，可舉 例如專利文獻4等所記載之聚合物，或市售各種顏料分散 用之聚合物或寡聚物等。 [專利文獻4 ]日本特開平8-259876號公報 又，本發明中，著色劑可依照期望，與分散劑一起使 用。該分散劑方面，可舉例如陽離子系，陰離子系，非離 子系，兩性，聚矽氧系，氟系等界面活性劑。 該界面活性劑方面，可舉例如聚氧乙烯月桂基醚，聚 氧乙烯硬脂醯基醚，聚氧乙烯油基醚等聚氧乙烯烷基醚類 ;聚氧乙烯正辛基苯基醚，聚氧乙烯正壬基苯基醚等 之聚氧乙烯烷基苯基醚類；聚乙二醇二月桂酸酯，聚乙二 醇二硬脂酸酯等聚乙二醇二酯類；山梨聚糖脂肪酸酯類； 脂肪酸改性聚酯類；3級胺改性聚胺甲酸乙酯類；聚乙烯 亞胺類等之外，尙有以下商品名，KP(信越化學工業公司 製），polyflow(共榮公司化學公司製），f-top(Tohkem products 公司製），megafuck(大日本油墨化學工業公司製）， Fluorad(住友 3M 公司製），Asahi guard，Safron(以上，旭 -11 - 200844661 硝子公司製），Disperbyk(Big chemi 公司製），Solspas(Seneca 公司製）等。 該等界面活性劑可單獨使用或混合2種以上使用。 界面活性劑之使用量相對於著色劑1 00重量份，通常 爲50重量份以下，較佳爲〇〜30重量份。 -(B)鹼可溶性樹脂- 本發明中鹼可溶性樹脂方面，相對於（A)著色劑係作 爲黏合劑作用，且在製造濾色片之際，在其顯影處理步驟 中所使用之顯影液，特佳爲相對於鹼顯影液若爲具有可溶 性者，並無特別限定，以具有羧基之鹼可溶性樹脂爲佳， 尤其是具有1個以上羧基之乙烯性不飽和單體（以下，稱爲 「含羧基不飽和單體」）與其他可共聚之乙烯性不飽和單 體（以下，稱爲「共聚合性不飽和單體」）之共聚物（以下 ，稱爲「含羧基共聚物」）爲佳。 含羧基不飽和單體方面，可舉例如（甲基）丙烯酸，巴 豆酸，α -氯丙烯酸，桂皮酸等不飽和單羧酸類； 順丁烯二酸，順丁烯二酸酐，反丁烯二酸，伊康酸， 伊康酸酐’檸康酸，檸康酸酐，中康酸等之不飽和二羧酸 或其酐類； 3價以上不飽和多價羧酸或其酐類； 琥珀酸單[2-(甲基）丙烯醯基氧乙基]酯，酞酸單[2-(甲 基）丙烯醯基氧乙基]酯等2價以上多價羧酸之單[(甲基）丙 烯醯基氧烷基]酯類； -12- 200844661 在〇)-羧基聚己內酯單（甲基）丙烯酸酯等兩末端具有羧 基與羥基之聚合物之單（甲基）丙烯酸酯類等。 該等含羧基不飽和單體中，以琥珀酸單（2-丙烯醯基 氧乙基）酯及酞酸單（2-丙烯醯基氧乙基）酯，各自係以 53 00及M-5400(東亞合成公司製）之商品名在市面銷售。 該含羧基不飽和單體可單獨使用或混合2種以上使用 〇 又’共聚合性不飽和單體方面，有例如苯乙烯，α-甲 基苯乙烯，鄰乙烯甲苯，間乙烯甲苯，對乙烯甲苯，對氯 苯乙烯，鄰甲氧基苯乙烯，間甲氧基苯乙烯，對甲氧基苯 乙烯’鄰乙烯苄基甲基醚，間乙烯苄基甲基醚，對乙烯苄 基甲基醚’鄰乙烯苄基環氧丙基醚，間乙烯苄基環氧丙基 醚’對乙烯苄基環氧丙基醚等之芳香族乙烯化合物； 茚，1-甲基茚等之茚類； 順丁烯二醯亞胺，Ν-苯基順丁烯二醯亞胺，Ν-環己基 順丁烯二醯亞胺等之不飽和醯亞胺類； 甲基（甲基）丙烯酸酯，乙基（甲基）丙烯酸酯，正丙基（ 甲基）丙烯酸酯，異丙基（甲基）丙烯酸酯，正丁基（甲基）丙 烯酸酯，異丁基（甲基）丙烯酸酯，二級丁基（甲基）丙烯酸 酯’三級丁基（甲基）丙烯酸酯，2-羥基乙基（甲基）丙烯酸 酯’ 2-羥基丙基（甲基）丙烯酸酯，3 -羥基丙基（甲基）丙烯 酸酯，2 -羥基丁基（甲基）丙烯酸酯，3 -羥基丁基（甲基）丙 烯酸酯，4-羥基丁基（甲基）丙烯酸酯，烯丙基（甲基）丙烯 酸酯，苄基（甲基）丙烯酸酯，環己基（甲基）丙烯酸酯，苯 -13- 200844661 基（甲基）丙烯酸酯，2-甲氧基乙基（甲基）丙烯酸酯，2-苯 氧基乙基（甲基）丙烯酸酯，甲氧基二乙二醇（甲基）丙烯酸 酯，甲氧基三乙二醇（甲基）丙烯酸酯，甲氧基丙二醇（甲 基）丙烯酸酯，甲氧基二丙二醇（甲基）丙烯酸酯，異伯基（ 甲基）丙烯酸酯，二環戊二烯基（甲基）丙烯酸酯，2-羥基-3-苯氧基丙基（甲基）丙烯酸酯，甘油單（甲基）丙烯酸酯等 之不飽和羧酸酯類； 2-胺基乙基（甲基）丙烯酸酯，2-二甲基胺基乙基（甲基 )丙烯酸酯，2-胺基丙基（甲基）丙烯酸酯，2-二甲基胺基丙 基（甲基）丙烯酸酯，3-胺基丙基（甲基）丙烯酸酯，3-二甲 基胺基丙基（甲基）丙烯酸酯等之不飽和羧酸胺基烷基酯類 ， 環氧丙基（甲基）丙烯酸酯等之不飽和羧酸環氧丙基酯 類； (甲基）丙烯腈，α-氯丙烯腈，氰化亞乙烯等氰化乙烯 化合物； (甲基）丙烯醯胺，α-氯丙烯醯胺，Ν-2-羥基乙基（甲基 )丙烯醯胺等之不飽和醯胺類； 乙酸乙烯酯，丙酸乙烯酯，丁酸乙烯酯，苯甲酸乙烯 酯等之羧酸乙烯酯類； 乙烯甲基醚，乙烯乙基醚，烯丙基環氧丙基醚等之不 飽和醚類； 1，3 - 丁二烯，異戊二烯，氯丁二烯等之脂肪族共軛二 烯類； -14- 200844661 聚苯乙烯，聚甲基（甲基）丙烯酸酯，聚-正丁基（甲基） 丙烯酸酯，聚矽氧烷等聚合物分子鏈末端具有單（甲基）丙 烯醯基之巨單體類等。 該等共聚性不飽和單體可單獨使用或混合2種以上使 用。 本發明中含羧基共聚物方面，係以（b 1)(甲基）丙烯酸 爲必須成份，視情形，進而含有以選自琥珀酸單[2-(甲基） 丙烯醯基氧乙基]及ω-羧基聚己內酯單（甲基）丙烯酸酯之 群之至少1種化合物的含羧基不飽和單體成份，與（b2)選 自苯乙烯，N -苯基順丁烯二醯亞胺，甲基（甲基）丙烯酸酯 ，2-羥基乙基（甲基）丙烯酸酯，烯丙基（甲基）丙烯酸酯， 苄基（甲基）丙烯酸酯，甘油單（甲基）丙烯酸酯，聚苯乙烯 巨單體及聚甲基甲基丙烯酸酯巨單體之群的至少1種共聚 性不飽和單體之共聚物（以下，稱爲「含羧基共聚物（B1) 」）爲佳。 含殘基共聚物（B1)之具體例方面，有（甲基）丙嫌酸/甲 基（甲基）丙烯酸酯共聚物， (甲基）丙烯酸/节基（甲基）丙靖酸酯共聚物， (甲基）丙烯酸/2-羥基乙基（甲基）丙烯酸酯共聚物， (甲基）丙烯酸/ 2-羥基乙基（甲基）丙烯酸酯/苄基（甲基） 丙烯酸酯共聚物， (甲基）丙烯酸/甲基（甲基）丙烯酸酯/聚苯乙烯巨單體 共聚物， (甲基）丙燦酸/甲基（甲基）丙烯酸酯/聚甲基甲基丙靖 •15- 200844661 酸酯巨單體共聚物， (甲基）丙烯酸/苄基（甲基）丙烯酸酯/聚苯乙烯巨單體 共聚物， (甲基）丙烯酸/苄基（甲基）丙烯酸酯/聚甲基（甲基）丙烯 - 酸酯巨單體共聚物， • (甲基）丙烯酸/苄基（甲基）丙烯酸酯/甘油單（甲基）丙烯 酸酯共聚物， φ (甲基）丙烯酸/苯乙烯/2-羥基乙基（甲基）丙烯酸酯共 聚物， (甲基）丙烯酸/2-羥基乙基（甲基）丙烯酸酯/苄基（甲基） 丙烯酸酯共聚物， (甲基）丙烯酸/2-羥基乙基（甲基）丙烯酸酯/苯基（甲基） 丙烯酸酯共聚物， (甲基）丙烯酸/苯乙烯/N-苯基順丁烯二醯亞胺/苄基（ ' 甲基）丙烯酸酯共聚物， • (甲基）丙烯酸/2-經基乙基（甲基）丙烯酸酯/节基（甲基） 丙烯酸酯/聚苯乙烯巨單體共聚物， (甲基）丙烯酸/2-羥基乙基（甲基）丙烯酸酯/苄基（甲基） 丙嫌酸酯/聚甲基（甲基）丙烯酸酯巨單體共聚物， (甲基）丙烯酸/苯乙烯/N-苯基順丁烯二醯亞胺/苄基（ 甲基）丙烯酸酯/甘油單（甲基）丙烯酸酯共聚物， (甲基）丙烯酸/2-羥基乙基（甲基）丙烯酸酯/苯乙烯/N_ 苯基順丁烯二醯亞胺/苯基（甲基）丙烯酸酯/聚苯乙嫌巨單 體共聚物， -16- 200844661 (甲基）丙烯酸/2-羥基乙基（甲基）丙烯酸酯/苯乙烯/N_ 苯基順丁烯二醯亞胺/苯基（甲基）丙烯酸酯/聚甲基甲基丙 烯酸酯巨單體共聚物， (甲基）丙烯酸/琥珀酸單[2-(甲基）丙烯醯基氧乙基]酯/ 苄基（甲基）丙烯酸酯/甘油單（甲基）丙烯酸酯共聚物， (甲基）丙烯酸/琥珀酸單[2-(甲基）丙烯醯基氧乙基]酯/ 苯乙烯/N-苯基順丁烯二醯亞胺/烯丙基（甲基）丙烯酸酯共 聚物， (甲基）丙烯酸/琥珀酸單[2-(甲基）丙烯醯基氧乙基]酯/ 苯乙烯/N-苯基順丁烯二醯亞胺/苄基（甲基）丙烯酸酯共聚 物， (甲基）丙烯酸/琥珀酸單[2-(甲基）丙烯醯基氧乙基]酯/ 苯乙烯/N-環己基順丁烯二醯亞胺/烯丙基（甲基）丙烯酸酯 共聚物， (甲基）丙烯酸/琥珀酸單[2-(甲基）丙烯醯基氧乙基]酯/ 苯乙烯/…環己基順丁烯二醯亞胺/苄基（甲基）丙烯酸酯共 聚物， (甲基）丙烯酸/ω·羧基聚己內酯單（甲基）丙烯酸酯/苯 乙烯/Ν-苯基順丁烯二醯亞胺/苄基（甲基）丙烯酸酯/甘油單 (甲基）丙烯酸酯共聚物等。 含羧基共聚物中含羧基不飽和單體之共聚合比率，通 常爲5〜50重量％，較佳爲10〜40重量％。在此情形，該共 聚合比率未達5重量％時，相對於所得敏輻射線性組成物 之鹼顯影液之溶解性有降低之傾向’一方面超過50重量％ -17- 200844661 時，相對於鹼顯影液之溶解性變的過大，在以鹼顯影液顯 影之際，會有易於產生自著色層基板之脫落或著色層表面 膜乾斑之傾向。 本發明中以鹼可溶性樹脂之凝膠滲透層析術（GPC， 溶離溶劑：四氫呋喃）測定之換算聚苯乙烯重量平均分子 量（以下，稱爲「Mw」），通常爲3,000〜3 00,000，較佳爲 55000〜1〇〇,〇〇〇〇 又，本發明中以鹼可溶性樹脂之凝膠滲透層析術 (GPC，溶離溶劑：四氫呋喃）測定之換算聚苯乙烯數平均 分子量（以下，稱爲「Μη」），通常爲3，0 0 0〜6 0，0 0 0，較 佳爲 5,000 〜25,000。 本發明中，藉由使用具有此種特定Mw及Μη之驗可 溶性樹脂，可獲得顯影性優異之敏輻射線性組成物，藉此 ，可形成具有敏銳圖型邊緣的像素及黑色矩陣，同時，在 顯影時於未曝光部之基板上及遮光層上殘渣，表面污斑， 膜變薄等難以發生。 又’本發明中鹼可溶性樹脂之 Mw與 Μη之比 (Mw/Mn)，較佳爲1〜5，進而較佳爲i〜4。 本發明中，鹼可溶性樹脂可單獨使用或混合2種以上 使用。 本發明中鹼可溶性樹脂之使用量，相對於（A)著色劑 100重量份’通常爲10〜1，000重量份，較佳爲2〇〜5〇〇重 量份。在此情形，鹼可溶性樹脂之使用量未達1 〇重量份時 ’例如’會有鹼顯影性降低，或在未曝光部之基板上或遮 -18- 200844661 光層上有發生表面污斑或膜變薄之虞’一方面超過l 000 重量份時，由於相對地降低著色劑濃度’故作爲薄膜會有 達成目的之色濃度造成困難之虞。 •(c)多官能性單體- 本發明中多官能性單體係由具有2個以上聚合性不飽 和鍵之單體所成。 多官能性單體方面，例如， 乙二醇，丙二醇等之烷撐二醇之二（甲基）丙烯酸酯類 9 聚乙二醇，聚丙二醇等聚烷撐二醇之二（甲基）丙烯酸 酯類； 甘油，三羥甲基丙烷，新戊四醇，二新戊四醇等3價 以上多價醇之聚（甲基）丙烯酸酯類’或該等二羧酸改性物 聚酯，環氧基樹脂，胺甲酸乙酯樹脂，醇酸樹脂，聚 矽氧樹脂，螺環烴樹脂之等之低聚（甲基）丙烯酸酯類； 兩末端經基聚-1，3_丁 一燦’兩末端經基聚異戊一矯’ 兩末端羥基聚己內酯等之兩末端羥基化聚合物之二（甲基） 丙烯酸酯類，或三個[2-(甲基）丙烯醯基氧乙基]磷酸酯等 〇 該等多官能性單體中，3價以上多價醇之聚（甲基）丙 烯酸酯類或該等二羧酸改性物，具體言之，有三羥甲基丙 烷三丙烯酸酯，三羥甲基丙烷三甲基丙烯酸酯，新戊四醇 -19 - 200844661 三丙烯酸酯，新戊四醇三甲基丙烯酸酯，新戊四醇四丙烯 酸酯，新戊四醇四甲基丙烯酸酯，二新戊四醇五丙烯酸酯 ，二新戊四醇五甲基丙烯酸酯，二新戊四醇六丙烯酸酯， 二新戊四醇六甲基丙烯酸酯， 下述式（2)所示之化合物 [化3]'CI Pigment Red 123, CI·Color Red 144, CI Pigment Red 146, CI Pigment Red 149, CI Pigment Red 150, CI·Color Red 151, CI Pigment Red 166, CI Pigment Red 168, CI Pigment Red 170, CI· Pigment Red 171, CI·Pigment Red 172, CI Pigment Red 174, CI·Pigment Red 175, CI Pigment Red 174, C. I·Pigment Red 177, C·I·Pigment Red 1 7 8, C. I. Pigment Red 1 7 9 , C · I · Pigment Red 1 80 0, C · I · Pigment Red 1 8 5, C · I · Pigment Red 1 8 7, C . I. Pigment Red 188, CI Pigment Red 190 , CI Pigment Red 193, CI Pigment Red 194, CI·Pigment Red 202, CI Pigment Red 206, CI Pigment Red 207, CI Pigment Red 208, CI·Color Red 209, CI·Color Red 215, CI Pigment Red 216, CI Pigment Red 220, CI Pigment Red 224, CI Pigment Red 226, CI Pigment Red 242, CI Pigment Red 243, CI Pigment Red 245, CI Pigment Red 254, CI Pigment Red 255, CI Pigment Red 264, C.I_ Pigment Red 265; CI·Pigment Blue 15, CI Pigment Blue 15: 3, CI Pigment Blue 15: 4, CI Pigment Blue 15: 6, CI Pigment Blue 60; CI Pigment Green 7, CI Pigment Green 36; C .I. Pigment brown 23, C.I. Pigment brown 25; C.I. Pigment black 1, C.I. Pigment black 7. These organic pigments can be used, for example, by a sulfuric acid recrystallization method, a solvent washing method, or the like. Further, examples of the inorganic pigment include titanium oxide, barium sulfate, gold carbonate, zinc white, sulfuric acid, yellow lead, zinc yellow, iron oxide red (red iron oxide), cadmium red, and blue. Ultramarine, Prussian [deep] blue, chrome oxide green, cobalt green, amber-10-200844661 (ambers), titanium black 'synthetic iron black, carbon black and so on. In the present invention, the organic pigment and the inorganic pigment may be used singly or in combination of two or more kinds, and an organic pigment and an inorganic pigment may be used, and when a pixel is formed, it is preferred to use one or more organic pigments. In the case of forming a black matrix, it is preferred to use two or more kinds of organic pigments and/or carbon. In the present invention, each of the pigments may be modified with a polymer as desired on the surface of the particles. For example, a polymer described in Patent Document 4 or a commercially available polymer or oligomer for dispersing various pigments may be used as the polymer of the surface of the pigment particles. [Patent Document 4] Japanese Laid-Open Patent Publication No. Hei 8-259876. In the present invention, the coloring agent can be used together with a dispersing agent as desired. Examples of the dispersant include surfactants such as cationic, anionic, nonionic, amphoteric, polyfluorene, and fluorine. Examples of the surfactant include polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl sulfonyl ether, and polyoxyethylene oleyl ether; and polyoxyethylene n-octyl phenyl ether; Polyoxyethylene alkylphenyl ethers such as polyoxyethylene n-decylphenyl ether; polyethylene glycol diesters such as polyethylene glycol dilaurate, polyethylene glycol distearate; Sugar fatty acid esters; fatty acid-modified polyesters; tertiary amine-modified polyurethanes; polyethyleneimines, etc., with the following trade names, KP (Shin-Etsu Chemical Co., Ltd.), polyflow ( Co-Profit Chemical Co., Ltd.), f-top (made by Tohkem Products Co., Ltd.), megafuck (made by Dainippon Ink Chemical Industry Co., Ltd.), Fluorad (made by Sumitomo 3M), Asahi guard, Safron (above, Asahi 11 - 200844661) Company system), Disperbyk (made by Big chemi company), Solspas (made by Seneca company), etc. These surfactants may be used singly or in combination of two or more. The amount of the surfactant to be used is usually 50 parts by weight or less, preferably 〇 30 parts by weight, based on 100 parts by weight of the coloring agent. - (B) alkali-soluble resin - the alkali-soluble resin in the present invention, which acts as a binder with respect to (A) a colorant, and a developer used in the development processing step when the color filter is manufactured, In particular, it is not particularly limited as long as it is soluble in the alkali developer, and an alkali-soluble resin having a carboxyl group is preferable, and in particular, an ethylenically unsaturated monomer having one or more carboxyl groups (hereinafter referred to as "including A copolymer of a carboxyl group-unsaturated monomer ") and another copolymerizable ethylenically unsaturated monomer (hereinafter referred to as "co-polymerizable unsaturated monomer") (hereinafter referred to as "carboxyl-containing copolymer") is preferred. . Examples of the carboxyl group-containing unsaturated monomer include unsaturated monocarboxylic acids such as (meth)acrylic acid, crotonic acid, α-chloroacrylic acid, and cinnamic acid; maleic acid, maleic anhydride, and antibutene Acid, itaconic acid, econic anhydride 'citrine acid, citraconic anhydride, mesaconic acid and the like unsaturated dicarboxylic acid or its anhydride; trivalent or higher unsaturated polyvalent carboxylic acid or its anhydride; succinic acid single [2-(Methyl)propenyloxyethyl]ester, mono [(meth) propylene of a divalent or higher polyvalent carboxylic acid such as mono [2-(methyl) acryloyloxyethyl] phthalate Mercaptooxyalkyl]esters; -12- 200844661 Mono(meth)acrylates having a polymer having a carboxyl group and a hydroxyl group at both terminals, such as fluorene-carboxypolycaprolactone mono(meth)acrylate. Among the carboxyl group-containing unsaturated monomers, mono(2-propenyl methoxyethyl) succinate and mono(2-propenyl methoxyethyl) decanoate are each 53 00 and M-5400. The trade name of (made by East Asia Synthetic Co., Ltd.) is sold in the market. The carboxyl group-containing unsaturated monomer may be used singly or in combination of two or more kinds of fluorene-co-polymerizable unsaturated monomers, such as styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, and ethylene. Toluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene 'o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl An aromatic vinyl compound such as an ethylene-o-benzyl epoxidized propyl ether, an ethylene-vinyl epoxidized propyl ether, a p-vinylbenzyl epoxypropyl ether or the like; an anthracene such as hydrazine or 1-methylhydrazine; An unsaturated quinone imine such as maleimide, fluorene-phenyl maleimide, fluorene-cyclohexylmethyleneimine or the like; methyl (meth) acrylate, (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, secondary Butyl (meth) acrylate 'tertiary butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate '2-Hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 3-hydroxybutyl (meth) acrylate, 4 -Hydroxybutyl (meth) acrylate, allyl (meth) acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, benzene-13- 200844661 based (meth) acrylate Ester, 2-methoxyethyl (meth) acrylate, 2-phenoxyethyl (meth) acrylate, methoxy diethylene glycol (meth) acrylate, methoxy triethylene Alcohol (meth) acrylate, methoxypropylene glycol (meth) acrylate, methoxy dipropylene glycol (meth) acrylate, isocarbyl (meth) acrylate, dicyclopentadienyl (methyl) Acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, unsaturated carboxylic acid esters such as glycerol mono(meth) acrylate; 2-aminoethyl (meth) acrylate Ester, 2-dimethylaminoethyl (meth) acrylate, 2-aminopropyl (meth) acrylate, 2-dimethylamino Alkyl (meth) acrylate, 3-aminopropyl (meth) acrylate, 3-dimethylaminopropyl (meth) acrylate, etc., unsaturated carboxylic acid aminoalkyl esters, ring An unsaturated carboxylic acid glycidyl ester such as oxypropyl (meth) acrylate; a vinyl cyanide compound such as (meth)acrylonitrile, α-chloroacrylonitrile or vinyl cyanide; (meth) propylene Indole amides such as decylamine, α-chloropropenylamine, hydrazine-2-hydroxyethyl(methyl) acrylamide; vinyl acetate, vinyl propionate, vinyl butyrate, vinyl benzoate Ethylene carboxylate; ethylene methyl ether, vinyl ethyl ether, allyl epoxypropyl ether and other unsaturated ethers; 1,3 - butadiene, isoprene, chloroprene Aliphatic conjugated dienes; -14- 200844661 Polystyrene, polymethyl (meth) acrylate, poly-n-butyl (meth) acrylate, polysiloxane, etc. A macromonomer having a mono(meth)acrylonitrile group or the like. These copolymerizable unsaturated monomers may be used singly or in combination of two or more. In the case of the carboxyl group-containing copolymer of the present invention, (b 1) (meth)acrylic acid is an essential component, and, if appropriate, further comprises a mono[2-(methyl)acryloyloxyethyl group selected from succinic acid and a carboxyl group-containing unsaturated monomer component of at least one compound of the group consisting of ω-carboxypolycaprolactone mono(meth)acrylate, and (b2) selected from styrene, N-phenyl maleimide , methyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, allyl (meth) acrylate, benzyl (meth) acrylate, glycerol mono (meth) acrylate, A copolymer of at least one type of copolymerizable unsaturated monomer of a polystyrene macromonomer and a polymethylmethacrylate macromonomer group (hereinafter referred to as "carboxyl group-containing copolymer (B1)") is preferred. Specific examples of the residue-containing copolymer (B1) include (meth)acrylic acid/methyl (meth) acrylate copolymer, (meth)acrylic acid / benzyl (meth) acrylate copolymer , (meth)acrylic acid/2-hydroxyethyl (meth) acrylate copolymer, (meth)acrylic acid / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate copolymer , (Meth)acrylic acid / methyl (meth) acrylate / polystyrene macromonomer copolymer, (methyl) propionic acid / methyl (meth) acrylate / polymethyl methacrylate 15- 200844661 Copolymer macromonomer copolymer, (meth)acrylic acid/benzyl (meth)acrylate/polystyrene macromonomer copolymer, (meth)acrylic acid/benzyl (meth)acrylate/ Polymethyl (meth) propylene-ester macromonomer copolymer, • (meth) acrylate / benzyl (meth) acrylate / glycerol mono (meth) acrylate copolymer, φ (meth) acrylate /styrene/2-hydroxyethyl (meth) acrylate copolymer, (meth) acrylate / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate copolymer, (meth) acrylate / 2-hydroxyethyl (meth) acrylate / phenyl (meth) acrylate copolymer, (meth) acrylate / styrene / N- Phenyl maleimide/benzyl ('meth) acrylate copolymer, • (meth) acrylate/2- benzylethyl (meth) acrylate / benzyl (meth) acrylate /polystyrene macromonomer copolymer, (meth)acrylic acid/2-hydroxyethyl (meth) acrylate / benzyl (meth) propyl acrylate / polymethyl (meth) acrylate giant Copolymer, (meth)acrylic acid / styrene / N-phenyl maleimide / benzyl (meth) acrylate / glycerol mono (meth) acrylate copolymer, (meth) acrylate /2-hydroxyethyl (meth) acrylate / styrene / N phenyl maleimide / phenyl (meth) acrylate / polyphenylene susceptor macromonomer copolymer, -16- 200844661 (meth)acrylic acid/2-hydroxyethyl (meth) acrylate / styrene / N phenyl maleimide / phenyl (meth) acrylate / poly methyl methacrylate Ester macromonomer copolymer, (meth)acrylic acid/succinic acid mono[2-(methyl)propenyloxyethyl]ester/benzyl (meth)acrylate/glycerol mono(meth)acrylate copolymer , (meth)acrylic acid / succinic acid mono [2-(methyl) acrylonitrile oxyethyl] ester / styrene / N-phenyl maleimide / allyl (meth) acrylic acid Ester copolymer, (meth)acrylic acid / succinic acid mono [2-(methyl) acrylonitrile oxyethyl] ester / styrene / N-phenyl maleimide / benzyl (methyl) Acrylate Copolymer, (meth)acrylic acid / succinic acid mono [2-(methyl) acrylonitrile oxyethyl] ester / styrene / N-cyclohexyl maleimide / allyl (A Acrylate copolymer, (meth)acrylic acid/succinic acid mono[2-(methyl)propenyloxyethyl]ester/styrene/...cyclohexylmethyleneimine/benzyl (A) Acrylate copolymer, (meth)acrylic acid/ω·carboxypolycaprolactone mono(meth)acrylate/styrene/Ν-phenyl maleimide/benzyl (meth)acrylic acid Ester/glycerol mono(meth)acrylate copolymer, etc.The copolymerization ratio of the carboxyl group-containing unsaturated monomer in the carboxyl group-containing copolymer is usually 5 to 50% by weight, preferably 10 to 40% by weight. In this case, when the copolymerization ratio is less than 5% by weight, the solubility of the alkali developer relative to the obtained linear composition of the radiation sensitive agent tends to decrease. On the one hand, when it exceeds 50% by weight -17-200844661, it is relative to the base. The solubility of the developer becomes too large, and when it is developed with an alkali developer, there is a tendency that peeling of the substrate from the colored layer or dry film on the surface of the colored layer is likely to occur. In the present invention, the weight average molecular weight of the converted polystyrene (hereinafter referred to as "Mw") measured by gel permeation chromatography (GPC, solvent: tetrahydrofuran) of an alkali-soluble resin is usually 3,000 to 30,000,000, preferably In the present invention, the number average molecular weight of the converted polystyrene is determined by gel permeation chromatography (GPC, solvent: tetrahydrofuran) of an alkali-soluble resin in the present invention (hereinafter, referred to as " Μη"), usually 3,0 0 0~6 0,0 0 0, preferably 5,000 to 25,000. In the present invention, by using a test-soluble resin having such a specific Mw and Μη, a linear composition of sensitive radiation excellent in developability can be obtained, whereby a pixel having a sharp pattern edge and a black matrix can be formed, and at the same time, At the time of development, residue on the substrate of the unexposed portion and the light-shielding layer, surface stains, thin film, and the like are less likely to occur. Further, the ratio (Mw/Mn) of Mw to Μη of the alkali-soluble resin in the present invention is preferably from 1 to 5, more preferably from i to 4. In the present invention, the alkali-soluble resin may be used singly or in combination of two or more. The amount of the alkali-soluble resin to be used in the invention is usually 10 to 1,000 parts by weight, preferably 2 to 5 parts by weight, per 100 parts by weight of the (A) colorant. In this case, when the amount of the alkali-soluble resin is less than 1 part by weight, 'for example, there is a decrease in alkali developability, or surface staining may occur on the substrate of the unexposed portion or on the light layer of the -18-200844661 or When the film is thinned, on the one hand, when it exceeds 1,000 parts by weight, since the concentration of the colorant is relatively lowered, it is difficult to achieve a desired color concentration as a film. (c) Polyfunctional monomer - The polyfunctional single system of the present invention is composed of a monomer having two or more polymerizable unsaturated bonds. Examples of the polyfunctional monomer include, for example, di(meth)acrylate 9 polyethylene glycol of an alkylene glycol such as ethylene glycol or propylene glycol, and di(meth)acrylic acid of a polyalkylene glycol such as polypropylene glycol. Ester; poly(meth) acrylates of trivalent or higher polyvalent alcohols such as glycerin, trimethylolpropane, neopentyl alcohol, dipentaerythritol, or the like, or such dicarboxylic acid modified polyesters, Epoxy resin, urethane resin, alkyd resin, polyoxyxylene resin, spirocyclic hydrocarbon resin, etc. oligo(meth)acrylates; both ends of the base group -1,3_丁一灿'Two (meth) acrylates of two terminal hydroxylated polymers, such as two-terminal hydroxypolycaprolactone at the two ends, or three [2-(methyl) acrylonitrile-based oxygenates Among the polyfunctional monomers such as ethyl]phosphate, a poly(meth)acrylate of a trivalent or higher polyvalent alcohol or a modified product of the dicarboxylic acid, specifically, trimethylolpropane Triacrylate, trimethylolpropane trimethacrylate, neopentyl alcohol-19 - 200844661 triacrylate, neopentyl alcohol trimethyl propyl Acid ester, neopentyl alcohol tetraacrylate, neopentyl alcohol tetramethacrylate, dipentaerythritol pentaacrylate, dipentaerythritol penta methacrylate, dipentaerythritol hexaacrylate, Dipentaerythritol hexamethacrylate, a compound represented by the following formula (2) [Chemical 3]

H2C=CHCOOCH2- ch2ococh=ch2 ?—ch2ococh2ch2cooh CH20C0CH=CH2 (2) 下述式（3 )所示之化合物 [化4] h2c= ch3 :ccooch2- ch3 ch2ococ=ch2 _c—ch2oc〇ch2ch2cooh ch2ococ=ch2 ch3 (3) 等爲佳，尤以三羥甲基丙烷三丙烯酸酯，新戊四醇三 丙烯酸酯及二新戊四醇六丙烯酸酯，著色層之強度高，著 色層之表面平滑性優異，且未曝光部之基板上及遮光層上 難以發生表面污斑，膜變薄等故佳。 該多官能性單體可單獨使用或混合2種以上使用。 -20- 200844661 本發明中多官能性單體之使用量，相對於（B )鹼可溶 性樹脂100重量份，通常爲5〜500重量份，較佳爲20〜300 重量份。在此情形，多官能性單體之使用量未達5重量份 時，著色層之強度或表面平滑性有降低之傾向，一方面超 過5 0 0重量份時，例如會有驗顯影性降低，或在未曝光部 之基板上或遮光層上易於發生表面污斑，膜變薄等之傾向 〇 又，在本發明中，係使多官能性單體之一部份置換爲 具有聚合性不飽和鍵1個之單官能性單體。 該單官能性單體方面，可舉例如就（B)鹼可溶性樹脂 所例示之與該含羧基不飽和單體或共聚性不飽和單體爲同 樣之化合物，或N-(甲基）丙烯醯基嗎啉，N-乙烯吡咯啶酮 ，N-乙烯-ε-己內醯胺之外，市售品之M-5 600(商品名，東 亞合成公司製）等。 該等單官能性單體可單獨使用或混合2種以上使用。 單官能性單體之使用比率，相對於多官能性單體與單官能 性單體之合計，通常爲90重量％以下，較佳爲50重量％以 下。在此情形，單官能性單體之使用比率超過90重量％時 ，所得著色層之強度或表面平滑性會有不充分之虞。 本發明中多官能性單體與單官能性單體之合計使用量 ，相對於（B)鹼可溶性樹脂1〇〇重量份，通常爲5〜500重量 份，較佳爲20〜3 00重量份。在此情形，該合計使用量未 達5重量份時，著色層之強度或表面平滑性有降低之傾向 ，一方面，超過5 0 0重量份時’例如會有鹼顯影性降低’ -21 - 200844661 或在未曝光部之基板上或遮光層上有易於發生表面污斑’ 膜變薄等之傾向。 -(D)光聚合引發劑- 本發明中光聚合引發劑係以該一般式（1 )所示化合物（ 以下，稱爲「化合物1」）爲必須成份，其具有’在藉由曝 光於該（C)多官能性單體及視情形所使用單官能性單體之 聚合可開始進行之產生活性種的作用者。 式（1)中，η示2〜12之整數，^示氫原子，羥基或上 述（I)，（II)，或者以（III)各自表示構造之任意基，（ΠΙ)中 R2係碳數1〜12之院基，碳數3〜8之環院基，苯基（其中’ 以碳數1〜6之烷基，碳數1〜6之烷氧基被至少1個以上所 取代）。 在此，R2之碳數1〜12之烷基，碳數3〜8之環烷基方 面，有例如甲基，乙基，正丙基，異丙基，正丁基，異丁 基，二級丁基，三級丁基，正戊基，正己基，正庚基，正 辛基，正壬基，正癸基，正--基，正十二基，環戊基， 環己基等。 又，被苯基取代之碳數1〜6之院基，碳數1〜6之院氧 基方面，碳數1〜6之烷基係例如甲基，乙基，正丙基，異 丙基，正丁基，異丁基，二級丁基，三級丁基，正戊基， 正己基，又碳數1〜6之烷氧基方面，有例如甲氧基，乙氧 基，正丙氧基，異丙氧基，正丁氧基，異丁氧基，二級丁 氧基，三級丁氧基等。 -22- 200844661 本發明中恰當化合物（1)之具體例方面， 有2-甲基·1·[4-(乙基硫代）苯基]-2-嗎啉基（morpholino)丙 烷-1-酮， 2-甲基-1-[4-(正丙基硫代）苯基]-2-嗎啉基丙烷-1-酮， 2-甲基-1-[4-(異丙基硫代）苯基]-2-嗎啉基丙烷-1-酮， 2-甲基-1-[4-(正丁基硫代）苯基]-2-嗎啉基丙烷-1-酮， 2-甲基-1-[4-(異丁基硫代）苯基]-2-嗎啉基丙烷-1-酮， 2-甲基三級丁基硫代）苯基]-2_嗎啉基丙烷·1· 酮， 2 -甲基-1-[4-(正戊基硫代）苯基]-2-嗎啉基丙烷-1-酮， 2-甲基-1-[4_(正己基硫代）苯基]-2·嗎啉基丙烷-1-酮， 2-甲基-1_[4-(正庚基硫代）苯基]-2-嗎啉基丙烷-1-酮， 2-甲基-1-[4-(正辛基硫代）苯基]-2-嗎啉基丙烷-1-酮， 甲基- l-[4-(正十二基硫代）苯基]-2-嗎啉基丙烷-1- 酮， 2-甲基- ΐ-[4-(2-羥基乙基硫代）苯基]-2-嗎啉基丙烷-1- 酮， 2-甲基-1·[4-(3-羥基丙基硫代）苯基]-2-嗎啉基丙烷-1- 酮， 2-甲基-1-[4-(4-羥基丁基硫代）苯基]-2-嗎啉基丙烷-1- 酮’ 2-甲基-1-[4-(5-羥基庚基硫代）苯基]-2-嗎啉基丙烷-1- 酮， 2-甲基- ΐ-[4-(5·羥基己基硫代）苯基]-2-嗎啉基丙烷-1- -23- 200844661 酮， 2-甲基-1-[4-(2·丙烯醯基氧乙基硫代）苯基]-2-嗎啉基 丙院-1 -酮， 2-甲基-1-[4-(2-甲基丙烯甲基丙烯醯基氧乙基硫代）苯 基]-2-嗎啉基丙烷-1-酮， 2-甲基- l-[4-(3-丙烯醯基氧丙基硫代）苯基]-2-嗎啉基 丙烷-1 -酮，H2C=CHCOOCH2-ch2ococh=ch2 ?-ch2ococh2ch2cooh CH20C0CH=CH2 (2) Compound represented by the following formula (3) h2c=ch3:ccooch2-ch3 ch2ococ=ch2 _c_ch2oc〇ch2ch2cooh ch2ococ=ch2 ch3 ( 3) etc., especially trimethylolpropane triacrylate, neopentyl alcohol triacrylate and dipentaerythritol hexaacrylate, the strength of the colored layer is high, the surface smoothness of the colored layer is excellent, and It is preferable that surface stains are less likely to occur on the substrate of the exposure portion and the light shielding layer, and the film is thinned. These polyfunctional monomers may be used singly or in combination of two or more. -20- 200844661 The amount of the polyfunctional monomer used in the present invention is usually 5 to 500 parts by weight, preferably 20 to 300 parts by weight, per 100 parts by weight of the (B) alkali-soluble resin. In this case, when the amount of the polyfunctional monomer used is less than 5 parts by weight, the strength or surface smoothness of the colored layer tends to decrease. On the other hand, when it exceeds 500 parts by weight, for example, the developability is lowered. Or, on the substrate of the unexposed portion or on the light shielding layer, surface stains are likely to occur, and the film is thinned, etc. In the present invention, a part of the polyfunctional monomer is replaced with a polymerizable unsaturated layer. One monofunctional monomer. The monofunctional monomer may, for example, be the same as the carboxyl group-containing unsaturated monomer or the copolymerizable unsaturated monomer exemplified as the (B) alkali-soluble resin, or N-(meth)acryl oxime. Commercially available M-5 600 (trade name, manufactured by Toagosei Co., Ltd.), etc., other than morpholine, N-vinylpyrrolidone, and N-ethylene-ε-caprolactam. These monofunctional monomers may be used singly or in combination of two or more. The use ratio of the monofunctional monomer is usually 90% by weight or less, preferably 50% by weight or less based on the total of the polyfunctional monomer and the monofunctional monomer. In this case, when the use ratio of the monofunctional monomer exceeds 90% by weight, the strength or surface smoothness of the resulting colored layer may be insufficient. The total amount of the polyfunctional monomer and the monofunctional monomer used in the present invention is usually 5 to 500 parts by weight, preferably 20 to 30,000 parts by weight, based on 1 part by weight of the (B) alkali-soluble resin. . In this case, when the total amount used is less than 5 parts by weight, the strength or surface smoothness of the colored layer tends to decrease. On the other hand, when it exceeds 500 parts by weight, 'for example, the alkali developability is lowered'. 200844661 Or on the substrate of the unexposed portion or on the light shielding layer, there is a tendency that surface stains are thinned. - (D) Photopolymerization Initiator - The photopolymerization initiator of the present invention is an essential component of the compound represented by the general formula (1) (hereinafter referred to as "compound 1"), which has a 'by exposure to the (C) The polymerization of a polyfunctional monomer and, where appropriate, a monofunctional monomer can be initiated to produce an active species. In the formula (1), n represents an integer of 2 to 12, and represents a hydrogen atom, a hydroxyl group or the above (I), (II), or an arbitrary group represented by each of (III), and an R 2 carbon number in (ΠΙ) A base of 1 to 12, a ring having a carbon number of 3 to 8, and a phenyl group (wherein 'the alkyl group having 1 to 6 carbon atoms and the alkoxy group having 1 to 6 carbon atoms are substituted by at least one or more). Here, R2 has an alkyl group having 1 to 12 carbon atoms and a cycloalkyl group having 3 to 8 carbon atoms, and has, for example, a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, and a second group. Butyl, tert-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-decyl, n-decyl, n-yl, n-dodecyl, cyclopentyl, cyclohexyl and the like. Further, a group having a carbon number of 1 to 6 substituted by a phenyl group, an alkyl group having a carbon number of 1 to 6, an alkyl group having 1 to 6 carbon atoms such as a methyl group, an ethyl group, a n-propyl group or an isopropyl group. , n-butyl, isobutyl, secondary butyl, tert-butyl, n-pentyl, n-hexyl, and alkoxy having 1 to 6 carbon atoms, such as methoxy, ethoxy, n-propyl Oxyl, isopropoxy, n-butoxy, isobutoxy, secondary butoxy, tert-butoxy and the like. -22- 200844661 In the specific example of the appropriate compound (1) in the present invention, there is 2-methyl·1·[4-(ethylthio)phenyl]-2-morpholinopropane-1- Ketone, 2-methyl-1-[4-(n-propylthio)phenyl]-2-morpholinylpropan-1-one, 2-methyl-1-[4-(isopropylthio Phenyl]-2-morpholinylpropan-1-one, 2-methyl-1-[4-(n-butylthio)phenyl]-2-morpholinylpropan-1-one, 2- Methyl-1-[4-(isobutylthio)phenyl]-2-morpholinylpropan-1-one, 2-methyltri-butylthio)phenyl]-2-morpholinyl Propane·1·one, 2-methyl-1-[4-(n-pentylthio)phenyl]-2-morpholinylpropan-1-one, 2-methyl-1-[4_(n-hexyl) Thio)phenyl]-2·morpholinylpropan-1-one, 2-methyl-1_[4-(n-heptylthio)phenyl]-2-morpholinylpropan-1-one, 2 -methyl-1-[4-(n-octylthio)phenyl]-2-morpholinylpropan-1-one, methyl-l-[4-(n-dodecylthio)phenyl] -2-morpholinylpropan-1-one, 2-methyl-indole-[4-(2-hydroxyethylthio)phenyl]-2-morpholinylpropan-1-one, 2-methyl -1·[4-(3-hydroxypropylthio)phenyl]-2-morpholinylpropan-1-one, 2-methyl-1- [4-(4-Hydroxybutylthio)phenyl]-2-morpholinylpropan-1-one '2-methyl-1-[4-(5-hydroxyheptylthio)phenyl]- 2-morpholinylpropan-1-one, 2-methyl-indole-[4-(5-hydroxyhexylthio)phenyl]-2-morpholinylpropan-1- -23- 200844661 ketone, 2- Methyl-1-[4-(2·acryloyloxyethylthio)phenyl]-2-morpholinylpropan-1-one, 2-methyl-1-[4-(2-A Propylene methacryloyloxyethylthio)phenyl]-2-morpholinylpropan-1-one, 2-methyl-l-[4-(3-propenyloxypropylthio) Phenyl]-2-morpholinylpropan-1-one,

2-甲基-1-[4-(3_甲基丙烯甲基丙烯醯基氧丙基硫代）苯 基]-2-嗎啉基丙烷-1-酮， 2-甲基-1-[4-(4-丙烯醯基氧丁基硫代）苯基]-2-嗎啉基 丙烷· 1 -酮， 2-甲基-1-[4-(4-甲基丙烯醯基氧丁基硫代）苯基]-2-嗎 啉基丙烷-1 -酮， 2-甲基-1-[4-(2-乙醯基乙基硫代）苯基]-2-嗎啉基丙 院-1 -醒’ 2-甲基-1-[4-(2-乙醯基乙基硫代）苯基]-2-嗎啉基丙 院-1 -酬’ 2 -甲基- l-[4-(2-丙醯基乙基硫代）苯基]-2-嗎啉基丙 院-1 -酮， 2 -甲基-1-[4_ (2-丁醯基乙基硫代）苯基]-2-嗎啉基丙 烷-1-酮， 2 -甲基-1-[4-(2-戊醯基乙基硫代）苯基]-2-嗎啉基丙 院-1 -酮， 2-甲基- l-[4-(2-己醯基乙基硫代）苯基]-2-嗎啉基丙 -24- 200844661 烷-1 -酮， 2-甲基- b[4-(2-苯醯基乙基硫代）苯基]-2-嗎啉基丙 烷-1-酮， 2-甲基·1·[4-(4-乙醯基丁基硫代）苯基]-2-嗎啉基丙 烷-1-酮等。 該等化合物（1)中，尤以2-甲基-1-[4-(乙基硫代）苯基 卜2-嗎啉基丙垸-κ酮，2-甲基-丨_[4_(正丙基硫代）苯基]-2_ 嗎啉基丙院-1_酮，2_甲基-1-[4-(正丁基硫代）苯基]-2_嗎 啉基丙院-1-酮’ 2-甲基-:144-(2-羥基乙基硫代）苯基]-2-嗎 啉基丙烷-1-酮，2-甲基-i-[4-(3-羥基丁基硫代）苯基]-2-嗎 啉基丙烷-卜酮’ 2-甲基-i-[4-(2-丙烯醯基氧乙基硫代）苯 基]-2-嗎咐基丙烷-1-酮，2_甲基-1-[4_(2_甲基丙烯醯基氧 乙基硫代）苯基]-2 -嗎啉基丙院-1 _酮，2 -甲基-1 - [ 4 - (4 -乙醯 基丁基硫代）苯基]-2-嗎啉基丙烷-1-酮等爲佳。 本發明中，化合物（1)可單獨使用或混合2種以上使用 〇 又，本發明中，與聚合引發劑（1)一起，亦可與其他 敏輻射線性聚合引發劑（以下，稱爲「其他聚合引發劑」） 倂用。 其他聚合引發劑方面，可舉例如至少1種具有下述式 (4)，式（5)或式（6)所示主要骨架之聯咪唑系化合物，乙醯 苯系化合物，二苯基酮系化合物，安息香系化合物，α -二 酮系化合物，多核酿系化合物，卩山酮（xanthone)系化合物 ，膦系化合物，三哄系化合物，昨唑系化合物等，該等中 -25 - 200844661 以聯咪唑系化合物，乙醯苯系化合物等爲佳。 [化5]2-methyl-1-[4-(3-methylpropenylmethylpropenyloxypropylthio)phenyl]-2-morpholinylpropan-1-one, 2-methyl-1-[ 4-(4-propenyl methoxy butyl thio)phenyl]-2-morpholinylpropane· 1-ketone, 2-methyl-1-[4-(4-methylpropenyloxybutyl) Thio)phenyl]-2-morpholinylpropan-1-one, 2-methyl-1-[4-(2-ethylindenylethylthio)phenyl]-2-morpholinylpropanoid -1 - awake '2-methyl-1-[4-(2-acetamidoethylthio)phenyl]-2-morpholinylpropanol-1 -relevation 2 -methyl-l-[ 4-(2-propionylethylthio)phenyl]-2-morpholinylpropan-1-one, 2-methyl-1-[4-(2-butyldecylethylthio)phenyl] -2-morpholinylpropan-1-one, 2-methyl-1-[4-(2-pentamethyleneethylthio)phenyl]-2-morpholinylpropan-1-one, 2 -methyl-l-[4-(2-hexylethylthio)phenyl]-2-morpholinylpropane-24- 200844661 alk-1-one, 2-methyl-b[4-( 2-phenylmercaptoethylthio)phenyl]-2-morpholinylpropan-1-one, 2-methyl·1·[4-(4-ethylmercaptobutylthio)phenyl]- 2-morpholinylpropan-1-one and the like. Among these compounds (1), especially 2-methyl-1-[4-(ethylthio)phenyl-2-morpholinopropanoid-kappanone, 2-methyl-indole_[4_( N-propylthio)phenyl]-2_morpholinylpropan-1-one, 2-methyl-1-[4-(n-butylthio)phenyl]-2_morpholinylpropane- 1-ketone '2-methyl-:144-(2-hydroxyethylthio)phenyl]-2-morpholinylpropan-1-one, 2-methyl-i-[4-(3-hydroxyl Butylthio)phenyl]-2-morpholinylpropane-buxone' 2-methyl-i-[4-(2-propenyloxyethylthio)phenyl]-2-indenyl Propane-1-one, 2-methyl-1-[4-(2-methylpropenyloxyethylthio)phenyl]-2-morpholinylpropan-1-one, 2-methyl- 1 - [ 4 - (4-Ethylbutylthio)phenyl]-2-morpholinylpropan-1-one is preferred. In the present invention, the compound (1) may be used singly or in combination of two or more kinds. In the present invention, together with the polymerization initiator (1), it may be combined with other radiation-sensitive linear polymerization initiators (hereinafter, referred to as "others". Polymerization initiator"). The other polymerization initiator may, for example, be at least one biimidazole compound having a main skeleton represented by the following formula (4), formula (5) or formula (6), an acetophenone compound, and a diphenyl ketone system. a compound, a benzoin compound, an α-diketone compound, a polynuclear brewing compound, an xanthone compound, a phosphine compound, a triterpenoid compound, an azole compound, etc., such as -25 - 200844661 A biimidazole compound, an acetamidine compound or the like is preferred. [Chemical 5]

(自上方開始爲式（4)，式（5)，式（6)) 該聯咪唑系化合物之具體例方面，有 2,2’_雙（2-氯苯基）-4,4’，5,5’-四個（4-乙氧基羰苯基）-1，2 ’ -聯咪唑， 2,2’-雙（2-溴苯基）-4,4’，5,5’-四個（4-乙氧基羰苯基）-1，2 ’ -聯咪唑， 2,2’-雙（2-氯苯基）-4,4’，5,5’-四苯基-1，2、聯咪唑， 2,2’-雙（2,4-二氯苯基）-4,4’，5,5、四苯基-1，2’-聯咪唑 2,2’-雙（2,4,6-三氯苯基）-4,4’，5,5’-四苯基-1，2’-聯咪 Q坐， 2,2、雙（2-溴苯基）-4,4’，5,5’-四苯基-1，2’-聯咪唑， -26- 200844661 2,2’-雙（2,4-二溴苯基）-4,4，，5,5，-四苯基-1，2，-聯咪唑 2,2’-雙（2,4,6-三溴苯基）-4,4，，5,5，-四苯基-1，2，-聯咪 唑 等。 該等聯咪唑系化合物中，以2，2 ’ -雙（2 -氯苯基）-4,4’55,5’-四苯基-1，2’-聯咪唑，2,2，-雙（2，4-二氯苯基）-4,4’，5,5’-四苯基-1，2’-聯咪唑及2,2，-雙（2,4,6-三氯苯基）-4,4’，5,5’-四苯基-1，2’-聯咪唑爲佳，尤以2,2，-雙（2-氯苯基 )-4,4’，5,5、四苯基-1，2’-聯咪唑爲佳。 該聯咪唑系化合物可單獨使用或混合2種以上使用。 本發明中，其他聚合引發劑係倂用聯咪唑系化合物之 情形’雖可添加下述氫予體，而就可使感度進而改良之點 爲佳。 在此之「氫予體」係指，相對於藉由曝光自聯咪唑系 化合物發生之自由基，可供予氫原子之化合物之意。 此種氫予體方面，以下述定義之硫醇系化合物，下述 定義之胺系化合物等爲佳。 該硫醇系化合物，係以苯環或雜環作爲母核，具有i 個以上直接鍵結於該母核之氫硫基，較佳爲1〜3個，進而 較佳爲具有1〜2個之化合物（以下稱爲「硫醇系氫予體」） 所成。 又’該fee系化合物’係以本丨哀或雑環爲母核，由巨有 1個以上直接鍵結於該母核之胺基，較佳爲1〜3個，進而 -27- 200844661 較佳爲具有1〜2個之化合物（以下稱爲「胺系氫予體」）所 成。 此外，該等氫予體，亦可同時具有氫硫基與胺基。 以下，就氫予體，更具體加以說明。 硫醇系氫予體，可各自具有1個以上苯環或雜環，又 可具有苯環與雜環兩者，在具有該等環2個以上之情形， 可形成縮合環亦可不形成。 又，硫醇系氫予體，在具有2個以上氫硫基之情形， 在殘存至少1個游離氫硫基之範圍，殘留之氫硫基之1個以 上可以烷基，芳烷或芳基所取代，進而在殘存至少1個游 離氫硫基之範圍，2個硫原子可具有使烷撐基等2價有機基 介在其中而鍵結之構造單位，或2個硫原子以二硫化物之 形鍵結之構造單位。 進而，硫醇系氫予體，在氫硫基以外之處所，可以羧 基，取代或者非取代之烷氧基羰基，取代或者非取代之苯 氧基羰基，硝基等所取代。 此種硫醇系氫予體之具體例方面，可舉2 -氫硫基苯并 噻唑，2-氫硫基苯并噁唑，2-氫硫基苯并咪唑，2,5-二氫 硫基-1，3,4-噻二唑，2-氫硫基-2,5-二甲基胺基吡啶等。 該等硫醇系氫予體中，以2-氫硫基苯并噻唑，2-氫硫 基苯并噁唑爲佳，尤以2-氫硫基苯并噻唑爲佳。 接著，胺系氫予體，可各自具有1個以上苯環或雜環 ，又可具有苯環與雜環之兩者，具有該等環2個以上之情 形，可形成縮合環亦可不形成。 -28 - 200844661 又，胺系氫予體係胺基之1個以上可以烷基或取代烷 基所取代，又在胺基以外之處所，可被羧基，取代或者非 取代之烷氧基羰基，取代或者非取代之苯氧基羰基，硝基 等所取代。 此種胺系氫予體之具體例方面，可例舉4,4’·雙（二甲 基胺基）二苯基酮，4,4’-雙（二乙基胺基）二苯基酮，4_二 乙基胺基乙醢苯，4 -二甲基胺基苯丙酮，4 -一甲基胺基苯 甲酸乙酯，4-二甲基胺基苯甲酸異戊酯，4-二甲基胺基苯 甲酸，4-二甲基胺基苯甲腈等。 該等胺系氫予體中，以4,4’-雙（二甲基胺基）二苯基酮 ，4,4’·雙（一^乙基胺基）一·本基酬爲佳’尤其是4，4’-雙（二 乙基胺基）二苯基酮爲佳。此外，4,4’-雙（二甲基胺基）二 苯基酮或4,4’-雙（二乙基胺基）二苯基酮，即使在聯咪唑系 化合物不存在之情形，其單獨可作爲敏輻射線性聚合引發 劑作用。 本發明中，氫予體可單獨使用或混合2種以上使用， 可組合1種以上硫醇系氫予體與1種以上胺系氫予體予以使 用，所形成之著色層在顯影時難以自基板脫落，又就著色 層之強度及感度亦高之點爲佳。 硫醇系氫予體與胺系氫予體之恰當組合之具體例方面 ，可舉2-氫硫基苯并噻唑/4,4’-雙（二甲基胺基）二苯基酮， 2-氫硫基苯并噻唑/4,4’-雙（二乙基胺基）二苯基酮，2-氫硫 基苯并噁唑/4,4’-雙（二甲基胺基）二苯基酮，2-氫硫基苯并 噁唑/4,4’-雙（二乙基胺基）二苯基酮等，進而恰當之組合 -29- 200844661 爲2-氫硫基苯并噻唑/4,4，-雙（二乙基胺基）二苯基酮，2-氫 硫基苯并噁唑/4，4’-雙（二乙基胺基）二苯基酮，特佳組合 爲2-氫硫基苯并噻唑/4,4，-雙（二乙基胺基）二苯基酮。 在硫醇系氫予體與胺系氫予體之組合中硫醇系氫予體 與胺系氫予體之重量比，通常爲1: 1〜1: 4，較佳爲1: 1 〜1 : 3。 又’該乙醯苯系化合物之具體例方面，可舉2，2-二甲 氧基乙醯苯，2,2-二乙氧基乙醯苯，2,2-二甲氧基-2-苯基 乙醯苯，2-羥基-2-甲基-1_苯基丙烷-1-酮，1-(.4-異丙基苯 基）-2-羥基_2_甲基丙烷-1-酮，1-[4-(甲基硫代）苯基]-2-甲 基-2-嗎啉代丙烷-1-酮，4-(2-羥基乙氧基）苯基-(2-羥基-2-丙基）酮，1-(4-嗎啉代苯基）-2-苄基-2-二甲基胺基丁烷-1-酮，1-(2-溴-4-嗎啉代苯基）_2_苄基-2-二甲基胺基丁烷-1-酮’ 1-(4-嗎啉代苯基）-2-(2-溴苄基）-2-二甲基胺基丁烷-1-酮’ 1-(4-嗎啉代苯基）-2-(4-溴苄基）-2-二甲基胺基丁烷-1-酮，1-羥基環己基苯基酮，2，2-二甲氧基-1，2-二苯基乙 烷-1-酮等。 該等乙醯苯系化合物中，以2-甲基-1-[4-(甲基硫代） 苯基]-2-嗎啉代丙烷-1-酮，1-(4-嗎啉代苯基）-2-苄基-2-二 甲基胺基丁烷-1-酮，1-(2-溴-4-嗎啉代苯基）-2-苄基-2-二 甲基胺基丁烷-1-酮，1-(4-嗎啉代苯基）-2-(4-溴苄基）-2·二 甲基胺基丁烷-1-酮等爲佳。 本發明中，其他聚合引發劑在可倂用乙醯苯系化合物 之情形，可添加該氫予體1種以上。 -30- 200844661 又，該二苯基酮系化合物之具體例方面，有4,4’-雙（ 二甲基胺基）二苯基酮，4，4’·雙（二乙基胺基）二苯基酮等 〇 又，該安息香系化合物之具體例方面，可舉安息香， 安息香甲基醚，安息香乙基醚，安息香異丙基醚，安息香 異丁基醚，甲基-2·苯醯基苯甲酸酯等。 又，該α·二酮系化合物之具體例方面，有二乙醯基 ，二苯醯基，甲基苯醯基甲酸酯等。 又，該多核醌系化合物之具體例方面，有蒽醌，2-乙 基蒽醌，2-三級丁基蒽醌，1，4-萘醌等。 又，該Ptli酮（xanthone)系化合物之具體例方面，有pi 酮（xanthone)，噻噸酮，2 -氯噻噸酮等。 又，該膦系化合物之具體例方面，有雙（2,4,6-三甲基 苯醯基）苯基膦氧化物，2,4,6-三甲基苯醯基二苯基膦氧化 物等。 又，該三哄系化合物之具體例方面，有2,4,6 -三個（三 氯甲基）-5-三哄，2-甲基-4,6-雙（三氯甲基）-3-三哄，2_[2-( 咲喃-2-基）乙烯基]-4,6-雙（三氯甲基）-s-三哄，2-[2-(5-甲 基呋喃-2-基）乙烯基]-4,6-雙（三氯甲基）-s-三哄，2-[2-(4-二乙基胺基-2-甲基苯基）乙烯基]-4,6-雙（三氯甲基）_s_三哄 ，2-[2-(3,4-二甲氧基苯基）乙烯基]-4,6-雙（三氯甲基）_8-三 哄，2-(4_甲氧基苯基）-4,6-雙（三氯甲基）-s·三哄，2-(4·乙 氧基苯乙烯基）-4,6-雙（三氯甲基）-s_三哄，2-(4-正丁氧碁 苯基）-4,6 -雙（三氯甲基）-s-三哄， -31 - 200844661 下述式（7)所示之化合物 [化6](Formula (4), Formula (5), Formula (6) from the top) Specific examples of the biimidazole-based compound include 2,2'-bis(2-chlorophenyl)-4,4', 5,5'-tetrakis(4-ethoxycarbonylphenyl)-1,2 '-biimidazole, 2,2'-bis(2-bromophenyl)-4,4',5,5'- Four (4-ethoxycarbonylphenyl)-1,2 '-biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1 , 2, biimidazole, 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5, tetraphenyl-1,2'-biimidazole 2,2'-double ( 2,4,6-trichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidine, 2,2,bis(2-bromophenyl)-4 , 4',5,5'-tetraphenyl-1,2'-biimidazole, -26- 200844661 2,2'-bis(2,4-dibromophenyl)-4,4,5,5 ,-Tetraphenyl-1,2,-biimidazole 2,2'-bis(2,4,6-tribromophenyl)-4,4,5,5,-tetraphenyl-1,2, - Biimidazole and the like. Among these biimidazole compounds, 2,2 '-bis(2-chlorophenyl)-4,4'55,5'-tetraphenyl-1,2'-biimidazole, 2,2,-double (2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole and 2,2,-bis(2,4,6-trichlorophenyl) -4,4',5,5'-tetraphenyl-1,2'-biimidazole is preferred, especially 2,2,-bis(2-chlorophenyl)-4,4',5,5 Tetraphenyl-1,2'-biimidazole is preferred. These biimidazole-based compounds may be used singly or in combination of two or more. In the present invention, in the case where the other polymerization initiator is a biimidazole-based compound, the following hydrogen donor may be added, and the sensitivity may be further improved. The "hydrogen donor" as used herein means a compound which can be supplied to a hydrogen atom with respect to a radical generated by exposure of a biimidazole-based compound. As such a hydrogen donor, a thiol compound defined below, an amine compound as defined below or the like is preferred. The thiol compound has a benzene ring or a heterocyclic ring as a nucleus, and has at least one hydrogen thio group directly bonded to the nucleus, preferably 1 to 3, and more preferably 1 to 2 The compound (hereinafter referred to as "thiol-based hydrogen donor") is formed. Further, the 'fee-based compound' is mainly composed of one or more amine groups directly bonded to the mother nucleus, preferably 1 to 3, and further -27-200844661. It is preferably a compound having 1 to 2 compounds (hereinafter referred to as "amine-based hydrogen donor"). Further, the hydrogen donors may have both a hydrogenthio group and an amine group. Hereinafter, the hydrogen donor will be more specifically described. The thiol-based hydrogen donor may have one or more benzene rings or heterocyclic rings, and may have both a benzene ring and a hetero ring. When two or more of the rings are present, a condensed ring may not be formed. Further, in the case where the thiol-based hydrogen donor has two or more hydrogenthio groups, at least one free thiol group remains, and one or more of the remaining thiol groups may be an alkyl group, an aralkyl group or an aryl group. Further, in the range in which at least one free thiol group remains, two sulfur atoms may have a structural unit in which a divalent organic group such as an alkylene group is bonded thereto, or two sulfur atoms may be disulfide. The structural unit of the shape bond. Further, the thiol-based hydrogen donor may be substituted with a carboxyl group, a substituted or unsubstituted alkoxycarbonyl group, a substituted or unsubstituted phenoxycarbonyl group, a nitro group or the like in addition to the thiol group. Specific examples of such a thiol-based hydrogen donor include 2-hydrothiobenzothiazole, 2-hydrothiobenzoxazole, 2-hydrothiobenzimidazole, and 2,5-dihydrosulfide. Base-1,3,4-thiadiazole, 2-hydrothio-2,5-dimethylaminopyridine, and the like. Among these thiol-based hydrogen donors, 2-hydrothiobenzothiazole and 2-hydrothiobenzoxazole are preferred, and 2-hydrothiobenzothiazole is preferred. Next, the amine-based hydrogen donor may have one or more benzene rings or heterocyclic rings, and may have both a benzene ring and a heterocyclic ring, and may have two or more such rings, and may form a condensed ring or may not be formed. -28 - 200844661 Further, one or more amine groups of the amine hydrogen group may be substituted by an alkyl group or a substituted alkyl group, and may be substituted by a carboxyl group, a substituted or unsubstituted alkoxycarbonyl group other than the amine group. Alternatively, it may be substituted with an unsubstituted phenoxycarbonyl group, a nitro group or the like. Specific examples of such an amine-based hydrogen donor include 4,4'-bis(dimethylamino)diphenyl ketone and 4,4'-bis(diethylamino)diphenyl ketone. , 4-diethylaminoethyl benzene, 4-dimethylaminopropiophenone, ethyl 4-methylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 4-di Methylaminobenzoic acid, 4-dimethylaminobenzonitrile, and the like. Among these amine-based hydrogen donors, 4,4'-bis(dimethylamino)diphenyl ketone, 4,4'-bis(monoethylamino)-based base is preferred. In particular, 4,4'-bis(diethylamino)diphenyl ketone is preferred. Further, 4,4'-bis(dimethylamino)diphenyl ketone or 4,4'-bis(diethylamino)diphenyl ketone, even in the case where the biimidazole-based compound is not present, It can act as a linear radiation polymerization initiator for sensitive radiation alone. In the present invention, the hydrogen donor may be used singly or in combination of two or more kinds, and one or more thiol-based hydrogen donors and one or more amine-based hydrogen donors may be used in combination, and the colored layer formed is difficult to develop at the time of development. It is preferable that the substrate is peeled off and the strength and sensitivity of the colored layer are also high. Specific examples of a suitable combination of a thiol-based hydrogen donor and an amine-based hydrogen donor include 2-hydrothiobenzothiazole/4,4'-bis(dimethylamino)diphenyl ketone, 2 -Hexylthiobenzothiazole/4,4'-bis(diethylamino)diphenyl ketone, 2-hydrothiobenzoxazole/4,4'-bis(dimethylamino)di Phenyl ketone, 2-hydrothiobenzoxazole/4,4'-bis(diethylamino)diphenyl ketone, etc., and the appropriate combination -29- 200844661 is 2-hydrothiobenzothiazole /4,4,-bis(diethylamino)diphenyl ketone, 2-hydrothiobenzoxazole/4,4'-bis(diethylamino)diphenyl ketone, special combination It is 2-hydrothiobenzothiazole/4,4,-bis(diethylamino)diphenyl ketone. The weight ratio of the thiol-based hydrogen donor to the amine-based hydrogen donor in the combination of the thiol-based hydrogen donor and the amine-based hydrogen donor is usually 1:1 to 1:4, preferably 1:1 to 1 : 3. Further, specific examples of the acetaminophen compound include 2,2-dimethoxyacetamidine, 2,2-diethoxyethyl benzene, and 2,2-dimethoxy-2- Phenylethyl benzene, 2-hydroxy-2-methyl-1 phenylpropan-1-one, 1-(.4-isopropylphenyl)-2-hydroxy-2-methylpropan-1- Ketone, 1-[4-(methylthio)phenyl]-2-methyl-2-morpholinopropan-1-one, 4-(2-hydroxyethoxy)phenyl-(2-hydroxyl 2-propyl)one, 1-(4-morpholinophenyl)-2-benzyl-2-dimethylaminobutan-1-one, 1-(2-bromo-4-morpholine Phenyl)_2_benzyl-2-dimethylaminobutan-1-one' 1-(4-morpholinophenyl)-2-(2-bromobenzyl)-2-dimethyl Aminobutane-1-one' 1-(4-morpholinophenyl)-2-(4-bromobenzyl)-2-dimethylaminobutane-1-one, 1-hydroxycyclohexyl Phenyl ketone, 2,2-dimethoxy-1,2-diphenylethane-1-one, and the like. Among these acetophenone compounds, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 1-(4-morpholinobenzene) 2-benzyl-2-dimethylaminobutan-1-one, 1-(2-bromo-4-morpholinophenyl)-2-benzyl-2-dimethylamino Butan-1-one, 1-(4-morpholinophenyl)-2-(4-bromobenzyl)-2.dimethylaminobutane-1-one, etc. are preferred. In the present invention, when the other polymerization initiator is an acetophenone-based compound, one or more hydrogen donors may be added. -30- 200844661 Further, specific examples of the diphenylketone-based compound include 4,4'-bis(dimethylamino)diphenyl ketone and 4,4'-bis(diethylamino). Diphenyl ketone and the like, and specific examples of the benzoin-based compound may be benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, methyl-2·benzoquinone Benzobenzoate and the like. Further, specific examples of the α·diketone compound include a diethenyl group, a diphenylfluorenyl group, a methylphenyl fluorenylcarboxylate, and the like. Further, specific examples of the polynuclear ruthenium compound include ruthenium, 2-ethyl fluorene, 2-tert-butyl fluorene, and 1,4-naphthoquinone. Further, specific examples of the Ptli ketone (xanthone)-based compound include pi ketone (xanthone), thioxanthone, 2-chlorothioxanthone and the like. Further, specific examples of the phosphine-based compound include bis(2,4,6-trimethylphenylhydrazino)phenylphosphine oxide and oxidation of 2,4,6-trimethylphenylnonyldiphenylphosphine. Things and so on. Further, specific examples of the triterpenoid compound include 2,4,6-tris(trichloromethyl)-5-trimium, 2-methyl-4,6-bis(trichloromethyl)- 3-trimium, 2_[2-(indol-2-yl)vinyl]-4,6-bis(trichloromethyl)-s-triterpene, 2-[2-(5-methylfuran- 2-yl)vinyl]-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(4-diethylamino-2-methylphenyl)vinyl]- 4,6-bis(trichloromethyl)_s_trisole, 2-[2-(3,4-dimethoxyphenyl)vinyl]-4,6-bis(trichloromethyl)_8- Triterpenoid, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s.triter, 2-(4.ethoxystyryl)-4,6-double (trichloromethyl)-s_tritium, 2-(4-n-butoxyphenyl)-4,6-bis(trichloromethyl)-s-triterpene, -31 - 200844661 7) the compound shown [Chemical 6]

CCI3 /H=\ i / N-\ CC,3 (7) • 下述式⑷所示之化合物 [化7]CCI3 /H=\ i / N-\ CC,3 (7) • A compound represented by the following formula (4) [Chemical 7]

等之具有鹵甲基之三哄系化合物等。 又，該_唑系化合物之具體例方面，有例如1-[9-乙 基-6-苯醯基- 咔唑-3-基]壬烷1，2-壬烷2-肟-0-苯甲酸 酯，1-[9-乙基-6-苯醯基-9·Η·-咔唑-3-基]壬烷1，2-壬烷2- 月5 - 0 -乙酸醋，1 - [ 9 -乙基-6 -本釀基· 9 · Η ·-味哩-3 -基]戊院- 1，2-戊烷-2-肟-0-乙酸酯，1-[9-乙基-6-苯醯基-9.Η.-昨唑- 3_基]辛烷-1-酮肟-0-乙酸酯，1-[9-乙基-6-(2-甲基苯醯基 )-9.卫.-咔唑-3-基]乙烷-1-酮肟-0-苯甲酸酯，1-[9-乙基-6- (2-甲基苯醯基）-9.H.-咔唑-3-基]乙烷-1-酮肟-0-乙酸酯， -32- 200844661 l-[9-乙基- 6-(2,4,6-三甲基苯醯基）-9·H··咔唑-3-基]乙烷-l-酮肟-0-苯甲酸酯，l·[9·正丁基·6-(2-乙基苯醯基）_9·H.-昨嗤-3-基]乙院-l-酮照-o·苯甲酸酯，乙酮（ethanone)，l-[9-乙基-6-[2-甲基-4-(2,2-二甲基-1，3-二氧雜戊環基）甲氧 基苯醯基]-9·Η·-咔唑-3-基]-，l-(〇-乙醯基肟）等。 該等咔唑系化合物中，以1-[9-乙基-6-(2-甲基苯醯基 )-9·Η·-咔唑_3·基]乙烷-1-酮肟-〇-乙酸酯，乙酮（ethanone) ，l-[9-乙基- 6-[2-甲基-4-(2,2-二甲基-1，3-二氧雜戊環基） 甲氧基苯醯基]-9·Η·-昨唑-3-基]-，1-(0_乙醯基肟）爲佳。 該等其他聚合引發劑可單獨使用或混合2種以上使用 。 其他聚合引發劑之使用比率，相對於聚合引發劑（1)與 其他聚合引發劑之合計，通常爲80重量％以下，進而較佳 爲7 0重量％以下。在此情形，其他聚合引發劑之使用比率 超過95重量％時，會有損及本發明所期望效果之虞。 本發明中聚合引發劑之使用量，相對於（C)多官能性 單體與單官能性單體之合計100重量份，通常爲0.01〜200 重量份，較佳爲1〜120重量份，特佳爲1〜1〇〇重量份。在 此情形，聚合引發劑之使用量在未達0.01重量份時，曝光 所致硬化爲不充分，會有像素圖型或黑色矩陣圖型依照設 定之配列而配置之圖型陣列之獲得造成困難之虞，一方面 超過200重量份’所形成之著色層在顯影時易於自基板脫 落，又在未曝光部之基板上或遮光層上表面污斑，膜變薄 等易於產生。 進而，在本發明中，與該敏輻射線性聚合引發劑一起 -33- 200844661 ，可因應需要，倂用增感劑，硬化促進劑或高分子光交聯 •增感劑之1種以上。 -添加劑- 本發明之著色層形成用敏輻射線性組成物，可因應需 要，含有各種添加劑。 該添加劑方面，顯示可更爲改善相對於著色層形成用 敏輻射線性組成物之鹼顯影液的溶解特性，且可更爲抑制 顯影後未溶解物之殘存的作用等，而可例舉有機酸或有機 胺基化合物（但，該氫予體爲除外）等。 該有機酸方面，以分子中具有1個以上羧基之，脂肪 族羧酸或含苯基羧酸爲佳。 該脂肪族羧酸之例方面， 有甲酸，乙酸，丙酸，丁酸，戊酸，三甲基乙酸，己酸， 二乙基乙酸，庚酸，辛酸等之單羧酸類； 草酸，丙二酸，琥珀酸，戊二酸，己二酸，庚二酸（pemellic acid)，辛二酸，壬二酸（azelaic acid)，癸二酸，十三碳二 酸（brasslic acid)，甲基丙二酸，乙基丙二酸，二甲基丙 二酸，甲基琥珀酸，四甲基琥珀酸，環己烷二羧酸，伊康 酸，檸康酸，順丁烯二酸，反丁烯二酸，中康酸等之二羧 酸類； 均丙三甲酸，烏頭酸（aconitic acid)，去碳樟腦三酸 (camphoronic acid)等之三竣酸類等。 又，該含苯基羧酸方面，有例如羧基爲直接鍵結於苯 -34- 200844661 基之化合物’使羧基介由碳鏈鍵結於苯基之羧酸等。 含苯基羧酸之例方面，有苯甲酸，甲苯甲醯基酸，茴 香甲酸（cuminic acid)，2,3-二甲苯甲酸（hemelitie acid)， 1，3，5 ·三甲苯酸等之芳香族單羧酸類； 酞酸，異酞酸，對苯二甲酸等芳香族二羧酸類； 1，2,4-苯二甲酸’均苯二甲酸（trimesjc acid)，1，2,3,5 -苯 四甲酸（mellophanic acid)，均苯四甲酸等3價以上芳香族 聚羧酸類，或 苯基乙酸，氫化阿拖酸，氫化桂皮酸，苦杏仁酸 (mandelic acid)，苯基琥珀酸，阿拖酸，桂皮酸，肉桂叉 酸（cinnamylidene acid)，闊烏酸（coumalic acid)，蕺酸 (unbellic acid)等 ° 該等有機酸中，就鹼溶解性，相對於後述溶劑之溶解 性，在未曝光部之基板上或遮光層上中由防止表面污斑或 防止膜變薄等觀點而言，脂肪族羧酸方面，以脂肪族二羧 酸類爲佳，尤以丙二酸，己二酸，伊康酸，檸康酸，反丁 烯二酸，中康酸等爲佳。又含苯基羧酸方面，以芳香族二 羧酸類爲佳，尤以酞酸爲佳。 該有機酸可單獨使用或混合2種以上使用。 有機酸之使用量，相對於敏輻射線性組成物全體’通 常爲1 5重量％以下，較佳爲1 〇重量％以下。在此情形’有 機酸之使用量超過1 5重量％時，會有相對於著色層之基板 之密接性降低之傾向。 又，該有機胺基化合物方面，在分子中具有1個以上 -35- 200844661 胺基之，脂肪族胺或含苯基胺爲佳。 該脂肪族胺之例方面，有正丙基胺，異丙基胺，正丁 基胺，異丁基胺，二級丁基胺，三級丁基胺，正戊基胺， 正己基胺，正庚基胺，正辛基胺，正壬基胺，正癸基胺， 正十一基胺，正十二基胺，環己基胺，2-甲基環己基胺， 3-甲基環己基胺，4-甲基環己基胺，2-乙基環己基胺，3-乙基環己基胺，4-乙基環己基胺等之單（環）烷基胺類； 甲基乙基胺，二乙基胺，甲基正丙基胺，乙基正丙基 胺，二-正丙基胺，二-異丙基胺，二-正丁基胺，二-異丁 基胺，二-二級丁基胺，二-三級丁基胺，二-正戊基胺， 二-正己基胺，甲基環己基胺，乙基環己基胺，二環己基 胺等之二（環）烷基胺類； 二甲基乙基胺，甲基二乙基胺，三乙基胺，二甲基正 丙基胺，二乙基正丙基胺，甲基二-正丙基胺，乙基二-正 丙基胺，三-正丙基胺，三-異丙基胺，三-正丁基胺，三-異丁基胺，三-二級丁基胺，三-三級丁基胺，三-正戊基 胺，三-正己基胺，二甲基環己基胺，二乙基環己基胺， 甲基二環己基胺，乙基二環己基胺，三環己基胺等之三（ 環）烷基胺類； 2 -胺基乙醇’ 3 -胺基-1-丙醇’ 1-胺基-2 -丙醇’ 4 -胺 基-1-丁醇，5-胺基-1-戊醇，6-胺基-1-己醇，4-胺基-1-環 己醇等之單（環）烷醇胺類； 二乙醇胺，二-正丙醇胺，二-異丙醇胺，二-正丁醇 胺，二-異丁醇胺’二-正戊醇胺，二-正己醇胺，二（4-環 -36- 200844661 己醇）胺等之二（環）烷醇胺類； 三乙醇胺，三-正丙醇胺，三-異丙醇胺，三-正丁醇 胺，三-異丁醇胺，三-正戊醇胺，三-正己醇胺，三（4-環 己醇）胺等之三（環）烷醇胺類； 3-胺基-1，2-丙烷二醇，2-胺基-1，3-丙烷二醇，4-胺 基-1，2-丁烷二醇，4-胺基-1，3-丁烷二醇，4-胺基·1，2-環己 烷二醇，4-胺基-1，3-環己烷二醇，3-二甲基胺基“ ’ 2_丙 烷二醇，3-二乙基胺基-1，2-丙烷二醇，2-二甲基胺基-1，3-丙烷二醇，2-二乙基胺基-1，3-丙烷二醇等之胺基（環）鏈烷 二醇類； 1·胺基環戊烷甲醇，4-胺基環戊烷甲醇，1-胺基環己 烷甲醇，4-胺基環己烷甲醇，4-二甲基胺基環戊烷甲醇’ 4-二乙基胺基環戊烷甲醇，4-二甲基胺基環己烷甲醇，4-二乙基胺基環己烷甲醇等之含胺基環鏈烷甲醇類； β-丙氨酸，2-胺基丁酸，3-胺基丁酸，4-胺基丁酸， 2-胺基異丁酸，3-胺基異丁酸，2-胺基戊酸，5-胺基戊酸 ，6-胺基己酸，1-胺基環丙烷羧酸，1-胺基環己烷羧酸， 4-胺基環己烷羧酸等之胺基羧酸類等。 又，該含苯基胺方面，例如，胺基爲直接鍵結於苯基 之化合物，胺基介由碳鏈鍵結於苯基之化合物等。 含苯基胺之例方面，有苯胺，2-甲基苯胺，3-甲基苯 胺，4-甲基苯胺，4-乙基苯胺，4-正丙基苯胺，4-異丙基 苯胺，4-正丁基苯胺，4-三級丁基苯胺，1-萘基胺，2-萘 基胺，Ν，Ν-二甲基苯胺，Ν，Ν-二乙基苯胺，4-甲基-Ν，Ν- -37- 200844661 二甲基苯胺等之芳香族胺類； 2_胺基苄基醇，3-胺基苄基醇，4-胺基苄基醇，4-二 甲基胺基苄基醇，4-二乙基胺基苄基醇等之胺基苄基醇類 2-胺基苯酚，3-胺基苯酚，4-胺基苯酚，4-二甲基胺 $苯酚’ 4-二乙基胺基苯酚等之胺基苯酚類等。 該等有機胺基化合物中，相對於後述之溶劑的溶解性 ’在耒曝光部之基板上或遮光層上就可防止表面污斑或膜 變薄等之觀點而言，脂肪族胺方面，以單（環）烷醇胺類及 胺基（環）鏈烷二醇類爲佳，尤以2-胺基乙醇，3-胺基-1-丙 醇，5-胺基-1-戊醇，3-胺基-1，2-丙烷二醇，2-胺基-1，3-丙烷二醇，4-胺基-1，2-丁烷二醇等爲佳。又，含苯基胺方 面，以胺基苯酚類爲佳，尤以2-胺基苯酚，3-胺基苯酚， 4-胺基苯酚等爲佳。 該有機胺基化合物可單獨使用或混合2種以上使用。 有機胺基化合物之使用量相對於敏輻射線性組成物全 體，通常爲15重量％以下，較佳爲10重量％以下。在此情 形，有機胺基化合物之使用量超過15重量％時，會有相對 於著色層之基板之密接性降低之傾向。 進而，其以外之添加劑方面，有例如酞菁銅衍生物等 藍色顏料衍生物或黃色顏料衍生物等之分散助劑； 玻璃，氧化鋁等之塡充劑； 聚乙烯醇，聚乙二醇單烷基醚類，聚（氟烷基丙烯酸 酯）類等之高分子化合物； -38- 200844661 非離子系，陽離子系，陰離子系等之界面活性劑； 乙烯二甲氧基砂院，乙燦三乙氧基砂院，乙綠三個 (2-甲氧基乙氧基）矽烷，N-(2_胺基乙基）_3-胺基丙基甲基 二甲氧基矽烷’ N_ (2-胺基乙基）-3·胺基丙基三甲氧基矽烷 ’ 3-胺基丙基三乙氧基矽烷，3_環氧丙基丙基三甲氧基矽 烷’ 3-環氧丙基丙基甲基二甲氧基矽烷，2-(3,4-環氧基環 己基）乙基三甲氧基矽烷，3 -氯丙基甲基二甲氧基矽烷， 3-氯丙基三甲氧基矽烷，3_甲基丙烯醯氧基丙基三甲氧基 砍院’ 3 ·氫硫基丙基三甲氧基矽烷等之密接促進劑； 2,2’-硫代雙（4 -甲基-6-三級丁基苯酣），2,6 -二-三級 丁基苯酚等之防氧化劑； 2-(3-三級丁基-5-甲基-2-羥基苯基）-5-氯苯并三唑， 烷氧基二苯基酮類等之紫外線吸收劑； 聚丙烯酸鈉等之防凝集劑； 1，1、偶氮雙（環己院-1-腈（carbonitrile))，2-苯基偶 氮-4-甲氧基-2,4-二甲基戊腈等之熱自由基發生劑等。 -溶劑- 本發明之著色層形成用敏輻射線性組成物，係以該 (A)〜（D)成份爲必須成份，視情形可含有該添加劑成份， 而通常配合溶劑調製作爲液狀組成物。 該溶劑方面，係將構成敏輻射線性組成物之各成份予 以分散或溶解，且並不與該等成份反應，在具有適度揮發 性之範圍，可適宜選擇做使用。 -39- 200844661A triterpenoid compound or the like having a halomethyl group. Further, specific examples of the azole compound are, for example, 1-[9-ethyl-6-benzoinyl-oxazol-3-yl]decane 1,2-decane 2-indole-0-benzene. Formate, 1-[9-ethyl-6-benzoin-9-indole-oxazol-3-yl]decane 1,2-decane 2-month 5 - 0 -acetic acid vinegar, 1 - [9-Ethyl-6-branched base·9 · Η ·- miso-3 -yl] Wuyuan - 1,2-pentane-2-indole-0-acetate, 1-[9-B -6-phenylhydrazinyl-9.Η.-previously azole-3-yl]octane-1-one oxime-0-acetate, 1-[9-ethyl-6-(2-methylbenzene醯基)-9. Wei.-oxazol-3-yl]ethane-1-one oxime-0-benzoate, 1-[9-ethyl-6-(2-methylphenylhydrazino) -9.H.-carbazol-3-yl]ethane-1-one oxime-0-acetate, -32- 200844661 l-[9-ethyl-6-(2,4,6-trimethyl) Benzo hydrazino)-9·H··oxazol-3-yl]ethane-l-ketooxime-0-benzoate, l·[9·n-butyl-6-(2-ethylbenzene)醯基)_9·H.-嗤嗤-3-基] 乙院-l-keto-o-benzoate, ethanone, l-[9-ethyl-6-[2- 4-(2,2-dimethyl-1,3-dioxolanyl)methoxybenzoinyl]-9·Η·-carbazol-3-yl]-,l-(〇 - 乙醯基肟) and so on. Among the oxazolyl compounds, 1-[9-ethyl-6-(2-methylbenzoinyl)-9·Η·-carbazole-3-yl]ethane-1-ketone-oxime -acetate, ethanone, l-[9-ethyl-6-[2-methyl-4-(2,2-dimethyl-1,3-dioxolanyl) A Preferably, oxyphenyl hydrazino]-9·Η·- oxazolyl-3-yl]-, 1-(0-ethenyl fluorene). These other polymerization initiators may be used singly or in combination of two or more. The use ratio of the other polymerization initiator is usually 80% by weight or less, and more preferably 70% by weight or less based on the total of the polymerization initiator (1) and the other polymerization initiator. In this case, when the use ratio of the other polymerization initiator exceeds 95% by weight, the desired effect of the present invention may be impaired. The amount of the polymerization initiator used in the present invention is usually 0.01 to 200 parts by weight, preferably 1 to 120 parts by weight, based on 100 parts by weight of the total of the (C) polyfunctional monomer and the monofunctional monomer. Preferably, it is 1 to 1 part by weight. In this case, when the amount of the polymerization initiator used is less than 0.01 parts by weight, hardening due to exposure is insufficient, and it is difficult to obtain a pattern array in which the pixel pattern or the black matrix pattern is arranged in accordance with the set arrangement. Then, on the one hand, more than 200 parts by weight of the formed color layer is liable to fall off from the substrate during development, and the surface of the unexposed portion or the surface of the light shielding layer is stained, and the film is thinned or the like easily. Further, in the present invention, the sensitizer, the hardening accelerator, or the polymer photocrosslinking/sensitizer may be used in combination with the radiation-sensitive linear polymerization initiator -33-200844661. - Additive - The linear composition of the sensitive layer for coloring layer formation of the present invention may contain various additives as needed. In terms of the additive, it is shown that the solubility characteristics of the alkali developing solution with respect to the linear composition for forming a photosensitive layer for coloring layer can be further improved, and the effect of remaining undissolved material after development can be further suppressed, and an organic acid can be exemplified. Or an organic amine-based compound (except that the hydrogen donor is excluded) or the like. The organic acid is preferably an aliphatic carboxylic acid or a phenylcarboxylic acid having one or more carboxyl groups in the molecule. Examples of the aliphatic carboxylic acid include formic acid, acetic acid, propionic acid, butyric acid, valeric acid, trimethylacetic acid, caproic acid, diethylacetic acid, heptanoic acid, caprylic acid and the like; oxalic acid, propylene Acid, succinic acid, glutaric acid, adipic acid, pemelilic acid, suberic acid, azelaic acid, azelaic acid, brassic acid, methyl propyl Diacid, ethylmalonic acid, dimethylmalonic acid, methyl succinic acid, tetramethyl succinic acid, cyclohexane dicarboxylic acid, itaconic acid, citraconic acid, maleic acid, anti-butyl a dicarboxylic acid such as adipic acid or mesaconic acid; a tricarboxylic acid such as propylene terephthalic acid, aconitic acid, or camphoric acid; and the like. Further, in the case of the phenyl group-containing carboxylic acid, for example, a carboxyl group is a compound directly bonded to a benzene-34-200844661 group, a carboxylic acid having a carboxyl group bonded to a phenyl group via a carbon chain. Examples of the phenyl carboxylic acid include benzoic acid, tolylmethyl phthalic acid, cuminic acid, hemelitie acid, and 1,3,5-tritoic acid. Group of monocarboxylic acids; tannic acid, isophthalic acid, terephthalic acid and other aromatic dicarboxylic acids; 1,2,4-phthalic acid 'trimesjc acid, 1,2,3,5 - a tetravalent or higher aromatic polycarboxylic acid such as melophanic acid or pyromellitic acid, or phenylacetic acid, hydrogenated aconsin, hydrogenated cinnamic acid, mandelic acid, phenylsuccinic acid, Toxic acid, cinnamic acid, cinnamylidene acid, coumalic acid, unbellic acid, etc. Among these organic acids, alkali solubility, relative to the solubility of the solvent described later, The aliphatic carboxylic acid is preferably an aliphatic dicarboxylic acid, particularly malonic acid or adipic acid, from the viewpoint of preventing surface stains or preventing film thinning on the substrate of the unexposed portion or the light shielding layer. Ikonic acid, citraconic acid, fumaric acid, mesaconic acid, etc. are preferred. Further, in terms of the phenylcarboxylic acid, an aromatic dicarboxylic acid is preferred, and tannic acid is preferred. These organic acids may be used singly or in combination of two or more. The amount of the organic acid used is usually 15% by weight or less, preferably 1% by weight or less, based on the entire linear composition of the radiation radiation. In this case, when the amount of the organic acid used exceeds 15% by weight, the adhesion to the substrate of the colored layer tends to decrease. Further, in the case of the organic amine-based compound, one or more amine groups of -35 to 200844661 are contained in the molecule, and an aliphatic amine or a phenylamine-containing amine is preferred. Examples of the aliphatic amine include n-propylamine, isopropylamine, n-butylamine, isobutylamine, secondary butylamine, tertiary butylamine, n-pentylamine, n-hexylamine, N-heptylamine, n-octylamine, n-decylamine, n-decylamine, n-undecylamine, n-dodecylamine, cyclohexylamine, 2-methylcyclohexylamine, 3-methylcyclohexyl a mono(cyclo)alkylamine such as an amine, 4-methylcyclohexylamine, 2-ethylcyclohexylamine, 3-ethylcyclohexylamine, 4-ethylcyclohexylamine or the like; methylethylamine, Diethylamine, methyl n-propylamine, ethyl n-propylamine, di-n-propylamine, di-isopropylamine, di-n-butylamine, di-isobutylamine, di-di Butylamine, di-tertiary butylamine, di-n-pentylamine, di-n-hexylamine, methylcyclohexylamine, ethylcyclohexylamine, dicyclohexylamine, etc. Amines; dimethylethylamine, methyldiethylamine, triethylamine, dimethyl-n-propylamine, diethyl-n-propylamine, methyldi-n-propylamine, ethyldi - n-propylamine, tri-n-propylamine, tri-isopropylamine, tri-n-butylamine, tri-isobutyl , tri- ortho-butylamine, tri-tertiary butylamine, tri-n-pentylamine, tri-n-hexylamine, dimethylcyclohexylamine, diethylcyclohexylamine, methyldicyclohexylamine , tricyclo(alkyl)alkylamines such as ethyldicyclohexylamine, tricyclohexylamine; 2-aminoethanol '3-amino-1-propanol' 1-amino-2-propanol' 4 a mono(cyclo)alkanolamine such as amino-1-butanol, 5-amino-1-pentanol, 6-amino-1-hexanol, 4-amino-1-cyclohexanol; Diethanolamine, di-n-propanolamine, di-isopropanolamine, di-n-butanolamine, di-isobutanolamine 'di-n-pentanolamine, di-n-hexanolamine, di(4-ring- 36- 200844661 hexanol) bis(cyclo)alkanolamines such as amines; triethanolamine, tri-n-propanolamine, tri-isopropanolamine, tri-n-butanolamine, tri-isobutanolamine, three a tri(cyclo)alkanolamine such as n-pentanolamine, tri-n-hexanolamine or tris(4-cyclohexanol)amine; 3-amino-1,2-propanediol, 2-amino group- 1,3-propanediol, 4-amino-1,2-butanediol, 4-amino-1,3-butanediol, 4-amino-1,2-cyclohexanediol , 4-amino-1,3-cyclohexanediol, 3-di Amino group "' 2 -propanediol, 3-diethylamino-1,2-propanediol, 2-dimethylamino-1,3-propanediol, 2-diethylamino -Amino (cyclo)alkanediols such as 1,3-propanediol; 1. Aminocyclopentane methanol, 4-aminocyclopentane methanol, 1-aminocyclohexane methanol, 4- Aminocyclohexane methanol, 4-dimethylaminocyclopentane methanol ' 4-diethylaminocyclopentane methanol, 4-dimethylaminocyclohexane methanol, 4-diethylamino group Aminocycloalkane methanols such as cyclohexanemethanol; β-alanine, 2-aminobutyric acid, 3-aminobutyric acid, 4-aminobutyric acid, 2-aminoisobutyric acid, 3-aminoisobutyric acid, 2-aminopentanoic acid, 5-aminopentanoic acid, 6-aminohexanoic acid, 1-aminocyclopropanecarboxylic acid, 1-aminocyclohexanecarboxylic acid, 4- An aminocarboxylic acid such as an aminocyclohexanecarboxylic acid or the like. Further, in the case of the phenylamine-containing compound, for example, the amine group is a compound directly bonded to a phenyl group, and the amine group is bonded to a phenyl group via a carbon chain. Examples of the phenylamine-containing compound include aniline, 2-methylaniline, 3-methylaniline, 4-methylaniline, 4-ethylaniline, 4-n-propylaniline, 4-isopropylaniline, 4 -n-butylaniline, 4-tertiary butylaniline, 1-naphthylamine, 2-naphthylamine, hydrazine, hydrazine-dimethylaniline, hydrazine, hydrazine-diethylaniline, 4-methyl-hydrazine ,Ν- -37- 200844661 aromatic amines such as dimethylaniline; 2-aminobenzyl alcohol, 3-aminobenzyl alcohol, 4-aminobenzyl alcohol, 4-dimethylaminobenzyl Alkyl benzyl alcohol such as 4-diethylaminobenzyl alcohol, 2-aminophenol, 3-aminophenol, 4-aminophenol, 4-dimethylamine, phenol' 4- An aminophenol such as diethylaminophenol or the like. In the organic amine-based compound, the solubility in a solvent to be described later is such that, in the case of preventing the surface stain or the film from being thinned on the substrate of the exposed portion or the light-shielding layer, the aliphatic amine is Mono(cyclo)alkanolamines and amine (cyclo)alkanediols are preferred, especially 2-aminoethanol, 3-amino-1-propanol, 5-amino-1-pentanol, 3-Amino-1,2-propanediol, 2-amino-1,3-propanediol, 4-amino-1,2-butanediol and the like are preferred. Further, the phenylamine-containing side is preferably an aminophenol, particularly preferably 2-aminophenol, 3-aminophenol or 4-aminophenol. These organic amine-based compounds may be used singly or in combination of two or more. The amount of the organic amine-based compound to be used is usually 15% by weight or less, preferably 10% by weight or less based on the total amount of the radiation sensitive linear composition. In this case, when the amount of the organic amine-based compound used exceeds 15% by weight, the adhesion to the substrate of the colored layer tends to decrease. Further, other additives, such as a blue pigment derivative such as a copper phthalocyanine derivative or a dispersing aid such as a yellow pigment derivative; a filler of glass, alumina or the like; polyvinyl alcohol, polyethylene glycol a polymer compound such as a monoalkyl ether or a poly(fluoroalkyl acrylate); -38- 200844661 a surfactant such as a nonionic, cationic or anionic surfactant; Triethoxy oxalate, Ethyl tris(2-methoxyethoxy)decane, N-(2-aminoethyl)-3-aminopropylmethyldimethoxydecane 'N_ (2 -aminoethyl)-3-aminopropyltrimethoxydecane '3-aminopropyltriethoxydecane, 3-epoxypropylpropyltrimethoxydecane' 3-epoxypropylpropane Methyldimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-chloropropylmethyldimethoxydecane, 3-chloropropyltrimethoxy密, 3, methacryloxypropyltrimethoxy sulfoxide '3 · thiopropyl propyl trimethoxy decane and other adhesion promoter; 2, 2 '- thiobis (4-methyl-6 -Tributylbenzene酣), an antioxidant such as 2,6-di-tertiary butyl phenol; 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chlorobenzotriazole, alkane Ultraviolet absorbers such as oxydiphenyl ketones; anti-agglomerating agents such as sodium polyacrylate; 1, 1, azobis(carbonitrile), 2-phenylazo-4 a thermal radical generator such as methoxy-2,4-dimethylvaleronitrile or the like. - Solvent - The linear composition for the formation of the coloring layer of the present invention is characterized in that the components (A) to (D) are essential components, and the additive component may be contained as the case may be, and usually formulated as a liquid composition in combination with a solvent. In the solvent, the components constituting the linear composition of the radiation radiation are dispersed or dissolved, and do not react with the components, and are suitably selected for use in a range having moderate volatility. -39- 200844661

此種溶劑方面，有例如乙二醇單甲基醚，乙二醇單乙 基醚，乙二醇單-正丙基醚，乙二醇單-正丁基醚，二乙二 醇單甲基醚，二乙二醇單乙基醚，二乙二醇單-正丙基醚 ，二乙二醇單-正丁基醚，三乙二醇單甲基醚，三乙二醇 單乙基醚，丙二醇單甲基醚，丙二醇單乙基醚，丙二醇 單-正丙基醚，丙二醇單-正丁基醚，二丙二醇單甲基醚’ 二丙二醇單乙基醚，二丙二醇單-正丙基醚，二丙二醇單-正丁基醚，三丙二醇單甲基醚，三丙二醇單乙基醚等之（ 聚）烷撐二醇單烷基醚類； 乙二醇單甲基醚乙酸酯，乙二醇單乙基醚乙酸酯’二 乙二醇單甲基醚乙酸酯，二乙二醇單乙基醚乙酸酯，丙二 醇單甲基醚乙酸酯，丙二醇單乙基醚乙酸酯等之（聚）烷撐Such solvents include, for example, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl Ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether , propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether 'dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl Ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether or the like (poly)alkylene glycol monoalkyl ether; ethylene glycol monomethyl ether acetate, Ethylene glycol monoethyl ether acetate 'diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether (poly)alkylene

二乙二醇二甲基醚，二乙二醇甲基乙基醚，二乙二 二乙基醚，四氫呋喃等之其他醚類； 甲基乙基酮，環己酮，2-庚酮，3-庚酮等之酮類； 乳酸甲酯，乳酸乙酯等之乳酸烷基酯類； 2-羥基-2-甲基丙酸乙酯，3-甲氧基丙酸甲酯，3-甲氧 基丙酸乙酯，3 -乙氧基丙酸甲酯，3 -乙氧基丙酸乙酯，乙 氧基乙酸乙酯，羥基乙酸乙酯，2-羥基-3-甲基丁烷酸甲 酯，3-甲氧基丁基乙酸酯，3-甲基-3-甲氧基丁基乙酸酯， 3-甲基-3-甲氧基丁基丙酸酯，乙酸乙酯，乙酸正丙酯， 乙酸異丙酯，乙酸正丁酯，乙酸異丁酯，甲酸正戊酯，乙 酸異戊酯，丙酸正丁酯，丁酸乙酯，丁酸正丙酯，丁酸異 -40- 200844661 丙醋’丁酸正丁酯，丙酮酸甲酯，丙酮酸乙酯，丙酮酸正 丙酯，乙醯乙酸甲酯，乙醯乙酸乙酯，2_氧代丁烷酸乙酯 等之其他酯類； 甲苯’二甲苯等之芳香族烴類； N，N-二甲基甲醯胺，Ν，Ν_=甲基乙醯胺，n-甲基吡咯 啶酮等之醯胺或內醯胺類等。 在該等溶劑中，就溶解性，顏料分散性，塗佈性等之 觀點以丙一醇單甲基醚，乙二醇單甲基醚乙酸酯，丙二醇 單甲基醚乙酸酯，丙二醇單乙基醚乙酸酯，二乙二醇二甲 基醚，二乙二醇甲基乙基醚，環己酮，庚酮，3_庚酮， 乳酸乙酯’ 3·甲氧基丙酸乙酯’ 3 -乙氧基丙酸甲酯，3_乙 氧基丙酸乙酯’ 3-甲氧基丁基乙酸酯，3_甲基-3 _甲氧基丁 基丙酸酯，乙酸正丁酯，乙酸異丁酯，甲酸正戊酯，乙酸 異戊酯，丙酸正丁酯，丁酸乙酯，丁酸異丙酯，丁酸正丁 酯，丙酮酸乙酯等爲佳。 該溶劑可單獨使用或混合2種以上使用。 又’與該溶劑一起，可倂用苄基乙基醚，二-正己基 醚，丙酮基丙酮，異佛爾酮，己酸，辛酸，辛醇，丨_壬 醇，苄基醇，乙酸苄酯，苯甲酸乙酯，草酸二乙酯，順丁 烯二酸二乙酯，γ-丁內酯，碳酸乙烯酯，碳酸丙烯酯，乙 二醇單苯基醚乙酸酯等之高沸點溶劑。 該等之高沸點溶劑可單獨使用或混合2種以上使用。 溶劑之使用量並無特別限定，就由所得敏輻射線性組 成物之塗佈性，穩定性等之觀點而言，除去該組成物溶劑 -41 - 200844661 之各成份合計濃度，通常爲5〜5 0重量％，較佳爲1 〇〜40 重量％之量爲所望。 濾色片 - 本發明之濾色片係具有由本發明之著色層形成用敏輻 • 射線性組成物所形成之著色層者。 以下就本發明之濾色片之形成方法加以說明。 • 首先’在基板表面上，可因應需要，將形成像素之部 分予以劃分之方式形成遮光層，在此基板上，例如在紅色 顏料被分散之敏輻射線性組成物液狀組成物之塗佈中，進 行預烘烤使溶劑蒸發，來形成塗膜。 接著，在此塗膜藉由光罩在曝光中，使用鹼顯影液進 行顯影，將塗膜之未曝光部予以溶解除去，其後藉由事後 烘烤，形成紅色像素圖型爲以設定之配列所配置之像素陣 ， 列。 # 其後，使用綠色或藍色之顏料被分散之各敏輻射線性 組成物之液狀組成物，與前述同，進行各液狀組成物之塗 佈，預烘烤，曝光，顯影及事後烘烤，將綠色像素陣列及 藍色像素陣列在同一基板上依順序形成，藉以獲得紅色， 綠色及藍色三原色之像素陣列被配置於基板上之濾色片。 但，在本發明中，形成各色像素之順序，並非限定於該等 之物。 又，黑色矩陣係使用本發明之著色層形成用敏輻射線 性組成物，可與該像素之形成之情形同樣地形成。 -42- 200844661 在形成像素及/或黑色矩陣之際所使用之基板方面， 可例舉例如玻璃，矽’聚碳酸酯，聚酯，芳香族聚醯胺， 聚醯胺醯亞胺，聚醯亞胺等。 又’在該等基板’可依照期望，做實施矽烷偶合劑等 所致樂品處理’電漿處理’離子電鍍，濺鍍，氣相反應法 ，真空蒸鍍等之適宜前處理之準備。 在將敏輻射線性組成物之液狀組成物塗佈於基板之際 ，可採用噴灑法，輥塗佈法，旋轉塗佈法（spill coating)， 縫模塗佈法，棒塗佈法，噴墨法等適宜之塗佈法，尤以旋 轉塗佈法，縫模塗佈法爲佳。 塗佈厚度’在作爲乾燥後之膜厚，通常爲〇」〜10μιη ，較佳爲〇·2〜8·0μιη，特佳爲0.2〜6.0μπι。 在形成像素及/或黑色矩陣之際所使用之輻射線方面 ，可使用例如可視光線，紫外線，遠紫外線，電子束，X 線等，以波長在190〜45 Onm範圍之輻射線爲佳。 輻射線之曝光量較佳爲10〜10,00(U/m2。 又，該鹼顯影液方面，以例如碳酸鈉，氫氧化鈉，氫 氧化鉀，氫氧化四甲基銨，膽鹼，1，8 -二氮雜二環- [5·4·0]-7-~]--烯，1，5-二氮雜二環-[4·3·0]-5-壬烯等之水 溶液爲佳。 在該鹼顯影液，可適量添加例如甲醇，乙醇等之水溶 性有機溶劑或界面活性劑等。此外，在鹼顯影後，通常進 行水洗。 顯影處理法方面，可適用沖洗顯影法，噴灑顯影法， -43- 200844661 浸漬顯影法，浸置式（puddle)(盛液）顯影法等。顯影條件 在常溫以5〜3 00秒爲佳。 如此一來所得本發明之濾色片，例如在透過型或反射 型之彩色液晶顯不兀件，彩色成像（imaging)管元件，彩色 感測器等極爲有用。 液晶顯示元件 本發明之液晶顯7K兀件係具備本發明之濾色片者。 又，作爲本發明之液晶顯示元件之1個實施形態，係 使用本發明之著色層形成用敏輻射線性組成物，在薄膜電 晶體基板陣列上如前述方式藉由形成像素及/或黑色矩陣 ，可製作具有特優特性的液晶顯示元件。 【實施方式】 以下，例舉實施例進而具體說明本發明之實施形態。 但本發明並非限定於下述實施例。 &lt;(B)鹼可溶性樹脂之製造&gt; 合成例1 在具備冷卻管，攪拌機之燒瓶，裝入2，2 ’ -偶氮雙 (2，4-二甲基戊腈）1重量份及丙二醇單甲基醚乙酸酯200重 量份，接著裝入甲基丙烯酸1 5重量份，苯乙烯1 5重量份， 苄基甲基丙烯酸酯35重量份，甘油單甲基丙烯酸酯10重量 份，N-苯基順丁烯二醯亞胺25重量份及鏈轉移劑α-甲基 -44- 200844661 苯乙燒二聚物2 · 5重量份進行氮取代，緩緩地攪拌，使反 應溶液之溫度升溫至80°C，保持此溫度進行3小時聚合。 其後’使反應溶液之溫度升溫至1 〇 〇 °c，添加2，2，-偶氮雙 (2,4·二甲基戊腈）0.5重量份’進而進行1小時聚合，以獲 得（Β)鹼可溶性樹脂之溶液（固形成份濃度=33.0%)。 此（Β)驗可溶性樹脂，Mw=17,000，Μη = 8,000。使此 (Β)鹼可溶性樹脂作爲「樹脂（Β-1)」。 合成例2 在具備冷卻管，攪拌機之燒瓶，裝入2，2，-偶氮雙 (2,4-二甲基戊腈）3重量份及丙二醇單甲基醚乙酸酯200重 量份’接著裝入甲基丙烯酸1 5重量份，苯乙烯1 5重量份， 苄基甲基丙烯酸酯10重量份，正丁基甲基丙烯酸酯20重量 份’ Ν-苯基順丁烯二醯亞胺25重量份，羥基乙基甲基丙烯 酸酯15重量份及鏈轉移劑α_甲基苯乙烯二聚物5重量份進 行氮取代，緩緩攪拌，使反應溶液之溫度升溫至8 〇。(：，保 持此溫度進行3小時聚合。其後，使反應溶液之溫度升溫 至1⑽。C，添加2,2，·偶氮雙（2,4-二甲基戊腈）0.5重量份， 進而1小時聚合，獲得（B)鹼可溶性樹脂之溶液（固形成份 濃度=32.9%)。 此（B)鹼可溶性樹脂，Mw=l 1，000，Mn = 6,700。將此 (B)鹼可溶性樹脂作爲「樹脂（B-2)」。 合成例3 -45- 200844661 在具備冷卻管，攪拌機之燒瓶，裝入2，2’-偶氮雙 (2，4·二甲基戊腈）1重量份及丙二醇單甲基醚乙酸酯2〇〇重 量份，接著裝入甲基丙烯酸15重量份，苯乙烯15重量份， 苄基甲基丙烯酸酯30重量份，甘油單甲基丙烯酸酯1〇重量 份，N-苯基順丁烯二醯亞胺3〇重量份及鏈轉移劑α-甲基 苯乙烯二聚物2.5重量份進行氮取代，緩緩攪拌，使反應 溶液之溫度升溫至80t，保持此溫度進行3小時聚合。其 後，使反應溶液之溫度升溫至100°C，添加2,2，-偶氮雙 (2,4-二甲基戊腈）〇·5重量份，進而1小時聚合，以獲得（B) 鹼可溶性樹脂之溶液（固形成份濃度=3 3.2%)。 此（Β)鹼可溶性樹脂，Mw=1 5,000，Μη = 7,000。使此 (Β)鹼可溶性樹脂作爲「樹脂（Β-3)」。 合成例4 在具備冷卻管’攪拌機之燒瓶裝入2，2，-偶氮雙（2，4· 一甲基戊腈）3重量份及丙二醇單甲基醚乙酸酯2〇〇重量份 接著裝入甲基丙烯酸I5重量份，乙烯合伸萘基3〇重量份， 节基甲基丙烯酸酯35重量份，2 -羥基乙基甲基丙烯酸酯1〇 重量份，ω-羧聚己內酯單丙烯酸酯10重量份及鏈轉移劑 α -甲基本乙細一·聚物5重重份在經氮取代中，緩緩擾泮， 使反應彳谷fe溫度上升至8 0 °C，保持此溫度經3小時聚合。 其後，將反應溶液之溫度升溫至1 00。&lt;3，添加2,2，_偶氮雙 (2,4-二甲基戊腈）0.5重量份，進而進行1小時聚合，獲得 (B)鹼可溶性樹脂之溶液（固形成份濃度=310%)。 -46 - 200844661 此（B)鹼可溶性樹脂爲Mw=10,000，Mn = 6,000。使此 (B)鹼可溶性樹脂作爲「樹脂（B-4)」。 實施例1 (A)著色劑係C.I·色素紅254與C.I.色素紅177之80/20( 重量比）混合物85重量份，（B)鹼可溶性樹脂係樹脂（B-l)70 重量份’（C)多官能性單體係二新戊四醇六丙烯酸酯80重 量份’（D)敏輻射線性聚合引發劑係2-甲基-1-[4-(羥基乙 基硫代）苯基]-2-嗎啉代丙烷-1-酮50重量份，及溶劑係3-乙氧基丙酸乙基與丙二醇單甲基醚乙酸酯之7 0/3 0(重量比） 混合物1，000重量份予以混合，來調製敏輻射線性組成物 之液狀組成物（R 1)。 &lt;著色層之形成&gt; 將液狀組成物（R1)，於表面可防止鈉離子之溶離之 Si02膜所形成之鈉鈣玻璃基板，使用自旋式塗佈機進行塗 佈，在90°C之熱板上進行2分鐘預烘烤，形成膜厚1.7 μιη 之塗膜。 接著，將此基板在室溫冷卻，使用高壓水銀燈，透過 光罩（縫隙寬30微米），在塗膜將含3 65nm，405nm及43 6nm 各波長之紫外線以5,00(U/m2之曝光量進行曝光。其後， 將基板浸漬於23°C之〇·〇4重量％氫氧化鉀水溶液1分鐘，在 顯影後，以超純水洗淨，進行風乾。其後，在22 0°C之潔 淨爐內進行3 0分鐘事後烘烤，在基板上形成紅色條帶狀像 -47- 200844661 素所成像素陣列。 顯影性之評價 在使像素陣列以光學顯微鏡觀察時，在未曝光部之基 • 板上無顯影殘留，且在像素圖型之邊緣無渣滓或缺陷。又 . ，像素陣列之殘膜率80%爲良好，且像素圖型之剖面以掃 描型電子顯微鏡（SEM)觀察時，無切割不足。 昇華性之評價 將液狀組成物（R1)塗佈於基板上後進行乾燥，形成膜 厚1.7 μηι之塗膜。其後，就此塗膜，標準物質係使用正辛 烷（比重=0.701，注入量=〇·〇2μ升），使清洗條件爲 100°C/10分，作爲液面上空間樣本（sampler)係使用 JHS-100A(商品名，日本分析工業公司製），而氣體層析術/質 _ 量分析裝置係使用JEOL JMS-AX5 05 W型質量分析計（商 • 品名，曰本分析工業公司製），進行液面上空間氣體層析 術/質量分析，求得來自（D)敏輻射線性聚合引發劑成份之 峰値面積A，以下述計算式，計算換算正辛烷所致揮發量 時揮發量爲〇pg。 &lt;換算正辛烷所致揮發量之計算式&gt; 揮發量（μ g ) ==Ax (正辛烷之量）（pg)/(正辛烷之峰値面積） -48- 200844661 液中異物之評價 在將液狀組成物（R 1)於5°(：保存7日後，以目視觀察 (D)敏輻射線性聚合引發劑成份再結晶化物之有無。又， 保存後液狀組成物（R 1)之溫度自5 °C上升至2 3 °C時，在液狀 組成物（Rl)l毫升中不予再溶解將殘存之0.5 μπι以上大小 之固形物（液中異物）之數，使用光散射式液中粒子檢測器 (商品名KS-28B，Rion公司製）進行測定時，無固形物。 實施例2 (D)除了敏輻射線性聚合引發劑係使用2-甲基-1-[4-( 正丁基硫代）苯基]-2 -嗎啉代丙烷-1 -酮5 0重量份以外，其 他則與實施例1同，調製敏輻射線性組成物之液狀組成物 (R2)。 接著，除了使用液狀組成物（R2)以替代液狀組成物 (R1)以外，其他則與實施例丨同樣地，在基板上形成紅色 條帶狀像素所成像素陣列，進行評價。 其結果’在未曝光部之基板上無顯影殘留，且在像素 圖型之邊緣無渣滓或缺陷。又，像素陣列之殘膜率8 5 %爲 良好’且將像素圖型之剖面以掃描型電子顯微鏡（SEM)觀 察時，無切割不足。又，塗膜之揮發量爲〇μ§，且亦無液 中異物。 比較例1 除了敏輻射線性聚合引發劑係使用2-甲基甲基 -49- 200844661 硫代）苯基]-2-嗎啉基丙烷-1-酮（千葉特用化學品公司製 Irgacure907)50重量份以外，其他與實施例1同，調製敏輻 射線性組成物之液狀組成物（r 1 )。 接著，除了使用液狀組成物（r 1 )以替代液狀組成物 (R1)以外，其他與實施例1同，在基板上形成紅色條帶狀 像素所成像素陣列，進行評價。 結果，在未曝光部之基板上無顯影殘留，像素陣列之 殘膜率爲79%，將像素圖型之剖面以掃描型電子顯微鏡 (SEM)觀察時，無切割不足，又雖亦無液中異物，但可在 像素圖型之邊緣確認渣滓或缺陷，又塗膜之揮發量爲 1 ·〇μ^。 實施例3 (Α)著色劑係C.I.色素綠36與C.I.色素黃150之60/40( 重量比）混合物95重量份，（B)鹼可溶性樹脂係樹脂（B-2)70 S量份，（C)多官能性單體係二新戊四醇六丙烯酸酯80重 量份’（D)敏輻射線性聚合引發劑係2-甲基-1·[4·(羥基乙 基硫代）苯基]-2-嗎啉代丙烷-1-酮50重量份，添加劑係丙 二酸1重量份，及溶劑係3 -甲氧基丁基乙酸酯與丙二醇單 甲基醚乙酸酯之5 0/5 0(重量比）混合物900重量份予以混合 ’來調製敏輻射線性組成物之液狀組成物（G1)。 接著，除了使用液狀組成物（G1)以替代液狀組成物 (R1)以外’其他則與實施例1同，在基板上形成綠色之條 帶狀像素所成像素陣列，進行評價。 -50- 200844661 結果，在未曝光部之基板上並無顯影殘留，且在像素 圖型之邊緣並無渣滓或缺陷。又，像素陣列之殘膜率80% 爲良好，且像素圖型之剖面以掃描型電子顯微鏡（SEM)觀 察時，無切割不足。又，塗膜之揮發量爲〇pg，且亦無液 中異物。 比較例2 除了敏輻射線性聚合引發劑係使用2-甲基-1-[4-(甲基 硫代）苯基]-2-嗎啉基丙烷-1-酮50重量份以外，其他則與 實施例3同’調製敏輻射線性組成物之液狀組成物（g 1}。 接著’除了使用液狀組成物（g 1)以替代液狀組成物 (R1)以外’其他則實施例1同，在基板上形成綠色之條帶 狀像素所成像素陣列，進行評價。 結果’在未曝光部之基板上並無顯影殘留，像素陣列 2殘膜率爲79%，將像素圖型之剖面以掃描型電子顯微鏡 (SEM)觀察時，並無切割不足，又雖亦無液中異物，但是 在像素圖型之邊緣有渣滓或缺陷，又塗膜之揮發量爲 1 .Opg 〇 實施例4 (A)者色劑係c·〗.色素藍15: 6與C.I.色素紫23之95/5( 重夏比）混合物70重量份，（b)鹼可溶性樹脂係樹脂（B-3)60 重量份’（C)多官能性單體係二新戊四醇六丙烯酸酯9〇重 量份’（D)敏輻射線性聚合引發劑係2-甲基-1-[4-(羥基乙 200844661 基硫代）苯基]-2-嗎啉代丙烷-1-酮50重量份，添加劑係非 離子系界面活性劑 A - 6 0 (商品名，花王公司製）5重量份， 及溶劑係3 -乙氧基丙酸乙基與丙二醇單甲基醚乙酸酯之 60/40(重量比）混合物900重量份予以混合，來調製敏輻射 線性組成物之液狀組成物（B 1 )。 接著’除了使用液狀組成物（B 1)以替代液狀組成物 (R1)以外，其他則實施例〗同，在基板上形成藍色之條帶 狀像素所成像素陣列，進行評價。 結果’在未曝光部之基板上並無顯影殘留，且在像素 圖型之邊緣並無渣滓或缺陷。又，像素陣列之殘膜率8 5 % 爲良好，且像素圖型之剖面以掃描型電子顯微鏡（SEM)觀 察時’無切割不足。又，塗膜之揮發量爲〇pg，且亦無液 中異物。 實施例5 (D)敏輻射線性聚合引發劑係2 -甲基-1-[4-(羥基乙基 硫代）苯基]-2-嗎啉代丙烷-1-酮15重量份，2,2，-雙（2-氯苯 基）-4,4’，5,5’-四苯基-1，2’-聯咪唑6重量份，胺系氫予體係 4,4’-雙（二乙基胺基）二苯基酮9重量份，硫醇系氫予體係 2-氫硫基苯并噻唑3重量份，及2-甲基-1-[4-(甲基硫代）苯 基]-2-嗎啉代丙烷-卜酮15重量份以外，其他則與實施例3 同，來調製敏輻射線性組成物之液狀組成物（B2)。 接著，除了使用液狀組成物（B2)以替代液狀組成物 (R1)以外，其他則與實施例〗同，在基板上形成藍色之條 -52 - 200844661 帶狀像素所成像素陣列，進行評價。 結果，在未曝光部之基板上並無顯影殘留，且在像素 圖型之邊緣並無渣滓或缺陷。又，像素陣列之殘膜率90% 爲良好，且像素圖型之剖面以掃描型電子顯微鏡（SEM)觀 察時，無切割不足。又，塗膜之揮發量爲〇Kg，且亦無液 中異物。 g 比較例3 除了敏輻射線性聚合引發劑係使用2-甲基-1-[4-(甲基 硫代）苯基]-2-嗎啉基丙烷-1-酮50重量份以外，其他則與 實施例3同，來調製敏輻射線性組成物之液狀組成物（b 1 ) 〇 接著，使用液狀組成物（bl)以替代液狀組成物（R1)以 外，其他則與實施例1同，在基板上形成藍色之條帶狀像 ^ 素所成像素陣列，進行評價。 0 結果，在未曝光部之基板上並無顯影殘留，在像素圖 型之邊緣無渣滓或缺陷，像素陣列之殘膜率爲84%，塗膜 之揮發量爲Opg，又雖然亦無液中異物，但是像素圖型之 剖面以掃描型電子顯微鏡（SEM)觀察時，則有切割不足。 實施例6 (A)著色劑係碳黑（御國色素公司製）25〇重量份，（B)驗 可溶性樹脂係樹脂（B-4)75重量份，（C)多官能性單體係二 新戊四醇六丙烯酸酯7 5重量份，（D)敏輻射線性聚合引發 -53- 200844661 劑係2-甲基- l-[4-(羥基乙基硫代）苯基]-2-嗎啉代丙烷-1-酮5 0重量份，及溶劑係丙二醇單甲基醚乙酸酯與環己酮之 5 0/5 0(重量比）混合物1，〇〇〇重量份予以混合，來調製敏輻 射線性組成物之液狀組成物（BK1)。 接著，除了使用液狀組成物（BK1)以替代液狀組成物 (R1)以外，其他則與實施例1同，在基板上形成黑色之條 帶狀像素所成像素陣列進行評價。 結果，在未曝光部之基板上並無顯影殘留，且在像素 圖型之邊緣並無渣滓或缺陷。又，像素陣列之殘膜率80% 爲良好，且像素圖型之剖面以掃描型電子顯微鏡（SEM)觀 察時，無切割不足。又，塗膜之揮發量爲0μ8，且亦無液 中異物。而且，與像素之基板之密接性亦優異。 比較例4 - 除了敏輻射線性聚合引發劑係2-甲基-1-[4-(甲基硫代 )苯基]-2-嗎啉基丙烷-1-酮30重量份，2,2’-雙（2-氯苯基）-4,4’，5,5’-四苯基-1，2、聯咪唑12重量份，胺系氫予體係 4，4’-雙（二乙基胺基）二苯基酮12重量份，及硫醇系氫予體 係2-氫硫基苯并噻唑6重量份以外，其他則與實施例7同， 來調製敏輻射線性組成物之液狀組成物（bkl )。 接著，除了使用液狀組成物（bkl)以替代液狀組成物 (BK1)以外，其他則與實施例〗同，在基板上形成黑色之條 帶狀像素所成像素陣列進行評價。 結果，在未曝光部之基板上無顯影殘留，像素陣列之 -54 - 200844661 殘膜率爲83 %，又塗膜之揮發量雖爲〇pg，但是在像素圖 型之邊緣有渣滓或缺陷’像素圖型之剖面以掃描型電子顯 微鏡（SEM)觀察時，有切割不足，又液中異物有5個被確 認。 , 實施例7 除了溶劑係3 -乙氧基丙酸乙酯與丙二醇單甲基醚乙酸 φ 酯之70/30(重量比）混合物1，50 〇重量份以外，其他則與實 施例1同’調製敏輻射線性組成物之液狀組成物（R2)。 接著’使用液狀組成物（R2)以替代液狀組成物（R1)， 使用縫模塗佈機以替代自旋式塗佈機進行塗佈以外，其他 則與實施例1同，在基板上形成紅色之條帶狀像素所成像 素陣列，進行評價。 結果’在未曝光部之基扳上並無顯影殘留，且在像素 * 圖型之邊緣並無渣滓或缺陷。又，像素陣列之殘膜率8 5 % 爲良好，且像素圖型之剖面以掃描型電子顯微鏡（SEM)觀 察時，無切割不足。又，塗膜之揮發量爲Opg，且亦無液 中異物。 -55-Diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethyldiethyl ether, tetrahydrofuran and other ethers; methyl ethyl ketone, cyclohexanone, 2-heptanone, 3 a ketone of heptanone or the like; an alkyl lactate such as methyl lactate or ethyl lactate; ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, 3-methoxy Ethyl propyl propionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxylate, ethyl hydroxyacetate, 2-hydroxy-3-methylbutanoic acid Ester, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutylpropionate, ethyl acetate, acetic acid N-propyl ester, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, butyrate 40- 200844661 Propyl vinegar 'n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetate, ethyl acetate, ethyl 2-oxobutanoate, etc. Other esters; aromatic hydrocarbons such as toluene'xylene; N,N-dimethylmethyl Amine, Ν, Ν_ = acetyl methyl amine, n- methyl pyrrolidone, etc. Amides or Lactams amines. Among these solvents, in terms of solubility, pigment dispersibility, coatability and the like, propanol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol Monoethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, cyclohexanone, heptanone, 3_heptanone, ethyl lactate '3·methoxypropionic acid Ethyl ester '3-ethoxypropionic acid methyl ester, ethyl 3-ethoxypropyl propionate 3-methoxybutyl acetate, 3-methyl-3-methoxypropyl propionate, N-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, isopropyl butyrate, n-butyl butyrate, ethyl pyruvate, etc. . These solvents may be used singly or in combination of two or more. And 'with the solvent, can be used benzyl ethyl ether, di-n-hexyl ether, acetone acetone, isophorone, hexanoic acid, octanoic acid, octanol, 丨 壬 sterol, benzyl alcohol, benzyl acetate High boiling point solvent such as ester, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, ethylene glycol monophenyl ether acetate . These high boiling point solvents may be used singly or in combination of two or more. The amount of the solvent to be used is not particularly limited, and the total concentration of each component of the solvent-41 - 200844661 is removed from the viewpoint of coatability, stability, and the like of the obtained linear composition of the radiation radiation, and is usually 5 to 5 The amount of 0% by weight, preferably 1 〇 to 40% by weight, is expected. Color filter - The color filter of the present invention has a coloring layer formed of the sensitive radiation composition for forming a color layer of the present invention. Hereinafter, a method of forming the color filter of the present invention will be described. • First, on the surface of the substrate, a portion of the pixel can be divided as needed to form a light-shielding layer on which the liquid composition of the linear composition of the sensitive radiation is dispersed, for example, in the dispersion of the red pigment. Prebaking is carried out to evaporate the solvent to form a coating film. Then, the coating film is developed by using an alkali developing solution by exposure of the mask, and the unexposed portion of the coating film is dissolved and removed, and then the post-baking is performed to form a red pixel pattern to be set. The configured pixel array, column. # Thereafter, using a liquid composition of a linear composition of each sensitive radiation dispersed with a green or blue pigment, as in the above, coating, prebaking, exposing, developing and post-baking each liquid composition Bake, the green pixel array and the blue pixel array are sequentially formed on the same substrate, and the pixel arrays of the three primary colors of red, green and blue are arranged to be disposed on the color filter on the substrate. However, in the present invention, the order in which the pixels of the respective colors are formed is not limited to these. Further, the black matrix is formed by using the photosensitive layer forming photosensitive layer of the present invention in the same manner as in the case of forming the pixel. -42- 200844661 In terms of a substrate used for forming a pixel and/or a black matrix, for example, glass, 矽'polycarbonate, polyester, aromatic polyamine, polyamidoimide, polyfluorene may be exemplified. Imine and the like. Further, in the case of the above-mentioned substrates, preparation for appropriate pretreatment such as chrome coupling treatment, plasma treatment, ion plating, sputtering, gas phase reaction, vacuum vapor deposition or the like can be carried out as desired. When the liquid composition of the linear composition of the radiation radiation is applied to the substrate, a spray method, a roll coating method, a spin coating method, a slit die coating method, a bar coating method, or a spray method may be employed. A suitable coating method such as an ink method, in particular, a spin coating method or a slit die coating method is preferred. The coating thickness 'is a film thickness after drying, and is usually from 10 to 10 μm, preferably from 2 to 8 · 0 μm, particularly preferably from 0.2 to 6.0 μm. For the radiation used in forming the pixel and/or the black matrix, for example, visible light, ultraviolet light, far ultraviolet light, electron beam, X-ray or the like can be used, and radiation having a wavelength in the range of 190 to 45 Onm is preferable. The exposure amount of the radiation is preferably 10 to 10,00 (U/m2. Further, in terms of the alkali developer, for example, sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1 , an aqueous solution of 8-diazabicyclo-[5·4·0]-7-~]--ene, 1,5-diazabicyclo-[4·3·0]-5-decene In the alkali developer, a water-soluble organic solvent such as methanol or ethanol, a surfactant, or the like may be added in an appropriate amount, and after the alkali development, water washing is usually carried out. Spray development method, -43-200844661 immersion development method, puddle (liquid) development method, etc. Development conditions are preferably 5 to 300 seconds at normal temperature. Thus, the color filter of the present invention is obtained, for example. It is extremely useful in a transmissive or reflective type of color liquid crystal display, a color imaging tube element, a color sensor, etc. Liquid crystal display element The liquid crystal display 7K element of the present invention is provided with the color filter of the present invention. Further, as one embodiment of the liquid crystal display device of the present invention, the sensitive layer forming sensitivity radiation of the present invention is used. The liquid crystal display element having the characteristic characteristics can be produced by forming a pixel and/or a black matrix on the thin film transistor substrate array as described above. [Embodiment] Hereinafter, the present invention will be specifically described by way of examples. The present invention is not limited to the following examples. <B) Production of alkali-soluble resin> Synthesis Example 1 A flask equipped with a cooling tube and a stirrer was charged with 2,2 '-azobis ( 2 parts by weight of 2,4-dimethylvaleronitrile) and 200 parts by weight of propylene glycol monomethyl ether acetate, followed by 15 parts by weight of methacrylic acid, 15 parts by weight of styrene, benzyl methacrylate 35 parts by weight, 10 parts by weight of glycerol monomethacrylate, 25 parts by weight of N-phenyl maleimide and chain transfer agent α-methyl-44- 200844661 phenylethylidene dimer 2 · 5 weight Nitrogen substitution was carried out, the stirring was slowly stirred, the temperature of the reaction solution was raised to 80 ° C, and the temperature was maintained for 3 hours. Thereafter, the temperature of the reaction solution was raised to 1 ° C, and 2, 2 was added. -Azobis(2,4·dimethylvaleronitrile) 0.5 parts by weight The polymerization was carried out for 1 hour to obtain a solution of (base) alkali-soluble resin (solid content concentration = 33.0%). This (Β) test soluble resin, Mw = 17,000, Μη = 8,000. This (Β) alkali-soluble resin was used as " Resin (Β-1)". Synthesis Example 2 In a flask equipped with a cooling tube and a stirrer, 3 parts by weight of 2,2,-azobis(2,4-dimethylvaleronitrile) and propylene glycol monomethyl ether were charged. 200 parts by weight of acetate' followed by 15 parts by weight of methacrylic acid, 15 parts by weight of styrene, 10 parts by weight of benzyl methacrylate, 20 parts by weight of n-butyl methacrylate, 'Ν-phenyl cis-butyl 25 parts by weight of enediamine, 15 parts by weight of hydroxyethyl methacrylate and 5 parts by weight of chain transfer agent α-methylstyrene dimer are nitrogen-substituted, and the mixture is slowly stirred to raise the temperature of the reaction solution to 8 〇. (:, maintaining this temperature for 3 hours of polymerization. Thereafter, the temperature of the reaction solution is raised to 1 (10). C, 0.5 parts by weight of 2,2,-azobis(2,4-dimethylvaleronitrile) is added, and further Polymerization was carried out for 1 hour to obtain a solution of (B) an alkali-soluble resin (solid content concentration = 32.9%). (B) an alkali-soluble resin, Mw = 1 1,000, Mn = 6,700. This (B) alkali-soluble resin was used as "Resin (B-2)". Synthesis Example 3 -45- 200844661 In a flask equipped with a cooling tube and a stirrer, 1 part by weight of 2,2'-azobis(2,4-dimethylacetonitrile) and 2 parts by weight of propylene glycol monomethyl ether acetate, followed by 15 parts by weight of methacrylic acid, 15 parts by weight of styrene, 30 parts by weight of benzyl methacrylate, and 1 part by weight of glycerol monomethacrylate , N-phenyl maleimide diamine 3 parts by weight and 2.5 parts by weight of the chain transfer agent α-methylstyrene dimer, nitrogen substitution, stirring slowly, the temperature of the reaction solution is raised to 80t, keeping This temperature was subjected to polymerization for 3 hours. Thereafter, the temperature of the reaction solution was raised to 100 ° C, and 2,2,-azobis(2,4-dimethylpentyl) was added. 5 parts by weight, further polymerized for 1 hour to obtain a solution of (B) an alkali-soluble resin (solid content concentration = 3 3.2%). This (Β) alkali-soluble resin, Mw = 15,000, Μη = 7,000. This (Β) alkali-soluble resin was used as "resin (Β-3)". Synthesis Example 4 A flask equipped with a cooling tube 'mixer was charged with 2,2,-azobis(2,4·monomethylvaleronitrile) 3 2 parts by weight by weight and propylene glycol monomethyl ether acetate, followed by 5 parts by weight of methacrylic acid, 3 parts by weight of ethylene naphthyl group, 35 parts by weight of benzyl methacrylate, 2 - hydroxy group B 1 part by weight of methacrylic acid ester, 10 parts by weight of ω-carboxypolycaprolactone monoacrylate and 5 parts by weight of chain transfer agent α-methylbenzidine monomer in the substitution of nitrogen, slowly disturbing The temperature of the reaction 彳谷fe was raised to 80 ° C, and the temperature was maintained for 3 hours. Thereafter, the temperature of the reaction solution was raised to 100 ° &lt; 3, 2, 2, _ azo double (2) was added. 0.5 parts by weight of 4-dimethylvaleronitrile, and further polymerization for 1 hour to obtain a solution of (B) an alkali-soluble resin (solid content concentration = 310%) -46 - 200 844661 The (B) alkali-soluble resin has Mw = 10,000 and Mn = 6,000. The (B) alkali-soluble resin is referred to as "resin (B-4)". Example 1 (A) Colorant CI and Pigment Red 254 80% by weight of the 80/20 (by weight) mixture of CI Pigment Red 177, (B) 70 parts by weight of the alkali-soluble resin-based resin (B1) '(C) polyfunctional single system dipentaerythritol hexaacrylate 80 Parts by weight '(D) radiation sensitive linear polymerization initiator is 50 parts by weight of 2-methyl-1-[4-(hydroxyethylthio)phenyl]-2-morpholinopropan-1-one, and solvent A liquid composition of a linear composition of a radiation sensitive radiation is prepared by mixing 1,000 parts by weight of a mixture of 3-ethoxypropionic acid ethyl and propylene glycol monomethyl ether acetate in a 70/30 (by weight) mixture. (R 1). &lt;Formation of colored layer&gt; The soda-lime glass substrate formed of the SiO 2 film on the surface of which the sodium ion is prevented from being dissolved by the liquid composition (R1) is applied by a spin coater at 90°. The hot plate of C was prebaked for 2 minutes to form a coating film having a film thickness of 1.7 μm. Next, the substrate was cooled at room temperature, and a high-pressure mercury lamp was passed through the reticle (the slit width was 30 μm), and the ultraviolet ray having a wavelength of 3 65 nm, 405 nm, and 436 nm was exposed at 5,00 (U/m 2 ) in the coating film. After exposure, the substrate was immersed in a 4 wt% potassium hydroxide aqueous solution at 23 ° C for 1 minute, and after development, it was washed with ultrapure water and air-dried. Thereafter, at 22 ° C After 30 minutes of post-baking in the clean oven, a red strip image-47-200844661 pixel array was formed on the substrate. The evaluation of the developability was performed in the unexposed portion when the pixel array was observed by an optical microscope. There is no development residue on the substrate, and there is no residue or defect at the edge of the pixel pattern. Also, the residual film rate of the pixel array is 80%, and the cross section of the pixel pattern is observed by scanning electron microscope (SEM). Evaluation of sublimation property The liquid composition (R1) was applied onto a substrate and dried to form a coating film having a film thickness of 1.7 μm. Thereafter, the coating material was used as a standard substance using n-octane ( Specific gravity = 0.701, injection amount = 〇 · 〇 2 μl), The washing condition was 100 ° C/10 minutes, and JHS-100A (trade name, manufactured by Nippon Analytical Industries Co., Ltd.) was used as the sample space on the head space, and JEOL was used as the gas chromatography/mass analyzer. JMS-AX5 05 W-type mass spectrometer (trade name, manufactured by Sakamoto Analytical Co., Ltd.), liquid head gas chromatography/mass analysis, and the peak of (D) sensitive radiation linear polymerization initiator The area A is calculated by the following formula, and the amount of volatilization when converting the amount of volatilization by n-octane is 〇pg. &lt;Calculation of conversion of volatilization by n-octane&gt; Volatilization amount (μg) ==Ax ( The amount of n-octane) (pg) / (the area of the peak of n-octane) -48- 200844661 The evaluation of the foreign matter in the liquid is carried out by visual observation of the liquid composition (R 1) at 5° (: after 7 days of storage) (D) The presence or absence of recrystallization of the linear polymerization initiator component of the sensitive radiation. Further, after the storage, the temperature of the liquid composition (R 1) rises from 5 ° C to 23 ° C, in the liquid composition (Rl) The number of solids (liquid foreign matter) of 0.5 μπι or more remaining without re-dissolving in 1 ml, using light scattering In the liquid particle detector (trade name: KS-28B, manufactured by Rion Co., Ltd.), there was no solid matter. Example 2 (D) In addition to the sensitive radiation linear polymerization initiator, 2-methyl-1-[4- The liquid composition (R2) of the linear composition of the radiation sensitive radiation was prepared in the same manner as in Example 1 except that 50 parts by weight of (n-butylthio)phenyl]-2-morpholinopropan-1-one. Next, in addition to the liquid composition (R2) instead of the liquid composition (R1), a pixel array formed of red strip-shaped pixels was formed on the substrate in the same manner as in Example ,, and evaluated. As a result, no development remains on the substrate of the unexposed portion, and there is no residue or defect at the edge of the pixel pattern. Further, when the residual film ratio of the pixel array was 85 %, and the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), there was no shortage of the cut. Further, the amount of volatilization of the coating film was 〇μ§, and there was no foreign matter in the liquid. Comparative Example 1 In addition to the sensitive radiation linear polymerization initiator, 2-methylmethyl-49-200844661 thio)phenyl]-2-morpholinylpropan-1-one (Irgacure 907, manufactured by Chiba Specialty Chemicals Co., Ltd.) was used. The liquid composition (r 1 ) of the linear composition of the radiation sensitive radiation was prepared in the same manner as in Example 1 except for the parts by weight. Next, in the same manner as in Example 1, except that the liquid composition (r 1 ) was used instead of the liquid composition (R1), a pixel array formed of red strip-shaped pixels was formed on the substrate, and evaluated. As a result, no development residue remained on the substrate of the unexposed portion, and the residual film ratio of the pixel array was 79%. When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), there was no insufficient cutting, and there was no liquid. Foreign matter, but the residue or defect can be confirmed at the edge of the pixel pattern, and the evaporation amount of the coating film is 1 ·〇μ^. Example 3 (Α) The colorant was 95 parts by weight of a 60/40 (by weight) mixture of CI Pigment Green 36 and CI Pigment Yellow 150, and (B) 70 S by weight of the alkali-soluble resin-based resin (B-2), ( C) Polyfunctional single system dipentaerythritol hexaacrylate 80 parts by weight '(D) radiation sensitive linear polymerization initiator 2-methyl-1·[4·(hydroxyethylthio)phenyl] 50 parts by weight of -2-morpholinopropan-1-one, the additive is 1 part by weight of malonic acid, and the solvent is 3-methoxybutyl acetate and propylene glycol monomethyl ether acetate. A 500 (by weight) mixture of 900 parts by weight was mixed to adjust the liquid composition (G1) of the linear composition of the radiation sensitive. Then, in the same manner as in Example 1, except that the liquid composition (G1) was used instead of the liquid composition (R1), a pixel array formed of green strip-shaped pixels was formed on the substrate, and evaluated. -50- 200844661 As a result, there is no development residue on the substrate of the unexposed portion, and there is no residue or defect at the edge of the pixel pattern. Further, the residual film ratio of the pixel array was 80%, and the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), and there was no insufficient cutting. Further, the amount of volatilization of the coating film was 〇pg, and there was no foreign matter in the liquid. Comparative Example 2 In addition to 50 parts by weight of 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one, the sensitive polymerization linear polymerization initiator was used. Example 3 is the same as the liquid composition (g 1} of the linear composition for modulating the radiation. Next, 'other than the liquid composition (g 1) instead of the liquid composition (R1), the other is the same as in the first embodiment. A pixel array formed of green strip-shaped pixels was formed on the substrate and evaluated. As a result, "there was no development residue on the substrate of the unexposed portion, and the residual film ratio of the pixel array 2 was 79%, and the cross-section of the pixel pattern was When scanning electron microscope (SEM) was observed, there was no undercut, and there was no liquid foreign matter, but there was dregs or defects at the edge of the pixel pattern, and the evaporation amount of the coating film was 1.Opg 〇 Example 4 ( A) The colorant system c·〗. 70 parts by weight of the pigment blue 15: 6 and 95/5 (heavy Charpy) mixture of CI Pigment Violet 23, (b) 60 parts by weight of the alkali-soluble resin-based resin (B-3) '(C) polyfunctional single system dipentaerythritol hexaacrylate 9 〇 parts by weight '(D) radiation sensitive linear polymerization initiator 2-methyl-1-[4-(hydroxy B, 200844661 thio)phenyl]-2-morpholinopropan-1-one 50 parts by weight, the additive is a nonionic surfactant A - 60 (trade name, manufactured by Kao Corporation) 5 parts by weight, and a solvent Mixing 900 parts by weight of a 60/40 (by weight) mixture of ethyl 3-ethoxypropionate and propylene glycol monomethyl ether acetate to prepare a liquid composition (B 1 ) of the linear composition of the radiation sensitive radiation Then, except that the liquid composition (B1) was used instead of the liquid composition (R1), the pixel array formed of the blue strip-shaped pixels was formed on the substrate and evaluated. As a result, there was no development residue on the substrate of the unexposed portion, and there was no residue or defect at the edge of the pixel pattern. Moreover, the residual film ratio of the pixel array was 85 %, and the cross section of the pixel pattern was scanned. When observed by electron microscopy (SEM), 'no undercutting. Moreover, the volatilization amount of the coating film was 〇pg, and there was no foreign matter in the liquid. Example 5 (D) Linear radiation initiator of the radiation radiation system 2-methyl-1- [4-(hydroxyethylthio)phenyl]-2-morpholinopropan-1-one 15 parts by weight, 2,2,-bis(2-chloro 6 parts by weight of phenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, amine-based hydrogen to system 4,4'-bis(diethylamino)diphenyl 9 parts by weight of a ketone, 3 parts by weight of a thiol-based hydrogen-providing system 2-hydrothiobenzothiazole, and 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropane The liquid composition (B2) of the linear composition of the radiation sensitive radiation was prepared in the same manner as in Example 3 except that 15 parts by weight of the ketone was used. Next, the liquid composition (B2) was used instead of the liquid composition ( Other than R1), in the same manner as in the example, a pixel array formed of strips of blue strips -52 - 200844661 was formed on the substrate and evaluated. As a result, there is no development residue on the substrate of the unexposed portion, and there is no residue or defect at the edge of the pixel pattern. Further, the residual film ratio of the pixel array was 90%, and the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), and there was no insufficient cutting. Further, the amount of volatilization of the coating film was 〇Kg, and there was no foreign matter in the liquid. g Comparative Example 3 Except that 50 parts by weight of 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one was used as the linear polymerization initiator for the radiation, the others were The liquid composition (b 1 ) of the linear composition of the radiation radiation was prepared in the same manner as in Example 3, and then the liquid composition (bl) was used instead of the liquid composition (R1), and the other was the same as in Example 1. In the same manner, a pixel array formed of a blue strip image was formed on the substrate and evaluated. 0 As a result, there is no development residue on the substrate of the unexposed portion, no residue or defects at the edge of the pixel pattern, the residual film ratio of the pixel array is 84%, the evaporation amount of the coating film is Opg, and although there is no liquid Foreign matter, but when the cross section of the pixel pattern is observed by a scanning electron microscope (SEM), there is insufficient cutting. Example 6 (A) A coloring agent-based carbon black (manufactured by Royal Pharmaceutical Co., Ltd.) 25 parts by weight, (B) 75 parts by weight of a soluble resin-based resin (B-4), (C) a polyfunctional single system II 75 parts by weight of pentaerythritol hexaacrylate, (D) linear polymerization initiation of sensitive radiation -53- 200844661 Is 2-methyl-l-[4-(hydroxyethylthio)phenyl]-2-? 50 parts by weight of morpholinopropan-1-one, and a solvent mixture of propylene glycol monomethyl ether acetate and cyclohexanone of 5 0/5 0 (by weight), and the hydrazine is mixed to prepare a mixture. A liquid composition (BK1) of a linear composition of sensitive radiation. Next, in the same manner as in Example 1, except that the liquid composition (BK1) was used instead of the liquid composition (R1), a pixel array in which black strip-shaped pixels were formed on the substrate was evaluated. As a result, there is no development residue on the substrate of the unexposed portion, and there is no residue or defect at the edge of the pixel pattern. Further, the residual film ratio of the pixel array was 80%, and the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), and there was no insufficient cutting. Further, the evaporation amount of the coating film was 0 μ 8 and there was no liquid foreign matter. Moreover, the adhesion to the substrate of the pixel is also excellent. Comparative Example 4 - In addition to the sensitive radiation linear polymerization initiator, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one 30 parts by weight, 2, 2' - bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2,biimidazole 12 parts by weight, amine-based hydrogen to system 4,4'-bis(diethylamine) A liquid composition of a linear composition of a radiation sensitive radiation is prepared in the same manner as in Example 7 except that 12 parts by weight of diphenyl ketone and 6 parts by weight of a thiol-based hydrogen-providing system 2-hydrothiobenzothiazole are used. (bkl). Next, in addition to the use of the liquid composition (bk1) instead of the liquid composition (BK1), the pixel array formed by forming black strip-shaped pixels on the substrate was evaluated in the same manner as in the examples. As a result, there is no development residue on the substrate of the unexposed portion, and the residual film ratio of the pixel array of -54 - 200844661 is 83%, and the volatilization amount of the coating film is 〇pg, but there is dross or defect at the edge of the pixel pattern' When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), there was insufficient cutting, and five foreign substances in the liquid were confirmed. Example 7 The same as Example 1 except that the solvent is a mixture of a solvent of 3-ethoxypropionate and a propylene glycol monomethyl ether acetate φ ester of 70/30 (by weight) of 1,50 parts by weight. The liquid composition (R2) of the linear composition of the sensitive radiation is modulated. Then, using the liquid composition (R2) instead of the liquid composition (R1), using a slit die coater instead of the spin coater, the other is the same as in the first embodiment, on the substrate. A pixel array formed by strips of red strips was formed and evaluated. As a result, there was no development residue on the base of the unexposed portion, and there was no residue or defect at the edge of the pixel * pattern. Further, the residual film ratio of the pixel array was 85 %, and the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), and there was no insufficient cutting. Further, the evaporation amount of the coating film was Opg, and there was no liquid foreign matter. -55-

Claims (1)

200844661 十、申請專利範圍 1 ·一種著色層形成用敏輻射線性組成物，其特徵爲含 有：（Α)著色劑、（Β)鹼可溶性樹脂、（C)多官能性單體、 及（D)下述式（1)所示之化合物，爲必須成份之敏輻射線性 聚合引發劑，200844661 X. Patent Application No. 1 · A linear composition for the formation of a sensitive layer for coloring layer, characterized by: (Α) colorant, (Β) alkali soluble resin, (C) polyfunctional monomer, and (D) a compound represented by the following formula (1), which is a sensitive radiation linear polymerization initiator of an essential component, ......⑴ [式（1)中，η示2〜12之整數，心示氫原子、羥基、或各以 下述（I)、（II)，或（III)表示構造之任意基，（III)中R2示碳 數1〜12之烷基、碳數3〜8之環烷基、或苯基（其中，可以 碳數1〜6之烷基、碳數1〜6之烷氧基之至少1個以上所取 代 2 化 〇I o=cI He- 2C H IH3 c——c II H2C ο- 〇=c 〇- 〇=c 1 2 R 2. —種具有由如申請專利範圍第1項之著色層形成用 敏輻射線性組成物所形成之著色層之濾色片。 3. —種具備如申請專利範圍第2項之濾色片的液晶顯 示元件。 -56- 200844661 明 說 單 無簡 為符 圖件 表元 代之 定圖 :指表 圖案代 表本本 無 代 定一二 .bsΓ\ /ι\ 八 本案若有化學式時，請揭示最能顯示發明特徵的化學 式·無(1) [In the formula (1), n represents an integer of 2 to 12, and a hydrogen atom, a hydroxyl group, or an arbitrary group each represented by the following (I), (II), or (III) And (III), R2 represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, or a phenyl group (wherein an alkyl group having 1 to 6 carbon atoms and an alkoxy group having 1 to 6 carbon atoms) Substituting at least one or more of 2 groups 〇I o=cI He- 2C H IH3 c——c II H2C ο- 〇=c 〇- 〇=c 1 2 R 2. — species having the scope as claimed in the patent The color layer of the first item forms a color filter of the coloring layer formed by the linear composition of the sensitive radiation. 3. A liquid crystal display element having a color filter as in the second aspect of the patent application. -56- 200844661 The simple figure is the map of the table element: the table pattern represents the book without a set of one or two. bsΓ \ /ι\ Eight cases, if there is a chemical formula, please reveal the chemical formula that best shows the characteristics of the invention.
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