KR101396158B1 - Ｅｕｖ 램프 및 연질 ｘ-선 램프의 전환 효율을 증가시키는 방법, 및 ｅｕｖ 방사선 및 연질 ｘ-선을 생성하는 장치 - Google Patents

Ｅｕｖ 램프 및 연질 ｘ-선 램프의 전환 효율을 증가시키는 방법, 및 ｅｕｖ 방사선 및 연질 ｘ-선을 생성하는 장치 Download PDF

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KR101396158B1
KR101396158B1 KR1020087030546A KR20087030546A KR101396158B1 KR 101396158 B1 KR101396158 B1 KR 101396158B1 KR 1020087030546 A KR1020087030546 A KR 1020087030546A KR 20087030546 A KR20087030546 A KR 20087030546A KR 101396158 B1 KR101396158 B1 KR 101396158B1
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liquid material
discharge space
soft
euv
lamp
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Korean (ko)
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KR20090021168A (ko
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제론 존커스
도미니크 마르셀 바우드레반게
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코닌클리케 필립스 엔.브이.
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0088—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam for preconditioning the plasma generating material

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Luminescent Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020087030546A 2006-05-16 2007-05-08 Ｅｕｖ 램프 및 연질 ｘ-선 램프의 전환 효율을 증가시키는 방법, 및 ｅｕｖ 방사선 및 연질 ｘ-선을 생성하는 장치 Expired - Fee Related KR101396158B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06113972 2006-05-16
EP06113972.1 2006-05-16
PCT/IB2007/051716 WO2007135587A2 (en) 2006-05-16 2007-05-08 A method of increasing the conversion efficiency of an euv and/or soft x-ray lamp and a corresponding apparatus

Publications (2)

Publication Number Publication Date
KR20090021168A KR20090021168A (ko) 2009-02-27
KR101396158B1 true KR101396158B1 (ko) 2014-05-19

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KR1020087030546A Expired - Fee Related KR101396158B1 (ko) 2006-05-16 2007-05-08 Ｅｕｖ 램프 및 연질 ｘ-선 램프의 전환 효율을 증가시키는 방법, 및 ｅｕｖ 방사선 및 연질 ｘ-선을 생성하는 장치

Country Status (9)

Country Link
US (1) US8040030B2 (enExample)
EP (1) EP2020165B1 (enExample)
JP (1) JP5574705B2 (enExample)
KR (1) KR101396158B1 (enExample)
CN (1) CN101444148B (enExample)
AT (1) ATE489839T1 (enExample)
DE (1) DE602007010765D1 (enExample)
TW (1) TWI420976B (enExample)
WO (1) WO2007135587A2 (enExample)

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KR20250109087A (ko) 2024-01-09 2025-07-16 한국표준과학연구원 레이저 생성 플라즈마를 사용하는 극자외선 발생 장치 및 방법

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JP5386799B2 (ja) * 2007-07-06 2014-01-15 株式会社ニコン Ｅｕｖ光源、ｅｕｖ露光装置、ｅｕｖ光放射方法、ｅｕｖ露光方法および電子デバイスの製造方法
DE102007060807B4 (de) * 2007-12-18 2009-11-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungsquelle, insbesondere für EUV-Strahlung
KR20100102682A (ko) * 2007-12-27 2010-09-24 에이에스엠엘 네델란즈 비.브이. 극자외 방사선 소스 및 극자외 방사선을 생성하는 방법
NL2002890A1 (nl) 2008-06-16 2009-12-17 Asml Netherlands Bv Lithographic apparatus.
EP2308272B1 (en) * 2008-07-28 2012-09-19 Philips Intellectual Property & Standards GmbH Method and device for generating euv radiation or soft x-rays
JP4623192B2 (ja) * 2008-09-29 2011-02-02 ウシオ電機株式会社 極端紫外光光源装置および極端紫外光発生方法
CN102257883B (zh) 2008-12-16 2014-06-25 皇家飞利浦电子股份有限公司 用于以提高的效率生成euv辐射或软x射线的方法和装置
JP5245857B2 (ja) * 2009-01-21 2013-07-24 ウシオ電機株式会社 極端紫外光光源装置
JP5504673B2 (ja) * 2009-03-30 2014-05-28 ウシオ電機株式会社 極端紫外光光源装置
CN103281855B (zh) * 2013-05-16 2015-10-14 中国科学院光电研究院 一种用于激光光源的液态金属靶产生装置
CN104394642B (zh) * 2014-12-07 2017-03-08 湖南科技大学 激光等离子体共振x光源
CN105376919B (zh) * 2015-11-06 2017-08-01 华中科技大学 一种激光诱导液滴靶放电产生等离子体的装置
RU2670273C2 (ru) * 2017-11-24 2018-10-22 Общество с ограниченной ответственностью "РнД-ИСАН" Устройство и способ для генерации излучения из лазерной плазмы
JP7156331B2 (ja) * 2020-05-15 2022-10-19 ウシオ電機株式会社 極端紫外光光源装置

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US20050025280A1 (en) 2002-12-10 2005-02-03 Robert Schulte Volumetric 3D x-ray imaging system for baggage inspection including the detection of explosives
US20050178985A1 (en) 2004-02-13 2005-08-18 Plex Llc Injection pinch discharge extreme ultraviolet source

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US6031241A (en) * 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
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CN101795527B (zh) * 2002-09-19 2013-02-20 Asml荷兰有限公司 辐射源、光刻装置和器件制造方法
EP1401248B1 (en) 2002-09-19 2012-07-25 ASML Netherlands B.V. Radiation source, lithographic apparatus, and device manufacturing method
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DE10310623B8 (de) * 2003-03-10 2005-12-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen eines Plasmas durch elektrische Entladung in einem Entladungsraum
JP4052155B2 (ja) * 2003-03-17 2008-02-27 ウシオ電機株式会社 極端紫外光放射源及び半導体露光装置
EP1642482B1 (en) * 2003-06-27 2013-10-02 Bruker Advanced Supercon GmbH Method and device for producing extreme ultraviolet radiation or soft x-ray radiation
DE10342239B4 (de) 2003-09-11 2018-06-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung
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US20050025280A1 (en) 2002-12-10 2005-02-03 Robert Schulte Volumetric 3D x-ray imaging system for baggage inspection including the detection of explosives
US20050178985A1 (en) 2004-02-13 2005-08-18 Plex Llc Injection pinch discharge extreme ultraviolet source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250109087A (ko) 2024-01-09 2025-07-16 한국표준과학연구원 레이저 생성 플라즈마를 사용하는 극자외선 발생 장치 및 방법

Also Published As

Publication number Publication date
CN101444148B (zh) 2013-03-27
WO2007135587A3 (en) 2008-04-24
KR20090021168A (ko) 2009-02-27
US20090206268A1 (en) 2009-08-20
JP2009537943A (ja) 2009-10-29
TWI420976B (zh) 2013-12-21
WO2007135587A2 (en) 2007-11-29
DE602007010765D1 (de) 2011-01-05
CN101444148A (zh) 2009-05-27
TW200814858A (en) 2008-03-16
EP2020165A2 (en) 2009-02-04
US8040030B2 (en) 2011-10-18
ATE489839T1 (de) 2010-12-15
JP5574705B2 (ja) 2014-08-20
EP2020165B1 (en) 2010-11-24

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