KR101350648B1 - 전자부품용 적층 배선막 및 피복층 형성용 스퍼터링 타겟재 - Google Patents

전자부품용 적층 배선막 및 피복층 형성용 스퍼터링 타겟재 Download PDF

Info

Publication number
KR101350648B1
KR101350648B1 KR1020120089859A KR20120089859A KR101350648B1 KR 101350648 B1 KR101350648 B1 KR 101350648B1 KR 1020120089859 A KR1020120089859 A KR 1020120089859A KR 20120089859 A KR20120089859 A KR 20120089859A KR 101350648 B1 KR101350648 B1 KR 101350648B1
Authority
KR
South Korea
Prior art keywords
coating layer
film
wiring film
atomic
conductive layer
Prior art date
Application number
KR1020120089859A
Other languages
English (en)
Korean (ko)
Other versions
KR20130021333A (ko
Inventor
히데오 무라타
Original Assignee
히타치 긴조쿠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 히타치 긴조쿠 가부시키가이샤 filed Critical 히타치 긴조쿠 가부시키가이샤
Publication of KR20130021333A publication Critical patent/KR20130021333A/ko
Application granted granted Critical
Publication of KR101350648B1 publication Critical patent/KR101350648B1/ko

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G02F1/136295—Materials; Compositions; Manufacture processes

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Physical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Conductive Materials (AREA)
KR1020120089859A 2011-08-22 2012-08-17 전자부품용 적층 배선막 및 피복층 형성용 스퍼터링 타겟재 KR101350648B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2011-180195 2011-08-22
JP2011180195 2011-08-22

Publications (2)

Publication Number Publication Date
KR20130021333A KR20130021333A (ko) 2013-03-05
KR101350648B1 true KR101350648B1 (ko) 2014-01-10

Family

ID=47762411

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120089859A KR101350648B1 (ko) 2011-08-22 2012-08-17 전자부품용 적층 배선막 및 피복층 형성용 스퍼터링 타겟재

Country Status (4)

Country Link
JP (1) JP6037208B2 (ja)
KR (1) KR101350648B1 (ja)
CN (1) CN102953036B (ja)
TW (1) TWI493624B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102109166B1 (ko) 2013-01-15 2020-05-12 삼성디스플레이 주식회사 박막 트랜지스터 및 이를 구비하는 표시 기판
AT14576U1 (de) 2014-08-20 2016-01-15 Plansee Se Metallisierung für ein Dünnschichtbauelement, Verfahren zu deren Herstellung und Sputtering Target
CN114921761B (zh) * 2022-05-17 2023-01-17 广东欧莱高新材料股份有限公司 一种用于高世代高清液晶显示的高纯多元合金溅射镀膜材料

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11142617A (ja) * 1997-11-10 1999-05-28 Dainippon Printing Co Ltd ブラックマトリックス用ブランクスおよび液晶ディスプレイ用カラーフィルタ
JP2001311805A (ja) 2000-04-27 2001-11-09 Mitsubishi Materials Corp ブラックマトリックスを形成するための遮光膜および遮光膜形成用スパッタリングターゲット
JP2001311812A (ja) 2000-04-27 2001-11-09 Mitsubishi Materials Corp ブラックマトリックスを形成するための遮光膜および遮光膜形成用スパッタリングターゲット
JP2005091543A (ja) * 2003-09-16 2005-04-07 Hitachi Metals Ltd 薄膜配線層

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000144380A (ja) * 1998-11-10 2000-05-26 Mitsui Eng & Shipbuild Co Ltd 超耐食性合金及びその作製方法
JP4496518B2 (ja) * 2002-08-19 2010-07-07 日立金属株式会社 薄膜配線
JP4304459B2 (ja) * 2002-11-19 2009-07-29 宇部興産株式会社 金属薄膜付きポリイミドフィルム
JP2005289046A (ja) * 2004-03-10 2005-10-20 Asahi Glass Co Ltd 配線付き基体形成用の積層体、配線付き基体およびその形成方法
JP2006040589A (ja) * 2004-07-22 2006-02-09 Asahi Glass Co Ltd 積層体、有機ｅｌ表示素子、及び、有機ｅｌ表示素子の製造方法
JP4730662B2 (ja) * 2005-03-02 2011-07-20 日立金属株式会社 薄膜配線層
JP4655281B2 (ja) * 2005-03-29 2011-03-23 日立金属株式会社 薄膜配線層
JP5203908B2 (ja) * 2008-12-04 2013-06-05 新日鉄住金マテリアルズ株式会社 Ｎｉ−Ｍｏ系合金スパッタリングターゲット板

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11142617A (ja) * 1997-11-10 1999-05-28 Dainippon Printing Co Ltd ブラックマトリックス用ブランクスおよび液晶ディスプレイ用カラーフィルタ
JP2001311805A (ja) 2000-04-27 2001-11-09 Mitsubishi Materials Corp ブラックマトリックスを形成するための遮光膜および遮光膜形成用スパッタリングターゲット
JP2001311812A (ja) 2000-04-27 2001-11-09 Mitsubishi Materials Corp ブラックマトリックスを形成するための遮光膜および遮光膜形成用スパッタリングターゲット
JP2005091543A (ja) * 2003-09-16 2005-04-07 Hitachi Metals Ltd 薄膜配線層

Also Published As

Publication number Publication date
KR20130021333A (ko) 2013-03-05
CN102953036B (zh) 2014-11-05
CN102953036A (zh) 2013-03-06
JP2013060656A (ja) 2013-04-04
TW201310535A (zh) 2013-03-01
TWI493624B (zh) 2015-07-21
JP6037208B2 (ja) 2016-12-07

Similar Documents

Publication Publication Date Title
KR101358529B1 (ko) 전자부품용 적층 배선막 및 피복층 형성용 스퍼터링 타겟재
WO2010018864A1 (ja) 表示装置、これに用いるＣｕ合金膜およびＣｕ合金スパッタリングターゲット
KR20180076316A (ko) 적층 배선막 및 그 제조 방법 그리고 Mo 합금 스퍼터링 타깃재
JP6292471B2 (ja) 電子部品用金属薄膜および金属薄膜形成用Ｍｏ合金スパッタリングターゲット材
KR101350648B1 (ko) 전자부품용 적층 배선막 및 피복층 형성용 스퍼터링 타겟재
KR101597018B1 (ko) 금속 박막 및 금속 박막 형성용 Mo 합금 스퍼터링 타깃재
JP6361957B2 (ja) 電子部品用積層配線膜および被覆層形成用スパッタリングターゲット材
KR101828085B1 (ko) Ｃｕ 전극 보호막용 ＮｉＣｕ 합금 타겟재 및 적층막
KR101337141B1 (ko) 전자부품용 적층 배선막
KR20170078759A (ko) Cu 합금막 및 Cu 적층막
WO2016132847A1 (ja) Ｃｕ合金膜およびＣｕ積層膜
JP2010258347A (ja) 表示装置およびこれに用いるＣｕ合金膜
KR101421881B1 (ko) 전자 부품용 적층 배선막
CN112055888A (zh) Cu合金靶材、配线膜、半导体装置、液晶显示装置

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20161219

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20171219

Year of fee payment: 5

FPAY Annual fee payment

Payment date: 20181219

Year of fee payment: 6

FPAY Annual fee payment

Payment date: 20191219

Year of fee payment: 7