KR101311818B1 - 전자 종이 디스플레이 디바이스에 사용하기 위한 컬러 필터용 감광성 레지스트 조성물 - Google Patents

전자 종이 디스플레이 디바이스에 사용하기 위한 컬러 필터용 감광성 레지스트 조성물 Download PDF

Info

Publication number
KR101311818B1
KR101311818B1 KR1020087026712A KR20087026712A KR101311818B1 KR 101311818 B1 KR101311818 B1 KR 101311818B1 KR 1020087026712 A KR1020087026712 A KR 1020087026712A KR 20087026712 A KR20087026712 A KR 20087026712A KR 101311818 B1 KR101311818 B1 KR 101311818B1
Authority
KR
South Korea
Prior art keywords
meth
acrylate
photosensitive resist
copolymer
acrylic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020087026712A
Other languages
English (en)
Korean (ko)
Other versions
KR20080108594A (ko
Inventor
다니엘 횔츨레
케이저 헤라르뒤스 드
릴리아나 크라춘
Original Assignee
시바 홀딩 인크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 시바 홀딩 인크 filed Critical 시바 홀딩 인크
Publication of KR20080108594A publication Critical patent/KR20080108594A/ko
Application granted granted Critical
Publication of KR101311818B1 publication Critical patent/KR101311818B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Optical Filters (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
KR1020087026712A 2006-03-30 2007-03-21 전자 종이 디스플레이 디바이스에 사용하기 위한 컬러 필터용 감광성 레지스트 조성물 Expired - Fee Related KR101311818B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP06111989.7 2006-03-30
EP06111989 2006-03-30
EP06119172 2006-08-18
EP06119172.2 2006-08-18
PCT/EP2007/052671 WO2007113107A1 (en) 2006-03-30 2007-03-21 Photosensitive resist composition for color filters for use in electronic paper display devices

Publications (2)

Publication Number Publication Date
KR20080108594A KR20080108594A (ko) 2008-12-15
KR101311818B1 true KR101311818B1 (ko) 2013-09-30

Family

ID=38121575

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087026712A Expired - Fee Related KR101311818B1 (ko) 2006-03-30 2007-03-21 전자 종이 디스플레이 디바이스에 사용하기 위한 컬러 필터용 감광성 레지스트 조성물

Country Status (6)

Country Link
US (1) US8927182B2 (enExample)
EP (1) EP1999514B1 (enExample)
JP (1) JP5015231B2 (enExample)
KR (1) KR101311818B1 (enExample)
TW (1) TWI427413B (enExample)
WO (1) WO2007113107A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI368765B (en) * 2007-06-13 2012-07-21 Chimei Innolux Corp Color photo-resist with gold nano-particles and color filters made thereby
JP5284833B2 (ja) * 2008-03-31 2013-09-11 富士フイルム株式会社 フォトスペーサーの製造方法
JP5683490B2 (ja) 2009-01-19 2015-03-11 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ カラーフィルタ用のブラックマトリックス
US9575230B2 (en) 2010-05-03 2017-02-21 Basf Se Color filter for low temperature applications
KR20130094773A (ko) 2010-06-24 2013-08-26 바스프 에스이 온/오프 전류비가 개선되고 임계 이동이 제어가능한 유기 전계 효과 트랜지스터
KR101939419B1 (ko) 2010-12-30 2019-01-16 바스프 에스이 표면-개질된 안료 제제
KR20140101788A (ko) 2011-11-15 2014-08-20 바스프 에스이 유기 반도체 소자 및 이의 제조 방법
CN103975453B (zh) 2011-12-07 2018-01-30 巴斯夫欧洲公司 有机场效应晶体管
WO2013083506A1 (en) 2011-12-07 2013-06-13 Basf Se Diketopyrrolopyrrole polymers for use in organic semiconductor devices
PL397479A1 (pl) 2011-12-21 2013-06-24 Instytut Chemii Organicznej Polskiej Akademii Nauk Nowe, fluorescencyjne barwniki heterocykliczne i sposób ich otrzymywania
WO2013179237A1 (en) 2012-06-01 2013-12-05 Basf Se Black colorant mixture
KR101986763B1 (ko) * 2012-09-28 2019-06-07 롬엔드하스전자재료코리아유한회사 고내열성, 고해상도의 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
TWI489212B (zh) 2013-03-29 2015-06-21 Chi Mei Corp Photosensitive resin composition and its application
EP3013906B1 (en) 2013-06-24 2020-03-25 Basf Se Polymers based on fused diketopyrrolopyrroles
KR102134633B1 (ko) * 2016-11-25 2020-07-16 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치
US11602412B2 (en) 2016-12-23 2023-03-14 3M Innovative Properties Company Printable compositions including polymeric and polymerizable components, articles, and methods of making articles therefrom
TWI666518B (zh) * 2016-12-30 2019-07-21 奇美實業股份有限公司 感光性樹脂組成物及其應用
JP7526104B2 (ja) 2018-06-25 2024-07-31 サン・ケミカル・ベスローテン・ヴェンノーツハップ カラーフィルター用赤色顔料組成物
CN113031395A (zh) * 2019-12-24 2021-06-25 罗门哈斯电子材料韩国有限公司 着色的光敏树脂组合物和由其制备的黑色矩阵

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000122280A (ja) 1998-10-20 2000-04-28 Jsr Corp カラーフィルタ用感放射線性組成物
KR20040012637A (ko) * 1997-09-09 2004-02-11 제이에스알 가부시끼가이샤 감방사선성 조성물
KR20050020653A (ko) * 2003-08-21 2005-03-04 닛산 가가쿠 고교 가부시키 가이샤 염료함유 레지스트 조성물 및 그것을 사용한 컬러필터

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5140202A (ja) * 1974-10-02 1976-04-03 Unitika Ltd Chakushokukankoseisoseibutsu
JPS58117537A (ja) * 1982-01-06 1983-07-13 Toray Ind Inc 感光性樹脂組成物
DE3619698A1 (de) * 1986-06-16 1987-12-17 Basf Ag Lichtempfindliches aufzeichnungselement
DE3719844A1 (de) * 1987-06-13 1988-12-29 Basf Ag Durch photopolymersisation vernetzbares gemisch
US4934791A (en) * 1987-12-09 1990-06-19 Matsushita Electric Industrial Co., Ltd. Color filter
US4985343A (en) * 1989-02-09 1991-01-15 Mitsubishi Rayon Co., Ltd. Crosslinking-curable resin composition
JPH03160058A (ja) * 1989-11-17 1991-07-10 Mitsubishi Rayon Co Ltd 架橋硬化型樹脂組成物
JPH1020490A (ja) * 1996-06-28 1998-01-23 Hitachi Chem Co Ltd 着色感光性樹脂組成物、着色画像形成材料、カラーフィルタの製造法及びカラーフィルタ
JPH10111566A (ja) 1996-10-07 1998-04-28 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
JPH11338142A (ja) * 1998-05-25 1999-12-10 Fujifilm Olin Co Ltd 感光性樹脂組成物
JP4164919B2 (ja) * 1998-11-30 2008-10-15 チッソ株式会社 光重合開始剤および光重合性開始剤組成物
JP2001166462A (ja) * 1999-12-10 2001-06-22 Fuji Photo Film Co Ltd 平版印刷版原版
JP2001290265A (ja) 2000-04-05 2001-10-19 Jsr Corp 感放射線性樹脂組成物及びこれを用いたフォトリソグラフィ
JP2003255120A (ja) * 2002-02-28 2003-09-10 Showa Denko Kk カラーフィルタ用樹脂組成物
JP3843865B2 (ja) * 2002-03-04 2006-11-08 東洋インキ製造株式会社 顔料組成物および顔料分散体
JP2004163917A (ja) * 2002-10-25 2004-06-10 Sumitomo Chem Co Ltd 着色感光性樹脂組成物
US20050208423A1 (en) 2004-03-19 2005-09-22 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040012637A (ko) * 1997-09-09 2004-02-11 제이에스알 가부시끼가이샤 감방사선성 조성물
JP2000122280A (ja) 1998-10-20 2000-04-28 Jsr Corp カラーフィルタ用感放射線性組成物
KR20050020653A (ko) * 2003-08-21 2005-03-04 닛산 가가쿠 고교 가부시키 가이샤 염료함유 레지스트 조성물 및 그것을 사용한 컬러필터

Also Published As

Publication number Publication date
EP1999514A1 (en) 2008-12-10
US8927182B2 (en) 2015-01-06
JP2009531727A (ja) 2009-09-03
KR20080108594A (ko) 2008-12-15
TWI427413B (zh) 2014-02-21
US20100164911A1 (en) 2010-07-01
WO2007113107A1 (en) 2007-10-11
EP1999514B1 (en) 2018-10-03
JP5015231B2 (ja) 2012-08-29
TW200745752A (en) 2007-12-16

Similar Documents

Publication Publication Date Title
KR101311818B1 (ko) 전자 종이 디스플레이 디바이스에 사용하기 위한 컬러 필터용 감광성 레지스트 조성물
EP2567284B1 (en) Color filter for low temperature applications
CN104423148B (zh) 着色感光性树脂组合物、包含其的滤色器和显示装置
CN107229183B (zh) 红色感光性树脂组合物、使用其制造的滤色器和包含该滤色器的显示元件
KR20110068861A (ko) 착색 조성물, 컬러 필터 및 컬러 액정 표시 소자
TWI512394B (zh) 著色層形成用敏輻射線性組成物、彩色濾光片及彩色液晶顯示元件
CN111796484A (zh) 着色感光性树脂组合物、滤色器和具备其的图像显示装置
JP5109678B2 (ja) 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
CN110297394B (zh) 着色感光性树脂组合物、滤色器和图像显示装置
CN101416112B (zh) 电子纸显示器中的滤色片所用的光敏抗蚀剂组合物
KR20240111977A (ko) 착색 감광성 수지 조성물 및 이를 이용하여 제조된 컬러필터 및 고체 촬상 소자
KR20200114021A (ko) 착색 감광성 수지 조성물, 이를 사용하여 제조된 컬러필터, 및 상기 컬러필터를 포함하는 화상표시장치

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20160909

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20170831

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20180904

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20190830

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20200918

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20200918