JP5015231B2 - 電子ペーパーディスプレイ装置に用いるカラーフィルター用感光性レジスト組成物 - Google Patents

電子ペーパーディスプレイ装置に用いるカラーフィルター用感光性レジスト組成物 Download PDF

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Publication number
JP5015231B2
JP5015231B2 JP2009502026A JP2009502026A JP5015231B2 JP 5015231 B2 JP5015231 B2 JP 5015231B2 JP 2009502026 A JP2009502026 A JP 2009502026A JP 2009502026 A JP2009502026 A JP 2009502026A JP 5015231 B2 JP5015231 B2 JP 5015231B2
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JP
Japan
Prior art keywords
meth
acrylate
photosensitive resist
copolymer
coating film
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2009502026A
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English (en)
Japanese (ja)
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JP2009531727A (ja
JP2009531727A5 (enExample
Inventor
ヘルツェル，ダニエル
デ・ケイツァー，ゲラードゥス
クラチュン，リリアナ
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BASF Schweiz AG
Original Assignee
Ciba Holding AG
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Application filed by Ciba Holding AG filed Critical Ciba Holding AG
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Publication of JP2009531727A5 publication Critical patent/JP2009531727A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Optical Filters (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
JP2009502026A 2006-03-30 2007-03-21 電子ペーパーディスプレイ装置に用いるカラーフィルター用感光性レジスト組成物 Expired - Fee Related JP5015231B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP06111989.7 2006-03-30
EP06111989 2006-03-30
EP06119172 2006-08-18
EP06119172.2 2006-08-18
PCT/EP2007/052671 WO2007113107A1 (en) 2006-03-30 2007-03-21 Photosensitive resist composition for color filters for use in electronic paper display devices

Publications (3)

Publication Number Publication Date
JP2009531727A JP2009531727A (ja) 2009-09-03
JP2009531727A5 JP2009531727A5 (enExample) 2010-05-06
JP5015231B2 true JP5015231B2 (ja) 2012-08-29

Family

ID=38121575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009502026A Expired - Fee Related JP5015231B2 (ja) 2006-03-30 2007-03-21 電子ペーパーディスプレイ装置に用いるカラーフィルター用感光性レジスト組成物

Country Status (6)

Country Link
US (1) US8927182B2 (enExample)
EP (1) EP1999514B1 (enExample)
JP (1) JP5015231B2 (enExample)
KR (1) KR101311818B1 (enExample)
TW (1) TWI427413B (enExample)
WO (1) WO2007113107A1 (enExample)

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TWI368765B (en) * 2007-06-13 2012-07-21 Chimei Innolux Corp Color photo-resist with gold nano-particles and color filters made thereby
JP5284833B2 (ja) * 2008-03-31 2013-09-11 富士フイルム株式会社 フォトスペーサーの製造方法
JP5683490B2 (ja) 2009-01-19 2015-03-11 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ カラーフィルタ用のブラックマトリックス
US9575230B2 (en) 2010-05-03 2017-02-21 Basf Se Color filter for low temperature applications
KR20130094773A (ko) 2010-06-24 2013-08-26 바스프 에스이 온/오프 전류비가 개선되고 임계 이동이 제어가능한 유기 전계 효과 트랜지스터
KR101939419B1 (ko) 2010-12-30 2019-01-16 바스프 에스이 표면-개질된 안료 제제
KR20140101788A (ko) 2011-11-15 2014-08-20 바스프 에스이 유기 반도체 소자 및 이의 제조 방법
CN103975453B (zh) 2011-12-07 2018-01-30 巴斯夫欧洲公司 有机场效应晶体管
WO2013083506A1 (en) 2011-12-07 2013-06-13 Basf Se Diketopyrrolopyrrole polymers for use in organic semiconductor devices
PL397479A1 (pl) 2011-12-21 2013-06-24 Instytut Chemii Organicznej Polskiej Akademii Nauk Nowe, fluorescencyjne barwniki heterocykliczne i sposób ich otrzymywania
WO2013179237A1 (en) 2012-06-01 2013-12-05 Basf Se Black colorant mixture
KR101986763B1 (ko) * 2012-09-28 2019-06-07 롬엔드하스전자재료코리아유한회사 고내열성, 고해상도의 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
TWI489212B (zh) 2013-03-29 2015-06-21 Chi Mei Corp Photosensitive resin composition and its application
EP3013906B1 (en) 2013-06-24 2020-03-25 Basf Se Polymers based on fused diketopyrrolopyrroles
KR102134633B1 (ko) * 2016-11-25 2020-07-16 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치
US11602412B2 (en) 2016-12-23 2023-03-14 3M Innovative Properties Company Printable compositions including polymeric and polymerizable components, articles, and methods of making articles therefrom
TWI666518B (zh) * 2016-12-30 2019-07-21 奇美實業股份有限公司 感光性樹脂組成物及其應用
JP7526104B2 (ja) 2018-06-25 2024-07-31 サン・ケミカル・ベスローテン・ヴェンノーツハップ カラーフィルター用赤色顔料組成物
CN113031395A (zh) * 2019-12-24 2021-06-25 罗门哈斯电子材料韩国有限公司 着色的光敏树脂组合物和由其制备的黑色矩阵

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JPS5140202A (ja) * 1974-10-02 1976-04-03 Unitika Ltd Chakushokukankoseisoseibutsu
JPS58117537A (ja) * 1982-01-06 1983-07-13 Toray Ind Inc 感光性樹脂組成物
DE3619698A1 (de) * 1986-06-16 1987-12-17 Basf Ag Lichtempfindliches aufzeichnungselement
DE3719844A1 (de) * 1987-06-13 1988-12-29 Basf Ag Durch photopolymersisation vernetzbares gemisch
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JPH10111566A (ja) 1996-10-07 1998-04-28 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
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JPH11338142A (ja) * 1998-05-25 1999-12-10 Fujifilm Olin Co Ltd 感光性樹脂組成物
JP2000122280A (ja) 1998-10-20 2000-04-28 Jsr Corp カラーフィルタ用感放射線性組成物
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JP2003255120A (ja) * 2002-02-28 2003-09-10 Showa Denko Kk カラーフィルタ用樹脂組成物
JP3843865B2 (ja) * 2002-03-04 2006-11-08 東洋インキ製造株式会社 顔料組成物および顔料分散体
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Also Published As

Publication number Publication date
EP1999514A1 (en) 2008-12-10
US8927182B2 (en) 2015-01-06
JP2009531727A (ja) 2009-09-03
KR101311818B1 (ko) 2013-09-30
KR20080108594A (ko) 2008-12-15
TWI427413B (zh) 2014-02-21
US20100164911A1 (en) 2010-07-01
WO2007113107A1 (en) 2007-10-11
EP1999514B1 (en) 2018-10-03
TW200745752A (en) 2007-12-16

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