KR101306917B1 - 노광 장치 - Google Patents

노광 장치 Download PDF

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Publication number
KR101306917B1
KR101306917B1 KR1020087001979A KR20087001979A KR101306917B1 KR 101306917 B1 KR101306917 B1 KR 101306917B1 KR 1020087001979 A KR1020087001979 A KR 1020087001979A KR 20087001979 A KR20087001979 A KR 20087001979A KR 101306917 B1 KR101306917 B1 KR 101306917B1
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KR
South Korea
Prior art keywords
exposure
photomask
light
exposed
mask
Prior art date
Application number
KR1020087001979A
Other languages
English (en)
Korean (ko)
Other versions
KR20080059546A (ko
Inventor
고이치 가지야마
요시오 와타나베
Original Assignee
브이 테크놀로지 씨오. 엘티디
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 브이 테크놀로지 씨오. 엘티디 filed Critical 브이 테크놀로지 씨오. 엘티디
Publication of KR20080059546A publication Critical patent/KR20080059546A/ko
Application granted granted Critical
Publication of KR101306917B1 publication Critical patent/KR101306917B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020087001979A 2005-10-25 2006-10-04 노광 장치 KR101306917B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005309205A JP5382899B2 (ja) 2005-10-25 2005-10-25 露光装置
JPJP-P-2005-00309205 2005-10-25
PCT/JP2006/319853 WO2007049436A1 (ja) 2005-10-25 2006-10-04 露光装置

Publications (2)

Publication Number Publication Date
KR20080059546A KR20080059546A (ko) 2008-06-30
KR101306917B1 true KR101306917B1 (ko) 2013-09-10

Family

ID=37967554

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087001979A KR101306917B1 (ko) 2005-10-25 2006-10-04 노광 장치

Country Status (5)

Country Link
JP (1) JP5382899B2 (zh)
KR (1) KR101306917B1 (zh)
CN (1) CN101268420B (zh)
TW (1) TWI446124B (zh)
WO (1) WO2007049436A1 (zh)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5235061B2 (ja) * 2007-08-30 2013-07-10 株式会社ブイ・テクノロジー 露光装置
JP5098041B2 (ja) * 2007-08-31 2012-12-12 株式会社ブイ・テクノロジー 露光方法
JP5256434B2 (ja) * 2008-06-11 2013-08-07 株式会社ブイ・テクノロジー 近接露光装置
WO2010070988A1 (ja) * 2008-12-16 2010-06-24 株式会社ブイ・テクノロジー 凸状パターン形成方法、露光装置及びフォトマスク
KR101254442B1 (ko) * 2009-02-26 2013-04-12 도판 인사츠 가부시키가이샤 컬러 필터 및 컬러 필터의 제조 방법
JP5258051B2 (ja) * 2009-04-03 2013-08-07 株式会社ブイ・テクノロジー 露光方法及び露光装置
JP5622052B2 (ja) * 2009-04-28 2014-11-12 凸版印刷株式会社 カラーフィルタ、液晶表示装置、カラーフィルタの製造方法
KR20120022908A (ko) 2009-04-30 2012-03-12 도판 인사츠 가부시키가이샤 액정 표시 장치
US8605237B2 (en) 2009-04-30 2013-12-10 Toppan Printing Co., Ltd. Color filter and liquid crystal display device, and exposure mask
JP5633021B2 (ja) * 2009-06-29 2014-12-03 株式会社ブイ・テクノロジー アライメント方法、アライメント装置及び露光装置
TWI421546B (zh) * 2009-10-02 2014-01-01 Unique Instr Co Ltd A Method for Copying Production of 3D Parallax Gratings
US8778576B2 (en) 2009-12-24 2014-07-15 Toppan Printing Co., Ltd. Exposure method and exposure device
JP5542456B2 (ja) 2010-01-18 2014-07-09 凸版印刷株式会社 カラーフィルタ基板の露光方法
JP5549233B2 (ja) * 2010-01-18 2014-07-16 凸版印刷株式会社 カラーフィルタ基板の露光方法
JPWO2011105461A1 (ja) * 2010-02-24 2013-06-20 Ｎｓｋテクノロジー株式会社 露光装置用光照射装置、露光装置、露光方法、基板の製造方法、マスク、及び被露光基板
JP5382456B2 (ja) * 2010-04-08 2014-01-08 株式会社ブイ・テクノロジー 露光方法及び露光装置
KR101681143B1 (ko) 2010-07-19 2016-12-02 삼성디스플레이 주식회사 노광 장치 및 이를 이용한 노광 방법
KR101104367B1 (ko) * 2011-07-27 2012-01-16 주식회사 필옵틱스 Ｌｅｄ 광원 노광 장치
US9081297B2 (en) 2012-05-01 2015-07-14 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography apparatus having dual reticle edge masking assemblies and method of use
CN103955088B (zh) * 2014-05-12 2017-02-22 青岛斯博锐意电子技术有限公司 一种液晶光掩膜及其应用
CN103955087B (zh) * 2014-05-12 2017-01-04 青岛斯博锐意电子技术有限公司 一种液晶光掩膜、其应用及制版装置
CN106324892B (zh) * 2016-10-11 2019-08-02 武汉华星光电技术有限公司 一种用于制备显示基板的曝光系统及曝光控制方法
CN114252014A (zh) * 2021-12-24 2022-03-29 长飞光纤光缆股份有限公司 一种光掩膜基板标记尺寸测试系统及方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0757985A (ja) * 1993-08-09 1995-03-03 Nikon Corp 走査型露光装置
JPH1010745A (ja) * 1996-06-19 1998-01-16 Toppan Printing Co Ltd パターン露光方法
JP2001305747A (ja) * 2000-02-18 2001-11-02 Nikon Corp 露光装置及び露光方法
JP2002222761A (ja) * 2000-11-22 2002-08-09 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02177317A (ja) * 1988-12-28 1990-07-10 Canon Inc 露光装置
JPH09199402A (ja) * 1996-01-12 1997-07-31 Canon Inc 走査型露光装置
JPH09274323A (ja) * 1996-04-04 1997-10-21 Toppan Printing Co Ltd パターン露光方法
JPH1197343A (ja) * 1997-09-24 1999-04-09 Canon Inc 露光装置
JP4346320B2 (ja) * 2003-02-05 2009-10-21 大日本印刷株式会社 露光方法及び露光装置
JP2005221596A (ja) * 2004-02-04 2005-08-18 Dainippon Screen Mfg Co Ltd パターン描画装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0757985A (ja) * 1993-08-09 1995-03-03 Nikon Corp 走査型露光装置
JPH1010745A (ja) * 1996-06-19 1998-01-16 Toppan Printing Co Ltd パターン露光方法
JP2001305747A (ja) * 2000-02-18 2001-11-02 Nikon Corp 露光装置及び露光方法
JP2002222761A (ja) * 2000-11-22 2002-08-09 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置

Also Published As

Publication number Publication date
TWI446124B (zh) 2014-07-21
CN101268420A (zh) 2008-09-17
KR20080059546A (ko) 2008-06-30
JP5382899B2 (ja) 2014-01-08
WO2007049436A1 (ja) 2007-05-03
JP2007121344A (ja) 2007-05-17
TW200731033A (en) 2007-08-16
CN101268420B (zh) 2010-10-27

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