JP5382899B2 - 露光装置 - Google Patents

露光装置 Download PDF

Info

Publication number
JP5382899B2
JP5382899B2 JP2005309205A JP2005309205A JP5382899B2 JP 5382899 B2 JP5382899 B2 JP 5382899B2 JP 2005309205 A JP2005309205 A JP 2005309205A JP 2005309205 A JP2005309205 A JP 2005309205A JP 5382899 B2 JP5382899 B2 JP 5382899B2
Authority
JP
Japan
Prior art keywords
exposure
light
exposed
photomask
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2005309205A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007121344A (ja
Inventor
康一 梶山
由雄 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
V Technology Co Ltd
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Priority to JP2005309205A priority Critical patent/JP5382899B2/ja
Priority to PCT/JP2006/319853 priority patent/WO2007049436A1/ja
Priority to KR1020087001979A priority patent/KR101306917B1/ko
Priority to CN2006800349340A priority patent/CN101268420B/zh
Priority to TW95139074A priority patent/TWI446124B/zh
Publication of JP2007121344A publication Critical patent/JP2007121344A/ja
Application granted granted Critical
Publication of JP5382899B2 publication Critical patent/JP5382899B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005309205A 2005-10-25 2005-10-25 露光装置 Active JP5382899B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2005309205A JP5382899B2 (ja) 2005-10-25 2005-10-25 露光装置
PCT/JP2006/319853 WO2007049436A1 (ja) 2005-10-25 2006-10-04 露光装置
KR1020087001979A KR101306917B1 (ko) 2005-10-25 2006-10-04 노광 장치
CN2006800349340A CN101268420B (zh) 2005-10-25 2006-10-04 曝光装置
TW95139074A TWI446124B (zh) 2005-10-25 2006-10-24 曝光裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005309205A JP5382899B2 (ja) 2005-10-25 2005-10-25 露光装置

Publications (2)

Publication Number Publication Date
JP2007121344A JP2007121344A (ja) 2007-05-17
JP5382899B2 true JP5382899B2 (ja) 2014-01-08

Family

ID=37967554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005309205A Active JP5382899B2 (ja) 2005-10-25 2005-10-25 露光装置

Country Status (5)

Country Link
JP (1) JP5382899B2 (zh)
KR (1) KR101306917B1 (zh)
CN (1) CN101268420B (zh)
TW (1) TWI446124B (zh)
WO (1) WO2007049436A1 (zh)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5235061B2 (ja) * 2007-08-30 2013-07-10 株式会社ブイ・テクノロジー 露光装置
JP5098041B2 (ja) * 2007-08-31 2012-12-12 株式会社ブイ・テクノロジー 露光方法
JP5256434B2 (ja) * 2008-06-11 2013-08-07 株式会社ブイ・テクノロジー 近接露光装置
WO2010070988A1 (ja) * 2008-12-16 2010-06-24 株式会社ブイ・テクノロジー 凸状パターン形成方法、露光装置及びフォトマスク
WO2010098093A1 (ja) * 2009-02-26 2010-09-02 凸版印刷株式会社 カラーフィルタ及びカラーフィルタの製造方法
JP5258051B2 (ja) * 2009-04-03 2013-08-07 株式会社ブイ・テクノロジー 露光方法及び露光装置
TWI468748B (zh) 2009-04-28 2015-01-11 Toppan Printing Co Ltd 彩色濾光片、液晶顯示裝置、彩色濾光片之製造方法
US8605237B2 (en) * 2009-04-30 2013-12-10 Toppan Printing Co., Ltd. Color filter and liquid crystal display device, and exposure mask
WO2010125824A1 (ja) 2009-04-30 2010-11-04 凸版印刷株式会社 液晶表示装置
JP5633021B2 (ja) * 2009-06-29 2014-12-03 株式会社ブイ・テクノロジー アライメント方法、アライメント装置及び露光装置
TWI421546B (zh) * 2009-10-02 2014-01-01 Unique Instr Co Ltd A Method for Copying Production of 3D Parallax Gratings
US8778576B2 (en) 2009-12-24 2014-07-15 Toppan Printing Co., Ltd. Exposure method and exposure device
JP5549233B2 (ja) * 2010-01-18 2014-07-16 凸版印刷株式会社 カラーフィルタ基板の露光方法
JP5542456B2 (ja) 2010-01-18 2014-07-09 凸版印刷株式会社 カラーフィルタ基板の露光方法
KR101437210B1 (ko) * 2010-02-24 2014-11-03 엔에스케이 테쿠노로지 가부시키가이샤 노광 장치용 광조사 장치, 노광 장치, 노광 방법, 기판의 제조 방법, 마스크, 및 피노광 기판
JP5382456B2 (ja) * 2010-04-08 2014-01-08 株式会社ブイ・テクノロジー 露光方法及び露光装置
KR101681143B1 (ko) 2010-07-19 2016-12-02 삼성디스플레이 주식회사 노광 장치 및 이를 이용한 노광 방법
KR101104367B1 (ko) * 2011-07-27 2012-01-16 주식회사 필옵틱스 Ｌｅｄ 광원 노광 장치
US9081297B2 (en) * 2012-05-01 2015-07-14 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography apparatus having dual reticle edge masking assemblies and method of use
CN103955088B (zh) * 2014-05-12 2017-02-22 青岛斯博锐意电子技术有限公司 一种液晶光掩膜及其应用
CN103955087B (zh) * 2014-05-12 2017-01-04 青岛斯博锐意电子技术有限公司 一种液晶光掩膜、其应用及制版装置
CN106324892B (zh) * 2016-10-11 2019-08-02 武汉华星光电技术有限公司 一种用于制备显示基板的曝光系统及曝光控制方法
CN114252014A (zh) * 2021-12-24 2022-03-29 长飞光纤光缆股份有限公司 一种光掩膜基板标记尺寸测试系统及方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02177317A (ja) * 1988-12-28 1990-07-10 Canon Inc 露光装置
JP3348476B2 (ja) * 1993-08-09 2002-11-20 株式会社ニコン 走査型露光装置及び走査露光方法
JPH09199402A (ja) * 1996-01-12 1997-07-31 Canon Inc 走査型露光装置
JPH09274323A (ja) * 1996-04-04 1997-10-21 Toppan Printing Co Ltd パターン露光方法
JPH1010745A (ja) * 1996-06-19 1998-01-16 Toppan Printing Co Ltd パターン露光方法
JPH1197343A (ja) * 1997-09-24 1999-04-09 Canon Inc 露光装置
JP4581262B2 (ja) * 2000-02-18 2010-11-17 株式会社ニコン 露光装置及び露光方法
JP2002222761A (ja) * 2000-11-22 2002-08-09 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP4346320B2 (ja) * 2003-02-05 2009-10-21 大日本印刷株式会社 露光方法及び露光装置
JP2005221596A (ja) * 2004-02-04 2005-08-18 Dainippon Screen Mfg Co Ltd パターン描画装置

Also Published As

Publication number Publication date
TW200731033A (en) 2007-08-16
KR101306917B1 (ko) 2013-09-10
CN101268420A (zh) 2008-09-17
TWI446124B (zh) 2014-07-21
KR20080059546A (ko) 2008-06-30
CN101268420B (zh) 2010-10-27
WO2007049436A1 (ja) 2007-05-03
JP2007121344A (ja) 2007-05-17

Similar Documents

Publication Publication Date Title
JP5382899B2 (ja) 露光装置
TWI446122B (zh) 曝光裝置
JP5224341B2 (ja) 露光装置及びフォトマスク
TWI467345B (zh) 曝光裝置及光罩
JP5235061B2 (ja) 露光装置
TWI481971B (zh) 曝光方法及曝光裝置
JP4764237B2 (ja) 露光装置
US20090029270A1 (en) Projection exposure device and method of separate exposure
JP5217367B2 (ja) フォトマスク及びそれを使用した凸状パターン形成方法
TWI391796B (zh) 曝光裝置及被曝光體
KR101660918B1 (ko) 노광 장치 및 포토 마스크
TWI407246B (zh) 光罩及使用該光罩之曝光方法
TWI512388B (zh) 光罩、使用該光罩之雷射退火裝置及曝光裝置
KR101650116B1 (ko) 노광 장치 및 그것에 사용하는 포토마스크
JP5098041B2 (ja) 露光方法
JP4971835B2 (ja) 露光方法及び露光装置
JP5495135B2 (ja) 凸状パターン形成方法、露光装置及びフォトマスク
JP4773160B2 (ja) 露光装置
TWI548947B (zh) 曝光裝置及光罩
JP4773158B2 (ja) 露光装置
JP5190609B2 (ja) 露光装置及びそれに使用するフォトマスク
TWI490657B (zh) 曝光裝置及其所使用的光罩

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080708

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110614

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110811

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120724

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120918

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20121016

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130115

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20130122

A912 Re-examination (zenchi) completed and case transferred to appeal board

Free format text: JAPANESE INTERMEDIATE CODE: A912

Effective date: 20130208

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130829

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130930

R150 Certificate of patent or registration of utility model

Ref document number: 5382899

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250