KR101286817B1 - 리소그래피용 세정제 또는 린스제 - Google Patents

리소그래피용 세정제 또는 린스제 Download PDF

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Publication number
KR101286817B1
KR101286817B1 KR1020060086563A KR20060086563A KR101286817B1 KR 101286817 B1 KR101286817 B1 KR 101286817B1 KR 1020060086563 A KR1020060086563 A KR 1020060086563A KR 20060086563 A KR20060086563 A KR 20060086563A KR 101286817 B1 KR101286817 B1 KR 101286817B1
Authority
KR
South Korea
Prior art keywords
solvent
butanediol
propylene glycol
agent
alkyl ether
Prior art date
Application number
KR1020060086563A
Other languages
English (en)
Korean (ko)
Other versions
KR20070029570A (ko
Inventor
아끼라 호리구찌
도루 가따야마
Original Assignee
가부시끼가이샤 다이셀
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시끼가이샤 다이셀 filed Critical 가부시끼가이샤 다이셀
Publication of KR20070029570A publication Critical patent/KR20070029570A/ko
Application granted granted Critical
Publication of KR101286817B1 publication Critical patent/KR101286817B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR1020060086563A 2005-09-09 2006-09-08 리소그래피용 세정제 또는 린스제 KR101286817B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00261580 2005-09-09
JP2005261580A JP4588590B2 (ja) 2005-09-09 2005-09-09 リソグラフィー用洗浄剤又はリンス剤

Publications (2)

Publication Number Publication Date
KR20070029570A KR20070029570A (ko) 2007-03-14
KR101286817B1 true KR101286817B1 (ko) 2013-07-17

Family

ID=37858730

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060086563A KR101286817B1 (ko) 2005-09-09 2006-09-08 리소그래피용 세정제 또는 린스제

Country Status (4)

Country Link
JP (1) JP4588590B2 (zh)
KR (1) KR101286817B1 (zh)
CN (1) CN1928725A (zh)
TW (1) TWI406109B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120066227A (ko) * 2010-12-14 2012-06-22 주식회사 동진쎄미켐 포토리소그래피용 세정액 조성물

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02253265A (ja) * 1989-03-28 1990-10-12 Nippon Zeon Co Ltd レジスト剥離剤
JPH0449938A (ja) * 1990-06-15 1992-02-19 Toshiba Corp 内視鏡
JPH10186680A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd リンス液

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000058252A1 (fr) * 1999-03-31 2000-10-05 Daicel Chemical Industries, Ltd. Solvant derive de 1,3-propanediol tres pur, son procede de production et son utilisation
JP2001117242A (ja) * 1999-10-14 2001-04-27 Daicel Chem Ind Ltd リソグラフィー用洗浄剤
JP2001117241A (ja) * 1999-10-21 2001-04-27 Daicel Chem Ind Ltd リソグラフィー用リンス液
AU2003257636A1 (en) * 2002-08-22 2004-03-11 Daikin Industries, Ltd. Removing solution
CN1882880A (zh) * 2003-11-17 2006-12-20 昭和电工株式会社 水性抗蚀剂组合物
JP4626978B2 (ja) * 2004-03-03 2011-02-09 ダイセル化学工業株式会社 リソグラフィー用洗浄剤及びリンス液

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02253265A (ja) * 1989-03-28 1990-10-12 Nippon Zeon Co Ltd レジスト剥離剤
JPH0449938A (ja) * 1990-06-15 1992-02-19 Toshiba Corp 内視鏡
JPH10186680A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd リンス液

Also Published As

Publication number Publication date
TW200717200A (en) 2007-05-01
JP4588590B2 (ja) 2010-12-01
CN1928725A (zh) 2007-03-14
JP2007072332A (ja) 2007-03-22
TWI406109B (zh) 2013-08-21
KR20070029570A (ko) 2007-03-14

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