KR101269566B1 - 프린터블 반도체 구조들 및 관련 제조 및 조립 방법 - Google Patents

프린터블 반도체 구조들 및 관련 제조 및 조립 방법 Download PDF

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KR101269566B1
KR101269566B1 KR1020087000080A KR20087000080A KR101269566B1 KR 101269566 B1 KR101269566 B1 KR 101269566B1 KR 1020087000080 A KR1020087000080 A KR 1020087000080A KR 20087000080 A KR20087000080 A KR 20087000080A KR 101269566 B1 KR101269566 B1 KR 101269566B1
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South Korea
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printable semiconductor
silicon wafer
semiconductor device
recessed features
etching
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KR20080015921A (ko
Inventor
랄프 지. 누조
존 에이. 로저스
에티엔 메나르드
이권재
강달영
유강 선
매튜 메이틀
쳉타오 츄
고흥조
맥 숀
Original Assignee
더 보오드 오브 트러스티스 오브 더 유니버시티 오브 일리노이즈
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Priority claimed from PCT/US2005/019354 external-priority patent/WO2005122285A2/en
Application filed by 더 보오드 오브 트러스티스 오브 더 유니버시티 오브 일리노이즈 filed Critical 더 보오드 오브 트러스티스 오브 더 유니버시티 오브 일리노이즈
Priority claimed from PCT/US2006/021161 external-priority patent/WO2006130721A2/en
Publication of KR20080015921A publication Critical patent/KR20080015921A/ko
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    • H01L21/02697—Forming conducting materials on a substrate
    • G—PHYSICS
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    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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    • H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
    • H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
    • H10D30/475—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
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    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Thin Film Transistor (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Recrystallisation Techniques (AREA)
KR1020087000080A 2005-06-02 2006-06-01 프린터블 반도체 구조들 및 관련 제조 및 조립 방법 Active KR101269566B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
USPCT/US2005/019354 2005-06-02
PCT/US2005/019354 WO2005122285A2 (en) 2004-06-04 2005-06-02 Methods and devices for fabricating and assembling printable semiconductor elements
US11/145,574 US7622367B1 (en) 2004-06-04 2005-06-02 Methods and devices for fabricating and assembling printable semiconductor elements
US11/145,574 2005-06-02
US11/145,542 US7557367B2 (en) 2004-06-04 2005-06-02 Stretchable semiconductor elements and stretchable electrical circuits
US11/145,542 2005-06-02
PCT/US2006/021161 WO2006130721A2 (en) 2005-06-02 2006-06-01 Printable semiconductor structures and related methods of making and assembling

Related Child Applications (1)

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KR1020127032629A Division KR101308548B1 (ko) 2005-06-02 2006-06-01 프린터블 반도체 구조들 및 관련 제조 및 조립 방법

Publications (2)

Publication Number Publication Date
KR20080015921A KR20080015921A (ko) 2008-02-20
KR101269566B1 true KR101269566B1 (ko) 2013-06-07

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KR1020087000080A Active KR101269566B1 (ko) 2005-06-02 2006-06-01 프린터블 반도체 구조들 및 관련 제조 및 조립 방법
KR1020127032629A Active KR101308548B1 (ko) 2005-06-02 2006-06-01 프린터블 반도체 구조들 및 관련 제조 및 조립 방법

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EP (2) EP4040474B1 (enExample)
JP (5) JP5164833B2 (enExample)
KR (2) KR101269566B1 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2925221B1 (fr) * 2007-12-17 2010-02-19 Commissariat Energie Atomique Procede de transfert d'une couche mince
WO2009111641A1 (en) * 2008-03-05 2009-09-11 The Board Of Trustees Of The University Of Illinois Stretchable and foldable electronic devices
KR101004849B1 (ko) 2008-09-02 2010-12-28 삼성전기주식회사 박막소자 제조방법
KR101077789B1 (ko) 2009-08-07 2011-10-28 한국과학기술원 Ｌｅｄ 디스플레이 제조 방법 및 이에 의하여 제조된 ｌｅｄ 디스플레이
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