KR101247491B1 - 광조사 장치 - Google Patents

광조사 장치 Download PDF

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Publication number
KR101247491B1
KR101247491B1 KR1020090121825A KR20090121825A KR101247491B1 KR 101247491 B1 KR101247491 B1 KR 101247491B1 KR 1020090121825 A KR1020090121825 A KR 1020090121825A KR 20090121825 A KR20090121825 A KR 20090121825A KR 101247491 B1 KR101247491 B1 KR 101247491B1
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KR
South Korea
Prior art keywords
lens
light
filter
flesh
frame
Prior art date
Application number
KR1020090121825A
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English (en)
Korean (ko)
Other versions
KR20100091099A (ko
Inventor
마사시 신보리
가즈요시 스즈키
Original Assignee
우시오덴키 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 우시오덴키 가부시키가이샤 filed Critical 우시오덴키 가부시키가이샤
Publication of KR20100091099A publication Critical patent/KR20100091099A/ko
Application granted granted Critical
Publication of KR101247491B1 publication Critical patent/KR101247491B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
KR1020090121825A 2009-02-09 2009-12-09 광조사 장치 KR101247491B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009027048A JP5157945B2 (ja) 2009-02-09 2009-02-09 光照射装置
JPJP-P-2009-027048 2009-02-09

Publications (2)

Publication Number Publication Date
KR20100091099A KR20100091099A (ko) 2010-08-18
KR101247491B1 true KR101247491B1 (ko) 2013-03-29

Family

ID=42595361

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020090121825A KR101247491B1 (ko) 2009-02-09 2009-12-09 광조사 장치

Country Status (4)

Country Link
JP (1) JP5157945B2 (ja)
KR (1) KR101247491B1 (ja)
CN (1) CN101799632B (ja)
TW (1) TWI392975B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6315959B2 (ja) * 2013-12-03 2018-04-25 キヤノン株式会社 被照明面を照明する光学系、露光装置、インプリント装置、デバイス製造方法、および、光学系の製造方法
CN106292189A (zh) * 2015-05-24 2017-01-04 上海微电子装备有限公司 一种照明系统
CN105549339B (zh) * 2016-02-19 2017-08-11 京东方科技集团股份有限公司 一种曝光机及用于曝光机的光学过滤器
JP6674306B2 (ja) * 2016-03-31 2020-04-01 キヤノン株式会社 照明装置、光学装置、インプリント装置、投影装置、及び物品の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003282412A (ja) 2002-03-25 2003-10-03 Ushio Inc 光照射装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61180435A (ja) * 1985-02-06 1986-08-13 Canon Inc 照明光学装置
JPH05127086A (ja) * 1991-11-01 1993-05-25 Matsushita Electric Ind Co Ltd 光強度の均一化方法およびそれを用いた露光装置
JPH07153674A (ja) * 1993-11-30 1995-06-16 Nec Corp 縮小投影露光装置
JPH09171956A (ja) * 1995-12-21 1997-06-30 Nikon Corp 露光装置
JP4310816B2 (ja) * 1997-03-14 2009-08-12 株式会社ニコン 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法
JP2000250226A (ja) * 1999-02-26 2000-09-14 Nikon Corp 露光装置
JP2000277409A (ja) * 1999-03-23 2000-10-06 Nikon Corp 露光装置および照明領域設定装置
WO2000057459A1 (fr) * 1999-03-24 2000-09-28 Nikon Corporation Méthode d'exposition et dispositif correspondant
AU3325500A (en) * 1999-03-24 2000-10-09 Nikon Corporation Position determining device, position determining method and exposure device, exposure method and alignment determining device, and alignment determining method
JP3918440B2 (ja) * 2001-02-09 2007-05-23 ウシオ電機株式会社 照度分布均一化フィルタを備えた光照射装置
JP2002246297A (ja) * 2001-02-20 2002-08-30 Canon Inc 光源装置、その光源装置に用いられるフライアイ・レンズ、その光源装置を有する露光装置
JP2004245912A (ja) * 2003-02-12 2004-09-02 Ushio Inc 光照射装置
JP4503967B2 (ja) * 2003-09-26 2010-07-14 三星電子株式会社 調節フィルタ及び露光装置
JP2008281837A (ja) * 2007-05-11 2008-11-20 Harison Toshiba Lighting Corp 露光装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003282412A (ja) 2002-03-25 2003-10-03 Ushio Inc 光照射装置

Also Published As

Publication number Publication date
TW201030473A (en) 2010-08-16
CN101799632B (zh) 2013-06-19
CN101799632A (zh) 2010-08-11
TWI392975B (zh) 2013-04-11
KR20100091099A (ko) 2010-08-18
JP5157945B2 (ja) 2013-03-06
JP2010182989A (ja) 2010-08-19

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