KR101185718B1 - 고순도 콜로이드실리카의 제조 방법 - Google Patents

고순도 콜로이드실리카의 제조 방법 Download PDF

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Publication number
KR101185718B1
KR101185718B1 KR1020050069221A KR20050069221A KR101185718B1 KR 101185718 B1 KR101185718 B1 KR 101185718B1 KR 1020050069221 A KR1020050069221 A KR 1020050069221A KR 20050069221 A KR20050069221 A KR 20050069221A KR 101185718 B1 KR101185718 B1 KR 101185718B1
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KR
South Korea
Prior art keywords
colloidal silica
chelating agent
aqueous solution
acid
exchange resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020050069221A
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English (en)
Korean (ko)
Other versions
KR20060048901A (ko
Inventor
구니아끼 마에지마
신스께 미야베
마사히로 이즈미
Original Assignee
니폰 가가쿠 고교 가부시키가이샤
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Publication of KR20060048901A publication Critical patent/KR20060048901A/ko
Application granted granted Critical
Publication of KR101185718B1 publication Critical patent/KR101185718B1/ko
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
KR1020050069221A 2004-08-06 2005-07-29 고순도 콜로이드실리카의 제조 방법 Expired - Fee Related KR101185718B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00230610 2004-08-06
JP2004230610A JP3659965B1 (ja) 2004-08-06 2004-08-06 高純度コロイダルシリカの製造方法

Publications (2)

Publication Number Publication Date
KR20060048901A KR20060048901A (ko) 2006-05-18
KR101185718B1 true KR101185718B1 (ko) 2012-09-24

Family

ID=34698046

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050069221A Expired - Fee Related KR101185718B1 (ko) 2004-08-06 2005-07-29 고순도 콜로이드실리카의 제조 방법

Country Status (3)

Country Link
JP (1) JP3659965B1 (https=)
KR (1) KR101185718B1 (https=)
TW (1) TW200619139A (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI681929B (zh) 2011-12-28 2020-01-11 日揮觸媒化成股份有限公司 高純度氧化矽溶膠及其製造方法
CN103771425B (zh) * 2014-01-17 2015-08-19 江西恒隆实业有限公司 利用稻壳灰制备白炭黑的生产工艺
CN103803559B (zh) * 2014-01-17 2015-08-19 江西恒隆实业有限公司 低水份含量的白炭黑加工工艺
JP2017171599A (ja) * 2016-03-23 2017-09-28 高化学技術株式会社 固体触媒、及びその固体触媒を用いたエチレングリコールの製造方法
JP7594864B2 (ja) * 2020-06-05 2024-12-05 株式会社フジミインコーポレーテッド アニオン変性コロイダルシリカの製造方法
CN118270796A (zh) * 2024-03-27 2024-07-02 万华化学集团股份有限公司 一种氟硅酸制氟化氢生产过程中副产硅渣的综合利用方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003514742A (ja) * 1999-11-17 2003-04-22 アクゾ ノーベル エヌ．ブイ． シリカゾルの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5100581A (en) * 1990-02-22 1992-03-31 Nissan Chemical Industries Ltd. Method of preparing high-purity aqueous silica sol
JP3225553B2 (ja) * 1991-10-11 2001-11-05 日産化学工業株式会社 高純度の水性シリカゾルの製造方法
JP2001294417A (ja) * 2000-04-12 2001-10-23 Nippon Chem Ind Co Ltd コロイダルシリカの製造方法
JP4643085B2 (ja) * 2001-09-19 2011-03-02 日本化学工業株式会社 研磨剤用高純度コロイダルシリカの製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003514742A (ja) * 1999-11-17 2003-04-22 アクゾ ノーベル エヌ．ブイ． シリカゾルの製造方法

Also Published As

Publication number Publication date
JP2006045022A (ja) 2006-02-16
TWI357887B (https=) 2012-02-11
JP3659965B1 (ja) 2005-06-15
KR20060048901A (ko) 2006-05-18
TW200619139A (en) 2006-06-16

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