KR101108901B1 - 일정한 최대 효율로 ｒｆ 생성기의 자동-조정을 이용하는개선된 메가소닉 세정 작용 - Google Patents

일정한 최대 효율로 ｒｆ 생성기의 자동-조정을 이용하는개선된 메가소닉 세정 작용 Download PDF

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Publication number
KR101108901B1
KR101108901B1 KR1020057014555A KR20057014555A KR101108901B1 KR 101108901 B1 KR101108901 B1 KR 101108901B1 KR 1020057014555 A KR1020057014555 A KR 1020057014555A KR 20057014555 A KR20057014555 A KR 20057014555A KR 101108901 B1 KR101108901 B1 KR 101108901B1
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KR
South Korea
Prior art keywords
output
generator
input
voltage
coupled
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KR1020057014555A
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English (en)
Korean (ko)
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KR20050097992A (ko
Inventor
존 보이드
앤드라스 쿠티
윌리엄 시
마이클 지 알 스미스
로버트 크놉
토마스 더블유 앤더슨
Original Assignee
램 리써치 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/359,765 external-priority patent/US7053000B2/en
Priority claimed from US10/360,320 external-priority patent/US7033845B2/en
Priority claimed from US10/360,316 external-priority patent/US6998349B2/en
Priority claimed from US10/360,322 external-priority patent/US6995067B2/en
Application filed by 램 리써치 코포레이션 filed Critical 램 리써치 코포레이션
Publication of KR20050097992A publication Critical patent/KR20050097992A/ko
Application granted granted Critical
Publication of KR101108901B1 publication Critical patent/KR101108901B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/0207—Driving circuits
    • B06B1/0223—Driving circuits for generating signals continuous in time
    • B06B1/0238—Driving circuits for generating signals continuous in time of a single frequency, e.g. a sine-wave
    • B06B1/0246—Driving circuits for generating signals continuous in time of a single frequency, e.g. a sine-wave with a feedback signal
    • B06B1/0253—Driving circuits for generating signals continuous in time of a single frequency, e.g. a sine-wave with a feedback signal taken directly from the generator circuit
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B2201/00—Indexing scheme associated with B06B1/0207 for details covered by B06B1/0207 but not provided for in any of its subgroups
    • B06B2201/70—Specific application
    • B06B2201/71—Cleaning in a tank
KR1020057014555A 2003-02-06 2003-12-23 일정한 최대 효율로 ｒｆ 생성기의 자동-조정을 이용하는개선된 메가소닉 세정 작용 KR101108901B1 (ko)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US10/360,316 2003-02-06
US10/359,765 US7053000B2 (en) 2003-02-06 2003-02-06 System, method and apparatus for constant voltage control of RF generator for optimum operation
US10/360,322 2003-02-06
US10/360,320 US7033845B2 (en) 2003-02-06 2003-02-06 Phase control of megasonic RF generator for optimum operation
US10/360,316 US6998349B2 (en) 2003-02-06 2003-02-06 System, method and apparatus for automatic control of an RF generator for maximum efficiency
US10/359,765 2003-02-06
US10/360,322 US6995067B2 (en) 2003-02-06 2003-02-06 Megasonic cleaning efficiency using auto-tuning of an RF generator at constant maximum efficiency
US10/360,320 2003-02-06
PCT/US2003/041226 WO2004071938A2 (en) 2003-02-06 2003-12-23 Improved megasonic cleaning efficiency using auto- tuning of an rf generator at constant maximum efficiency

Publications (2)

Publication Number Publication Date
KR20050097992A KR20050097992A (ko) 2005-10-10
KR101108901B1 true KR101108901B1 (ko) 2012-02-20

Family

ID=32872957

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020057014555A KR101108901B1 (ko) 2003-02-06 2003-12-23 일정한 최대 효율로 ｒｆ 생성기의 자동-조정을 이용하는개선된 메가소닉 세정 작용

Country Status (7)

Country Link
EP (1) EP1590828A2 (zh)
JP (1) JP4602773B2 (zh)
KR (1) KR101108901B1 (zh)
CN (1) CN100401479C (zh)
AU (1) AU2003299889A1 (zh)
TW (1) TWI292985B (zh)
WO (1) WO2004071938A2 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2270838B1 (en) 2009-07-02 2019-06-12 IMEC vzw Method and apparatus for controlling optimal operation of acoustic cleaning
TWI490931B (zh) * 2009-10-05 2015-07-01 Tokyo Electron Ltd 超音波清洗裝置、超音波清洗方法、及記錄有用來執行此超音波清洗方法之電腦程式的記錄媒體
TWI716699B (zh) * 2018-06-29 2021-01-21 施俊名 用於超音波加工器具之超音波頻率調整裝置
CN110801160B (zh) * 2018-08-06 2021-06-18 佛山市顺德区美的电热电器制造有限公司 烹饪装置的控制方法、系统及烹饪装置
CN113578859A (zh) * 2021-08-02 2021-11-02 史荃 一种错相差频式超声波在线灭菌破碎搅拌清洁方法和设备
CN113787050B (zh) * 2021-09-27 2023-08-18 韶关市洁盟超声科技有限公司 一种超声波输出波形可控的超声波清洗机
CN116581067B (zh) * 2023-07-12 2023-09-22 北京东方金荣超声电器有限公司 基于器件湿法处理的兆声波系统的控制方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001346805A (ja) 2000-06-09 2001-12-18 Olympus Optical Co Ltd 超音波手術装置
JP2002543976A (ja) 1999-05-13 2002-12-24 エフエスアイ インターナショナル インコーポレイテッド 超希薄洗浄液を使用して、ミクロ電子基材を洗浄する方法

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JPS6418229A (en) * 1987-07-14 1989-01-23 Oki Electric Ind Co Ltd Super-ultrasonic cleaning device
JP3112542B2 (ja) * 1992-01-24 2000-11-27 オリンパス光学工業株式会社 超音波研磨装置
US5339844A (en) * 1992-08-10 1994-08-23 Hughes Aircraft Company Low cost equipment for cleaning using liquefiable gases
US5601655A (en) * 1995-02-14 1997-02-11 Bok; Hendrik F. Method of cleaning substrates
US5931173A (en) * 1997-06-09 1999-08-03 Cypress Semiconductor Corporation Monitoring cleaning effectiveness of a cleaning system
CA2346240A1 (en) * 1998-10-14 2000-04-20 Delsys Pharmaceutical Corporation Electrostatic sensing chuck using area matched electrodes
US6311702B1 (en) * 1998-11-11 2001-11-06 Applied Materials, Inc. Megasonic cleaner
US6228563B1 (en) * 1999-09-17 2001-05-08 Gasonics International Corporation Method and apparatus for removing post-etch residues and other adherent matrices
US20020049551A1 (en) * 2000-10-20 2002-04-25 Ethicon Endo-Surgery, Inc. Method for differentiating between burdened and cracked ultrasonically tuned blades
US6713022B1 (en) * 2000-11-22 2004-03-30 Xerox Corporation Devices for biofluid drop ejection
US6623700B1 (en) * 2000-11-22 2003-09-23 Xerox Corporation Level sense and control system for biofluid drop ejection devices
US6503454B1 (en) * 2000-11-22 2003-01-07 Xerox Corporation Multi-ejector system for ejecting biofluids
US6706337B2 (en) * 2001-03-12 2004-03-16 Agfa Corporation Ultrasonic method for applying a coating material onto a substrate and for cleaning the coating material from the substrate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002543976A (ja) 1999-05-13 2002-12-24 エフエスアイ インターナショナル インコーポレイテッド 超希薄洗浄液を使用して、ミクロ電子基材を洗浄する方法
JP2001346805A (ja) 2000-06-09 2001-12-18 Olympus Optical Co Ltd 超音波手術装置

Also Published As

Publication number Publication date
JP2006513844A (ja) 2006-04-27
TWI292985B (en) 2008-01-21
CN1759471A (zh) 2006-04-12
EP1590828A2 (en) 2005-11-02
AU2003299889A8 (en) 2004-09-06
JP4602773B2 (ja) 2010-12-22
AU2003299889A1 (en) 2004-09-06
WO2004071938A2 (en) 2004-08-26
KR20050097992A (ko) 2005-10-10
TW200421713A (en) 2004-10-16
WO2004071938A3 (en) 2004-12-29
CN100401479C (zh) 2008-07-09

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