TW200421713A - Improved megasonic cleaning efficiency using auto-tuning of an rf generator at constant maximum efficiency - Google Patents

Abstract

A system and method of cleaning a substrate includes a megasonic chamber that includes a transducer and a substrate. The transducer is being oriented toward the substrate. A variable distance d separates the transducer and the substrate. The system also includes a dynamically adjustable RF generator that has an output coupled to the transducer. The dynamically adjustable RF generator can be controlled by a phase comparison of an oscillator output voltage and a phase of an RF generator output voltage. The dynamically adjustable RF generator can also be controlled by monitoring a peak voltage of an output signal and controlling the RF generator to maintain the peak voltage within a predetermined voltage range. The dynamically adjustable RF generator can also be controlled by dynamically controlling a variable DC power supply voltage.

Description

200421713

1. [Technical Field to which the Invention belongs] The present invention generally relates to a tuning method ', and more particularly, to a method and system for automatically tuning a device. Radio frequency (RF) generator system and square substrate cleaning system, one of which is used to generate RF. [Previous technology] The use of acoustic energy is a highly advanced, non-contact cleaning technology for manufacturing, flat panel displays, and micro-electromechanical systems. (Mems), Micro Opto-Electro-Mechanical ', = MOEMS), etc., to remove small particles from, for example, a semiconductor wafer 2 board. The cleaning process generally requires transmission through a liquid medium to remove particles from the surface of the substrate and clean the surface of the substrate. = 10,000 Hz ultrasonic energy generally ranges from about 700 kHz (07 million hertz (Hz)) to about! .〇MHz (including the frequency range transmission media of 0007 and 10) can be deionized water or several substrate washing agents = and any one or more of combinations thereof. The transmission of sound energy through the liquid medium Mainly through the formation of bubbles from dissolved gas in the liquid medium (herein referred to as a hole button), microfluidics, and the use of improved mass transfer to improve the chemical reaction when the liquid medium is used, or to provide activation energy Promote chemical reactions' to achieve non-contact substrate cleaning.-Figure 1A is a diagram of a typical batch of substrate cleaning system 10. Figure ib Top view of batch substrate cleaning system 10. Tank j 丨 filled with substrates. Medicine strip washing liquid 16. The substrate carrier is deionized and the water is counted (a crystal boat box) to support a batch of substrates 14 to be cleaned. One or more change of IS18A, 18B, 18C to generate the transmitted sound energy transmitted through the washing liquid 16

200421713

15. The relative positions and distances between the substrate 14 and the converters 18, 18β, and 18C are generally fixed from one batch of substrates 14 to another batch of substrates by using the positioning jigs ha and ㈣ of the carrier 12. . With or without the proper chemistry to control the emission energy of particulate re-adhesion, substrate cleaning is achieved through pitting, sonic flow, and enhanced mass transfer (if cleaning chemicals are used). The entire batch of substrate cleaning processes generally requires a long processing time and consumes too much cleaning chemicals16. In addition, it is difficult to achieve consistency and substrate-to-substrate control. In the whole batch and other substrate megahertz ultrasonic processes, there are usually situations such as "shadowing" and "hot spots". The shielding system is generated by reflection of the emitted energy 15 and / or constructive and destructive interference, and is combined with the additional substrate surface area of most substrates 14 and the wall surface of the processing tank. The occurrence of hot spots (mainly due to constructive interference due to the use and reflection of most converters) will also increase with additional multiple substrate surface areas. These key issues are typically addressed by relying on the average effect of multiple reflections of sound energy on the substrate, which results in lower average power to the substrate surface. In order to compensate the lower average power and provide effective cleaning and particle removal, the power to the converter is increased to increase the emission energy by 15 and increase the hole residual and acoustic flow ’, which increases the cleaning efficiency. In addition, the pulsating multi-to-digital converter arrays 1 8 A, 1 8 B, and 1 8 C are used (that is, to provide, for example, an on-time for 20 ms and then an off-time period of 10 ms). Converters 1 8 A, 1 8 B, and 1 8 C can also be operated inconsistently (eg, sequentially activated) to reduce combined reflections and interference. Figure 1C is a conventional RF supply to provide one or more converters.

Page 10 200421713 Five- > Description of the invention (3) Sm, Fig. 30 is a schematic view of Fig. 8c. The adjustable voltage control oscillator mii (vc〇) 2m outputs the signal 33 to the rf generator 34, and the generator 34 outputs the converted signal 35 ° to the signal ΛΛ, and the output signal 36 to the monitor signal 35 of the emissivity sensor 36. Number of converters: change! The correct impedance will change with, for example, the substrate in the carrier 12 "之 # 夕 # #, 0 pitch, and many variables of the distance between the substrate 14 and the converter 18B. Turner 1 8 B 0 f # f / The exact impedance will also change with

: 18 changed by repeated use aging. For example, if the signal 3 «3 3 5 has a frequency of approximately 1 μ Η z bottle, Xuan Yue 1 丨 +, ϋ @ @ ι i frequency, in the deionized water quality of the washing liquid 16 for example, the wavelength is approximately 1 5 mm (〇.〇〇〇 Figure: a 'If the substrate 14 and the carrier 12 m changes, if the substrate 24, 24A is rotated, the impedance will be cycle 35: Γ two to two rate by changing the frequency, so Change signal 33: Adjust the impedance of the converter.-General:

= Is the minimum f rate from 3 to 5 and the emission energy is 15; Once the second work number 38, 032 is generally not adjusted, significant repairs or maintenance are performed. Soil plate Θ washing system When the impedance of the conversion surface is not matched, it is sent from the conversion surface.

200421713 V. Description of the invention (4) Part of the emitted energy 17 (ie, wave) is reflected back to the converter 18B. On the surface of the converter 18B, the reflected energy 17 will hinder the emitted energy 15 which causes constructive and destructive interference. Destructive interference reduces the effective cleaning power of the emitted energy 15 because part of the emitted energy 15 is effectively offset by the reflected energy 丨 7. Therefore, the efficiency of the RF generator 34 is reduced. Constructive interference can cause excessive energy, which can cause hot spots on the surface of the substrate 14 being cleaned. These hot spots can exceed the energy threshold of the substrate 14 and damage the substrate 14. FIG. 1D is a typical converter 18B. Figure 1E is a graph 100 of the energy distribution across converter 18B. The curve 102 is the energy curve emitted across the converter 18 B toward the X axis. Curve 104 is a curve of energy transmitted across converter 18B toward the y-axis. Curve 120 is a curve that emits composite energy across converter 18B toward both the X-axis and the y-axis. The composite energy that is emitted across the converter 18B toward both the X-axis and the y-axis can generally be changed between curve 120 and curve 122, such as known changes (for example, the position of the substrate's aging of the converter 'and the relative rotation of the substrate (Such as the wobble of the converter, etc.) to change the impedance of the converter 18B. The threshold energy level T is a damage threshold for the substrate 14. In general, the maximum power of the RF signal 35 and the emitted energy generated by the converter 18B is reduced to the maximum constructive interference leading to a peak value smaller than the energy threshold T of the substrate 14 (also -That is, the peak value of the curve 1 2 0), to prevent damage to the substrate 14. However, the reduced power of the RF signal 35 and the reduced power of 15 increase the cleaning process time required to achieve the desired cleaning results. In some instances, the reduced power of the signal M and the transmitted energy 15 is not sufficient to remove a certain amount from the substrate 14 Some Muzen particles. As shown, the effective emission energy can be changed to a lower level.

Page 12 200421713 Five "Explanation of the invention (5) (represented by the valley part of the curve 1 2 2), so that the effect of the cleaning process is strictly affected because the effective energy is so low (approximately 3), so it extends from approximately Energy window up to about 17, as shown in terms of energy scale. Converters 1 8 B are generally piezoelectric elements such as crystals. The constructive and destructive interference caused by reflected energy 17 is also A force can be added to the surface of the converter 18B, which is sufficient for the converter 18B to generate a corresponding reflected signal 38. The power sensor 36 can detect the reflected signal 38 reflected from the converter 18B to the RF generator 34. The reflected signal 38 can constructively or destructively hinder the signal 35 output from the generator 34 to further reduce the efficiency of the Rj? Generator 34. Based on the above description, we need a way to provide the RF generator with increased efficiency and emitted acoustic energy An improved megahertz ultrasonic cleaning system that reduces the energy window 'and reduces the possibility of substrate damage. III. [Summary of the Invention] In a broad sense, the present invention provides a dynamic tuning heart generator to To meet these requirements, this dynamically tuned RF generator is often tuned to maintain the resonance between the converter and the transmitted energy from the converter. I should understand that the present invention can be implemented in many ways, including as a process, a device, a system , A computer-readable medium, or a device. Several inventive embodiments of the present invention are described below. One embodiment includes a method for dynamically adjusting the instantaneous resonance frequency of a bit generator to a converter. The method includes changing from an oscillation RF input signal

Page 13 200421713

V. Description of the invention (6) Input the RF to one of the first voltage to one frequency to one frequency and one frequency to measure voltage. Pressure measurement. Will include the step number. When the frequency of the signal is first and the number is not changed, the number and the number are in phase control of a ratio. The output rate control of the second phase converter is controlled by the amount of the frequency, the frequency, and the frequency. The frequency can also be adjusted by the generator. The measurement is from bits. From into. When the signal. The input. A phase-controllable phase-frequency control signal includes one of the rf signal output of the RF generator combined with the rf signal output of the RF generator which measures an input voltage of the RF input signal and is connected to the first When the phase is not equal to the second phase, a frequency control signal is applied to the oscillator including adjusting the measurement power of the first phase to include the measurement power of adjusting the second phase to the frequency control input of the oscillator signal. The frequency control input frequency control signal applied to the vibrator is different from a set point control signal. The first phase includes: if the number is reduced, this step can control the second phase of the signal. The first phase of the vibration target is changed to the RF. Input control signal. Since the first oscillator rate control is dedicated to that rate. When the separation change bit and the second phase 'then the number of the incoming signal between the frequency of the frequency-phase oscillator and the two phases of the integral control every two weeks, a phase is behind the first; if the plus The oscillating position, the frequency signal of the resonance is increased by a second-phase converter to change the signal quantity produced during the measurement period, and the signal is generated. At least one of the parties, the frequency controls two phases, then the frequency of the first phase collar; the frequency control signal, along with the conversion, the frequency control signal may also include an application to the frequency

200421713 Five-Description of Invention (7) Another embodiment includes a system for providing RF to a converter. The system includes an oscillator, an RF generator, and a voltage phase detector. The oscillator has a frequency control input and an RF signal output. The chirp generator has an input to the heart signal output connected to the oscillator and an RF generator output connected to the converter. The voltage phase detector includes a first phase input connected to the 1 ^ signal output of the oscillator, a second phase input connected to the RI generator output, and a frequency control signal output connected. To oscillator frequency control input.

The first phase input can be connected to the RF signal output of the oscillator through a scaling device. The second phase input can be connected to the RF generator output via a scaling device. The frequency control signal output can be connected to the oscillator frequency control input via a control amplifier. The control amplifier may include: a first input 'connected to the frequency control signal output; a second input connected to a set point control signal; and an output connected to the oscillator frequency control input. The RF generator may be an e-type rj? Generator. The converter can be oriented to a target, which is a variable distance from the converter. The converter can be contained in a megahertz cleaning chamber

in. The target may be a semiconductor substrate. The RF generator can operate in the range of about 400-kHz to about 2MHz. Another embodiment includes a converter RF source including a voltage controlled oscillator (VC0), a Class E RF generator, and a voltage phase detector. The VC0 has a frequency control voltage input and an output. The Class E cardiac generator has one input connected to the VCO output and one with a variable impedance '

200421713 V. One of the name converters of invention description (8) R F generator output. The voltage phase detector includes: a first phase input connected to the round-out of the VC0; a second phase input ^ 'connected to the RF generator output; and a voltage control signal output, ,,' to A control amplifier is connected to this VC frequency control voltage input. The control amplifier includes: a first input connected to the voltage control signal output, a second input connected to a setpoint control signal, and an output 'connected to the VC0 frequency control voltage input. ... one embodiment includes a substrate cleaning method that includes applying an RF signal to a converter at a frequency f. The converter is aligned to the substrate i so that the converter radiates an acoustic energy to the substrate at the frequency f. The substrate is moved relative to the converter. The RF signal is dynamically adjusted to maintain a resonance of the acoustic energy. Dynamically adjusting the frequency f may include automatically adjusting the 4 frequency f at each cycle of the RF signal. Moving the substrate relative to the converter may include rotating the substrate. The substrate can also be immersed in a strip cleaning solution. The washing solution may be deionized water. The washing liquid may include one or more of a plurality of washing medicines. The step of dynamically trimming the RF signal to maintain the resonance of the acoustic energy includes maintaining a fixed voltage of the RF signal applied to the converter. An RF generator can apply the RF signal to the converter, and the step of maintaining a fixed voltage of the RF signal applied to the converter includes the following steps: measuring a first voltage of the RF signal; comparing the first A voltage and a desired setpoint voltage; and a control signal is turned into a variable DC power plane

Page 16 200421713 Fifth invention description (9) --- Supply Department, can not adjust the output voltage of one of the variable DC power supply, the variable DC power supply provides! ^ Power to the ^. 产 _ 号 以The step of the resonance of the Hai sound energy includes moving to a frequency f of the RF signal to the converter. An RF generator may apply the evaluation signal to the converter, and the step of dynamically adjusting the frequency f of the evaluation signal applied to the converter includes: measuring a power supply voltage applied to the RF generator; Crossing a peak voltage of an output amplifier included in the RF generator; generating a frequency control signal when the peak voltage is not equal to a selection ratio of the power supply voltage; and applying the frequency control signal to generating the evaluation signal One of the oscillators is one of the frequency control inputs. An RF generator may apply the rf signal to the converter, and the step of dynamically adjusting the frequency f of the RF signal applied to the converter includes inputting an RF input signal from an oscillator to the RF generator And amplify the RF signal in the RF generator. A first phase of an input voltage of the 1 ^ input signal is measured, and a second phase of a voltage of the RF signal output from the comment generator is measured. When the first phase is not equal to the second phase, a frequency control # is generated. The frequency control signal is applied to a frequency control input of the oscillator. -Another embodiment includes a substrate cleaning system including a cleaning chamber, the cleaning chamber including a converter and a substrate. The converter is aligned to the substrate. A variable distance d separates the converter from the substrate. The system also includes: a dynamically adjustable RF generator having an output connected to the converter; and a feedback circuit connected to the adjustable

Page 17 200421713 V. Description of the invention (10) Control input of RF generator. The substrate can be rotated. When the substrate is rotated, the distance d changes about 1/2 the wavelength of the -RF signal output from the bile generator. The attentive adjustable RF generator may include a variable DC power supply having a control input and a DC output connected to the RF generator. The counter circuit may include a first-comparator, which includes a first input A connected to the set-point control signal, a second input connected to the cardiac output of the cardiac generator, and connected to the adjustable RF. One of the control inputs of the generator controls the "No." output. The control input includes a voltage control input on the variable DC power supply section. The movable L adjustable RF generator may include an oscillator, an output state connected to the oscillator, an output amplifier, and a load network. The oscillator has a control # input and an RF signal output. The load network is connected between one output of a 5 ohm output amplifier and the output of the "generator." The feedback circuit may include a peak voltage detector and a second comparator. The peak, detection, A second input can be connected across the output amplifier. The first input of the second comparator 3 is connected to an output of the variable DC power supply; a fourth input is connected to an output of the peak voltage detector. And a second comparator output connected to the control input of the adjustable RF generator. The control input may include the oscillator control signal input. The dynamically adjustable RF generator may include an oscillator and be connected to the One of the RF signal output of the oscillator is an RF generator input. The oscillator has one; rate: control input and an RF signal output. The feedback circuit may include a voltage phase detector. The voltage phase detector may include ·· A first phase input, connected

Page 18 200421713

No. output; a second phase input, connected to the -frequency control signal output, connected to this input. The control input may include the rj? Signal and the RF generator output connected to the oscillator; and the control frequency control voltage input for adjusting the RF generator. The dynamic oscillator has a device connected to one of the amplifiers and the output includes a comparator circuit. The supply voltage source; an output; and a control input RF voltage signal input to the RF output adjusts the RF frequency control. This dynamic can detect the signal output phase. The oscillator generator output generator makes voltage adjustment and the RF generator control signal is input to the oscillator output. The comparator circuit can have a second input through the output amplifier amplifier amplifier. The comparator output and the control input can be adjusted RF. The generator is one of the RF generation detectors. The oscillating voltage phase detection of the RF signal output; and a frequency of the control input input 0 may include: a supply voltage source; a vibration and an RF signal output; a load network connected between the outputs. A peak of the value voltage detector includes: a connection to the connection to the containing the first input, an output amplification at the output amplifier, a feedback circuit, a detector, and a ratio ′ connected to the

One of the peak voltage detectors is an adjustable RF control signal which may include an oscillator and an input, and the feedback device has a frequency controller including a first phase output and a second phase output control signal output. This control input can include the J input of the generator. Connected to the inverting circuit can include the order input and an Rf bit input, connect to, connect to the can include the oscillator, and the converter can include more than two converters. The dynamically adjustable RF generator may include more than two dynamically adjustable cardiac generators, each dynamically adjustable RF generator having one of two or more converters connected

Page 19

200421713

V. Description of the invention (12) The device is oriented to each output of the one. The converter may include: a first converter to an active surface of the substrate; and a second converter to an inactive side of the substrate. An embodiment includes a method for dynamically adjusting an RF generator to convert an inter-resonant frequency. The method includes providing an instantaneous signal to the RF generator from an oscillator, and measuring the band-in and input voltage applied to the RF generator. Measure one of the peak voltages in the RF generator. When the peak voltage is not a ratio selected from one of the power voltages, a frequency control signal is generated. f A frequency control signal is applied to one of the frequency control wheels of the oscillator. 4

Measuring the peak voltage may include measuring the peak voltage of each cycle of the RF input signal. Measuring the peak voltage may include measuring the peak voltage across the output amplifier included in the RF generator. The output amplifier may be a CMOS device, and the peak voltage is equal to a voltage from one drain to one source of the output amplifier. Measuring the power supply voltage applied to the RF generator may include adjusting the measured power supply voltage. Measuring the peak voltage may also include adjusting the measured peak voltage.

The selection ratio of the peak voltage to the power supply voltage may be equal to a range between about 3 to 1 and about 6 to 1. Specifically, the selection ratio of the peak voltage to the power supply voltage may be equal to about 4 to 1 or about 3.6 to 1 —. The method may also include applying at least one of a proportional control signal and an integral control signal to the frequency control signal. The method may also include applying an amplified RF signal output from one of the RF generators to a converter, the converter being oriented to a target, and a distance between the converter and the target being variable. distance.

200421713

One embodiment includes a system for generating RF, one. The oscillator amplifier is another voltage source voltage sense input and output. The output of the generator is amplified by a voltage output; the RF output, an oscillator, a detector, and a comparison RF signal are output. The load network is connected between one output. The device. The comparator power; a second input and a comparator output can also be connected to the output amplifier circuit. The output in the output amplifier peak voltage detector circuit includes: a first 'connected to the peak' connected to the The oscillation is connected to a converter. The load net device has an input connection to an input system. The voltage detector control includes a supply circuit, a peak, and a control signal. The oscillator output and the RF output cross the wheel and are connected to an input signal input to the device. . When a power supply voltage is not equal to a selection ratio of a peak voltage output by the peak voltage detector, the control signal can be output from the comparator by turns. The peak voltage detector may include a first capacitor connected in series with a second capacitor, and a diode connected in parallel with the second capacitor. The first input of the comparator is connected to the supply voltage source via a first scaling device. The peak voltage detector may include a second scaling device. The comparator may include an operational amplifier. The oscillator can operate in a range of approximately 400 kHz to approximately 2 MHz. Another embodiment includes an RF generator system including a supply voltage source, a voltage controlled oscillator (VC0) having a control voltage input and an output, and an output amplifier connected to the vc0 output. It also includes a Class E load network that is connected between one output of the / H output amplifier and one output of the RF generator. A peak voltage detector is connected across the output amplifier. A comparator circuit includes: a first input connected to the supply

200421713 V. Description of the invention (14) The voltage source to be applied; a 箆 -private λ _ cut a first-input, connected to one of the peak voltage detectors _ better output, connected to the VC0 control voltage input, ♦ Don't monitor it equal to the output from the peak voltage detector-peak-about 3 · 6 to 1 production ndb voltage is larger than a μ # control voltage system from the comparator output is turned out a converter system Connected to the RF generator output., ::: The embodiment includes a method for maintaining a fixed input voltage. This method is used to describe the formula of the formula 1 Μ Μ ^ ^ Step: Apply an RF _ from an RF generator ft s the conversion benefit; measure the RF signal M. to

I hope that the voltage of Zhongke + Guangxi, compare the first voltage ^ Rui _ _ sigh and input a control signal to a variable DC power supply, can adjust the variable DC power supply. An output unit that provides the DC power to the lobe generator to measure the voltage may include adjusting the measured first voltage. The π ^ th voltage is a function of one of the impedances of the converter. The impedance for which this transition can change with the transition. The step of changing the distance between the narrow-banded constellation ′ and the two-m voltage and the desired set-point voltage includes the second sign. The edge control signal is approximately equal to a difference between the desired setpoint voltages. Electricity! . Grief period Example control: t 5: The output voltage of the 5DC power supply section may include applying at least one of a product / knife control to the control signal. Talking about the converter converter orientation to a head #, a distance between the converter and the "standard is a variable distance. Another embodiment of the generator includes-a system to generate rf, which contains-biting can be DC Power supply unit and a comparator. The rf generator

Page 22 200421713 Fifth invention description (15) RF output with one of the inputs connected to the converter. The variable% power supply section has a control input and is connected to one of the R f " generators D [output. The comparator includes: a first input connected to a setpoint control signal; a second input connected to the RF generator RF output; and a control signal output 'connected to one of the variable DC power supply sections Voltage control input. The second input is connected to the r F generator RF output by a voltage scaling device. The comparator may also include at least one of a proportional control input and an integral control input. The RF generator may be an E-type rf generator. The voltage of the RF signal is a function of an impedance of the converter. The impedance of the converter changes with a distance between the converter and a converter target. The converter can be contained in a megahertz ultrasonic cleaning chamber. A 5H converter target may be a semiconductor substrate. The comparator can be an operational amplifier. Another embodiment includes a converter RF source, which includes a type E chirp generator, a variable DC power supply, and a comparator. The Class E cardiac device has an _RF output connected to one of the megahertz, one of the ultrasonic transducers in a one megahertz ultrasonic cleaning chamber. The variable% power supply section has a control input and a Dc output connected to one of the RF generators. The comparator includes: a first input connected to a set-point voltage source; a first input 'connected to the RF generator RF output; and a control signal output' connected to one of the variable DC power supply sections Voltage control input. The invention provides the advantage of significantly shortening the cleaning processing time, because the better power acoustic energy can be used without damaging the substrate being cleaned

200421713 V.-Description of the invention (16) (for example, 'no hot spots' will be generated without sound energy). Because of too much acoustic energy applied to the substrate ', the present invention reduces the number of damaged substrates. The auto-tuning RF generator can also automatically adjust process variations, such as different cleaning chemicals, different positions of the substrate, etc., to provide a more flexible and robust cleaning process. ^ Other aspects and advantages of the present invention will be apparent from the following detailed description in conjunction with the accompanying drawings showing principles of the present invention, for example. 4. [Embodiments] Several exemplary embodiments of the "signal" applied to the converter automatically and dynamically adjusted will now be described. Those skilled in the art will appreciate that the present invention may be implemented without some or all of the present invention. The specific details are implemented. As mentioned above, it is very important to increase the cleaning effect, efficiency, and production rate of the substrate cleaning system, while reducing the possibility of damaging the substrate. In short, the demand is due to the continuous reduction in device size and most The fact that the cleaning system is a single substrate cleaning system is aggravated. ^ Figures 2A and 28 show a dynamic single substrate cleaning system 200 according to an embodiment of the present invention. Figure 2A shows this dynamic single substrate cleaning system ~ system 2 0 A side view of the dynamic single substrate cleaning system 200 is shown in FIG. 2B. The substrate 20 2 system is immersed in the strip liquid 204 installed in the cleaning chamber 2 ^. The washing liquid 204 can be removed. Ionized water (]) 1 water) or other cleaning chemicals and their combinations well known in the art., 200421713 V.-Description of the invention (17) 俾 Can be carried out on the substrate 202 During the cleaning process, the substrate 200 can be rotated (for example, in the direction of 20 9A). One or more of the edge rollers 208A, 208B, and 208C can be driven (for example, in the direction of 209B), 俾 / The substrate 202 can be yoke-turned in the direction 209A. The substrate 202 can be rotated at a rate of about 500 RpM. The converter 210 is also included as part of the cleaning chamber 206. The converter 210 can be, for example, a crystal The piezoelectric element can convert the ^ signal 22 to the acoustic energy 2 1 4 emitted to the washing liquid 204. The converter 2 1 can be made of, for example, piezoelectric ceramics, lead-titanate, piezoelectric quartz And a gallium phosphate piezoelectric material, wherein the piezoelectric material is bonded to a resonator such as ceramic, carbide, stainless steel or aluminum, or quartz. As shown in FIG. 2B, the converter 21 can be significantly smaller than the substrate 2 〇2. Smaller converters can be manufactured more cheaply and also provide improved control in a smaller area of the substrate 202 that is impacted by the emitted energy 214 emitted from the smaller converter 210. The substrate 2 〇2 的 Active surface 218 (that is, there is an active element, active element The surface of the component is generally facing the converter 21, 0 / However, in some embodiments, the activation surface 218 may be located on the side of the substrate 2 0 2 opposite to the converter 21 0. When the substrate 202 rotates past the converter 210 At the time, the three edge rolls, 20B, 20C, and 20C maintain the distance between the substrate 202 and the converter 21 about a distance dl. The distance dl can be in the range of only a few millimeters to as much as about 100 mm or more. Distance dl is selected as the distance to match the converter impedance. In one embodiment, "distance" is selected as the resonance distance of the frequency of the emitted energy ^. Alternatively, the frequency of the emitted energy 21 4 may be selected. 200421713 V. Description of the invention (18) The rate ′ is therefore a distance d 1 which is a resonance distance. In any embodiment, in the case of resonance, the minimum reflected energy 216 is reflected from the substrate 202 back to the converter 210. As described above, the reflected energy 2 16 will hinder the emitted energy 214, which will reduce the power efficiency of the RF signal 220 and reduce the cleaning effect (e.g., interference patterns) on the substrate 202. However, the 'substrate 202' will be slightly "swayed" so that the distance between the substrate 202 and the converter 2 10 will be between the first distance dl and the second distance d2 when the substrate 2 is rotated through the converter 2 1 0. Between changes. The difference between the first distance dl and the second distance d2 may be as high as about 0.5 mm (0.020 inch) or even greater. Although the improved edge rollers 208A, 20 8B, 208C and other similar technologies may maintain a more consistent distance d 1 ′ between the substrate 2 0 and the converter 2 10, the improved edge rollers cannot guarantee an absolutely fixed distance. dj, so there will still be a change in distance dl. In addition, the distance between the substrate 200 and the converter 210 may be changed for other reasons (for example, the substrate 202 is disposed within the edge rollers 208A, 208B, 208C, etc.). As will be described in more detail below, a change in the distance between the substrate 2 02 and the converter 2 1 0 will strictly impact the performance and efficiency of the cleaning system 2 0 0. The converter 210 is connected to the RF generator 212. Fig. 2C is a flow chart of the method of operating a 250 Hz auto-tuning rf generator system used in, for example, the megahertz cleaning system 200 illustrated in Figs. 2A and 上述, according to an embodiment of the present invention. In operation 255, the RF generator provides an RF signal 22o to the converter 21o. The heart signal 220 may have a frequency between about 400 kHz and about 2 MHz, but is typically between about 700 kHz and about 1 MHz. The wavelength of the high-frequency sound energy 214 emitted from the converter 210 is in the washing liquid.

200421713 May Day, Description of Invention (19) 20 4γ The length is approximately ι · 5 ιηπι (〇 · 〇〇〇〇〇〇). In operation 260, the distance to the target (such as the substrate 202) changes as the target moves relative to the converter 2 10. When the distance (! 丨 changes, the amount of reflected energy 2 1 6 also changes, because when the distance d 1 changes, the emitted energy 2 1 4 is not necessarily in resonance (that is, the impedance of the converter 2 1 〇 is (Mismatched). In operation 2 70, the rf generator 2 丨 2 is automatically and dynamically adjusted, and the month b often decays the RF signal 220 to correct any impedance mismatch when the distance d 1 changes. Because the transmitted energy The wavelength of 214 is approximately h 5 mmCO. 060 inches), so only a movement of 0.50 mm (0.020 inches) can cause significant impedance changes, thereby generating, for example, as much as 50% of the voltage change and between about 25% and 〇〇 Power variation between 0%. In the case that there is no automatic tuning of the RF generator to compensate for the change in d, the peak energy level of the emission energy 214 must be reduced to a sufficiently low value that the substrate's energy absorption capacity (inter-energy value) does not exceed, 俾Avoid damaging the substrate 2 02 with the peak emission energy 2 1 4. The auto-circle auto-generator 2 1 2 can be automatically tuned to compensate for variations in the distance dl via a law of change. Bian Yilu 杳 # t ⑷. In one embodiment, the peak voltage is detected, and the device 212 is maintained at the impedance-optimized frequency of the RF signal 22 °. In another embodiment, the impedance optimization frequency of the phase of the sustain voltage is maintained. In yet another implementation, electric impedance ^ is optimized. Many embodiments may also be used in conjunction with the soap auto / week #RF generator system. Fig. 3 is a block diagram of an implement system 300 according to the present invention. "Bai Xu ^ Bi Li" with great energy W House students automatic tuning # RF generator 3 〇 2 provides feedback control 200421713 V.-Description of the invention (20) Signal to the voltage controlled oscillator (Vc〇) 3 06 Adjust the frequency of the VCO RF signal 310 output from vc0306. VC0 306 can also be included as part of the RF generator 302. The Dc power supply unit 312 is included in the RF generator 302 'and provides DC power for amplification of the vc RF signal 310 in the generator 302. The auto-tuning RF generator 302 includes an inductor 314 in the input section of the RF generator 302. One or more amplifiers 320 that amplify the vc RF signal 31 are also included in the µ generator 302. In one embodiment, the amplifier 32o is CMOS, and the VCO RF signal 310 is applied to the gate 6. The drain D is connected to a DC biasing guide (bias rai 1) 322 'and the source s is connected to a ground potential guide 324. The peak voltage to the source (peak Vds) detector 3 2 6 is connected across the drain 0 of the amplifier 320 and the source s terminal, and cannot capture the peak voltage drain of the source of the amplifier 32 0. .

The output of the amplifier 320 is connected to the input of a class E load network 330. Class E load network 3 3 0 is used to perform large-scale impedance matching between r ρ source (ie RF generator 302) and RF load (ie converter 33 2), which are well known to those skilled in the art. Functional ordinary components. Class E load network 3 3 〇 Generally includes LC network. The output of the class E load network 33 is connected to the converter wheel. . FIG. 4 is a flowchart of a method operation 400 of an auto-tuning μ generator system 300 according to an embodiment of the present invention at the RF generator 302, which is providing the RF signal 220 to the converter 332f. In operation 405, the DC power source and voltage are measured or detected by the comparator device 340. A voltage divider network 342 may also be included to connect the DC power supply 312 to the comparator device 34.

200421713

The amplitude of each voltage is adjusted or reduced to the level available to the comparator device 34. Proportional, derivative, and integral control can also be included in the comparator device, so the speed and number of control signal changes can be selected. & In operation 410, the peak vds is applied by the peak vds detector 326 and applied to the second input of the comparator device 340. The peak L detector may also include circuitry to adjust or reduce the amplitude of the voltage connected from the peak Vds detector 326 to the comparator device 340 to a level available to the comparator device 34. ’

For example, the DC power supply unit 3 1 2 may output 2000 VDC, and the comparator device 340 can compare 5 VDC signals, so the voltage divider network 342 can adjust the DC power supply voltage from 200 VDC to 5 VDC. (Indicates 200 VDC of comparator device 340). Similarly, the peak Vds detector 326 may include, for example, a scaling device of a voltage divider network, so that the actual peak vds voltage applied to the comparator device 340 is approximately 5 VDC. In operation 4 1 5, the comparator device 3 4 0 compares the peak Vds with the DC power supply voltage originating from the d C power supply section 3 12. If the DC power supply voltage is the peak value Vds of the desired ratio, no correction signal is output from the comparator device, and the method operation continues to return to the above operation 405.

Or 'if the DC power supply voltage is not the peak% 3 of the desired ratio, the method operation continues to operation 4 2 0. In operation 4 2 0, the corresponding correction signal is output from the comparator device 340 to the VCO 306 to adjust the frequency of the VCO output signal 3 1 0, and the method operation continues to return to the operation 4 0 5 described above. The correction signal can adjust the frequency of the VCO RF signal 310 to a higher or lower frequency as required.

Page 29 200421713

The desired ratio of the DC power supply voltage to the peak yds depends on the particular values of the various components in the π generator 302 and the converter 332, and the system that may include the generator 302 and the converter 332 (such as the above) The substrate cleaning system 200 in FIG. 2). In one embodiment, the desired ratio is in the range of about 3: i to about 6: 1, where the peak I is a higher voltage than the Dc power supply voltage. In one embodiment, the desired ratio is approximately 4: 1, and more specifically approximately 3.6: 1, where the peak Vds is approximately equal to approximately 3.6 times the DC power supply voltage. FIG. 5A is a schematic diagram of the peak value detector 3 2 6 according to an embodiment of the present invention. The continuously connected capacitors 5 0 2 and 5 0 4 are connected across the terminal D and the source s of the amplifier 320. The diode 506 is connected in parallel with the capacitor 504. In operation, the capacitor 502 connects the peak Vds of each cycle of the amplified evaluation signal to the capacitor 504. The capacitor 504 stores a peak value L of each cycle of the amplified RF signal output from the amplifier 320. The diode 506 operates on the peak vds and connects the peak Vds to the comparator device 340 via the peak Vds terminal. FIG. 5B is a waveform diagram 55 of the peak voltage detected by the peak voltage detector 326 according to an embodiment of the present invention. When the amplifier device 3 2 0 is executing 'because there are only a few voltage drops across the amplifier 3 2 0, the peak voltage detector 3 2 6 does not detect too much voltage. When the amplifier stops executing, then, the current stored in the inductor and capacitor of the RF generator 30 and the load network 33 () is released to generate a voltage waveform as detected by the peak voltage detector 326 552, 5 5 4, 556. The amplifier 320 series is designed to discharge when the voltage (Vds) across the amplifier 3 2 0 drops to zero.

Page 30 200421713

The road system is subject to any changes in the resonance of the converter 332 (for example, any movement of the beauty relative to the converter 33 2), and this is the result of * ^ soil plate ^ 330 330 ^ ^, χ ^ ^ ^ J; 5 52 ^ ^ ^ ^ ^ ^ 320 / Start execution to build a tuned amplifier circuit. Tuning amplifier = 4 when combined Λ large 1 ^ 2〇 series * is a fairly tune-up class amplifier and wave A. § When out of resonance, the converter 332 may have capacitive reactance or inductance ^^ to cause an increase in capacitive reactance or inductance, which causes the Class E load network 33 to be out of regulation. The offset class E load network 330 results in a waveform 552 or 556 with a peak voltage V3 that is too high or a peak voltage V3 that is too low.

Through extensive experiments and nose calculations, we have found that the peak voltage is a function of the resonance of the conversion gain 332, and the peak L has a resonance ratio that is a function of the components of the RF generating circuit 302 compared to the applied redundant bias. For example, in a general RF generator, compared with the% bias ratio derived from the Dc power supply, the ratio is a peak voltage of about 4 ·· ι, or it is derived from the DC power supply in different ways. A peak value v of about 4 times the bias voltage of 3 1 2 indicates that the converter 332 is in resonance. & 'Fig. 6 is a block diagram of an auto-spectrum mu generating system 600 according to an embodiment of the present invention. The phase P1 of the voltage of the RF signal 31 0 output from the VCO 306 is compared with the phase P2 of the voltage input to the converter 332. If the voltage phases P1 and P2 do not match, a correction signal is applied to the frequency control input of ^ 〇3 06. The rf generator system 600 includes a generator 602. The RF generator 602 can be any type of RF generator familiar to those skilled in the art. The phase detector 604 contains two inputs β 〇 6 and 608. The first and second inputs 606, 608 may also include respective metering circuits 61,

Page 31, 200421713 V. Invention. Explanation (24) 61 2 (for example, voltage divider network P1 and phase P2) are adjusted to;} ^ 目 # # Γ:, the measured signal (for example, phase w α positive main Phase detector 604 and 604 can be familiar with the level of this technique. Phase detection detector, which can input the phase of each branch =, then the device compares the output RF signal of 22 to 5 of the electrical phase. ^. Conventional know-how =., The test formula has been shown * the comparison voltage phase projection 2 can be more simplified ^ the phase into the garden 7 and / a for / A required signal, which is used to adjust VC0 ° The 6 ° -strip Lnt is a flowchart of the method operation of the method for automatically tuning the RF generation system 600 according to one embodiment of the invention. In operation 705, the

The input RF signal 310 of VC0 306 is applied to the RF generator 6 02, and the rf generator 602 amplifies the input RF signal 31 0 and connects the amplified heart signal 22 0 to the converter 3 3 2. In operation 710, the first input 606 is connected to the phase detector 604 of the first phase (p 1) of the voltage of the RF signal 3 1 0 output from the VCO 3 06. In operation 715 ', the second input 608 connects the second phase (P2) of the voltage of the signal input to the converter 332 to the phase detector 604.

In operation 7 2 0, the phase detector compares the phase p 1 with the phase p 2 to determine whether the phase P1 matches the phase P 2. 8A-8C show the relationship between the phases P1 and P2 according to three examples of an embodiment of the present invention. In FIG. 8A, FIGS. 8 to 0 0 show that the phase P1 leads the phase P 2 (for example, the peak of the phase p 1 is located at the time T1 and the peak of the phase P2 is located at the later time T2). This means that the impedance of the converter 332 is not matched, and the converter 332 applies the reflected signal 222 to the RF generator 602. In FIG. 8B, graph 820 shows that phase P1 is behind phase P2 (e.g., phase

Page 32 200421713 V. Explanation of the invention (25) The peak value of P2 is located at time T1, and the peak value of phase P1 is located at the later time T2). This means that the impedance of the converter 3 3 2 is not matched, and the converter 3 3 2 applies the reflected signal 222 to the RF generator 602 again. The reflected signal output by the converter 332 can constructively or destructively block the signal output from the RF generator 602. In FIG. 8C, the graph 850 shows that the phase P1 is equal to the phase P2 (for example, the peaks of the phase P1 and the phase P2 are both located at the time T1). This means that the impedance of the converter 3 3 2 is matched, and the converter 3 3 2 does not apply any reflected signal to the RF generator 602. If phase P1 and phase P2 are equal in operation 720, the method operation continues (repeats) at operation 705. However, if the phase p 1 and the phase P 2 are not equal in operation 7 2 0, the method operation continues to operation 7 3 0. In operation 730, an appropriate control signal is applied to the frequency control input of sVC0306 to adjust the frequency of the RF signal 310 accordingly, and the method operation continues (repeats) at operation 7/5. The control signal applied to the frequency control input of vc〇3〇6 can adjust the frequency to a higher frequency in response to the monthly condition of phase p 丨 leading phase p 2 or the control of the frequency control input applied to VC0 30 6 The signal can be adjusted to a lower frequency in order to respond to the situation that the phase lags behind the phase…, the harmonious RF generator system 600 can also include a control amplifier 62o, and the phase detector 60 The control signal output is adjusted to be correct: control: vc0 30V control amplifier can also include-setpoint input measurement Γ ^ Amplified state 620 can combine setpoint input and phase detection " tether signal input. In this way, VCO RF signal 310 available by

Page 33 200421713 V. Description of the invention (26) The set point is selected, and then the selected set point can be automatically adjusted by the control signal output of the phase detector 604. -The system and method described in Figures 3 to 8C above can auto-tune the RF generators 302, 60 2 at very high calibration speeds (e.g., the mother cycle of the input evaluation signal 3 1 0 will cause subsequent RF signals 3 1 〇 frequency and output r signal 220 correction). Therefore, the frequency of the input Rj? Signal 3 1 0 can be corrected, for example, multiple times during each rotation of the substrate 202, thereby more accurately controlling the acoustic energy 214 applied to the substrate 202. For example, s 'If the substrate 202 rotates 60 times per minute (60 RPM) (ie,' 1 rotation per second) and the RF signal 310 is approximately 1 MHz, the frequency of the RF signal 310 during each rotation of the substrate 202 can be The adjustment is approximately one million times per second (that is, once every microsecond). This increased control of the acoustic energy 2 1 4 applied to the substrate 2 0 means that the average energy can be a minimum energy valley and a maximum energy peak very close to the emitted energy 2 4. Therefore, a higher average energy can be applied to the substrate 202, thereby greatly reducing the cleaning process time and improving the cleaning effect. ° Fig. 9 is a block diagram of an auto-tuning generator system 9 0 0 according to an embodiment of the present invention. This system includes a VCO 3 0 6 connected to the input of an rf generator β q 2. Variable DC power supply The supply unit 9 02 is connected to the RF generator 6 0 2 and provides DC power to the RF generator to amplify the RF signal 310 from the VCO 306. The output of the RF generator 60 2 is connected to the converter 332. General practice The sound energy cleaning system of the prior art focuses on maintaining a fixed net power input to the converter 332 (ie, the transmission power of the RF signal 220 minus the reflected power of the reflected signal 2 2 2). Through experiments, we have found that if

Page 34 200421713

When the voltage is maintained at a fixed voltage, the amplitude of the emission from the converter milk 214 here is qualitatively fixed. In addition, rf 俨 No. 22 is fixed below the energy limit of the substrate m ^ to prevent damage ^ 'At the same time also allows the maximum sound energy 214 to be applied to Figure 10 is an implementation according to the present invention For example, the flowchart of the method operation of the automatic tuning RF generating system 900. In operation 105, the RF generator 602 outputs an RF signal to the converter 332. In operation 1010, the voltage of the rf signal output to the converter 332 is measured and connected to the comparator 904.

In operation 1015, the comparator 904 compares the voltage of the bit signal output from the cardiac generator 602 with the desired setpoint voltage. If the output voltage is equal to the desired setpoint voltage, the method operation continues to operation 〖〇 丨 〇. Alternatively, if the output voltage is not equal to the set-point voltage, the method operation continues to operation 1 0 3 0. In operation 1030, the comparator 904 outputs a control signal to a control input on the variable DC power supply section 902. For example, if the output voltage is too high (ie, greater than the desired setpoint voltage), the control signal will reduce the DC voltage output from the variable DC power supply 902, thereby reducing the amount of amplification generated in the RF generator 602. Gain to reduce the amplitude of the RF signal output by the cardiac generator 6 0 2 ·. Proportional, derivative, and integral control can also be included in the comparator 904, so the speed and number of control signal changes can be selected. Metering circuit 90 6 can also be included to adjust the voltage output from rf generator 6 0 2 to a position that is easier to compare with the setpoint signal

Page 35 200421713 V. Description of Invention (28). For example, the metering circuit 906 can adjust the 200 V RF signal to 5 V for comparison with a 5 V setpoint signal. The metering circuit 906 may include a voltage divider. The metering circuit 906 may also include a rectifier to rectify the voltage of the RF signal 220 output from the rf generator 602 into a DC voltage for comparison with the DC setpoint signal. As described above, the method illustrated in FIGS. 3 to 8C described above can automatically tune the RF generators 30 2, 6 02 at a very high correction speed (for example, the RF signal 310 is tuned once every some period). Conversely, the system and method illustrated in FIGS. 9 and 10 can also automatically tune the RF generator 6 〇2, but tune at a slightly slower rate than that illustrated in FIGS. 3 to 8C, but still have a higher impedance than the converter 332 Possible changes due to the movement of the substrate 2 02 come quickly. The systems and methods illustrated in Figures 9 and 〇 are slightly slower, partly due to the hysteresis included in the variable DC power supply section 902. The systems and methods illustrated in Figures 9 and 10 may be used in conjunction with one or more of the systems and methods illustrated in Figures 3 to 8c above. Thus, the systems and methods shown in Figures 9 and 10 can be used to provide a very broad range of tuning RF generators to the dynamic resonance of the converter 332, while the systems and methods described in Figures 3 to% above can be used To provide very fine control and tuning of the tuned RF generator. ^ FIG. 11 is a diagram of a megahertz ultrasonic module 1 100 according to an embodiment of the present invention. Megahertz ultrasound module 丨 丨 〇〇 may be a material such as the one described in commonly-owned U.S. Patent Application No. 10/2 59,023. 1. sonic substrate processing module

Page 36 200421713

Module ", with an application date of September 26, 2002, which is hereby incorporated by reference for all purposes. The megahertz ultrasonic module 11 〇 includes a substrate processing tank 1 1 〇2 (hereinafter referred to as the slot 1102), and a slot sealing cover 1104 (hereinafter referred to as the sealing cover 1104). The Hertz Ultrasonic Converter 1108 and the Slot Megahertz Ultrasonic Converter 1106 are respectively placed on the sealing cover 11 04 and in the slot II 0 2 'and provide the Megahertz ultrasonic energy for simultaneous processing of the substrate III. 0 activity and back surface. The substrate 丨 丨 丨 〇 is placed in a plurality of driving wheels 1112, and is fixed in place by the substrate stabilizer arm / wheel 114. In one embodiment, the driving device 112 and the positioning rod 1122 are used to% set the substrate stabilizer arm / wheel 1114 to open and close the stabilizer arm / wheel 丨 丨 14 to receive, fix, and release the Mega-Hertz Ultrasonic Sonic module 〖丨 〇〇 the substrate to be processed 111 0. The seal cover 1 1 04 can be placed in the open or closed position by a drive system (not shown) that raises and lowers the seal cover 1 104 and keeps the groove 1 10 2 stationary. Alternatively, the groove 11 2 can be moved to fit the sealing cover 1 104. In the conventional embodiment, the 'substrate stabilization arm / wheel 1 1 1 4 series is designed to fix and support the substrate 丨 丨 丨 0 for processing in a horizontal direction, and allow the substrate 111 0 to rotate. In other embodiments, the substrate is processed in a vertical direction. During processing, the driving wheels 1 丨 丨 2 contact the peripheral edges of the substrate 丨 i 0 and the rotating substrate 111 0. The substrate stabilizing arm / wheel 丨 丨 丨 4 may include a free rotating wheel to allow the substrate 1 1 〇 to rotate, and at the same time support the substrate 111 0 〇 Once the substrate Π10 is set in the groove 110, the groove 11〇2 Will be full of bags

Page 37 200421713

V. Description of the invention (30)

Deionized (D I) water, or a treatment fluid according to the desired treatment chemistry. Once the closed megahertz ultrasonic module is filled with the desired processing fluid, the substrate 111 10 is immersed in it, and the megahertz ultrasonic converter 1106 can be used to guide the megahertz ultrasonic wave. The energy counteracts the surface of the substrate 111 × facing the slot megahertz ultrasonic converter 1106), and the megahertz ultrasonic converter 11 〇8 (guides the megahertz ultrasonic energy to face the desire to seal) by sealing the cover The surface of the substrate 1 1 Q 8 of the megahertz converter 1 1 Q 8) achieves the megahertz ultrasonic processing of the substrate 111 0. Regarding the substrate 1110 immersed in = chemistry, the driving wheel 1112 rotates the substrate 111 ° to ensure that k crosses the activity of the substrate 1 1 10 and the entire surface of the back surface is completely and uniformly treated. In one embodiment, a driving motor 丨 丨 6 is provided to drive the driving wheel 111 2 via a mechanical connector 111 8 (for example, a driving belt, a gear, a key wheel and a chain, etc.). The auto-tuning RF generator system as explained in the above Fig. 3-10 can be connected to one or both of the sealed cover converter 11 and the slot converter 丨 丨 〇 can be on the substrate 1 1 1 0 When rotating, each converter 丨 丨 〇8, 丨 丨 〇6 is fixed and automatically tuned for the dynamic impedance of each converter 108, 1 10. Fig. 12 is the energy distribution across the converter according to an embodiment of the present invention. Fig. 120 ° Compared with the conventional energy window shown by curves 12 and 122, the 'auto-tuning generator will This results in a narrower energy window 丨 2 〇 2 between the curve 丨 2 丨 and the curve 1 2 1 2. Because the energy window is more narrow, the energy window can be moved upward to bring it closer to the energy threshold T of the substrate, thereby providing a more efficient acoustic energy cleaning process.

Page 38 200421713 51. Description of the invention (31) As used herein in conjunction with the description of the invention "means" means +/- m. For example, film 1 uses the special term ^ to expand the range between 225 and 275. I will be even more powerful. An "approximately 250" means that the instruction expressed in the operation of 10 is not required to press two. To all the processes shown in Figs. 4, 7 and the row, and represented by these operations, it is not necessary to implement the present invention.

Although the above-mentioned invention has been described in considerable detail for the purpose of clear understanding, I will understand that certain changes and modifications can be implemented within the scope of the following patent application scope. Therefore, this embodiment is to be considered as illustrative and not restrictive, and the present invention is not limited to the details provided herein, but may vary within the scope and equivalent design of the scope of patent applications below.

Page 39 200421713 Brief Description of the Drawings 5. Brief Description of the Drawings The present invention will be easily understood through the detailed description in conjunction with the accompanying drawings, and the same reference numerals indicate the same structural elements. Figure 1 A is a diagram of a typical batch substrate cleaning system. Figure 1B is a top view of the entire substrate cleaning system. Figure 1C is a schematic diagram of the RF supply of one or more converters for conventional techniques. Figure 1 is a typical converter 8b. Figure 1E is the energy distribution diagram across the converter. 2A and 2B show a dynamic single substrate cleaning system according to an embodiment of the present invention. ^ FIG. 2C is a flow chart of the method operation of a megahertz cleaning system RF generator system such as that described in FIGS. 2A and 2B according to an embodiment of the present invention. A's Automatic Heart Figure 3 is a block diagram of an automatic system according to an embodiment of the present invention. Tuning RF Generation Figure 4 is a flow chart of an auto-tuning RF generator system according to one embodiment of the present invention— ^ |, ^^^. ㈣ “Method operation when the tiger is supplied to the converter. FIG. 5A is a schematic diagram according to the present invention. FIG. 5 of the peak Vds detector of the embodiment is shown in FIG. 5B is the peak value according to one embodiment of the present invention. The waveform of the peak voltage (Vds) detected by the voltage detector. Mbe! Figure 6 is an automatic tuning RF generation according to one embodiment of the present invention.

200421713 Block diagram of simple illustration system. FIG. 7 is a flowchart of the operation of the method for automatically tuning the rf generator system according to an embodiment of the present invention. 8A to 8C show the relationship between the phase P1 and the phase P2 according to three examples of an embodiment of the present invention. FIG. 9 is a block diagram of an auto-tuning RF generator system according to an embodiment of the present invention.

FIG. 10 is a flowchart of the operation of a method for automatically tuning an RF generator system according to an embodiment of the present invention. FIG. 11 is a diagram of a megahertz ultrasonic module according to an embodiment of the present invention. Figure 12 is an energy distribution diagram across a converter according to an embodiment of the present invention. Component symbol description: 1 0 ~ substrate cleaning system U ~ tank 12 ~ substrate carrier

14 ~ substrate 1 5 ~ emitted energy 1 6 ~ washing liquid 1 7 ~ reflected energy 18A, 18B, 18C ~ converter 19A, 19B ~ positioning fixture

P.41 200421713 Diagrams and brief descriptions 24, 24A ~ Substrate 3 0 ~ Outline Figure 32 ~ Voltage controlled oscillator (VC0) 3 3, 3 5 ~ Signal 34 ~ RF generator 3 6 ~ Power sensor 38 ~ Reflection Signal 100 ~ Energy distribution chart 1 0 2, 1 0 4, 1 2 0, 1 2 2 ~ Curve 2 0 0 ~ Megahertz ultrasonic cleaning system 20 2 ~ Substrate 2 0 4 ~ Cleaning solution 2 0 6 ~ Cleaning Capacitors 208A, 2 0 8B, 208C ~ edge rollers 209A, 209B ~ direction 21 0 ~ converter 212 ~ RF generator 214 ~ emitted energy 21 6 ~ reflected energy 2 1 8 ~ activated surface 220 ~ RF signal 222 ~ reflected signal 2 5 0 ~ method operation 25 5, 260, 270 ~ operation

Page 42 200421713 Simple illustration 30 0 ~ Automatic tuning RF generator system 30 2 ~ RF generator 30 6 ~ Voltage controlled oscillator (VCO) 310 ~ RF signal 31 2 ~ DC power supply unit 314 ~ Inductor 3 2 0 ~ amplifier 322 ~ DC bias rail 324 ~ ground potential rail 3 2 6 ~ predictor 3 3 0 ~ type E load network 332 ~ converter 340 ~ comparator device 342 ~ voltage divider network 4 0 0 ~ Method operation 405, 410, 415, 42 0 ~ operation 502, 504 ~ capacitor 5 0 6 ~ diode 5 5 0 ~ waveform diagram 552, 554, 556 ~ voltage waveform 600 ~ RF generator system 602 ~ RF generator 6 0 4 ~ phase detector 6 0 6 ~ first input

Page 43 200421713 Figure-style brief description 608 ~ second input 610, 612 ~ metering circuit 6 2 0 ~ control amplifier 70 5, 710, 715, 720, 73 0 ~ operation 9 0 0 ~ auto-tuning RF generator system 90 2 ~ Variable DC power supply unit 9 0 4 ~ Comparator 906 ~ Metering circuit

I 0 0 5, 1 0 1 0, 1 0 1 5, 1 0 3 0 to operation II 0 0 to 1 million Hz ultrasonic module 1102 to substrate processing tank 11 0 4 to seal cover 11 0 6 to 1 million Hertz Ultrasonic Converter II 0 8 ~ Sealed Cover Mega Hertz Ultrasonic Converter III 0 ~ Substrate

111 2 ~ Drive wheel 111 4 ~ Stabilizer arm / wheel 111 6 ~ Drive motor 111 8 ~ Mechanical connector 11 2 0 ~ Drive 1122 ~ Positioning rod 1 2 0 0 ~ Energy distribution map 1 2 0 2 ~ Energy window 1 2 1 0, 1 2 1 2 ~ curve

Page 44

Claims (1)

200421713 VI. Application Patent Scope 1 · A method for dynamically adjusting the instantaneous resonance frequency of an RF generator to a converter, including the following steps: Inputting an RF input signal to the RF generator from an oscillator; Measuring the RF input signal An input voltage and a first phase; a second phase of a voltage of the RF signal output from the RF generator and connected to a converter input is measured; when the first phase is not equal to the second phase, Generating a frequency control signal; and Apply the frequency control signal to one of the frequency control inputs of the oscillator ° 2. The method for dynamically adjusting the instantaneous resonance frequency of the RF generator to the converter as described in the first item of the patent application scope, wherein the frequency control signal is applied The step of the frequency control input to the oscillator includes combining the frequency control signal with a setpoint control signal. 3. The method for dynamically adjusting the instantaneous resonance frequency of an RF generator to a converter as described in item 1 of the scope of patent application, wherein when the first phase is not equal to the second phase, the step of generating the frequency control signal includes: If the first phase is behind the second phase, the frequency control signal decreases the frequency of the oscillator; if the first phase leads the second phase, the frequency control signal increases the frequency of the oscillator; and if the The first phase is equal to the second phase, so the frequency control signal does not change the frequency of the oscillator. .4. Dynamically adjust the RF generator as described in item 1 of the patent application scope to Page 45 200421713 In which, measuring the first phase and each cycle of the frequency to generate the frequency control method to convert the instantaneous resonance frequency of the second phase, and input a signal signal in the frame. A converter RF source includes: an oscillator having a frequency control input and a signal output; an RF generator having a rain input of the RF signal output connected to the oscillator and one of the converters The output of the RF generator is the same as the voltage phase detector. The voltage phase detector includes: a first = bit turn-in, which is connected to the output of the evaluation signal of the oscillator; a second phase = in ^ Connected to the RF generator output; and-a frequency control signal input, connected to the oscillator frequency control input. The converter RF source according to item 5 of the patent application scope, wherein the M control signal output is connected to the neck rate control input via a control amplifier. 7 丄 ^ The converter RF source according to item 6 of the patent application scope, wherein the control amplifier includes: a first input connected to the frequency control signal output; two second inputs connected to a setpoint control signal; and Output 'is connected to this oscillator frequency control input. M 4 ^ The RF source of the converter as described in claim 5 of the patent scope, wherein the converter is contained in a -megahertz ultrasonic cleaning chamber. 9. A converter RF source containing an electric controlled oscillator (VCQ) with a frequency controlled voltage input Page 46 200421713 An E-type RF generator having one connected to the converter and one of the converters with -variable impedance == and-a voltage phase detector, the voltage phase: wheel out two and phase input, connected to the VC ( ) Of the one, ', and one ws • one is first connected to the RF generator for rotation; and one, the first: the phase input, the flail system cries, and the * pull' voltage control signal is output through one or two To connect to the VC0 frequency control voltage input; the control amplifier includes: one, one input, connected to the voltage control signal output; A second input 'is connected to a setpoint control signal; and an output' is connected to the vc0 frequency control voltage input. 10. A method for cleaning a substrate, comprising the following steps: applying an RF signal to a converter at a frequency f, the converter being aligned to the substrate 'so that the converter radiates to the substrate at the frequency f An acoustic energy; moving the substrate relative to the edge converter, and dynamically adjusting the RF signal to maintain a resonance of the acoustic energy. 11. The method for cleaning a substrate as described in the scope of the patent application, wherein the step of dynamically adjusting the RF signal to maintain the resonance of the acoustic energy includes maintaining a fixed voltage of the RF signal applied to the converter . 12. The method for cleaning a substrate as described in Item 10 of the scope of patent application ', wherein an RF generator applies the RF signal to the converter and maintains a fixed voltage of the RF signal applied to the converter. The steps include the following steps: measuring a first voltage of the RF signal; Page 47 200421713 VI. The scope of the patent application compares the first voltage with a desired setpoint voltage; and a control signal is input to a variable DC power supply unit, which can adjust an output of the variable DC power supply unit Voltage, the variable DC power supply unit provides DC power to the rf generator. 13. The method for cleaning a substrate as described in item 10 of the scope of patent application, wherein the step of dynamically adjusting the RF signal to maintain the resonance of the acoustic energy includes dynamically adjusting a frequency of the RF signal applied to the converter f. 14. The method for cleaning a substrate as described in item 13 of the scope of the patent application, wherein the RF signal is applied by an RF generator and the step of dynamically adjusting the frequency f of the RF signal applied to the converter Including: measuring a power voltage applied to the RF generator; measuring a peak voltage across an output amplifier included in the RF generator; generating a voltage when the peak voltage is not equal to a selection ratio of the power voltage A frequency control signal; and applying the frequency control signal to a frequency control input of an oscillator that generates the RF signal. 15. The method for cleaning a substrate according to item 13 of the scope of the patent application, wherein the RF signal is applied by an rf generator and the step of dynamically adjusting the frequency f of the RF signal applied to the converter The method includes the following steps: inputting an RF input signal to the RF generator from an oscillator, and amplifying the RF signal in the RF generator; measuring a first phase of an input calendar of the RF input signal; measuring from One of the voltages of the RF signal output of the RF generator 200421713 6. Two phases of patent application scope; when the first phase is not equal to the second phase, a frequency control signal is generated; and the frequency control signal is applied to one of the frequency control inputs of the oscillator ° 1 6. A cleaning The system includes: a cleaning chamber 'comprising a converter and a substrate, the converter being Aligned to the substrate, a variable distance d separates the converter from the substrate; a dynamically adjustable RF generator with an output connected to the converter; and a feedback circuit connected to the adjustable RF generator One of the control inputs ° Y ·, ^ The cleaning system described in item 16 of the scope of patent application, wherein the soil can be rotated 'and wherein when the substrate is rotated, the distance d has changed' since the 4RF generator. An RF signal is output at about 1/2 wavelength. 1 8 · The cleaning system as described in item 16 of the patent application, wherein: f The dynamically adjustable RF generator includes: a 4 DC power supply unit with a control input and a DC connected to one of the RF generators. And the feedback circuit includes: a first comparator including: a first input connected to a set-point control signal; a second input connected to the RF output of the RF generator; and 200421713 Sixth, the scope of patent application A control signal is turned out and connected to the adjustable Rf product. Input, the control input is included in the variable]) C power supply or control control input. i 电 β 19. The dynamic adjustable RF generator described in item 18 of the scope of the patent application includes: 'system' where: an oscillator having a control signal input and an R-output amplifier connected to The oscillator turns out, two outputs; a load network connected between the outputs of one of the output amplifiers; and the output and the RF output The feedback circuit includes a peak voltage detector whose connection crosses the output amplifier; and a second comparator including: a third input connected to one of the outputs of the variable DC power supply; The fourth input is connected to an output of the peak voltage detector; the second comparator output is connected to the control input of the adjustable RF generator, and the control input includes the oscillator control signal input . ° · The cleaning system as described in item 18 of the scope of patent application, wherein: the dynamically adjustable RF generator includes: a vibrator with a frequency control input and an RF signal output; connected to two RF generator inputs to The oscillator "signal is output; and the feedback circuit includes: 200421713 on page 50, patent application scope a voltage phase detector, including: a phase input connected to the RF signal output of the ironer; a second phase input connected to the RF generator output; And a frequency control signal output connected to the control input of the adjustable RF generator, the control input including the oscillator frequency control voltage input. 21. The cleaning system according to item 16 of the scope of patent application, wherein: the dynamically adjustable RF generator includes: a supply voltage source; the vibrator 'has a control signal input and an RF signal output; a round-out amplifier, Connected to the oscillator output; a load network connected between an output of the output amplifier and the output of the RF generator; and the 5H feedback circuit includes: a peak voltage picker connected across the output An amplifier; and a comparator circuit, including a first input connected to the supply voltage source; a second input connected to an output of the peak voltage detector; > than the car parent's output 'connection The control input control input to the adjustable RF generator includes the oscillator control signal input. 2 2 · The cleaning system as described in item 6 of the patent application scope, wherein: j the dynamically adjustable RF generator includes: a vibrator 'with a frequency control input and an RF signal output; RF generator input' connection To this oscillator RF signal output; and Page 51 200421713 ----- 6. Scope of patent application The feedback circuit includes: a voltage phase detector, including: a first-phase input, continuous roll-second phase input T, the RF signal output; 1 rate control Signal output, if connected to% =: and 2, a & input contains the frequency control voltage input of the oscillator. • A method for dynamically adjusting the instant of an RF generator to a converter, including the following steps: Beqian provides an RF input signal from an oscillator to the RF generator; measures a power supply voltage applied to the rF generator; A peak ephemeris in the RF generator; when the peak voltage is not equal to a selection ratio of the power supply voltage, generating a frequency control signal; and applying the frequency control signal to a frequency control input of the oscillator 0 24 The method for dynamically adjusting the instantaneous resonance frequency of an RF generator to a converter as described in item 23 of the scope of patent application, wherein the step of measuring the peak voltage includes measuring across an output amplifier included in the r F generator The peak voltage. 2 5 The method of the instantaneous resonance frequency of the dynamic delta-rounding RF generator to the converter as described in item 23 of the scope of the patent application, wherein the selection ratio of the peak voltage to the power supply voltage is equal to about 3 to 1 and A range between about 6 to 1. 26 · —A kind of RF generator, including 200421713 A supply voltage source, an oscillator, an output amplifier, a load network, a control signal input and an evaluation signal output between one of the outputs of the generator; 'connected to the oscillator output; connected to one output of the output amplifier A peak voltage detector is produced with the Rp, connected across the output amplifier; and: the comparator circuit 'includes: a first input, connected to the chalk, a second round-in, and connected to the peak voltage detection One of the device's inputs ... '^ A comparison n output, connected to the control signal input of the oscillator. • According to the RF generator described in item 26 of the patent application scope, when A is equal to one of the peak power output by the peak voltage detector, a control signal is output from the comparator output. 28. An RF generator comprising: a supply voltage source; a voltage controlled oscillator (VC0) output; a control voltage input and an output amplifier connected to the VC0 output; an RF product class / load circuit , Connected between the output * amplification 11-the output and one of the RF generated states output; a peak voltage detector connected across the output amplifier; and prostitute 5 :: comparator circuit 'The comparator circuit contains : -Th-input, connect to ^ supply voltage source; n people, connect to the peak voltage ^ state of the turn-on output; _comparator turn-out, connect to the VC0 control voltage input, the input power voltage is not equal to The peak voltage detector output is one of the peaks 200421713 Six, the patent application range value of about 3.6 to 1 output is output; and a conversion ratio, a control appliance, connected to the RF output 29. A fixed input The voltage to the converter is output from the comparator. The method includes the following steps: Applying an RF signal from an RF generator to the first signal to an output to measure the RF signal and comparing the second signal to the control signal power supply. Change DC provides a function of the DC 30. And its voltage and number are input to the RF production patent range of the application, where the change is changed and the patent range generator number is changed to the converter; Voltage, which can be; and the response section, which can adjust the DC power supply section A distance between the targets 31. If the method is applied to the converter, the step of determining the voltage includes determining a value approximately equal to the 32. The first electric-to-RF converter voltage and the converter RF have a range of 29 It is said that the first voltage is that the impedance of the converter changes with the converter and the head. Compare the desired set source of the control signal, including the first fixed voltage and the desired set point electrical number described in the impedance item of a fixed input voltage converter, and the control signal is a large fixed point. A difference between the voltages. Including: one of the converter's RF outputs; one of the generators; a comparator variable DC power supply unit having a control input and connected to the RF DC output; the comparator includes: a first input connected to a Assume Page 54 200421713 VI. Patent application Fixed-point control signal; a second input connected to the RF generator RF output; and a control signal output connected to a voltage control input on the variable% power supply section. 33 · —A kind of converter RF source, including ... — Class E generator, with one RF output connected to one of the inputs of the one million megahertz ultrasonic transducer in the one million megahertz ultrasonic cleaning valley; A variable DC power supply unit having a control input and a DC output connected to the RF generator; L: Comparator, the comparator includes a first input, connected to-set 2 L, a voltage source and a second input, connected to the RF generator's RF output; connected to the second batch of f signal output ' -Electricity on the variable DC power supply Page 55