JP3112542B2 - Ultrasonic polishing equipment - Google Patents

Ultrasonic polishing equipment

Info

Publication number
JP3112542B2
JP3112542B2 JP04034423A JP3442392A JP3112542B2 JP 3112542 B2 JP3112542 B2 JP 3112542B2 JP 04034423 A JP04034423 A JP 04034423A JP 3442392 A JP3442392 A JP 3442392A JP 3112542 B2 JP3112542 B2 JP 3112542B2
Authority
JP
Japan
Prior art keywords
polishing
ultrasonic
elastic body
vibration
grindstone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP04034423A
Other languages
Japanese (ja)
Other versions
JPH05200659A (en
Inventor
浩之 今林
優 佐伯
毅直 藤村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optic Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optic Co Ltd filed Critical Olympus Optic Co Ltd
Priority to JP04034423A priority Critical patent/JP3112542B2/en
Publication of JPH05200659A publication Critical patent/JPH05200659A/en
Application granted granted Critical
Publication of JP3112542B2 publication Critical patent/JP3112542B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、レンズ、プリズムなど
のガラス研磨において、超音波振動を用いる研磨装置に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing apparatus using ultrasonic vibration in polishing glass such as lenses and prisms.

【0002】[0002]

【従来の技術】レンズまたはプリズムなどのガラス研磨
に超音波振動を用いて研削加工する技術は知られてい
る。この超音波振動による研磨に関する文献としては、
例えば特開昭64−78748号公報がある。この公報
に記載されている技術内容は、公報に示す第1図によれ
ば、円環形の超音波振動体1の上面に電歪材(若しくは
磁歪材)2を接着固定し、この励振振動によって振動体
1に円環を循環する超音波振動の進行波を発生させてい
る。上記円環の超音波振動体1の先端面に放射線状に切
込んだ切欠きを形成して、振動伝播する超音波進行波を
振幅増幡して砥石に伝播し研削振動効果を向上させるよ
うにしている。そのために上記超音波振動体1の先端に
砥石3を固設して被研磨面を圧接にて加工している。
2. Description of the Related Art A technique for grinding a glass such as a lens or a prism using ultrasonic vibration is known. Literature on polishing by ultrasonic vibration includes:
For example, there is JP-A-64-78748. According to the technical content described in this publication, according to FIG. 1 shown in the publication, an electrostrictive material (or a magnetostrictive material) 2 is adhered and fixed to the upper surface of a ring-shaped ultrasonic vibrator 1, and the excitation vibration A traveling wave of ultrasonic vibration circulating in the ring is generated in the vibrator 1. A notch cut radially is formed at the tip end surface of the annular ultrasonic vibrating body 1 so that the amplitude of the ultrasonically propagating ultrasonic wave that propagates and propagates to the grindstone to improve the grinding vibration effect. I have to. For this purpose, a grindstone 3 is fixed to the tip of the ultrasonic vibrator 1 and the surface to be polished is processed by pressing.

【0003】しかし、上記公報による研削装置において
は、進行波の超音波振動によって得られる振幅は、通常
3μm程度(外径φ60 9波長 印加電圧150Vp
−p)であり、大振幅を得るためには波長を大きくした
り、印加電圧を増加させたりしなければならない。しか
し、波長を大きくすれば、振動体の外径が大きくなり、
電圧も200Vp−pを越えるために安全性が大きく問
題となる。従って、従来の進行波の超音波研磨装置は、
振動振幅を小さくして行う精密研磨には適するが、大振
幅を必要とする荒研磨などのには不向きであった。
However, in the grinding apparatus disclosed in the above publication, the amplitude obtained by the ultrasonic vibration of the traveling wave is usually about 3 μm (outer diameter φ609 wavelength, applied voltage 150 Vp
-P), in order to obtain a large amplitude, the wavelength must be increased or the applied voltage must be increased. However, if the wavelength is increased, the outer diameter of the vibrator increases,
Since the voltage also exceeds 200 Vp-p, safety is a major problem. Therefore, the conventional traveling wave ultrasonic polishing apparatus is
Although it is suitable for precision polishing performed with a small vibration amplitude, it is not suitable for rough polishing requiring a large amplitude.

【0004】また、現今の進行波を発生する超音波発生
手段は、圧電素子(電歪材)を一定波長毎に分極方向を
反転させたり、振動体を振幅拡大のため、円環の振動体
の先端に放射状に切込んだ切り欠きを形成したりして、
非常にコスト高となるなどの問題も生じていた。
[0004] The present ultrasonic wave generating means for generating a traveling wave includes a ring-shaped vibrating body for inverting the polarization direction of a piezoelectric element (electrostrictive material) at every predetermined wavelength or for expanding the vibrating body in amplitude. To form a notch radially cut at the tip of the
Problems such as extremely high costs also occurred.

【0005】[0005]

【発明が解決しようとする課題】本発明は、上記問題点
に鑑みてなされたもので、簡単な構成でかつ安価で、荒
研磨から精密研磨まで用途の広い研磨が行える小型の超
音波研磨装置を提供することを目的とするものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has a simple structure, is inexpensive, and is a small ultrasonic polishing apparatus capable of performing a wide range of polishing from rough polishing to precision polishing. The purpose is to provide.

【0006】[0006]

【課題を解決するための手段】本発明は、超音波振動を
用いて研磨を行う超音波研磨装置において、回転自在に
設け、その面上に被研磨物を配設したワーク固定台と、
このワーク固定台上の被研磨物の上面に載置して被研磨
物を研磨するよう構成した研磨砥石と、この研磨砥石の
上面に一体的に設け、上面に中央位置に駆動手段と接続
する研磨軸を設けた弾性体と、この弾性体に埋設され、
自身の超音波振動によって前記弾性体を介して前記研磨
砥石が周方向に往復運動することにより励振し、研磨面
において定在波の面内振動するように設けた積層型圧電
アクチュエータと、この積層型圧電アクチュエータによ
る超音波振動を伝達する研磨液と、を具備したことを特
徴とする超音波研磨装置である。
According to the present invention, there is provided an ultrasonic polishing apparatus for performing polishing using ultrasonic vibration, a work fixing table provided rotatably and having an object to be polished disposed on its surface,
A polishing grindstone configured to be mounted on the upper surface of the object to be polished on the work fixing table to polish the object to be polished, and provided integrally with the upper surface of the polishing wheel, and connected to the driving means at a central position on the upper surface. An elastic body provided with a polishing shaft and embedded in this elastic body,
A lamination type piezoelectric actuator provided so that the polishing grindstone is reciprocated in the circumferential direction through the elastic body by its own ultrasonic vibration to be excited and vibrated in the plane of the standing wave on the polishing surface; And a polishing liquid for transmitting ultrasonic vibrations from the piezoelectric actuator.

【0007】[0007]

【作用】上記構成の超音波研磨装置は、研磨砥石の研磨
面において定在波の面内振動を発生させ、超音波研磨が
行われる。上記積層型圧電アクチュエータの使用によっ
て低電圧で大振幅の振動振幅が得られるため、通常の超
音波研磨に比し研磨量が多く研磨時間が短縮される。面
内振動は研磨砥石だけでなく、研磨液にも伝達され、研
磨砥石に含有された砥粒の超音波振動の作用によって研
磨効果が向上する。また、定在波の超音波発生手段とし
ての前記アクチュエータは、比較的安価に製造でき、大
振幅の超音波の振動発生手段も進行波の超音波研磨手段
に比べ小型に構成できるなどの利点がある。
The ultrasonic polishing apparatus having the above-described structure generates an in-plane vibration of a standing wave on the polishing surface of the polishing grindstone to perform ultrasonic polishing. The use of the above-mentioned laminated piezoelectric actuator allows a large amplitude of vibration to be obtained at a low voltage, so that the polishing amount is large and the polishing time is reduced as compared with ordinary ultrasonic polishing. The in-plane vibration is transmitted not only to the polishing grindstone but also to the polishing liquid, and the polishing effect is improved by the action of the ultrasonic vibration of the abrasive grains contained in the polishing grindstone. Further, the actuator as the standing wave ultrasonic wave generating means has advantages such as that it can be manufactured relatively inexpensively, and the vibration generating means of the large amplitude ultrasonic wave can be made smaller than the ultrasonic polishing means of the traveling wave. is there.

【0008】[0008]

【実施例1】本発明の具体例を図面に基づいて説明す
る。図1は、本発明に係わる超音波研磨装置の実施例1
の要部を示す正面図である。図2は、図1に示すA−A
線よりの上面図である。図に示す符号1は、円環形状で
厚さ5〜10mm、幅3〜8mmに形成された研磨砥石
である。この研磨砥石1は、ダイヤモンド砥粒と金属ボ
ンドあるいはレジボンドが含有構成されている。また、
研磨砥石1の上面には、同径に形成され、青銅、アルミ
合金、ジェラルミン、ステンレスなどの振動伝達の優れ
た材質で積層型圧電アクチュエータの変位を効率よく伝
達する材質により形成された弾性体2が一体的に装着さ
れている。この弾性体2の上面中央位置には、基端を駆
動手段と接続構成された円柱状の研磨軸5が配設し、弾
性体2および研磨砥石1を上下動自在に構成すると共
に、図面に示す矢印(左右)方向に往復運動するように
構成されている。
Embodiment 1 A specific example of the present invention will be described with reference to the drawings. FIG. 1 is a first embodiment of an ultrasonic polishing apparatus according to the present invention.
It is a front view which shows the principal part of. FIG. 2 is a sectional view taken along the line AA shown in FIG.
It is a top view from a line. Reference numeral 1 shown in the figure is an annular grinding wheel having a thickness of 5 to 10 mm and a width of 3 to 8 mm. This polishing wheel 1 is configured to contain diamond abrasive grains and a metal bond or a resist bond. Also,
An elastic body 2 is formed on the upper surface of the grinding wheel 1 with the same diameter and made of a material that transmits vibration of the laminated piezoelectric actuator efficiently, such as bronze, aluminum alloy, duralumin, stainless steel, etc. Are integrally mounted. At the center of the upper surface of the elastic body 2, a column-shaped polishing shaft 5 whose base end is connected to a driving means is disposed, and the elastic body 2 and the polishing grindstone 1 are configured to be movable up and down. It is configured to reciprocate in the indicated arrow (left-right) direction.

【0009】上記弾性体2の上面には、法線方向から一
定角度傾斜した方向に小判形状の溝15と16を形成
し、その溝15と16内の中央にはそれぞれ一定角度傾
斜した方向に変位するように矩形状に構成された積層型
圧電アクチュエータ3,4(10×10−18mm)が
それぞれエポキシ系接着剤で固定装着されている。ま
た、上記積層型圧電アクチュエータ3,4と弾性体2の
上記小判形状の溝との間に生じた間隙には防湿用の樹脂
17,18,19,20がそれぞれ埋設されている。ま
た、上記積層型圧電アクチュエータ3,4は、それぞれ
パラレルに結線し、図示しない駆動回路により交番電圧
を印加し、弾性体2と研磨砥石1とを研磨面6に対して
平行に往復運動(矢印)されるように構成されている。
Oval grooves 15 and 16 are formed on the upper surface of the elastic body 2 in a direction inclined at a certain angle from the normal direction, and the center of each of the grooves 15 and 16 is formed in a direction inclined at a constant angle. Laminated piezoelectric actuators 3 and 4 (10 × 10-18 mm) each having a rectangular shape so as to be displaced are fixedly mounted with an epoxy-based adhesive. Moisture-proof resins 17, 18, 19, and 20 are embedded in gaps formed between the laminated piezoelectric actuators 3, 4 and the oval-shaped grooves of the elastic body 2, respectively. The laminated piezoelectric actuators 3 and 4 are connected in parallel, apply an alternating voltage by a drive circuit (not shown), and reciprocate the elastic body 2 and the polishing wheel 1 in parallel with the polishing surface 6 (arrows). ) Is configured to be.

【0010】研磨砥石1の研磨面(下面)6側には、研
磨砥石1より大径に形成されたワーク固定台8が配設さ
れている。このワーク固定台8の上面には、研磨物であ
るガラス9,10,11がホットメルト接着剤により貼
着固定されている。また、ワーク固定台8の下面中央位
置には、その基端に駆動手段と接続した円柱状のワーク
固定台軸7が装着されて、研磨物9,10,11を均等
に研磨するため、上記研磨軸13とは一定間隔ずれた状
態にて駆動するように配設されている。上記ワーク固定
台8の上方位置には、研磨液供給手段と接続構成された
パイプ13より研磨液14が研磨物(ガラス)9,1
0,11上に噴出するよう構成されている。
On the side of the polishing surface (lower surface) 6 of the polishing grindstone 1, a work fixing base 8 having a larger diameter than the polishing grindstone 1 is provided. Glasses 9, 10, and 11, which are abrasives, are adhered and fixed to the upper surface of the work fixing table 8 by a hot melt adhesive. At the center of the lower surface of the work fixing table 8, a columnar work fixing table shaft 7 connected to a driving means is mounted at the base end thereof to uniformly polish the polished objects 9, 10 and 11. It is disposed so as to be driven in a state of being shifted from the polishing shaft 13 by a predetermined distance. At a position above the work fixing table 8, a polishing liquid 14 is polished with a polishing object (glass) 9, 1 from a pipe 13 connected to a polishing liquid supply means.
It is configured to squirt onto 0,11.

【0011】次に上記構成よりなる本実施例の作用を説
明する。ワーク固定台8上に固設されたガラス9,1
0,11の上面に研磨砥石1および弾性体2を下降し、
ワーク固定台8を6〜300rpmで回転すると共に、
パイプ13より研磨液14をガラス9,10,11上へ
噴出する。続いて、積層型圧電アクチュエータに電圧を
印加する。この印加により、電圧に応じた振動振幅が発
生(印加電圧50Vp−p、駆動周波数25kHzで約
10μmの振幅が発生)する。この発生によるアクチュ
エータ3と4からの超音波振動は、研磨軸5の法線方向
から所定角度傾斜しているため、弾性体2および研磨砥
石1を矢印に示すように円周方向に往復運動し、超音波
振動を励振する。
Next, the operation of this embodiment having the above-described configuration will be described. Glass 9, 1 fixed on work fixing table 8
The polishing wheel 1 and the elastic body 2 are lowered on the upper surfaces of 0 and 11,
While rotating the work fixing table 8 at 6 to 300 rpm,
A polishing liquid 14 is jetted onto the glass 9, 10, 11 from a pipe 13. Subsequently, a voltage is applied to the multilayer piezoelectric actuator. By this application, a vibration amplitude corresponding to the voltage is generated (approximately 10 μm amplitude is generated at an applied voltage of 50 Vp-p and a driving frequency of 25 kHz). Since the ultrasonic vibrations from the actuators 3 and 4 caused by this generation are inclined at a predetermined angle from the normal direction of the polishing shaft 5, the elastic body 2 and the polishing grindstone 1 reciprocate in the circumferential direction as shown by the arrow. Excitation of ultrasonic vibration.

【0012】上記振動によって、ワーク固定台8上のガ
ラス9,10,11の研磨は促進され、ガラス9,1
0,11の研磨面を短時間で所定の表面粗さまで仕上げ
られる。また、研磨砥石1とガラス9,10,11の接
触面間に研磨液が入り込み、研磨砥石1の超音波振動が
研磨液14にも伝達され、研磨液14内の砥粒を高速振
動させることにより一段と研磨が促進される。
The above-mentioned vibration accelerates the polishing of the glasses 9, 10, 11 on the work fixing table 8, and the glass 9, 1
The polished surfaces 0 and 11 can be finished to a predetermined surface roughness in a short time. Also, the polishing liquid enters between the contact surfaces of the polishing grindstone 1 and the glasses 9, 10, and 11, and the ultrasonic vibration of the polishing grindstone 1 is also transmitted to the polishing liquid 14, causing the abrasive grains in the polishing liquid 14 to vibrate at high speed. Thereby, polishing is further promoted.

【0013】上記構成および作用の本実施例によれば、
積層型圧電アクチュエータを用いているため、装置を小
型に製造でき、非共振時においても大振幅が得られやす
く、発熱がほとんど発生しない。また、小型の積層型圧
電アクチュエータを弾性体に接着剤にて固定装着するこ
とだけで装置が構成されるので、非常にコストが安価に
製造できる。また、定在波の面内振動によって研磨を促
進し、通常(従来)の研磨時間に比し、約3分の1に短
縮することができ、研磨面も通常研磨に比し、非常に緻
密に形成できる。また、荒研磨を行う場合は、印加電圧
を100Vp−pまで上げると、振幅が約20μmまで
増加し、荒研磨を行うことができる。また、逆に電圧を
下げると精密研磨が更に緻密に形成できるが、約1μm
の振動幅以下は、超音波による研磨効果が低下してく
る。
According to this embodiment having the above configuration and operation,
Since the laminated piezoelectric actuator is used, the device can be manufactured in a small size, a large amplitude is easily obtained even at the time of non-resonance, and heat is hardly generated. Further, since the device is constituted only by fixing and mounting the small-sized laminated piezoelectric actuator to the elastic body with an adhesive, it can be manufactured at very low cost. In addition, the polishing is promoted by the in-plane vibration of the standing wave, and the polishing time can be reduced to about one third as compared with the normal (conventional) polishing time. The polished surface is also very dense as compared with the normal polishing. Can be formed. In the case of performing rough polishing, if the applied voltage is increased to 100 Vp-p, the amplitude increases to about 20 μm, and rough polishing can be performed. Conversely, when the voltage is lowered, precision polishing can be formed more densely.
If the vibration width is less than or equal to, the polishing effect by the ultrasonic wave decreases.

【0014】[0014]

【実施例2】図3と図4に基づいて本発明の実施例2を
説明する。図3は、本発明に係わる超音波研磨装置の実
施例2の研磨皿の要部を示す正面よりの断面図である。
図4は、図3に示すB−B線よりの上面図である。な
お、図中において上記実施例1と同一部材、同一形状お
よび同一構成についは、同一符号を付し、その説明は省
略する。図に示す符号21は、厚さ5〜10mm、幅3
〜8mmに形成された円環形状の研磨砥石である。この
研磨砥石21は、ダイヤモンド砥粒と金属ボンドあるい
はレジンボンドを含有した構成となっている。この研磨
砥石21の上面には、青銅、アルミ合金、ジュラルミ
ン、ステンレスなどの振動伝達の優れた材質で積層型圧
電アクチュエータの変位を効率よく伝達するように構成
された上記研磨砥石21と同径の弾性体22が一体的に
固設されている
Second Embodiment A second embodiment of the present invention will be described with reference to FIGS. FIG. 3 is a sectional view from the front showing a main part of a polishing plate of an ultrasonic polishing apparatus according to a second embodiment of the present invention.
FIG. 4 is a top view from line BB shown in FIG. In the drawing, the same members, the same shape and the same configuration as those of the first embodiment are denoted by the same reference numerals, and the description thereof will be omitted. Reference numeral 21 shown in the figure indicates a thickness of 5 to 10 mm and a width of 3
It is an annular grinding wheel formed to a size of about 8 mm. The polishing grindstone 21 has a configuration containing diamond abrasive grains and a metal bond or a resin bond. The upper surface of the grinding wheel 21 has the same diameter as the grinding wheel 21 made of a material having excellent vibration transmission, such as bronze, aluminum alloy, duralumin, and stainless steel, so as to efficiently transmit the displacement of the laminated piezoelectric actuator. The elastic body 22 is integrally fixed.

【0015】上記弾性体22には、円周縁辺に所望の深
さで、かつ等間隔に切り欠き23,24,25を形成
し、その切り欠き23,24,25内部に積層型圧電ア
クチュエータ(10×10−18mm)26,27,2
8を接着剤にて接合埋設構成されている。更に、弾性体
22の上記円周縁辺に埋設した積層圧電アクチュエータ
26と27、27と28、28と26間には、中心に植
設した研磨軸5との間を支持固定するためのバー29,
30,31が渡設されている。即ちバー29と30、3
0と31、31と29のそれぞれの間は、扇形状の凹部
32,33,34が形成されて研磨皿を構成されてい
る。上記積層型圧電アクチュエータ26,27,28
は、それぞれにパラレルに結線し、図示しない駆動回路
により交番電圧を印加し、弾性体22を介して研磨砥石
21を矢印にて示す方向に円弧に往復運動するよう構成
されている。その外の構成は、実施例1と同様に付き省
略する。
In the elastic body 22, notches 23, 24, 25 are formed at a desired depth and at equal intervals on the periphery of the circumference, and a laminated piezoelectric actuator (not shown) is formed inside the notches 23, 24, 25. 10 × 10-18 mm) 26, 27, 2
8 is buried by bonding with an adhesive. Further, between the laminated piezoelectric actuators 26 and 27, 27 and 28, and 28 and 26 buried in the peripheral edge of the elastic body 22, a bar 29 for supporting and fixing between the polishing shaft 5 implanted at the center is provided. ,
30 and 31 are provided. That is, bars 29 and 30, 3
Between each of 0 and 31, and 31 and 29, fan-shaped recesses 32, 33, and 34 are formed to constitute a polishing dish. The laminated piezoelectric actuators 26, 27, 28
Are connected in parallel to each other, an alternating voltage is applied by a drive circuit (not shown), and the polishing grindstone 21 reciprocates in an arc in the direction shown by the arrow via the elastic body 22. Other configurations are omitted as in the first embodiment.

【0016】上記構成の本実施例による作用を説明す
る。積層型圧電アクチュエータ26,27,28に電圧
を印加すると、超音波の振動が研磨面6において、円弧
状に往復運動する。このために研磨液14の砥粒が研磨
砥石21とガラス9,10,11の間に取り込み(挿
入)が容易となる。また、弾性体22の円周方向のベン
ディングモードの共振周波数に積層型圧電アクチュエー
タ26,27,28の駆動周波数を合わせることによっ
て、共振時の大きな振動振幅を得ることができる。
The operation of this embodiment having the above configuration will be described. When a voltage is applied to the laminated piezoelectric actuators 26, 27, 28, the vibration of the ultrasonic wave reciprocates in an arc shape on the polishing surface 6. For this reason, the abrasive grains of the polishing liquid 14 are easily taken in (inserted) between the polishing grindstone 21 and the glasses 9, 10, 11. Further, by adjusting the driving frequency of the multilayer piezoelectric actuators 26, 27, 28 to the resonance frequency of the bending mode in the circumferential direction of the elastic body 22, a large vibration amplitude at the time of resonance can be obtained.

【0017】上記構成と作用による本実施例によれば、
精密研磨のときは、非共振の駆動周波数でアクチュエー
タを駆動し、荒研磨のときは、共振の駆動周波数で駆動
することによって、電圧一定で駆動周波数を変化させる
ことのみで荒研磨と精密研磨とを選択して研磨できるの
で非常に能率的である。また、非常にコンパクト化が図
れるなどの利点を有する。
According to this embodiment having the above configuration and operation,
In the case of precision polishing, the actuator is driven at a non-resonant drive frequency.In the case of rough polishing, the actuator is driven at a resonant drive frequency. Is very efficient because it can be selectively polished. In addition, there is an advantage that a very compact design can be achieved.

【0018】[0018]

【発明の効果】上記構成および作用による本発明によれ
ば、研磨砥石の研磨面に定在波の面内振動を発生させる
超音波振動発生手段として、積層型圧電アクチュエータ
を用いるため、低電圧で大振幅の振動が得られる。その
ため、研磨時間の短縮と荒研磨と精研磨の用途別選択が
できる。また、定在波の面内振動は、研磨砥石のみでな
く、研磨液にも伝達されるので砥粒が研磨物と研磨面間
に介在し、研磨効果が向上し、高精度の研磨が短時間に
できる。また、定在波の超音波振動発生手段である前記
アクチュエータが簡単に装着できるので装置が小型に、
かつ安価にできるなどの諸効果を奏する。
According to the present invention having the above configuration and operation, the laminated piezoelectric actuator is used as the ultrasonic vibration generating means for generating the in-plane vibration of the standing wave on the polishing surface of the polishing grindstone. A large amplitude vibration is obtained. Therefore, the polishing time can be shortened, and rough polishing and fine polishing can be selected for each application. In addition, the in-plane vibration of the standing wave is transmitted not only to the polishing grindstone but also to the polishing liquid, so that the abrasive grains are interposed between the polished object and the polished surface, so that the polishing effect is improved, and high-precision polishing is shortened. Can be in time. Further, since the actuator, which is a means for generating ultrasonic vibration of standing waves, can be easily mounted, the apparatus can be reduced in size,
In addition, various effects such as being able to be inexpensive are achieved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係わる超音波研磨装置の実施例1の要
部を示す正面図である。
FIG. 1 is a front view showing a main part of a first embodiment of an ultrasonic polishing apparatus according to the present invention.

【図2】図1に示すA−A線よりの上面図である。FIG. 2 is a top view taken along line AA shown in FIG.

【図3】本発明に係わる超音波研磨装置の実施例2の研
磨皿の要部を示す説明図である。
FIG. 3 is an explanatory diagram showing a main part of a polishing plate of a second embodiment of the ultrasonic polishing apparatus according to the present invention.

【図4】図3に示すB−B線よりの上面図である。FIG. 4 is a top view taken along line BB shown in FIG.

【符号の説明】[Explanation of symbols]

1,21 研磨砥石 2,22,38 弾性体 3,4,26,27,28 積層型圧電アクチュエータ 5 研磨軸 6 研磨面 7 ワーク固定台軸 8 ワーク固定台 9,10,11 研磨物(ガラス) 13 パイプ 14 研磨液 15,16 溝 17,18,19,20 樹脂 23,24,25 切り欠き 29,30,31 バー 32,33,34 凹部 1,21 Polishing whetstone 2,22,38 Elastic body 3,4,26,27,28 Laminated piezoelectric actuator 5 Polishing shaft 6 Polishing surface 7 Work fixing table shaft 8 Work fixing table 9,10,11 Polished material (glass) 13 Pipe 14 Polishing liquid 15, 16 Groove 17, 18, 19, 20 Resin 23, 24, 25 Notch 29, 30, 31 Bar 32, 33, 34 Recess

フロントページの続き (56)参考文献 特開 昭63−114855(JP,A) 特開 昭63−236577(JP,A) 特開 平3−234451(JP,A) 特開 平3−213257(JP,A) 特開 昭64−78748(JP,A) 特開 昭64−20956(JP,A) (58)調査した分野(Int.Cl.7,DB名) B24B 1/04 B24B 7/04 Continuation of the front page (56) References JP-A-63-114855 (JP, A) JP-A-63-236577 (JP, A) JP-A-3-234451 (JP, A) JP-A-3-213257 (JP) , A) JP-A-64-78748 (JP, A) JP-A-64-20956 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) B24B 1/04 B24B 7/04

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 超音波振動を用いて研磨を行う超音波研
磨装置において、 回転自在に設け、その面上に被研磨物を配設したワーク
固定台と、 このワーク固定台上の被研磨物の上面に載置して被研磨
物を研磨するよう構成した研磨砥石と、 この研磨砥石の上面に一体的に設け、上面に中央位置に
駆動手段と接続する研磨軸を設けた弾性体と、 この弾性体に埋設され、自身の超音波振動によって前記
弾性体を介して前記研磨砥石が周方向に往復運動するこ
とにより励振し、研磨面において定在波の面内振動する
ように設けた積層型圧電アクチュエータと、 この積層型圧電アクチュエータによる超音波振動を伝達
する研磨液と、 を具備したことを特徴とする超音波研磨装置。
1. An ultrasonic polishing apparatus for performing polishing using ultrasonic vibration, comprising: a work fixing table rotatably provided, and a work to be polished disposed on a surface thereof; A polishing whetstone configured to polish an object to be polished placed on the upper surface of the polishing whetstone; an elastic body provided integrally with the upper surface of the polishing whetstone, and provided with a polishing shaft connected to a driving means at a central position on the upper surface; A lamination buried in this elastic body and provided so as to be excited by the reciprocating movement of the polishing grindstone in the circumferential direction through the elastic body by its own ultrasonic vibration, and to vibrate the standing wave in the plane on the polishing surface. An ultrasonic polishing apparatus, comprising: a piezoelectric actuator; and a polishing liquid for transmitting ultrasonic vibration by the laminated piezoelectric actuator.
JP04034423A 1992-01-24 1992-01-24 Ultrasonic polishing equipment Expired - Fee Related JP3112542B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04034423A JP3112542B2 (en) 1992-01-24 1992-01-24 Ultrasonic polishing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04034423A JP3112542B2 (en) 1992-01-24 1992-01-24 Ultrasonic polishing equipment

Publications (2)

Publication Number Publication Date
JPH05200659A JPH05200659A (en) 1993-08-10
JP3112542B2 true JP3112542B2 (en) 2000-11-27

Family

ID=12413801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04034423A Expired - Fee Related JP3112542B2 (en) 1992-01-24 1992-01-24 Ultrasonic polishing equipment

Country Status (1)

Country Link
JP (1) JP3112542B2 (en)

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* Cited by examiner, † Cited by third party
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WO2003080293A1 (en) * 2002-03-25 2003-10-02 Kazumasa Ohnishi Lapping device and lapping method
WO2003095144A1 (en) * 2002-05-09 2003-11-20 Kazumasa Ohnishi Lapping device and lapping work method
EP1590828A2 (en) * 2003-02-06 2005-11-02 Lam Research Corporation Improved megasonic cleaning efficiency using auto- tuning of an rf generator at constant maximum efficiency
JP4636905B2 (en) * 2005-03-10 2011-02-23 株式会社ディスコ Whetstone for ultrasonic vibration, ultrasonic vibration processing apparatus equipped with the same, and method for manufacturing ultrasonic vibration whetstone
US20100197205A1 (en) * 2005-06-21 2010-08-05 Kazumasa Ohnishi Grinding device using ultrasonic vibration
JP4918298B2 (en) * 2006-07-12 2012-04-18 Hoya株式会社 Polishing method and polishing apparatus
JP4977416B2 (en) * 2006-07-25 2012-07-18 株式会社ディスコ Grinding equipment and grinding wheel
JP2008194771A (en) * 2007-02-09 2008-08-28 Kyoritsu Seiki Kk Method and device for grinding lens sphere
JPWO2008108463A1 (en) * 2007-03-07 2010-06-17 大西 一正 Polishing tool and polishing apparatus
JP2009247953A (en) * 2008-04-03 2009-10-29 Shizuo Yoshida Ultrasonic cleaning device
JP2013031887A (en) * 2009-11-25 2013-02-14 Kazumasa Onishi Grinding tool
JP5848640B2 (en) * 2012-03-08 2016-01-27 株式会社ディスコ Polishing surface plate and lapping equipment
CN102873595A (en) * 2012-10-12 2013-01-16 上海理工大学 Three-dimensional ultrasonic auxiliary processing device used for optical aspheric-surface grinding
JP2015147262A (en) * 2014-02-06 2015-08-20 株式会社ディスコ grinding method
CN104786153B (en) * 2015-02-03 2023-07-25 浙江工业大学 Reverse ultrasonic-assisted gas-liquid-solid three-phase abrasive particle flow polishing processing method and device
CN104786155B (en) * 2015-02-03 2023-07-25 浙江工业大学 Ultrasonic-assisted gas-liquid-solid three-phase abrasive particle flow polishing processing method and device
CN109500662B (en) * 2018-12-20 2019-11-15 中国人民解放军国防科技大学 Excitation device based on extension formula magnetic current becomes polishing

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