TWI292985B - System and method of dynamically adjusting a rf generator to an instantaneous resonant frequency of a transducer,a transducer rf source and an rf generator - Google Patents

Description

1292985

V. INSTRUCTIONS OF THE INVENTION (1) [Technical Fields of the Invention] The method, the system and the system for tuning a radio frequency (RF) generator, and the automatic tuning of a substrate for a substrate cleaning system Use it - RF generation 2, [Prior Art] Used to make = in the disc 1 as a kind of advanced, non-contact cleaning technology, system (MOEMS) and other equal faces, shells, non-jux, MEMS ( MEMS), Weiguang Electromechanical Smile Cup Team Temple in various states from, for example, semiconductor wafer sound i, with :: Γ. The cleaning process typically involves transporting the megahertz surface through a liquid medium to remove particles and cleaning the surface of the substrate. (ΜΗζ)) The daily wave energy is generally in the frequency range of about 700 kHz (with a transmission of about 7.6 MHz and containing G·7 MHZ and 1·ϋ MHz) and its group: Ionic water or several substrate detergents are made up of bubbles from dissolved gases in a liquid medium: = two are pore erosive flows, and enhanced by chemical reactions such as when used as a liquid medium, or by foot evolution Learn the reaction to achieve the cleaning of the non-contact substrate: Figure 1A is a typical batch of substrate cleaning system: the substrate cleaning system!. The top view. The groove μ is a 2 2 crystal boat phantom support to be cleaned Substrate 14: Converter m8C is generated via the wash roller

Page 9 1292985 V. Invention Description (2) "~~' - 15. The relative positional distance between the substrate 14 and the transducers 18A, 18B, and 18C is generally approximately fixed from one batch of substrates 丨4 to another batch of substrates via the use of the positioning fixtures 19A, 199 that contact and position the carrier 12. The distance from the emission energy with or without proper chemistry to control the re-adhesion of the particles is achieved by pitting, sound flow, and improved mass transfer (if detergents are used) to achieve substrate cleaning. The entire batch cleaning process is generally required. Long processing time and excessive consumption of detergents 丨6. In addition, it is difficult to achieve consistency and substrate-to-substrate control. In the whole batch and other substrate megahertz ultrasonic processes, it is generally like "shadowing" Shadowing) and "hot spots". The masking system is generated by the reflection of the emission energy of 15 and/or the phase length and the destructive interference, and is combined with the additional substrate surface area of the plurality of substrates 14, the wall surface of the processing tank, and the like. The occurrence of hot spots (mainly due to the effects of constructive interference due to the use and reflection of most converters) also increases with additional multiple substrate surface areas. These critical issues are generally addressed by relying on the average effect of multiple reflections of acoustic energy on the substrate, which results in a lower average power to the substrate surface. In order to compensate for the lower average power and provide effective cleaning and particle removal, the power to the converter is increased, thereby increasing the emission energy 丨5 and increasing the hole and sound flow, thereby increasing the cleaning efficiency. In addition, the pulsating multi-converter arrays 18A, 18B, and 18C are used (i.e., provide, for example, to turn the converter on for 20 ms, then turn off the active period of 1 〇 ms). converter. 18A, 18B, and 18C may also be operated inconsistently (e.g., sequentially activated) to reduce combined reflections and interference. Figure 1C is an RF supply of the prior art to provide one or more converters

Page 10 1292985 V. Description of Invention (3) -- Summary of Figure 18A, 18B, and 18C. An adjustable voltage controlled oscillator (vc〇) 32 outputs the signal 33 to the RF generator 34 at a selected frequency. The RF generator 34 amplifies the signal 33 to produce a signal 35 with increased power. The signal is output to the converter 18B. Power sensor 36 monitors signal 35. The converter 18B outputs the emission energy Η. The correct impedance of converter 18B will vary with, for example, the number and spacing of substrates 14 in carrier 丨2 and the distance between substrate 丨4 and converter 丨8β = numerous variables. The correct impedance of converter 18B will also change as converter 18B ages due to repeated use. For example, if the signals 33, 35 have about! The frequency of MHz is, for example, about 15 mm (0.060 Å) in the deionized aqueous medium of the wash solution 16. Therefore, referring again to Fig. 1A', if the position of the substrate 丨4 and the carrier 丨2 is separated and is as small as or less than about 0.5 mm (0.020 Å), the impedance of the converter 18β is substantially falsified only. Further, if the substrates 24, 24A are rotated, the impedance changes periodically. Adjusting the frequency of the vco can adjust the impedance of the converter 18B by changing the frequency to change the wavelength of the signals 33, 3^ and the transmitted energy 15. Generally, the carrier 12 filled with the substrate 14 is placed in the slot u, and the %〇32 is adjusted to change the frequency of the signals 33, 35 with the emission energy 15 until the resistance of the converter 18β is matched, for example, It is represented by the value of the reflected signal 38 ί detected by the power meter 36. Once the VC has been taken. 32 Adjustments to achieve the minimum reflected signal Batch KO 32 will generally not be adjusted unless significant repair or repair is performed on the substrate cleaning system. When the impedance of the field converter 1 8B is not matched, it is transmitted from the converter 丨8β

1292985

A portion of the transmitted energy 17 (i.e., wave) is reflected back to the converter 丨 8B. On the surface of the converter 1 8B, the reflected energy 丨7 hinders the emission energy 15 which causes constructive and destructive interference. Destructive interference reduces the effective cleaning power of the emission energy 丨5 because the partial emission energy 丨5 is effectively offset by the reflected energy 丨7. Therefore, the efficiency of the RF generator 34 is reduced.

Constructive interference can result in excessive energy that can cause hot spots on the surface of the substrate 14 being cleaned. These hot spots can exceed the energy threshold of the substrate 14 and damage the substrate 14. Figure 1D is a typical converter 18B. Figure 1E is an energy profile 100 traversing transducer #18. Curve 1 〇 2 is the energy curve that is emitted across the converter 18B toward the center line. Curve 1〇4 is the energy curve and line that traverses converter 18B toward the y-axis. Curve 12 is a plot of the combined energy of the yaw axis and the y axis across the transducer 18B. The composite energy emitted across the converter 丨8β for both the yaw axis and the y axis can generally vary between curve 120 and curve 122, as is known by variations (eg, substrate position, converter aging, and rotation). The impedance of the converter 18B is changed by the substrate relative to the swing of the converter. The threshold energy level τ is the damage threshold to the substrate 14. In general, the maximum power of the RF signal carrier and the emitted energy 丨5 generated by the output of the converter 1 8 B is reduced such that the maximum constructive interference results in a smaller peak value than the energy threshold τ of the substrate 14 ( That is, the peak of the curve 120) can avoid damage to the substrate 14. However, the reduced power of the RF signal 35 and the transmitted energy 15 increases the cleaning process time required to achieve the desired cleaning result. In some instances, the reduced power of the signal ^ and the emitted energy 15 is insufficient to remove certain portions from the substrate 14. If the target particles are not, the effective emission energy can be changed to a lower level of dirt. 11 1 Page 12 1292985 V. Inventive Note (5) (indicated by the valley of curve 1 2 2) to make the cleaning process The effect is severely affected because the effective energy is so low (about 3) that it results in an energy window extending from about 3 to about 17, as shown by energy scale.

The converter 1 8B is generally a piezoelectric element such as a crystal. The constructive and destructive interference caused by the reflected energy 17 can also add a force to the surface of the converter 18B which is sufficient for the converter 18B to produce a corresponding reflected signal 38. Power sensor 36 can detect reflected signal 38 that is reflected from converter 18B to RF generator 34. The reflected signal 38 can constructively or destructively block the signal 35' output from the RF generator 34 to further reduce the efficiency of the generator 34. In view of the above, we need an improved megahertz ultrasonic cleaning system that provides an increased efficiency of the RF generator and a reduced energy window for the emission of acoustic energy and reduces the likelihood of substrate damage. Third, [invention content]

Broadly speaking, the present invention satisfies these needs by providing a dynamically tuned RF generator. This dynamic tuning generator is often tuned to maintain the converter's resonance with the emitted energy from the converter. It should be understood that the present invention can be implemented in many ways, including as a process, a device, a system, a computer readable medium, or a device. Several inventive embodiments of the invention are described below. One embodiment includes a method of dynamically adjusting the instantaneous resonance frequency of the generator to the converter. The method includes inputting an evaluation letter from an oscillator

Page 13 1292985 V. Invention Note (6) is input to the RF generator. A first phase. The measurement comes from one of the second phases of the pressure. From the input to the converter. When a frequency control signal is generated. One of the frequency control inputs. The first phase is measured to be compressible. The second phase is measured to be compressible. The frequency control signal can include adjusting the frequency control. The step of controlling the frequency control signal can also include combining the numbers. The step of the first phase unequal signal may include: if the frequency control signal lowers the first phase, the frequency and if the first phase coefficient does not change the frequency of the oscillator and a target One of the first phase and the first phase of the RF input signal is a proportional control signal and a rate control signal is measured by one of the RF input signals. The RF signal output is connected, and when the phase is not equal to the second phase, the frequency control signal is applied to the oscillator, and the measuring the power including adjusting the first phase comprises adjusting the measured electrical application of the second phase The frequency to the oscillator controls the input signal. The frequency control input frequency control signal applied to the oscillator and a set point control signal are equal to the second rate control signal of the first oscillator. The transition changes and the two phases are integrated. When the phase is integrated, the phase is generated after the phase is integrated. If the phase is increased by the phase, the converter changes. It is measured and generated. The frequency of the first phase pilot is at least the phase of the signal, and the frequency control signal may also include a frequency applied to the frequency control signal.

Page 14 1292985 V. INSTRUCTIONS (7) ----------- Another embodiment includes a system for providing RF to a converter = ;=,:RF generator, and -voltage phase detection ν 八 has a frequency control input and an RF signal output. The generating is coupled to one of the RF signal output inputs of the oscillator and to one of the RF converter outputs of the f 2 converter. The voltage phase detector includes: a first phase input coupled to the evaluation signal output of the oscillator, a second phase input coupled to the RF generator output; and an output 1 connected to the oscillator Frequency control input. The sheep control controls the first phase input to be coupled to the RF signal output of the oscillator via a scaling device. The second phase input can be connected to the RF generator output via a scaling device. The "Hai frequency control signal output can be coupled to the oscillator frequency control input via a control amplifier. The control amplifier can include a first input v = 丄 connected to the frequency control signal output, a second input coupled to a no-point control signal, and an output coupled to the oscillator frequency control input. The RF generator can be an e-class rf generator. The converter can be aligned to a target that varies from one of the converters. The converter can be contained in a one million Hz ultrasonic cleaning chamber. The target can be a semiconductor substrate. The heart generator can operate in the range of approximately 40 0 kHz to approximately 2 MHz. Another embodiment includes a converter RF source including a voltage controlled oscillator (VCO), a class E RF generator, and a voltage phase detector. The VCO has a frequency control voltage input and an output. The class E generating appliance has an input connected to the VCO output and is connected to have a varying impedance

Page 15 1292985

The first phase input of the converter of the Kf generator output field electric phase detector is connected to the output of the vco; the input is connected to the output of the generator; and a voltage control; Rrvc ° frequency control power (four) the control output ^ 入 into one: 入 into 'the connection to the power control signal input, the first input, connected to a set point control signal; and an output 'connected to the VC 0 frequency Control voltage input.

One embodiment includes a method of cleaning a substrate that includes applying an RF signal to a converter at a frequency f. The converter is aligned to the substrate ' to cause the converter to emit an acoustic energy to the substrate at the frequency f. The substrate moves relative to the converter. The RF signal is dynamically adjusted to maintain resonance of one of the acoustic energy. ^ w Dynamically adjusting the frequency f may include automatically adjusting the frequency f during each cycle of the RF signal. Moving the substrate relative to the converter can include rotating the substrate.

The substrate can also be immersed in a wash solution. The washing liquid may be deionized water. The wash liquor may comprise one or more of a plurality of wash drugs. The step of dynamically adjusting the RF signal to maintain the resonance of the acoustic energy includes maintaining a fixed voltage of the RF signal applied to the converter. An RF generator can apply the rf signal to the converter, and the step of maintaining a fixed voltage of the RF signal applied to the converter includes the following steps: measuring a first voltage of the RF signal; comparing the a first voltage and a desired set point voltage; and inputting a control signal to a variable DC power supply

Page 16 1292985 V. INSTRUCTIONS (9) The supply unit can adjust the output voltage of one of the variable DC power supply units, and the variable DC power supply unit supplies power to the evaluation generator. The step of dynamically adjusting the RF signal to maintain the resonance of the acoustic energy includes dynamically adjusting a frequency f of the RF signal applied to the transducer. An RF generator can apply the rf signal to the converter and dynamically adjust, the step of adding the frequency f of the RF signal to the converter includes 'measuring a supply voltage applied to the RF generator; measuring the cross Crossing a peak voltage of one of the output amplifiers included in the RF generator; generating a frequency control signal when the peak voltage is not equal to a selection ratio of the power supply voltage; and applying the frequency control signal to generate the evaluation signal One of the oscillators is a frequency control input. An RF integer is applied to one of the first phase voltages in an oscillator generator to produce one frequency of the other frequency chamber and the other chamber is aligned. The conversion generator can convert the RF signal to an RF signal and measure the second phase rate control signal to control the substrate. The RF of the RF is entered into the signal number. The measurement comes from ° when the number. The entry. Including a chamber comprising a variable: an output of an actuator; the system also includes a "number applied to the converter, and the step of dynamically frequency-modulating the frequency f includes inputting from the input to the RF generator and amplifying the RF When one of the rf signal outputs of the RF generator is one of the RF input signals and the first phase is not equal to the second phase, the frequency control signal is applied to the cleaning system of the oscillating seed substrate, which includes a Clearing a converter and a substrate. The converter is coupled to the substrate and the substrate is conditioned by an adjustable RF generator having a connection and a feedback circuit coupled to the adjustable

1292985 V. Description of the Invention (ίο) One of the RF generators controls the input. The substrate can be rotated. When the substrate is rotated, the distance d changes about 1/2 wavelength from the RF signal output of one of the RF generators. The dynamically adjustable RF generator can include a variable DC power supply having a control input and a DC output coupled to one of the RF generators. The feedback circuit can include a first comparator including a first input coupled to a set point control signal, a second input coupled to the RF output of the RF generator, and coupled to the adjustable RF generator One of the control inputs controls the signal output. The control input includes a voltage control input on the variable DC power supply. Including one device can be controlled by the third input four-input comparator. The output state can be adjusted with an RF. The voltage state can be adjusted to generate one of the output amplifier signal inputs. One of the RF output devices can output one of the output signals. The packet and the signal are transmitted to the RF detector to pass the peak to the oscillator to be input to the oscillator. This counter can be wrapped. The vibrating network is the comparator between the outputs. . One of the wheels of the second supply unit is wheeled in. For the connection and the input device, there is a power supply, a phase of the inverter output, and a control. The output feedback circuit can be used for voltage detection, including: one out; one second and one second round. The momentum Is R F letter controls the wheeled detector. The peak voltage connection is traversed, connected, connected to the output, and the connection can include the entire RF generation signal output. Phase detection includes a recovery of a load network. The comparator and the second output amplifier are converted to a DC power supply voltage detection to adjust the RF control signal to include an oscillation. The vibrating circuit can include: a first to the oscillating device connected to the . The inverse of the peak comparator is outputted, and the control is applied to the frequency of the oscillator.

1292985 V. INSTRUCTIONS (11) The RF signal output to the oscillator. _ The RF generator output; and 1 rate control; = input adjusts the control wheel of the RF generator. Two rounds, frequency control voltage input. 4 control wheel input can be included in the dynamic adjustable RF generator can be packaged - with - control signal wheeled and connected to the oscillator output; - output, one of the output and the RF generated The 兮j road, the connection containing the connection traverses the output between the two. The comparator circuit. The comparator circuit can be: peak: voltage is supplied to the supply voltage source; a second input is supplied; output, output; and a comparator output is connected to the value voltage control input. The control input can include the = the dynamic adjustable RF generator can include a rf RF signal output, rf generation, state, _ _ Wang Gonghan, and the error-voltage phase detector. This oscillator has a signal output. The voltage phase detector comprises: a, the RF signal connected to the oscillator, and the RF generator output; and 4; control = to input the control input of the fF generator. This control input can include a frequency control voltage input. The j匕 converter can contain more than two converters. The dynamic benefit can include more than two dynamically adjustable generators with connections to more than two =

The 19th page of the I surface is connected to the connection to the voltage source of the oscillator; the output of the oscillator is amplified, and the feedback circuit of the output can measure the ratio of the target to the generator, and is connected to the generator of the detector. Number input. The connection to the oscillating circuit can include an input and an RF bit input, connected to each of the outputs connected to the one of the dynamics of the oscillatory state, which can be included in the oscillatory state, 1292985, invention description (12). The converter can include: a first converter sized to an activation surface of the substrate; and a second converter aligned to one of the inactive sides of the substrate. One embodiment includes a method of dynamically adjusting the instantaneous frequency of the generator to the converter. The method includes providing an RF input h from an oscillator to the RF generator and measuring a supply voltage applied to the RF generator. One of the peak voltages in the RF generator is measured. A frequency control signal is generated when the peak voltage is not equal to one of the supply voltage selection ratios. The frequency control is applied to one of the oscillator's frequency control inputs. Measuring the peak voltage can include measuring the peak voltage for each period of the evaluated input signal. Measuring the peak voltage can include measuring the peak voltage across the output amplifier included in the RF generator. The output amplifier can be a CMOS device and the peak voltage is equal to a voltage from one of the drains of the output amplifier to a source. Measuring the supply voltage applied to the RF generator can include adjusting the measured supply voltage. Measuring the peak voltage can also include adjusting the measured peak voltage. The selection ratio of the peak voltage to the supply voltage can be equal to a range between about 3 to 1 and about 6 to 1. Specifically, the selection ratio of the peak voltage to the power supply voltage may be equal to about 4 丨 or about 36 to 1. The method can also include applying at least one of a proportional control signal and an integral control signal to the frequency control signal. The method can also include applying an amplified RF signal output from one of the RF generators to a converter that is aligned to a target, a distance between the converter and the target being a variable distance.

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Another embodiment of the package - voltage source, - oscillator, - 浐 f ^ 糸 ^ it contains - supply voltage detector and a ratio of ΐ = amplification, - negative 1 network, - peak. Quarter parent circuit . The vibrator has a control for the load. The output amplifier is coupled to the oscillating "earth unit; the output-output amplifier. The comparator circuit scoop, Detect: 1 connection across the output; and - the connection to the peak (four) detector - the input «F 产生^ ώ ίτ = 'Connect to the (four) device control signal input. The output of the 玍w 玍w can also be connected to a conversion cry. The value is output from the peak of the peak output of the voltage detector. The peak voltage is: the crying 3 signal can be output from the comparator by a first lightning test, and VW, DD can include a series connection with a second capacitor.兮t and one of the two connected in parallel with the second capacitor are connected to the supply voltage ^. The device is scaled via a -first scaling device. The detector may comprise a second . , , λλ t„ and may additionally comprise an operational amplifier. The oscillator may operate in a range of from about 40 " Hz to about 2 MHz. Contains a lion generator system, which includes - supplied one E: gland; output between the output of the RF generator - the first input, connected to the supply ^ A , 〇 - , t Λ //'

1292985 V. Invention description (14) should be the voltage source; out; the younger one input, connected to the peak voltage detector is turned out than the parent device, connected to the VCO control voltage input, v, one of the wheel output When the voltage of the large source voltage is not equal to the ratio of about 3.6 to 1 detected by the peak voltage, a control voltage is output from the comparator wheel. A converter is coupled to the RF generator output. wheel

One embodiment includes a method of maintaining a fixed input voltage to a converter. The method includes the steps of: applying an RF signal from the RF generator to the converter; measuring a first voltage of the RF signal; comparing the first voltage to a desired set point voltage; and inputting a control signal to the The variable DC power supply unit is configured to adjust an output voltage of the variable DC power supply unit, and the variable DC power supply unit supplies the dc power to the RF generator. Measuring the first voltage can include adjusting the measured first voltage. The first voltage is a function of one of the impedances of the converter. The impedance of the converter can vary as a function of distance between the converter and a target. The step of comparing the first voltage to the desired set point voltage includes determining a control signal. The control signal is approximately equal to a difference between the first voltage and the desired set point voltage.

Adjusting the output voltage of the variable DC power supply may include applying at least one of a proportional control and an integral control to the control signal. The method can also include aligning the converter to a target, a distance between the converter and the target being a variable distance. Another embodiment includes a system for generating RF that includes an RF generator, a variable DC power supply, and a comparator. The RF generator

Page 22 1292985 V. Description of the invention (15) has one of the inputs connected to one of the converters. The variable power supply has a control input and a DC output connected to the one of the turns generators. The comparator includes: a first input coupled to a set point control signal; a second turn in 'connected to the RF generator RF output; and a control signal output 'connected to the variable DC power supply A voltage control input. The second input is coupled to the RF generator RF output by a voltage scaling device. The comparator can also include at least one of a proportional control input and an integral control input. The RF generator can be a £ core generator. The voltage of the RF signal is a function of one of the impedances of the converter. The impedance of the converter changes as a distance between the converter and a converter target changes. The converter can be contained in a one million Hz ultrasonic cleaning chamber. The 谠 converter target can be a semiconductor substrate. The comparator can be an operational amplifier. Another embodiment includes a converter core source that includes a class of evaluations, a variable DC power supply, and a comparator. The Class E evaluation has one of the input inputs of one of the one million Hz super chopper converters connected to a one million Hz ultrasonic cleaning chamber. The variable power supply has a control input and an output connected to one of the RF generators. The ratio J includes a first input A connected to a set point voltage source, a first input coupled to the RF generator RF output, and a control signal output coupled to the variable DC power supply One of the voltage control inputs. The invention has the advantages of greatly shortening the cleaning processing time, because the force rate b of the sixth force can be used without damaging the substrate to be cleaned.

1292985 V. INSTRUCTIONS (16) (For example, no sound energy "hot spots" will occur). The present invention thereby reduces the number of damaged substrates due to excessive acoustic energy applied to the substrate. The auto-tuning RF generator also automatically adjusts process changes, such as different cleaning chemistries, different locations on the substrate, etc., to provide a more flexible and robust cleaning process. Other embodiments and advantages of the invention will be apparent from the accompanying drawings. Fourth, [Implementation]

Several illustrative embodiments of automatically and dynamically adjusting the RF signal applied to the converter will now be described. It will be apparent to those skilled in the art that the present invention may be practiced without some or all of the specific details set forth herein. As described above, it is very important to increase the cleaning effect, efficiency, and throughput rate of the substrate cleaning system while reducing the possibility of damage to the substrate. These demands are exacerbated by the fact that the size of the device has been continuously reduced and that most cleaning systems have evolved into a single substrate cleaning system.

2A and 2B show a dynamic single substrate cleaning system 200 in accordance with one embodiment of the present invention. Figure 2A shows a side view of this dynamic single substrate cleaning system. Figure 2B shows a top view of this dynamic single substrate cleaning system 200. The substrate 2 0 2 is immersed in a washing liquid 205 contained in the cleaning chamber 2 〇 β . Washing; strip 2 0 4 may be deionized water (j) I water) or other cleaning chemistry known in the art and combinations thereof. The substrate 202 is substantially circular and is supported by three or more edge rollers 208, 208B, 208C (or similar edge support means).

1292985 V. INSTRUCTION OF THE INVENTION (17) ----- When the substrate 202 is subjected to a cleaning process, the substrate 2〇2 can be rotated, for example, in the direction 209A. The edge rollers 2〇8A, 2〇8B and 2〇8 (one or more of which can be driven (e.g., driven in the direction 2〇9b) can be rotated toward the substrate 202. The substrate 202 can be up to about 5 inches. The rate of RpM is rotated. The dry converter 210 is also included as part of the cleaning chamber 2〇6. The conversion, 2^0 can be a piezoelectric element such as a crystal, which can convert the signal to the wash. The acoustic energy of the liquid 204. The transducer 21 can be composed of, for example, ??陶兖, lead bismuth titanate, piezoelectric stone, or gallium phosphate, wherein the piezoelectric material is bonded to, for example, Tauman, carbonized, non-recorded steel or aluminum, or quartz resonators. As shown in Figure 2, the conversion of Christine 2 1 0 can be significantly smaller than the substrate 2 〇 2. Smaller to be cheaper to manufacture, and also The control can be provided in a smaller area of the substrate 2〇2 that is impacted by the smaller transducer 2jI. The substrate 202 has an activation surface 218 (i.e., straight up and active:: or active). The surface of the component is generally oriented toward the transducer 21〇. However, in the second and second gamma yoke examples, the activation surface 21 8 may Positioned on the side of the board 202 opposite the converter 2. The three edge rollers 2〇8A, 2〇8B, 208C maintain the distance between the substrate 202 and the converter 21 as the substrate 202 rotates through the converter 21〇. A fixed distance dl. The distance dl can be in the range of only a few shy (coffee) up to about 1 〇〇 or more. The distance dl is chosen to match the distance of the converter 210 H. 纟 - an embodiment In the middle, the distance dl is selected as the resonance distance of the frequency in the emission energy. Alternatively, the frequency of the emission energy 2 1 4 can be selected.

1292985 V. DESCRIPTION OF THE INVENTION (18) Rate 'The distance d 1 is the resonance distance. In either embodiment, in the case of resonance, the minimum reflected energy 2 16 is reflected from the substrate 202 to the converter 2 1 0. As described above, the reflected energy 2 16 interferes with the emission energy 2 1 4, which reduces the power efficiency of the RF signal 220 and reduces the cleaning effect on the substrate 202 (e.g., interference patterns).

However, the substrate 2 0 2 will be slightly "swinged" so that the distance between the substrate 2 0 2 and the converter 2 10 0 will be rotated at the substrate 2 〇 2 through the converter 2 1 , at the first distance dl and The distance between the two distances d2 changes. The difference between the first distance d1 and the second distance d2 can be as high as about 〇 5 mm (0·020 忖) or even greater. Although the improved edge rollers 208A, 20 8B, 208C and other similar techniques may maintain a more uniform distance d 1 ' between the substrate 202 and the transducer 210, the improved edge roller cannot guarantee an absolutely fixed distance dj, so A change in the distance dl is produced. Further, the distance between the substrate 2〇2 and the converter 21〇 can be changed for other reasons (e.g., the substrate 2〇2 is disposed within the edge rollers 208A, 208B, and 208C, etc.). As will be more detailed below [Tian Ming's, the change in the distance between the substrate 2 0 2 and the converter 2 1 会 will severely impair the performance and efficiency of the impact cleaning system 200.

The chirp converter 210 is connected to the RF generator 212. Figure 2C is a diagram of an auto-tuning RF generator system in a megahertz, ultrasonic cleaning system 2, as illustrated in Figures 2a and 2B above, in accordance with the present embodiment. 250 flow chart. In operation 255, the RF generator provides an RF signal to the converter 21A. The chirp signal 220 can have a frequency between about 400 kHz and about z, but is typically between about 7 kHz and about 1 mHz. The high frequency acoustic energy emitted from the converter 2 1 0 is 2 丨 4 wavelength in the washing liquid

Page 26 1292985 V. INSTRUCTIONS (19) --------- The length of 204 is approximately ι·5 mm (0.060忖). In operation 260, the distance to the target (e.g., substrate 2〇2) changes as the target moves relative to converter 210. When the distance is changed, the amount of reflected energy 2曰16 also changes, because when the distance dl changes, the emission energy 2 14 is not necessarily in resonance (ie, the impedance of the converter 2 is mismatched). )_. In operation 270, the generator 212 is automatically and dynamically tuned to constantly tune the RF signal 220 at a distance. Correct any impedance mismatch when changing. Since the wavelength of the emitted energy 214 is about 1.5 mm (〇·〇6〇吋), only the movement of 〇·50 mm (0·020吋) causes a significant impedance change, thereby generating, for example, 50%. The voltage change and the power variation between approximately 25% and 1%. In the absence of an auto-tuning RF generator to compensate for the change in di, the peak energy level of the transmitted energy 214 must be reduced to a sufficiently low value that the energy absorption (energy threshold) of the substrate 2〇2 is not exceeded, 俾The peak emission energy 214 can be prevented from damaging the substrate 202. The automatic harmonic RF generator 2 1 2 can be automatically tuned to compensate for the variation of the distance d 1 via the law of variation. In one embodiment, the peak voltage is detected, thereby maintaining the RF generator 212 at the impedance optimization frequency of the rf signal 220. In another embodiment, the phase of the voltage is maintained and the impedance optimized frequency of the RF signal 220 is generated. In yet another embodiment, the power supply α卩 can be adjusted to optimize the r F彳§ 2 2 0 impedance. Many embodiments can also be used in conjunction with a single auto-tuning RF generator system. 3 is a block diagram of the system 30 0 for automatic tuning RF generation in accordance with an embodiment of the present invention. Auto-tuning RF generator 302 provides feedback control

1292985 V. INSTRUCTION DESCRIPTION (20) The signal is applied to a voltage controlled oscillator (VC〇) 306, which is capable of adjusting the frequency of the VCO RF signal 310 output from the VCO 306. The VCO 306 can also be included as part of the RF generator 302. The DC power supply section 3 12 is included in the RF generator 302 and provides DC power for amplification of the VCO RF signal 310 in the RF generator 302. The auto-tuning RF generator 322 includes an inductor 314 in the input portion of the RF generator 3〇2. One or more amplifiers 320 that amplify the vc〇 RF signal 310 are also included in the RF generator 302. In one embodiment, amplifier 320 is CMOS and VCO RF signal 310 is applied to gate G. The drain D is connected to (iv) a biasing conductor (1)] [heart rail) 322 ' and the source S is connected to a ground potential pilot 3 24 . To the source (peak Vds) detection, the peak voltage of the 3 3 6 is not connected across the amplifier 3 2 0 and the source s terminal, which can be taken to the peak of the source of the amplifier 3 2 〇 Voltage bungee. The output of amplifier 320 is coupled to the input of class e load network 33A. The class-e load network 330 is a common component well known to those skilled in the art for performing the large-scale impedance matching function between the source, i.e., RF generator 302, and the RF load (i.e., converter 332). Class E load network 3 3 〇 Generally contains an LC network. The output of the class E load network 33 is coupled to the pair of converters 332. FIG. 4 is an automatic tuning rf generation in accordance with an embodiment of the present invention. The RF generator 302 is providing the RF signal 22 to the converter 332. The method operates a flowchart of 400. The pole 4 Π G ΤΛ ^ li t £340 ^,1 is included to be transported from the DC power supply unit 312 to the comparator device 340.

Page 28 1292985

The amplitude of the voltage is adjusted or reduced to the level of the comparator device 34. The differential and integral control can also be included in the comparator device 340, so that the rate and amount of change of the control signal can be selected. In operation 410, the 'peak I' is detected by the peak I detector 326 and applied to the second input of the comparator device 340. The peak Vds detector 326 may also include an electrogastrochannel ' to adjust or reduce the amplitude of the voltage connected from the peak L detector 326 to the comparator device 340 to a level available to the comparator device 34.

For example, 'DC power supply 312 may output 2 VDC, and comparator device 340 can compare 5 VDC signals, so voltage divider network 342 can adjust DC supply voltage from 2 〇〇 v DC to 5 VDC. The voltage (representing 200 VDC of comparator device 340). Similarly, peak vds detector 326 may also include a scaling device such as a voltage divider network that enables the actual peak vds voltage applied to comparator device 340 to be approximately 5 VDC. In operation 41 5, the comparator means 34 4 compares the peak value vds with the DC power supply voltage derived from d [power supply section 31 2 . If the DC supply voltage is the peak Vds of the desired ratio, no correction signal is output from the comparator means, and the method operation proceeds back to the above operation 4 〇 5.

Alternatively, if the DC supply voltage is not the peak of the desired ratio, then the method operation proceeds to operation 420. In operation 420, the corresponding correction signal is output from the comparator device 340 to the VCO 30 6 to adjust the frequency of the VCO output number 3 1 0 and the method operation proceeds back to the above operation 4 〇 5. The correction signal adjusts the frequency of the VCO RF signal 3 1 0 to the desired higher or lower frequency.

1292985

The expected ratio of the D c supply voltage to the peak value ν s depends on the particular value of the components of the converter 332 that depend on the RF generation benefit, and the RF generator 302 and the conversion cry. With this, .9ηη, /, can be replaced by 3 32 (such as the substrate of Figure 2 above, monthly wash, couch 0). In one embodiment, it is desirable to be in the range of about 6:1, and the straight line is also in the large, U · i ^ ^ m ^ _ An ^ , and the middle peak L is more than the DC power supply voltage. Coats electricity. In a yoke example, the expected ratio is about 4: i, and more definitely about 3·6: 1 , straight from the squats, the yang, the moon, the octet, the octave I, the force is dedicated to the DC supply voltage. About ci. b borrowed from the graph of 326 - "The peak of one embodiment of the invention of the invention is continuously connected to the capacitor 5 〇 2, 5 〇 4 series across the amplification: / 亟 a source S The diode 506 is connected in parallel with the capacitor 504. In operation, the capacitor 502 connects the peak value vds of each period of the amplified RF signal to the capacitor 5〇4. The capacitor 5〇4 stores the output from the amplifier 320. The peak value of each period of the amplification number is 1. The diode 5 〇 6 H peak vds, and the peak i is connected to the comparator device 340 via the peak Vds terminal. Figure 5B is the peak voltage according to an embodiment of the present invention. The peak voltage detected by the detector 326 (the waveform of the VdJ is 55 〇. When the amplifier device 3 2 0 is being executed 'the peak voltage detector 326 does not detect because only a small number of voltage drops across the amplifier 3 2 〇 Too much voltage is measured. When the amplifier stops executing, then, release is stored in RF The currents 3〇2 and the load network 33〇=the currents in the inductors and capacitors, thereby generating the voltage waveforms 5 52, 55 4, 556 as detected by the peak voltage detector 326. The amplifier 320 is designed When the voltage across the amplifier 32 降至 drops to zero, put

Page 30 1292985 DESCRIPTION OF THE INVENTION The amplifier 320 begins execution to establish a tuning amplifier circuit. The tuned amplifying circuit is affected by any change in the resonance of the converted singularity (eg, any movement of the substrate 2 〇 2 relative to the converter 332) that is reflected by the load network 330 to change the detected Waveform 5 52, 554, 556. When in resonance, amplifier 3 2 0 is a relatively tuned class e amplification cry and waveform 554 is generated. When out of resonance, the converter 33 2 may have a capacitance; or an inductance, thereby causing an increase in capacitive reactance or inductive reactance, which causes the class E load network 33 to be out of tune. The offset Class E load network 330 results in a waveform 552 or 556 having a peak voltage V1 that is too high or a peak voltage V3 that is too low.

Through continuity and calculation, we have found that the peak voltage (Vds) is a function of the resonance of the transition state 332, and the peak Vds has a resonance ratio as a function of the components of the RF generation circuit 302 compared to the applied bias voltage. . For example, in a general RF generator, the ratio is approximately 4:1 peak voltage compared to the bias voltage derived from the Dc power supply, or in a different manner.

It is said that the peak value of about four times the bias voltage from the DC power supply unit 3 1 2 indicates that the converter 323 is in resonance. S

Figure 6 is a block diagram of an automated tuning evaluation genre system 60 in accordance with one embodiment of the present invention. The phase P1 of the voltage of the rf signal 31 0 output from the VCO 30 6 is the phase of the voltage input to the converter 332? 2 for comparison. If the voltage phases P1 and P2 do not match, a correction signal is applied to the frequency control input of 306. The rF generator system 6A includes an RF generator 6 0 2 . The RF generating state 602 can be any type of RF generator that is well known to those skilled in the art. Phase detector 604 includes two inputs 6〇6, 6〇8.

Page 31 1292985 V. Invention Description (24) Two: two f: the device network), which can detect the detected signal (for example, the phase phase picker 604 available level. Phase detection piano /, Ignore the phase of any type that is well known to those skilled in the art. ^ : β detects the phase of each input voltage signal. The phase detector compares the voltage and current of the output 叮 signal 22〇. It has been shown that the comparison voltage phase (four) nanosine can be more simple and easy to be used, and the required signal is used to adjust vc 〇 306. Fig. 7 is an automatic tuning core according to an embodiment of the present invention. Flowchart of the method operation of the generator system 60. In operation 7〇5, it will come from

The input RF signal 310 of the VCO 306 is applied to the RF generator 602, and the RF generator 602 amplifies the input RF signal 310 and connects the amplified cardiac signal 22A to the converter 332. In operation 710, the first input 6〇6 connects the first phase (p丨) of the voltage of the heart signal 3 1 0 output from vc〇 3〇6 to the phase detector 6 〇 4. In operation 715, the second input 608 connects the second phase (P 2 ) of the voltage of the signal that is clocked into the converter 332 to the phase detector 6 〇 4.

In operation 720, the phase detector compares phase P1 with phase p2 to determine if phase P1 matches phase P2. Figures 8A-8C show the relationship between phases P1 and P2 for three examples in accordance with one embodiment of the present invention. In Fig. 8A, Fig. 800 shows that phase P1 leads phase P2 (e.g., phase P1 peak is at time T1 and phase P2 peak is at a later time T2). This means that the impedance of converter 332 is not matched and converter 332 applies reflected signal 222 to RF generator 602. In FIG. 8B, FIG. 820 shows that phase P1 is behind phase P2 (eg, phase

Page 32 1292985 V. INSTRUCTIONS (25) The P2 peak is at time T1, and the phase P1 peak is at a later time T2). This means that the impedance of the converter 332 is not matched, and the converter 332 applies the reflected signal 222 to the RF generator 602. The reflected signal output by converter 332 can constructively or destructively block the signal output from RF generator 602. In Fig. 8C, Fig. 85 shows that phase P1 is equal to phase p2 (for example, both phase P1 and phase P2 peak are at time T1). This means that the impedance of converter 332 is matched and converter 332 does not apply any reflected signals into RF generator 602.

If phase P1 and phase P2 are equal in operation 72 0, then the method operation continues (repetition) at operation 705. However, if phase p i and phase P2 are not equal in operation 7 2 , the method operation proceeds to operation 73 . In operation 730, an appropriate control signal is applied to the frequency control input of 〇3〇6 to adjust the frequency of the RF signal 3丨〇 accordingly, and the method operates at operation M5 to continue (repeated). The control signal applied to the frequency control input of vc〇 3〇6 adjusts the frequency to a higher frequency to accommodate phase p2 in response to phase p丨. Alternatively, the control signal applied to the frequency control input of the VCO 30 6 can adjust the frequency to a lower frequency to account for the phase p丨 behind the phase? 2 conditions. old

The tuned RF generator system 60 0 can also include a control amplifier 62 〇 that can adjust the control signal output to the correct signal level by the phase detector 6 〇 4 to control vc 〇 3 〇 6. The control amplifier β 2 〇 can also include a set point input: the two-home control amplifier 620 can be combined with the set point input and the input from the phase detection system. In this way, the VC〇 RF signal 31 can be used by

Page 33 1292985 V. INSTRUCTIONS (26) The set point is selected and the selected set point is automatically adjusted by the control signal output of phase detector 6 〇 4. The systems and methods illustrated in Figures 3 through 8C above can automatically tune the RF generators 3 0 2, 6 0 2 at very high correction speeds (e.g., each cycle of the ARF signal 310 will result in a subsequent RF signal 310). Frequency and correction of output RF signal 220). Thus, the frequency of the input RF signal 310 can be corrected as many times during each rotation of the substrate 2〇2, thereby more accurately controlling the acoustic energy 214 applied to the substrate 202. For example, if the substrate 2 0 2 is rotated 6 times per minute (β 〇 r ρ μ ) (that is, rotated once per second) and the RF signal 310 is approximately! That is, the frequency of the RF signal 310 during each rotation of the substrate 202 can be adjusted by a factor of one million per second (i.e., once every microsecond). This increase in control of the acoustic energy 214 applied to the substrate 2〇2 means that the average energy can be a minimum energy valley and a maximum energy peak that are very close to the emission energy 214. Therefore, a higher average energy can be applied to the substrate 2 0 2, thereby greatly shortening the cleaning process time and improving the cleaning effect. Figure 9 is a block diagram of an auto-tuning rf generator system 900 in accordance with one embodiment of the present invention. This system includes a VCO 306 that is coupled to the RF generator 6〇2. The variable DC power supply unit 9〇2 is connected to generate a crying '602 and provides DC power to the RF generator for amplifying the output from the vc〇3〇6:rf signal 310 〇RF generator 602 to the converter 332. A conventional prior art acoustic energy cleaning system focuses on maintaining a fixed net power input to converter 332 (i.e., the reflected power of the transmitted signal reflected signal 222 of the RF signal 22). Through experiments, we have found out if

1292985 V. INSTRUCTION DESCRIPTION (27) The voltage of the RF #5 Tiger 220 is maintained at a fixed voltage, and the amplitude of the emission energy 214 output from the converter 332 is substantially fixed. Again, maintaining the voltage of the RF signal 22〇 at a fixed level below the energy threshold limit of the substrate 202 protects the substrate from damage while also allowing the maximum acoustic energy 214 to be applied to the substrate 202. Figure 10 is a flow diagram of the method operation of the automatic tone modulation generator system 900 in accordance with one embodiment of the present invention. In operation 1 〇 〇 5, the r f generator 6 0 2 outputs the R F # number to the converter 3 3 2 . In operation 1 〇 1 ,, the voltage of the r ρ signal is output to the converter 3 32 and connected to the comparator 9〇4.

In operation 1015, comparator 904 compares the voltage from the RF signal output of rf generator 602 to the desired set point voltage. If the output voltage is equal to the desired setpoint voltage, the method operation continues to return to operation 丨〇丨〇. Alternatively, if the output voltage is not equal to the set point voltage, the method operation continues to operation 1 0 3 0. ▲ In operation 1〇3〇, the comparator 904 outputs a control signal to a control input located at the only DC power supply unit 9 〇 2 . For example, if the output voltage is too high (ie, greater than the desired set point voltage), the null signal will reduce the DC voltage output from the variable DC power supply 902, thereby reducing the generation in the RF generator 602. The gain of amplification is used to reduce the amplitude of the RF signal output by the heart generator 602. The proportional, differential 舆 integral control can also be included in the comparator 904 so that the rate and amount of change of the control signal can be selected. The meter circuit 906 can also be included to adjust the output from the μ generator 620 to a bit that is easier to compare with the set point signal.

1292985 V. Description of invention (28) Standard. For example, metering circuit 906 can adjust the 200 V RF signal to 5 V for comparison with a 5 V setpoint signal. The metering circuit 9 〇 6 can include a voltage divider. Metering circuit 906 may also include a rectifier to rectify the voltage of RF signal 220 output from RF generator 602 to a DC voltage for comparison with a DC setpoint signal.

The method illustrated in Figures 3 through 8C above can automatically tune the rF generators 3, 2, 602 (e.g., every cycle of the RF signal 3 10 to be tuned once) at a very high correction speed. Conversely, the systems and methods illustrated in Figures 9 and 亦可 can also automatically tune the RF generator 602, but are tuned at a slightly slower rate than that illustrated in Figures 3 through 8C, but still due to the impedance of the converter 3 3 2 The movement of the substrate 2 0 2 produces a possible change. The system and method illustrated in Figures 9 and 略 are slightly slower, due in part to the hysteresis contained in the variable DC power supply unit 902. The systems and methods illustrated in Figures 9 and 10 can be used in conjunction with Figures 3 through 8 (described above, one or more systems and methods are illustrated. Thus, Figures 9 and 1 can be used to provide tuning The very wide 1巳® of the RF generator is used for dynamic resonance of the converter 332, while the above described Figures 3 to 8 (the illustrated system and method can be used to provide very small control and adjustment of the tuned RF generator.

Figure 11 is a diagram of a megahertz ultrasonic two-group 1100 in accordance with one embodiment of the present invention. The megahertz ultrasonic module 〇〇1〇〇 can be a 4 Hz ultrasonic module of the material described in U.S. Patent Application Serial No. 1〇/2 59, 〇23, which is entitled to Hertzonic Substrate pr〇cessing

1292985 V. Description of invention (29)

Module), the application date is September 26, 2002, all of which is included in the reference for all purposes. The megahertz ultrasonic module 1 1 0 〇 includes a substrate processing tank 2 (shown below as slot 1102) and a slot seal cover 11〇4 (hereinafter indicated by a seal cover 11〇4). The sealed cover megahertz ultrasonic transducer 丨丨〇8 and slot megahertz ultrasonic transducer 11 0 6 are respectively placed on the sealing cover 丨丨〇4 and in the slot II 0 2, and k for millions Hertz ultrasonic energy for simultaneous processing of substrates

III 0 activity and free surface. The substrate 111 is placed in a plurality of drive wheels 1112 and secured in place by a substrate stabilizing arm/wheel 1114. In one embodiment, the substrate stabilization arm/wheel 1 1 1 4 is disposed by the driving device 112 〇 and the positioning rod 1122 for opening and closing the stabilization arm/rim J 4 to receive, fix, and release in the hundred The substrate 1110 to be processed in the terahertz ultrasonic module. The seal cap 104 can be placed in an open or closed position by a drive system (not shown) that raises and lowers the seal cap 1104 to maintain the slot 1 102 stationary. Alternatively, the slot 2 can be moved to mate with the sealing cover 4. In one embodiment, the substrate stabilizing arm/wheel 1114 is designed to secure and support the substrate 1 1 1 0 in a horizontal direction for processing and to permit rotation of the substrate 111 0 . In other embodiments, substrate processing is performed on the substrate 丨丨i 〇 in a vertical direction. During processing, the drive wheel 111 2 contacts the peripheral edge of the substrate 111 and the rotating substrate 1110. The substrate stabilizing arm/wheel 1114 can include a freely rotating wheel to allow the substrate 111 to rotate while supporting the substrate 1110 in a horizontal direction. ι Once the substrate 111 0 is placed in the slot 11 〇 2, the slot 2 will be filled.

Page 37 1292985 V. INSTRUCTIONS (30) Treatment fluids containing deionized (D I ) water or depending on the desired treatment chemistry. Once the closed megahertz ultrasonic module 11 is filled with the desired processing fluid and the substrate 111 0 is immersed therein, the slot 1 megahertz ultrasonic wave can be converted to Jay 1106 (guided megahertz ultrasonic energy) Against the surface of the grooved megahertz ultrasonic conversion 1106 substrate 111), and by sealing the cover megahertz ultrasonic transducer 11 〇 8 (guided megahertz ultrasonic energy against the face-to-seal cover million Hz The surface of the substrate 1 1 1 of the ultrasonic transducer 1 1 〇 8) achieves a million Hz ultrasonic processing of the substrate 111 0 . Regarding the substrate 1 1 1 沉 sunk in the processing chemistry, the driving rim 2 rotates the substrate to ensure complete and uniform processing of k over the entire surface of the substrate 111 and the back surface. . In one embodiment, a drive motor 丨i i 6 is provided to drive the drive wheel 11 1 2 via a mechanical connection 1 1 1 8 (e.g., drive belt, gear, sprocket, chain, etc.). The auto-tuning RF generator system as illustrated in Figures 3-1 above can be connected to one or both of the sealed cover converters 1 1 〇 8 and the slot converter 丨丨〇 6 to be rotated on the substrate 111 At this time, each of the converters 丨丨〇8, 丨丨〇6 is fixed and automatically tuned for the dynamic impedance of each of the converters 11 〇 8, 11 〇 6. Figure 2 is a distribution of the cross-over converter in the month of the converter according to one embodiment of the present invention. Compared to the prior art, the energy windows shown by the curves 丨2 〇 and 丨2 2 The 'automatic tuning evaluation generator' will result in a narrower energy window 12〇2 between the curve 121〇 and the curve 1212. Since the energy window 12〇2 is more narrow, the energy window can be moved upwards to bring it closer to the energy of the substrate. The threshold T is used to provide a more efficient acoustic energy cleaning process.

Page 38 1292985 V. INSTRUCTIONS (31) As used herein in connection with the description of the present invention, the term "about" means +/ - 10%. For example, the phrase "about 250" indicates a range between 22 5 and 275. It will be further understood that the instructions represented by the operations of Figures 4, 7 and 10 are not required to be performed in the order shown, and that all of the processing represented by these operations may not be necessary to practice the invention. Although the invention has been described in considerable detail for the purpose of clarity of the invention, it is understood that certain changes and modifications may be made within the scope of the following claims. Therefore, the present embodiments are to be considered as illustrative and not restrictive, and the invention is not limited to the details of the invention, but may vary within the scope and equivalents thereof.

BRIEF DESCRIPTION OF THE DRAWINGS [0009] [Brief Description of the Drawings] The present invention will be readily understood by the following detailed description in conjunction with the accompanying drawings, and the same reference numerals indicate the same structural elements. Figure 1A is a diagram of a typical bulk substrate cleaning system. Figure 1 B is a top view of the entire batch of substrate cleaning system. Figure 1 c is a schematic diagram of an RF supply for one or more converters of the prior art. Figure 1 D is a typical converter 1 8 b. Figure 1 E is an energy distribution diagram across the converter. 2A and 2B show a dynamic single substrate cleaning system in accordance with one embodiment of the present invention. Figure 2C is a flow diagram of the method operation of an auto-tuning RF generator system for use in a megahertz ultrasonic cleaning system such as that illustrated in Figures 2A and 2B above, in accordance with one embodiment of the present invention. 3 is a block diagram of an auto-tuning μ generator system in accordance with one embodiment of the present invention. 4 is a flow diagram of the method operation of an auto-tuning μ generator system in accordance with one embodiment of the present invention when an RF generator is providing an RF signal to a converter. 5A is a waveform diagram of a peak voltage (Vds) detected by a peak device according to an embodiment of the present invention. FIG. 5B is a waveform diagram of a peak and a detector according to an embodiment of the present invention. Bellow Figure 6 is an automatic modulation μ generation according to an embodiment of the present invention.

Page 40 1292985 Schematic diagram of the system. Figure 7 is a flow diagram of the operation of the method of automatically tuning an RF generator system in accordance with one embodiment of the present invention. Figures 8-8-8 show the relationship between phase P1 and phase P2 in three examples in accordance with one embodiment of the present invention. Figure 9 is a block diagram of an auto-tuning R F generator system in accordance with one embodiment of the present invention. Figure 10 is a flow diagram of the method operation of an auto-tuning RF generator system in accordance with one embodiment of the present invention. Figure 11 is a diagram of a megahertz ultrasonic module in accordance with one embodiment of the present invention. Figure 12 is a diagram of the energy distribution across the transducer in accordance with one embodiment of the present invention. Description of the components: 1 0 ~ Substrate cleaning system 1 slot 12 ~ substrate carrier 14 ~ substrate 1 5 ~ emission energy 1 6 ~ washing liquid 1 7 ~ reflection energy 18A, 18B, 18C ~ converter 19A, 19B ~ positioning fixture

1292985 Schematic description of the 24, 24A ~ substrate 3 0 ~ summary Figure 32 ~ voltage controlled oscillator (VCO) 3 3, 3 5 ~ signal 34 ~ RF generator 3 6 ~ power sensor 38 ~ reflected signal 100 ~ energy Distribution map 1 0 2, 1 0 4, 1 2 0, 1 2 2 ~ curve 2 0 0 ~ million Hertz ultrasonic cleaning system 2 0 2 ~ substrate 2 0 4 ~ washing liquid 2 0 6 ~ cleaning chamber 208A 208B, 2 08C~edge roller 209A, 209B~direction 2 1 0~converter 212~RF generator 2 1 4~transmit energy 2 1 6~reflected energy 2 1 8~activated surface 220~RF signal 222~reflected signal 2 5 0~ method operation 255 ^ 260 > 270 ~ operation

1292985 Schematic description 300~Auto-tuning RF generator system 302~RF generator 30 6~Voltage controlled oscillator (VCO) 310~RF signal 31 2~DC power supply part 314~Inductor 3 2 0~Amplifier 322~ DC bias rail 324 ~ ground potential rail 3 2 6 ~ detector 3 3 0 ~ E load network 332 ~ converter 340 ~ comparator device 3 4 2 ~ voltage divider network 40 0 ~ method operation 40 5 , 410, 415, 420 ~ operation 5 0 2, 5 0 4 ~ capacitor 5 0 6 ~ diode 5 5 0 ~ waveform diagram 552, 554, 556 ~ voltage waveform 600 ~ RF generator system 602 ~ RF generator 6 0 4 ~ phase detector 606 ~ first ^ input

1292985 Schematic description 608 ~ second input 610, 612 ~ metering circuit 6 2 0 ~ control amplifier 705, 710, 715, 720, 730 ~ operation 900 ~ auto-tuning RF generator system 9 0 2 ~ variable DC power supply Portion 9 0 4 to comparator 9 0 6 to metering circuit I 0 0 5, 1 0 1 0, 1 0 1 5, 1 0 3 0 ~ operation II 0 0 to megahertz ultrasonic module 1102 to substrate processing tank 1104~ Sealing cover 11 0 6 ~ slot million Hertz ultrasonic converter II 0 8~ Sealing cover million Hertz ultrasonic converter III 0~ substrate 111 2~ drive wheel 1114~stabilizing arm/wheel 111 6~ drive motor 111 8~mechanical connector 11 2 0~drive unit 11 2 2~positioning rod '1 2 0 0~ energy distribution diagram 1202~ energy window 1 2 1 0, 1 2 1 2~ curve

Claims (1)

Sixth, the scope of application for patent 1. Method, from the input of the signal to the rate; when the signal; will be into the ° 2. The converter is added to the signal 3. The converter is the second if the increase is increased by the % Buck β is a dynamic adjustment of the RF generator to the converter comprising the following steps: ^, the vibration rate of one of the oscillators, and an RF round-in signal output of the RF input signal of one of the input voltages; The quantity is rotated from the RF generator and connected to =., a second phase of a voltage, wherein 丄褥 is replaced by the input RF, and wherein the converter is aligned to the conversion substrate to emit a Sound energy, the middle of the bean-substrate, the converter, the frequency of the RF signal, the first phase is not equal to the second phase, and the frequency is generated A frequency control wheel, such as the method of applying the instantaneous resonance frequency of the scope of the patent, the dynamic adjustment of the RF generator to the frequency of the oscillator, wherein the frequency control signal is applied to a set point control signal = step Including the combination of the frequency control, such as the instantaneous resonant frequency of the patent application scope, and the dynamic adjustment of the RF generator to the position: when the frequency is generated, when the first phase is not equal to f, the first phase is behind The "system: step 5 includes: the frequency of the oscillator; - the revenge, then the frequency control signal = the frequency of the first phase leading oscillator; and a phase, the frequency control signal Page 45 1292985 Amendment 曰 >1 1~— ----- Case No. 9213$^ VI. Application Patent Range = If the first phase is equal to the second phase, then the frequency tiger does not change the oscillator. frequency. , Feng t 信 棘 ^ ^ ^ / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / /冃 & hatred with the - signal. ΜInto the wheel of the mother of the tiger to generate the frequency control" 5 · A converter RF source, including · vibration state, with a frequency control input and an RF signal wheel; The RF signal output connected to the oscillator is connected to the RF generator output of the converter at t, wherein a signal from the 2 output is applied to the converter input, and where Aligned to a substrate, the transducer is radiated toward the substrate for one month, and the acoustic energy has a frequency of the RF signal; and the first phase phase #: voltage phase detector, the voltage phase detector The method includes: wheeling, = the RF signal output connected to the oscillator; a first shot t ¥ none, the RF generator output, wherein the second phase input will be a total to the electrical phase, the reflection The signal is equivalent to the energy of the 进入 射 injection into the converter, and a frequency control JU ^ 'connected to the oscillator frequency control wheel. Frequency is converted in the 15th item _ source 'its' frequency System ί is connected to the oscillator via a control amplifier ^ Ice is stated as patentable scope of item 6 of the RF source converter, wherein the control amplifier comprising: Iraq Comment 1292985 Page 47 1292985 A method of cleaning a substrate comprising the following steps: ^^ applying an RF signal to a converter at a frequency f, the converter being U-shaped so that the converter is at the frequency f toward the substrate Radiating a spicy/middle substrate and the converter are immersed in a cleaning solution; moving the substrate with the converter; and dynamically adjusting the RF signal to maintain a period between the substrate and the converter A resonance. Μ# Basin 11. The cleaning method of the substrate as described in claim 丨0, the step of adjusting the RF signal to maintain the resonance of the acoustic energy A fixed voltage is maintained that maintains one of the RF signals applied to the converter.匕12. The cleaning method of the substrate according to the first aspect of the patent application, the Μ Μ 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰 杰The step of electrically dissipating comprises: stepping: one of the first voltages of the $.rf signal; comparing the first voltage with a desired set point voltage; and inputting a control signal to a variable DC power supply unit, A turn-off voltage of one of the variable DC power supply units can be adjusted, the variable DC power supply providing DC power to the rf generator. " 13. The method of cleaning a substrate according to claim 2, wherein the step of dynamically adjusting the RF signal to maintain the resonance of the acoustic energy comprises dynamically adjusting one of the RF signals applied to the converter. Frequency f. The substrate=cleaning method as described in claim 3, wherein the RF signal is applied by an RF generator and dynamically adjusted Page 48 1292985 __Case No. 92137672 VI. Scope of Patent Application a Amendment The step of the frequency f of the RF signal of the converter comprises: measuring a supply voltage applied to the RF generator; measuring the output across the output of the RF generator to amplify the peak value of the crying peak; DD < When the peak voltage is not equal to a selection ratio of the power supply voltage, a frequency control signal is generated; and the frequency control signal is applied to generate one of the RF signals to vibrate a frequency control input. The method of cleaning a substrate according to claim 3, wherein the RF signal is applied by an RF generator, and the step of dynamically adjusting the frequency f of the RF signal to which the conversion is applied includes The following steps: input an RF wheeling signal from an oscillator to the RF generator, and shoot the RF signal in the RF generator; and 'measure the first phase of one of the input voltages of the RF input signal; The RF signal from the RF generator outputs a voltage #2 phase; when the phase is not equal to the second phase, a frequency 扒 is generated; and the frequency control signal is applied to the oscillator A frequency control wheel, a cleaning system, comprising: a cleaning chamber comprising a converter and a substrate, the converter being separated from the substrate by a variable distance d; dynamically adjustable RF generator with a wheel connected to the converter 1292985,: the signal output from the generator output is applied to the conversion crying device toward the substrate... the acoustic energy, the center of the signal has the frequency of the signal that is generated by the state; and the feedback circuit, a control input coupled to the adjustable RF generator = adjusting an output of the adjustable RF generator to maintain a resonance of the acoustic energy external to the converter; wherein the dynamically adjustable RF generator comprises: a variable a DC power supply unit having a 〆 control wheel and a DC turn connected to the RF generator; The feedback circuit comprises: a first comparator comprising: a first wheel input connected to a set point control signal; a second input connected to the RF output of the generator; and a control signal wheeled, connected To the control input of the adjustable RF generator, the control wheel enters a voltage control input included in the sinusoidal DC power supply. 17. The cleaning system of claim 16, wherein the substrate is rotatable, and wherein the distance ^ changes about one-half of a signal output from the RF generator when the substrate is rotated 2 wavelengths. 18. The cleaning system of claim 16, wherein the dynamically adjustable RF generator comprises: an oscillator having a control signal input and an RF signal rotation; an output amplifier coupled to The oscillator output; and a load network 'connected to one of the output amplifiers and the RF output Page 50 1292985 The 5 Hz feedback circuit includes: its connection across the wheel-out amplifier; a peak voltage detector, and a second comparator, including: one ^ three inputs, connected to One of the variable DC power supply units has a fourth input connected to the output of one of the peak voltage detectors, and the output of the comparator is connected to the input of the adjustable RF generator. The control input contains the oscillator control signal input. . The cleaning system of claim 16, wherein: the dynamically adjustable RF generator comprises: ', · an oscillator having a frequency control input and an RF signal output; and an RF generator Wheeling, connected to the oscillator RF signal output 5H feedback circuit comprises: a voltage phase detector comprising: · a first phase wheel, the RF signal output connected to the oscillator · a second phase wheel Connected to the RF generator wheel; and 'a frequency control signal output coupled to the adjustable control input of the adjustable RF generator, the control input including the oscillator frequency control voltage wheeled 20. a system comprising: a cleaning valley chamber comprising a converter and a substrate, the converter being aligned to the substrate, a variable distance d separating the converter from the substrate; 1292985 _ Case No. 92137672 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ And wherein the converter emits an acoustic energy toward the substrate, wherein the acoustic energy has a frequency of the signal output from the RF generator; and a feedback circuit coupled to the control input of the adjustable RF generator - Maintaining a resonance of the acoustic energy external to the converter by adjusting an output of the adjustable RF generator, wherein: - the dynamically adjustable RF generator comprises: a supply voltage source; An oscillator having a control signal input and an RF signal output; an output amplifier coupled to the oscillator output; a load network coupled between the output of one of the output amplifiers and the output of the RF generator; The feedback circuit includes: a peak voltage detector connected across the output amplifier; and a comparator circuit comprising: a first input coupled to the supply voltage source; a second input coupled to the output of the peak voltage detector; and a comparator output coupled to the control input of the adjustable RF generator, The control input contains the oscillator control signal input. 21. A cleaning system comprising: Page 52 1292985 Case No. 92137R79 VI. The patent application scope cleansing the distribution to the substrate, a dynamic output, wherein the conversion from the RF generator to the feedback device to adjust the acoustic energy can be adjusted. a dynamic chamber comprising a converter and a substrate, the converter being separated from the substrate by a variable distance d; the J-RF generating state having a connection to the converter One of the output of the device is applied to the converter, U emits an acoustic energy to the substrate, the sound energy has a frequency of the signal outputted, and a path connected to one of the adjustable RF generators: fF generation The output of the device maintains the conversion; the resonance, where ···, the oscillating state 'having a -frequency control input and the -RF signal input state input' is connected to the oscillator RF signal output; the feedback circuit comprises: The detector includes: ... a phase input, the RF signal input to the oscillator, the RF generator includes an f 7 phase input, and is connected to the RF generator output...: signal rounding, even Connect to the adjustable second production: i into. The input contains the oscillator frequency control voltage input 2 2 · A dynamic tuning: & suppress the u method, including the following steps: benefit to the converter's instantaneous resonant frequency 1292985 --jjt, 921376^__ car _^ Day Correction VI. Application Specialization IS ^ _ " - Provide an RF round-in signal from an oscillator to the input of the rf generator, wherein one of the signals from the RF generator is applied to a converter input Wherein the converter is aligned to a substrate such that the transducer emits an acoustic energy toward the substrate, wherein the acoustic energy has a frequency of a z-signal output from the RF generator; A' measurement is applied to the generator a power supply voltage; - measuring a peak voltage of the RF generator; s 忒 peak voltage is not equal to a selection ratio of the power supply voltage, generating a frequency control signal; and applying the frequency control signal to the oscillator Frequency control wheeling 0 23 · The method of dynamically adjusting RF as described in claim 22 of the patent application to generate a momentary resonance frequency of crying to the converter, wherein the peak voltage is measured: Through an RF generator contained in the vessel that the peak voltage of the amplifier. 24. The method of dynamically adjusting an instantaneous resonant frequency of an RF generator to a converter as recited in claim 22, wherein the selected ratio of the peak voltage to the supply voltage is equal to about 3 to 1 and about 6 to 1 A range between. An rf generator comprising: a supply voltage source; an oscillator having a control signal input and an RF signal output; an output amplifier having an input coupled to the oscillator output; a load network, Connected to one of the output amplifiers and the RF output Page 54 I292985 Ί_1^92137672 Year of the month - 佟 π,, application for special----~· Application < An output between which a signal output from the RF generator is added to a converter input The converter is aligned to a substrate, and the device emits an acoustic energy toward the substrate, wherein the acoustic energy has a frequency of the signal that is rotated from the "device"; a peak voltage detector, The connection crosses between the wheel of the wheeled amplifier and a reference voltage rail; and Α < ” a comparator circuit comprising: a first input coupled to the supply voltage source; a second input Connected to one of the peak voltage detectors; and a comparator output connected to the oscillator control signal input. 26. The RF generator of claim 25, wherein a control signal is from the comparator when a supply voltage is not equal to a peak ratio selected by the peak voltage detector output. The output is rotated = 27 · an RF generator comprising: a supply voltage source; a voltage controlled oscillator (VCO) having a control voltage wheel and an output; /, an output amplifier connected to the VCO output a load network connected between one of the outputs of the output amplifier and one of the outputs of the generator; a peak voltage detector connected across the output amplifier; and a comparator circuit comprising: a first input connected to the supply voltage source; a second turn in, connected to the One output of the peak voltage detection state; a comparator output connected to the vco control voltage input, when a power supply voltage is not equal to the peak current output by the peak voltage detector Page 55 1292985 ----- Picture number 92137672__, the application of the patent range pressure is about 3 · 6 to 1 ratio is output; and the control voltage is from the comparator to a converter, connected to the RF generator Turning out, wherein one of the signals from the "turned t" is applied to a converter input, wherein the second, = to a substrate of the converter causes the transducer to emit acoustic energy toward the substrate, the acoustic energy There is a frequency of the signal output from the RF generator. 28 - A method of maintaining a fixed input voltage to a converter, comprising the steps of: applying an RF signal from a generator to the converter, wherein the RF A signal that is rotated by the generator is applied to a converter input, wherein the turn is aligned to a substrate, causing the converter to emit a sound toward the substrate, wherein the sound energy has output from the RF generator The frequency of the signal; measuring a first voltage of the RF signal; comparing the first voltage with a desired set point voltage; and inputting a control signal to a variable DC power supply unit, which can be adjusted Change like One of the source supply portions outputs a voltage, and the variable DC power supply unit supplies the DC power to the RF generator. [9] A method of maintaining a fixed input voltage to a converter as described in claim 28, wherein The first voltage is a function of one of the impedances of the converter, and wherein the impedance of the converter changes as a distance between the converter and a target changes. 3 0 · as claimed in claim 2 The method of maintaining a fixed input voltage to a converter according to item 8, wherein comparing the first voltage with the desired set point voltage 1292985 Case No. 92137672 修正 Amendment 6. This step of applying for a patent includes determining a control signal, and wherein the control signal is approximately equal to a difference between the first voltage and the desired set point voltage. 31. A converter RF source comprising: 'an RF generator having one of the inputs to one of the converters R{? wheel out, wherein one of the RF signals from which the RF generator is rotated is applied a converter input, wherein the converter is aligned to a substrate, the converter is directed toward, radiating acoustic energy to the substrate, wherein the acoustic energy has a frequency of the RF signal output from the "generator" ^ A variable DC power supply unit having a control input and a DC output connected to the heart generator; a comparator that compares to crying whites and saliva.. Ping Wei w contains • one brother one input, connected to a set point control signal; a second wheel-in, pull-down coin "in" is connected to the RF generator rf wheel; and a control signal output is connected to the king's turn-off voltage control input. (4) Power supply on the power supply - 32. A converter RF source, comprising: an E-type RF generator, and the right, * Duo room in the hundreds of stands, connected to a million Hz ultrasonic cleaning capacity Master Ding, for the white 禹 Hertz Ultrasonic, will cry from the RF One of the RF inputs of one of the inputs is turned on, and one of the RF signals of one of A _ ί A is applied to a converter, and that the converter emits sound energy of the 刖 substrate. , the sound of the second substrate, the frequency of the converter toward the RF signal /, β has the control output from the evaluation generator having a control input and connected to the RF: variable DC power supply Generate 1 § - DC output; than the car father, the comparator contains: the first input, connected to a set Page 57 1292985 Page 58