KR101107855B1 - 플루오로화합물-함유 가스 스트림의 처리 방법 및 장치 - Google Patents

플루오로화합물-함유 가스 스트림의 처리 방법 및 장치 Download PDF

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KR101107855B1
KR101107855B1 KR1020067016692A KR20067016692A KR101107855B1 KR 101107855 B1 KR101107855 B1 KR 101107855B1 KR 1020067016692 A KR1020067016692 A KR 1020067016692A KR 20067016692 A KR20067016692 A KR 20067016692A KR 101107855 B1 KR101107855 B1 KR 101107855B1
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plasma
stream
chamber
gas
ions
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Korean (ko)
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KR20070004634A (ko
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제임스 로버트 스미스
앤드류 제임스 실레이
마릴레나 라도이우
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에드워즈 리미티드
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2047—Hydrofluoric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2066—Fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
    • B01J2219/0896—Cold plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Biomedical Technology (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Treating Waste Gases (AREA)
  • Drying Of Semiconductors (AREA)
KR1020067016692A 2004-02-20 2005-02-18 플루오로화합물-함유 가스 스트림의 처리 방법 및 장치 Expired - Lifetime KR101107855B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB0403797.4A GB0403797D0 (en) 2004-02-20 2004-02-20 Gas abatement
GB0403797.4 2004-02-20
PCT/GB2005/000619 WO2005079958A1 (en) 2004-02-20 2005-02-18 Method and apparatus for treating a fluorocompound-containing gas stream

Publications (2)

Publication Number Publication Date
KR20070004634A KR20070004634A (ko) 2007-01-09
KR101107855B1 true KR101107855B1 (ko) 2012-01-31

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KR1020067016692A Expired - Lifetime KR101107855B1 (ko) 2004-02-20 2005-02-18 플루오로화합물-함유 가스 스트림의 처리 방법 및 장치

Country Status (8)

Country Link
US (1) US20070235339A1 (enExample)
EP (1) EP1715937B1 (enExample)
JP (1) JP2007522935A (enExample)
KR (1) KR101107855B1 (enExample)
CN (1) CN1917932B (enExample)
GB (1) GB0403797D0 (enExample)
TW (1) TWI364316B (enExample)
WO (1) WO2005079958A1 (enExample)

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WO2007007003A2 (fr) * 2005-07-12 2007-01-18 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Procede de traitement par plasma d'effluents gazeux
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GB0605048D0 (en) * 2006-03-14 2006-04-26 Boc Group Plc Apparatus for treating a gas stream
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JP2010058009A (ja) * 2008-09-01 2010-03-18 Landmark Technology:Kk 三フッ化窒素分解処理方法および三フッ化窒素分解処理装置
KR100987978B1 (ko) * 2008-10-27 2010-10-18 (주)트리플코어스코리아 가스 스크러빙 장치 및 가스 스크러빙 방법
CN101492812B (zh) * 2008-11-24 2011-03-23 招商局漳州开发区创大太阳能有限公司 一种可连续大面积均匀化学气相沉积的喷头系统
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KR101127096B1 (ko) * 2009-05-11 2012-03-23 주성호 스팀프라즈마를 이용한 악성오염물질 열분해처리장치
US8153958B2 (en) * 2009-07-10 2012-04-10 Sphere Renewable Energy Corp. Method and apparatus for producing hyperthermal beams
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CN102125818B (zh) * 2010-12-31 2013-12-11 武汉凯迪工程技术研究总院有限公司 用等离子体制取高温、富含活性粒子水蒸汽的方法及装置
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CN103465113B (zh) * 2013-09-06 2015-10-21 西安工业大学 用于光学材料去除、抛光的装置及其使用方法和应用
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KR200488645Y1 (ko) 2016-12-09 2019-03-06 (주)트리플코어스코리아 음전극의 방열구조 및 이를 포함하는 플라즈마 스크러버
MX2019009253A (es) * 2017-02-03 2020-02-07 The South African Nuclear Energy Corporation Soc Ltd Proceso de preparacion para fluoruros de metal de tierras raras.
CN110291611B (zh) * 2017-02-09 2022-05-17 应用材料公司 利用水蒸气和氧试剂的等离子体减量技术
JPWO2018221067A1 (ja) * 2017-05-29 2020-02-06 カンケンテクノ株式会社 排ガスの減圧除害方法及びその装置
GB2567168A (en) * 2017-10-04 2019-04-10 Edwards Ltd Nozzle and method
WO2019238699A1 (en) * 2018-06-12 2019-12-19 Agc Glass Europe Method for preparing catalytic nanoparticles, catalyst surfaces, and/or catalysts
KR102243816B1 (ko) * 2019-07-09 2021-04-23 한국핵융합에너지연구원 워터젯 액상 방전 발생 장치 및 이를 이용한 액체 물질의 코팅 장치 및 액체의 살균 장치
CN114288961A (zh) * 2021-12-08 2022-04-08 核工业西南物理研究院 一种热等离子体还原氟化物的装置及方法
CN115554823B (zh) * 2022-06-16 2023-08-04 西安交通大学 基于热等离子体的六氟化硫降解装置

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JP2000133494A (ja) 1998-10-23 2000-05-12 Mitsubishi Heavy Ind Ltd マイクロ波プラズマ発生装置及び方法
JP2000334294A (ja) 1999-05-31 2000-12-05 Shinmeiwa Auto Engineering Ltd 代替フロンのプラズマアーク分解方法及び装置
JP2003245520A (ja) 2002-02-26 2003-09-02 Seiko Epson Corp Ｐｆｃ分解方法、ｐｆｃ分解装置及び半導体装置の製造方法
JP2003282465A (ja) 2002-03-26 2003-10-03 Hitachi Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
CN1917932A (zh) 2007-02-21
EP1715937A1 (en) 2006-11-02
EP1715937B1 (en) 2013-04-10
WO2005079958A1 (en) 2005-09-01
GB0403797D0 (en) 2004-03-24
TWI364316B (en) 2012-05-21
JP2007522935A (ja) 2007-08-16
CN1917932B (zh) 2010-09-29
TW200533410A (en) 2005-10-16
US20070235339A1 (en) 2007-10-11
KR20070004634A (ko) 2007-01-09

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