JP2007522935A - フッ素化化合物−含有ガス流を処理する方法及び装置 - Google Patents

フッ素化化合物−含有ガス流を処理する方法及び装置 Download PDF

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JP2007522935A
JP2007522935A JP2006553678A JP2006553678A JP2007522935A JP 2007522935 A JP2007522935 A JP 2007522935A JP 2006553678 A JP2006553678 A JP 2006553678A JP 2006553678 A JP2006553678 A JP 2006553678A JP 2007522935 A JP2007522935 A JP 2007522935A
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plasma
chamber
gas
source
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JP2007522935A5 (enExample
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ジェイムズ ロバート スミス
アンドリュー ジェイムズ シーリー
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ザ ビーオーシー グループ ピーエルシー
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2047—Hydrofluoric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2066—Fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
    • B01J2219/0896—Cold plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Chemistry (AREA)
  • Epidemiology (AREA)
  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Treating Waste Gases (AREA)
  • Drying Of Semiconductors (AREA)
JP2006553678A 2004-02-20 2005-02-18 フッ素化化合物−含有ガス流を処理する方法及び装置 Pending JP2007522935A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0403797.4A GB0403797D0 (en) 2004-02-20 2004-02-20 Gas abatement
PCT/GB2005/000619 WO2005079958A1 (en) 2004-02-20 2005-02-18 Method and apparatus for treating a fluorocompound-containing gas stream

Publications (2)

Publication Number Publication Date
JP2007522935A true JP2007522935A (ja) 2007-08-16
JP2007522935A5 JP2007522935A5 (enExample) 2011-05-12

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JP2006553678A Pending JP2007522935A (ja) 2004-02-20 2005-02-18 フッ素化化合物−含有ガス流を処理する方法及び装置

Country Status (8)

Country Link
US (1) US20070235339A1 (enExample)
EP (1) EP1715937B1 (enExample)
JP (1) JP2007522935A (enExample)
KR (1) KR101107855B1 (enExample)
CN (1) CN1917932B (enExample)
GB (1) GB0403797D0 (enExample)
TW (1) TWI364316B (enExample)
WO (1) WO2005079958A1 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010058009A (ja) * 2008-09-01 2010-03-18 Landmark Technology:Kk 三フッ化窒素分解処理方法および三フッ化窒素分解処理装置
JP2014508635A (ja) * 2010-12-31 2014-04-10 武▲漢凱▼迪工程技▲術▼研究▲総▼院有限公司 プラズマを使用する活性粒子に富む高温水蒸気の調製方法および装置
KR200488645Y1 (ko) 2016-12-09 2019-03-06 (주)트리플코어스코리아 음전극의 방열구조 및 이를 포함하는 플라즈마 스크러버
JPWO2018221067A1 (ja) * 2017-05-29 2020-02-06 カンケンテクノ株式会社 排ガスの減圧除害方法及びその装置
CN114288961A (zh) * 2021-12-08 2022-04-08 核工业西南物理研究院 一种热等离子体还原氟化物的装置及方法

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FR2898066B1 (fr) * 2006-03-03 2008-08-15 L'air Liquide Procede de destruction d'effluents
FR2888519B1 (fr) * 2005-07-12 2007-10-19 Air Liquide Procede de traitement, par plasma, d'effluents gazeux
EP1904664A2 (fr) * 2005-07-12 2008-04-02 Air Liquide Electronics Systems Procede de traitement par plasma d'effluents gazeux
GB0521830D0 (en) * 2005-10-26 2005-12-07 Boc Group Plc Plasma reactor
GB0605048D0 (en) * 2006-03-14 2006-04-26 Boc Group Plc Apparatus for treating a gas stream
KR100945038B1 (ko) * 2008-01-22 2010-03-05 주식회사 아론 플라즈마 반응기와 이를 이용한 플라즈마 스크러버
KR100987978B1 (ko) * 2008-10-27 2010-10-18 (주)트리플코어스코리아 가스 스크러빙 장치 및 가스 스크러빙 방법
CN101492812B (zh) * 2008-11-24 2011-03-23 招商局漳州开发区创大太阳能有限公司 一种可连续大面积均匀化学气相沉积的喷头系统
CN101496992B (zh) * 2009-01-15 2011-09-07 大连海事大学 去除全氟碳化物气体的系统和方法
US20100258510A1 (en) * 2009-04-10 2010-10-14 Applied Materials, Inc. Methods and apparatus for treating effluent
KR101127096B1 (ko) * 2009-05-11 2012-03-23 주성호 스팀프라즈마를 이용한 악성오염물질 열분해처리장치
US8153958B2 (en) * 2009-07-10 2012-04-10 Sphere Renewable Energy Corp. Method and apparatus for producing hyperthermal beams
CN101607175B (zh) * 2009-07-27 2011-11-16 安徽皖投力天世纪空气净化系统工程有限公司 加油站挥发性有机化合物降解装置
GB2497273B (en) 2011-11-19 2017-09-13 Edwards Ltd Apparatus for treating a gas stream
CN103465113B (zh) * 2013-09-06 2015-10-21 西安工业大学 用于光学材料去除、抛光的装置及其使用方法和应用
GB2534890A (en) * 2015-02-03 2016-08-10 Edwards Ltd Thermal plasma torch
GB2540992A (en) * 2015-08-04 2017-02-08 Edwards Ltd Control of gas flow and power supplied to a plasma torch in a multiple process chamber gas treatment system
NL2017198B1 (en) * 2016-07-20 2018-01-26 Jiaco Instr Holding B V Decapsulation of electronic devices
CA3052259A1 (en) * 2017-02-03 2018-08-09 The South African Nuclear Energy Corporation Soc Limited Preparation process for rare earth metal fluorides
CN110291611B (zh) 2017-02-09 2022-05-17 应用材料公司 利用水蒸气和氧试剂的等离子体减量技术
GB2567168A (en) * 2017-10-04 2019-04-10 Edwards Ltd Nozzle and method
JP2021526966A (ja) * 2018-06-12 2021-10-11 エージーシー グラス ユーロップＡｇｃ Ｇｌａｓｓ Ｅｕｒｏｐｅ 触媒ナノ粒子、触媒表面及び／又は触媒を調製する方法
KR102243816B1 (ko) * 2019-07-09 2021-04-23 한국핵융합에너지연구원 워터젯 액상 방전 발생 장치 및 이를 이용한 액체 물질의 코팅 장치 및 액체의 살균 장치
CN115554823B (zh) * 2022-06-16 2023-08-04 西安交通大学 基于热等离子体的六氟化硫降解装置

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JP2001009233A (ja) * 1999-06-30 2001-01-16 Daihen Corp フロン等のプラズマアーク分解無害化装置
JP2002273169A (ja) * 2001-03-22 2002-09-24 Mitsubishi Electric Corp ハロゲン含有ガスの処理装置
JP2003117344A (ja) * 2001-10-12 2003-04-22 Seiko Epson Corp 除害装置用ｈ２ｏ供給機構及びプラズマ除害方法
JP2003245520A (ja) * 2002-02-26 2003-09-02 Seiko Epson Corp Ｐｆｃ分解方法、ｐｆｃ分解装置及び半導体装置の製造方法
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010058009A (ja) * 2008-09-01 2010-03-18 Landmark Technology:Kk 三フッ化窒素分解処理方法および三フッ化窒素分解処理装置
JP2014508635A (ja) * 2010-12-31 2014-04-10 武▲漢凱▼迪工程技▲術▼研究▲総▼院有限公司 プラズマを使用する活性粒子に富む高温水蒸気の調製方法および装置
KR200488645Y1 (ko) 2016-12-09 2019-03-06 (주)트리플코어스코리아 음전극의 방열구조 및 이를 포함하는 플라즈마 스크러버
JPWO2018221067A1 (ja) * 2017-05-29 2020-02-06 カンケンテクノ株式会社 排ガスの減圧除害方法及びその装置
US11504669B2 (en) 2017-05-29 2022-11-22 Kanken Techno Co., Ltd. Method for exhaust gas abatement under reduced pressure and apparatus therefor
CN114288961A (zh) * 2021-12-08 2022-04-08 核工业西南物理研究院 一种热等离子体还原氟化物的装置及方法

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Publication number Publication date
EP1715937B1 (en) 2013-04-10
WO2005079958A1 (en) 2005-09-01
US20070235339A1 (en) 2007-10-11
EP1715937A1 (en) 2006-11-02
CN1917932B (zh) 2010-09-29
KR101107855B1 (ko) 2012-01-31
TWI364316B (en) 2012-05-21
KR20070004634A (ko) 2007-01-09
GB0403797D0 (en) 2004-03-24
TW200533410A (en) 2005-10-16
CN1917932A (zh) 2007-02-21

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