CN1917932B - 包含氟化合物的气流的处理方法和装置 - Google Patents

包含氟化合物的气流的处理方法和装置 Download PDF

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Publication number
CN1917932B
CN1917932B CN2005800050156A CN200580005015A CN1917932B CN 1917932 B CN1917932 B CN 1917932B CN 2005800050156 A CN2005800050156 A CN 2005800050156A CN 200580005015 A CN200580005015 A CN 200580005015A CN 1917932 B CN1917932 B CN 1917932B
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chamber
plasma
plasma jet
ion gun
transferred
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Expired - Lifetime
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Chinese (zh)
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CN1917932A (zh
Inventor
J·R·史密斯
A·J·西利
M·雷都犹
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Edwards Ltd
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BOC Group Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2047—Hydrofluoric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2066—Fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
    • B01J2219/0896—Cold plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Chemistry (AREA)
  • Epidemiology (AREA)
  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Treating Waste Gases (AREA)
  • Drying Of Semiconductors (AREA)
CN2005800050156A 2004-02-20 2005-02-18 包含氟化合物的气流的处理方法和装置 Expired - Lifetime CN1917932B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0403797.4 2004-02-20
GBGB0403797.4A GB0403797D0 (en) 2004-02-20 2004-02-20 Gas abatement
PCT/GB2005/000619 WO2005079958A1 (en) 2004-02-20 2005-02-18 Method and apparatus for treating a fluorocompound-containing gas stream

Publications (2)

Publication Number Publication Date
CN1917932A CN1917932A (zh) 2007-02-21
CN1917932B true CN1917932B (zh) 2010-09-29

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CN2005800050156A Expired - Lifetime CN1917932B (zh) 2004-02-20 2005-02-18 包含氟化合物的气流的处理方法和装置

Country Status (8)

Country Link
US (1) US20070235339A1 (enExample)
EP (1) EP1715937B1 (enExample)
JP (1) JP2007522935A (enExample)
KR (1) KR101107855B1 (enExample)
CN (1) CN1917932B (enExample)
GB (1) GB0403797D0 (enExample)
TW (1) TWI364316B (enExample)
WO (1) WO2005079958A1 (enExample)

Cited By (1)

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KR200488645Y1 (ko) 2016-12-09 2019-03-06 (주)트리플코어스코리아 음전극의 방열구조 및 이를 포함하는 플라즈마 스크러버

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GB0605048D0 (en) * 2006-03-14 2006-04-26 Boc Group Plc Apparatus for treating a gas stream
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JP2010058009A (ja) * 2008-09-01 2010-03-18 Landmark Technology:Kk 三フッ化窒素分解処理方法および三フッ化窒素分解処理装置
KR100987978B1 (ko) * 2008-10-27 2010-10-18 (주)트리플코어스코리아 가스 스크러빙 장치 및 가스 스크러빙 방법
CN101492812B (zh) * 2008-11-24 2011-03-23 招商局漳州开发区创大太阳能有限公司 一种可连续大面积均匀化学气相沉积的喷头系统
CN101496992B (zh) * 2009-01-15 2011-09-07 大连海事大学 去除全氟碳化物气体的系统和方法
US20100258510A1 (en) * 2009-04-10 2010-10-14 Applied Materials, Inc. Methods and apparatus for treating effluent
KR101127096B1 (ko) * 2009-05-11 2012-03-23 주성호 스팀프라즈마를 이용한 악성오염물질 열분해처리장치
US8153958B2 (en) * 2009-07-10 2012-04-10 Sphere Renewable Energy Corp. Method and apparatus for producing hyperthermal beams
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CN102125818B (zh) * 2010-12-31 2013-12-11 武汉凯迪工程技术研究总院有限公司 用等离子体制取高温、富含活性粒子水蒸汽的方法及装置
GB2497273B (en) 2011-11-19 2017-09-13 Edwards Ltd Apparatus for treating a gas stream
CN103465113B (zh) * 2013-09-06 2015-10-21 西安工业大学 用于光学材料去除、抛光的装置及其使用方法和应用
GB2534890A (en) * 2015-02-03 2016-08-10 Edwards Ltd Thermal plasma torch
GB2540992A (en) * 2015-08-04 2017-02-08 Edwards Ltd Control of gas flow and power supplied to a plasma torch in a multiple process chamber gas treatment system
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CA3052259A1 (en) * 2017-02-03 2018-08-09 The South African Nuclear Energy Corporation Soc Limited Preparation process for rare earth metal fluorides
CN110291611B (zh) 2017-02-09 2022-05-17 应用材料公司 利用水蒸气和氧试剂的等离子体减量技术
CN110582340A (zh) * 2017-05-29 2019-12-17 北京康肯环保设备有限公司 排气的减压除害方法及其装置
GB2567168A (en) * 2017-10-04 2019-04-10 Edwards Ltd Nozzle and method
JP2021526966A (ja) * 2018-06-12 2021-10-11 エージーシー グラス ユーロップＡｇｃ Ｇｌａｓｓ Ｅｕｒｏｐｅ 触媒ナノ粒子、触媒表面及び／又は触媒を調製する方法
KR102243816B1 (ko) * 2019-07-09 2021-04-23 한국핵융합에너지연구원 워터젯 액상 방전 발생 장치 및 이를 이용한 액체 물질의 코팅 장치 및 액체의 살균 장치
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KR200488645Y1 (ko) 2016-12-09 2019-03-06 (주)트리플코어스코리아 음전극의 방열구조 및 이를 포함하는 플라즈마 스크러버

Also Published As

Publication number Publication date
EP1715937B1 (en) 2013-04-10
WO2005079958A1 (en) 2005-09-01
US20070235339A1 (en) 2007-10-11
JP2007522935A (ja) 2007-08-16
EP1715937A1 (en) 2006-11-02
KR101107855B1 (ko) 2012-01-31
TWI364316B (en) 2012-05-21
KR20070004634A (ko) 2007-01-09
GB0403797D0 (en) 2004-03-24
TW200533410A (en) 2005-10-16
CN1917932A (zh) 2007-02-21

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