KR101070041B1 - 슬릿 노즐 및 그 슬릿 노즐을 사용한 처리액 공급장치 - Google Patents

슬릿 노즐 및 그 슬릿 노즐을 사용한 처리액 공급장치 Download PDF

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Publication number
KR101070041B1
KR101070041B1 KR1020040024826A KR20040024826A KR101070041B1 KR 101070041 B1 KR101070041 B1 KR 101070041B1 KR 1020040024826 A KR1020040024826 A KR 1020040024826A KR 20040024826 A KR20040024826 A KR 20040024826A KR 101070041 B1 KR101070041 B1 KR 101070041B1
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KR
South Korea
Prior art keywords
slit nozzle
processing liquid
slit
temperature
treatment liquid
Prior art date
Application number
KR1020040024826A
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English (en)
Korean (ko)
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KR20040089562A (ko
Inventor
시마이후토시
가와타시게루
Original Assignee
도쿄 오카 고교 가부시키가이샤
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Application filed by 도쿄 오카 고교 가부시키가이샤 filed Critical 도쿄 오카 고교 가부시키가이샤
Publication of KR20040089562A publication Critical patent/KR20040089562A/ko
Application granted granted Critical
Publication of KR101070041B1 publication Critical patent/KR101070041B1/ko

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    • EFIXED CONSTRUCTIONS
    • E02HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02BHYDRAULIC ENGINEERING
    • E02B3/00Engineering works in connection with control or use of streams, rivers, coasts, or other marine sites; Sealings or joints for engineering works in general
    • E02B3/04Structures or apparatus for, or methods of, protecting banks, coasts, or harbours
    • E02B3/12Revetment of banks, dams, watercourses, or the like, e.g. the sea-floor
    • E02B3/129Polyhedrons, tetrapods or similar bodies, whether or not threaded on strings
    • EFIXED CONSTRUCTIONS
    • E02HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02BHYDRAULIC ENGINEERING
    • E02B2201/00Devices, constructional details or methods of hydraulic engineering not otherwise provided for
    • EFIXED CONSTRUCTIONS
    • E02HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02BHYDRAULIC ENGINEERING
    • E02B3/00Engineering works in connection with control or use of streams, rivers, coasts, or other marine sites; Sealings or joints for engineering works in general
    • E02B3/04Structures or apparatus for, or methods of, protecting banks, coasts, or harbours
    • E02B3/06Moles; Piers; Quays; Quay walls; Groynes; Breakwaters ; Wave dissipating walls; Quay equipment

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Coating Apparatus (AREA)
  • Ocean & Marine Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nozzles (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
KR1020040024826A 2003-04-14 2004-04-12 슬릿 노즐 및 그 슬릿 노즐을 사용한 처리액 공급장치 KR101070041B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003108952A JP3838990B2 (ja) 2003-04-14 2003-04-14 スリットノズル及びそのスリットノズルを用いた処理液供給装置
JPJP-P-2003-00108952 2003-04-14

Publications (2)

Publication Number Publication Date
KR20040089562A KR20040089562A (ko) 2004-10-21
KR101070041B1 true KR101070041B1 (ko) 2011-10-04

Family

ID=33470265

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040024826A KR101070041B1 (ko) 2003-04-14 2004-04-12 슬릿 노즐 및 그 슬릿 노즐을 사용한 처리액 공급장치

Country Status (4)

Country Link
JP (1) JP3838990B2 (ja)
KR (1) KR101070041B1 (ja)
CN (1) CN100376330C (ja)
TW (1) TWI286673B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4619139B2 (ja) * 2005-01-19 2011-01-26 東京応化工業株式会社 スリットノズル
KR100782539B1 (ko) * 2006-06-15 2007-12-06 세메스 주식회사 슬릿 노즐 및 이를 포함하는 약액 도포 장치
CN101495241B (zh) * 2006-06-16 2012-09-19 曼泰克株式会社 喷嘴装置、使用该喷嘴装置的药液的供给方法
KR100898570B1 (ko) * 2006-12-28 2009-05-19 주식회사 나래나노텍 개선된 노즐 디스펜서
CN103464315B (zh) * 2013-08-28 2015-12-09 清华大学深圳研究生院 一种能形成均匀水幕的工艺喷嘴
CN104635437A (zh) * 2013-11-07 2015-05-20 沈阳芯源微电子设备有限公司 幕状显影喷嘴
US10766041B2 (en) 2014-12-24 2020-09-08 Illinois Tool Works Inc. Flow diverter in fluid application device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11145043A (ja) * 1997-11-12 1999-05-28 Dainippon Screen Mfg Co Ltd 現像装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH021907A (ja) * 1988-06-09 1990-01-08 Nec Kyushu Ltd インライン型半導体熱処理装置
JPH10174922A (ja) * 1996-12-19 1998-06-30 Konica Corp 塗布装置及び塗布方法
JPH11197576A (ja) * 1998-01-08 1999-07-27 Konica Corp 塗布装置及び塗布方法
JPH11319865A (ja) * 1998-05-18 1999-11-24 Sumitomo Heavy Ind Ltd 生物ろ過設備
JP2000102759A (ja) * 1998-07-31 2000-04-11 Toray Ind Inc 塗布方法および塗布装置並びにプラズマディスプレイおよびディスプレイ用部材の製造方法および製造装置
JP2002086041A (ja) * 2000-09-12 2002-03-26 Nitto Denko Corp エクストリュージョン用ダイ
JP2002219399A (ja) * 2001-01-29 2002-08-06 Nec Corp ダイコータ
JP2002336763A (ja) * 2001-05-15 2002-11-26 Sony Corp 塗布装置及び塗布方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11145043A (ja) * 1997-11-12 1999-05-28 Dainippon Screen Mfg Co Ltd 現像装置

Also Published As

Publication number Publication date
KR20040089562A (ko) 2004-10-21
CN100376330C (zh) 2008-03-26
TWI286673B (en) 2007-09-11
CN1541779A (zh) 2004-11-03
TW200506541A (en) 2005-02-16
JP2004313873A (ja) 2004-11-11
JP3838990B2 (ja) 2006-10-25

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