KR101005031B1 - 유체혼합시스템 및 유체혼합장치 - Google Patents
유체혼합시스템 및 유체혼합장치 Download PDFInfo
- Publication number
- KR101005031B1 KR101005031B1 KR1020080084568A KR20080084568A KR101005031B1 KR 101005031 B1 KR101005031 B1 KR 101005031B1 KR 1020080084568 A KR1020080084568 A KR 1020080084568A KR 20080084568 A KR20080084568 A KR 20080084568A KR 101005031 B1 KR101005031 B1 KR 101005031B1
- Authority
- KR
- South Korea
- Prior art keywords
- gas
- flow rate
- fluid
- fluid mixing
- duty ratio
- Prior art date
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
- G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
- G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
- G05D11/131—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
- G05D11/132—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components by controlling the flow of the individual components
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/86389—Programmer or timer
- Y10T137/86445—Plural, sequential, valve actuations
- Y10T137/86461—Variable cycle
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/877—With flow control means for branched passages
- Y10T137/87885—Sectional block structure
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Accessories For Mixers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007226913A JP5001757B2 (ja) | 2007-08-31 | 2007-08-31 | 流体混合システム及び流体混合装置 |
JPJP-P-2007-00226913 | 2007-08-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20090023230A KR20090023230A (ko) | 2009-03-04 |
KR101005031B1 true KR101005031B1 (ko) | 2010-12-30 |
Family
ID=40407256
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080084568A KR101005031B1 (ko) | 2007-08-31 | 2008-08-28 | 유체혼합시스템 및 유체혼합장치 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8201989B2 (zh) |
JP (1) | JP5001757B2 (zh) |
KR (1) | KR101005031B1 (zh) |
CN (1) | CN101376088B (zh) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2940624A1 (fr) * | 2008-12-30 | 2010-07-02 | Akhea | Dispositif melangeur d'au moins deux constituants gazeux |
KR101366019B1 (ko) * | 2010-02-22 | 2014-02-21 | 가부시키가이샤 후지킨 | 혼합 가스 공급 장치 |
US8522819B2 (en) * | 2011-01-21 | 2013-09-03 | Nissan North America, Inc. | Fluid distribution assembly for testing systems |
US8418732B2 (en) * | 2011-07-06 | 2013-04-16 | Air Products And Chemicals, Inc. | Blending compressed gases |
US9958302B2 (en) | 2011-08-20 | 2018-05-01 | Reno Technologies, Inc. | Flow control system, method, and apparatus |
US9188989B1 (en) | 2011-08-20 | 2015-11-17 | Daniel T. Mudd | Flow node to deliver process gas using a remote pressure measurement device |
DE102012001267A1 (de) * | 2012-01-23 | 2013-07-25 | Carl Zeiss Microscopy Gmbh | Partikelstrahlsystem mit Zuführung von Prozessgas zu einem Bearbeitungsort |
DE102012003278A1 (de) * | 2012-02-20 | 2013-08-22 | Bürkert Werke GmbH | Gasmischer |
US9004107B2 (en) * | 2012-08-21 | 2015-04-14 | Applied Materials, Inc. | Methods and apparatus for enhanced gas flow rate control |
EP2740528B1 (en) * | 2012-12-10 | 2015-11-04 | Gometrics S.L. | Gas mixer |
FR3021879B1 (fr) * | 2014-06-04 | 2021-04-30 | World Aero Techno Trend Watt | Dispositif de melange d'un gaz traceur avec un gaz porteur et procede de melange prevoyant un tel dispositif de melange |
CN104142695A (zh) * | 2014-07-02 | 2014-11-12 | 苏州宏瑞净化科技有限公司 | 一种合流式气体流量控制装置 |
US10838437B2 (en) | 2018-02-22 | 2020-11-17 | Ichor Systems, Inc. | Apparatus for splitting flow of process gas and method of operating same |
US10303189B2 (en) | 2016-06-30 | 2019-05-28 | Reno Technologies, Inc. | Flow control system, method, and apparatus |
US10679880B2 (en) | 2016-09-27 | 2020-06-09 | Ichor Systems, Inc. | Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same |
US11144075B2 (en) | 2016-06-30 | 2021-10-12 | Ichor Systems, Inc. | Flow control system, method, and apparatus |
CN106064026A (zh) * | 2016-07-26 | 2016-11-02 | 液化空气(中国)研发有限公司 | 多元气体混配系统 |
WO2018123193A1 (ja) * | 2016-12-28 | 2018-07-05 | オルガノ株式会社 | 希釈液製造装置および希釈液製造方法 |
US10663337B2 (en) | 2016-12-30 | 2020-05-26 | Ichor Systems, Inc. | Apparatus for controlling flow and method of calibrating same |
JP7296854B2 (ja) * | 2019-11-07 | 2023-06-23 | 東京エレクトロン株式会社 | ガス供給方法及び基板処理装置 |
WO2022186971A1 (en) | 2021-03-03 | 2022-09-09 | Ichor Systems, Inc. | Fluid flow control system comprising a manifold assembly |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006272323A (ja) * | 2005-03-04 | 2006-10-12 | Able Corp | ガス混合装置及びガス混合方法 |
JP2007175691A (ja) * | 2005-12-02 | 2007-07-12 | Asahi Organic Chem Ind Co Ltd | 流体混合装置 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52133294A (en) * | 1976-05-01 | 1977-11-08 | Nippon Bunko Kogyo Kk | Pumping system and liquid transfer process for liquid chromatography |
US4392514A (en) * | 1981-01-26 | 1983-07-12 | Queue Systems, Inc. | Apparatus and method for precision gas mixing |
JPS57198864A (en) * | 1981-05-30 | 1982-12-06 | Shimadzu Corp | Mixing device for solvent of high-speed liquid chromatograph |
DE3511731A1 (de) * | 1985-03-30 | 1986-10-02 | Robert Bosch Gmbh, 7000 Stuttgart | Gaszufuehreinrichtung zum einlassen eines aus mindestens zwei komponenten bestehenden, brennbaren gasgemisches |
DE3716289A1 (de) * | 1987-05-15 | 1988-11-24 | Leybold Ag | Einrichtung fuer die herstellung bestimmter konzentrationen gasfoermiger stoffe sowie zum mischen verschiedener gasfoermiger stoffe in einem vorgegebenen verhaeltnis |
JP3362204B2 (ja) * | 1993-01-28 | 2003-01-07 | 山善株式会社 | 低圧グラジェンターにおける2液の混合方法 |
JPH06229997A (ja) * | 1993-01-29 | 1994-08-19 | Yamazen Kk | 低圧グラジェンター |
JP4033925B2 (ja) * | 1996-04-03 | 2008-01-16 | 大陽日酸株式会社 | 混合ガス供給装置 |
US5662143A (en) * | 1996-05-16 | 1997-09-02 | Gasonics International | Modular gas box system |
JP3144771B2 (ja) * | 1997-09-29 | 2001-03-12 | 旭サナック株式会社 | 多液混合方法 |
AT406096B (de) * | 1997-12-22 | 2000-02-25 | Avl List Gmbh | Verfahren und vorrichtung zur erzeugung präziser, kontinuierlicher mischgasströme |
US6210482B1 (en) * | 1999-04-22 | 2001-04-03 | Fujikin Incorporated | Apparatus for feeding gases for use in semiconductor manufacturing |
EP1132669B1 (en) * | 2000-03-10 | 2004-10-13 | Tokyo Electron Limited | Fluid control apparatus |
US6631334B2 (en) * | 2000-12-26 | 2003-10-07 | Mks Instruments, Inc. | Pressure-based mass flow controller system |
WO2002095519A1 (en) * | 2001-05-24 | 2002-11-28 | Unit Instruments, Inc. | Method and apparatus for providing a determined ratio of process fluids |
JP3564115B2 (ja) * | 2001-12-06 | 2004-09-08 | シーケーディ株式会社 | ガス供給ユニット |
US7216019B2 (en) * | 2004-07-08 | 2007-05-08 | Celerity, Inc. | Method and system for a mass flow controller with reduced pressure sensitivity |
JP4585324B2 (ja) * | 2005-01-26 | 2010-11-24 | 株式会社日立製作所 | 電気機器の制御方法、及び電気機器の制御システム |
JP4854330B2 (ja) | 2005-12-02 | 2012-01-18 | 旭有機材工業株式会社 | 流体混合装置 |
JP5459895B2 (ja) * | 2007-10-15 | 2014-04-02 | Ckd株式会社 | ガス分流供給ユニット |
-
2007
- 2007-08-31 JP JP2007226913A patent/JP5001757B2/ja active Active
-
2008
- 2008-07-30 US US12/219,917 patent/US8201989B2/en not_active Expired - Fee Related
- 2008-08-28 KR KR1020080084568A patent/KR101005031B1/ko active IP Right Grant
- 2008-09-01 CN CN2008102111906A patent/CN101376088B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006272323A (ja) * | 2005-03-04 | 2006-10-12 | Able Corp | ガス混合装置及びガス混合方法 |
JP2007175691A (ja) * | 2005-12-02 | 2007-07-12 | Asahi Organic Chem Ind Co Ltd | 流体混合装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20090023230A (ko) | 2009-03-04 |
CN101376088B (zh) | 2012-12-26 |
JP2009056411A (ja) | 2009-03-19 |
JP5001757B2 (ja) | 2012-08-15 |
CN101376088A (zh) | 2009-03-04 |
US8201989B2 (en) | 2012-06-19 |
US20090059717A1 (en) | 2009-03-05 |
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