KR100972240B1 - 노광 장치 및 디바이스 제조 방법 - Google Patents

노광 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR100972240B1
KR100972240B1 KR1020070112939A KR20070112939A KR100972240B1 KR 100972240 B1 KR100972240 B1 KR 100972240B1 KR 1020070112939 A KR1020070112939 A KR 1020070112939A KR 20070112939 A KR20070112939 A KR 20070112939A KR 100972240 B1 KR100972240 B1 KR 100972240B1
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South Korea
Prior art keywords
exposure
shutter
substrate
controller
dose
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KR1020070112939A
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Korean (ko)
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KR20080041591A (ko
Inventor
신이치 히라노
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020070112939A 2006-11-07 2007-11-07 노광 장치 및 디바이스 제조 방법 Active KR100972240B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006302137A JP5100088B2 (ja) 2006-11-07 2006-11-07 露光装置及びデバイス製造方法
JPJP-P-2006-00302137 2006-11-07

Publications (2)

Publication Number Publication Date
KR20080041591A KR20080041591A (ko) 2008-05-13
KR100972240B1 true KR100972240B1 (ko) 2010-07-23

Family

ID=39359445

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070112939A Active KR100972240B1 (ko) 2006-11-07 2007-11-07 노광 장치 및 디바이스 제조 방법

Country Status (4)

Country Link
US (1) US7936446B2 (https=)
JP (1) JP5100088B2 (https=)
KR (1) KR100972240B1 (https=)
TW (1) TWI388937B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5173650B2 (ja) 2008-07-29 2013-04-03 キヤノン株式会社 露光装置およびデバイス製造方法
KR101154779B1 (ko) * 2011-03-11 2012-06-18 하이디스 테크놀로지 주식회사 포토 리소그래피 방법
TWI436030B (zh) 2012-07-04 2014-05-01 Test Research Inc 三維量測系統
CN103528541B (zh) * 2012-07-04 2016-05-04 德律科技股份有限公司 三维测量系统
JP6861463B2 (ja) * 2015-06-16 2021-04-21 キヤノン株式会社 露光装置及び物品の製造方法
KR102355296B1 (ko) * 2017-08-08 2022-01-25 삼성전자주식회사 반도체 메모리 장치 및 이의 제조를 위한 반도체 메모리 제조 장치
JP7352332B2 (ja) * 2018-05-14 2023-09-28 キヤノン株式会社 露光装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06120103A (ja) * 1992-10-07 1994-04-28 Canon Inc 露光装置
JPH07142305A (ja) * 1993-06-29 1995-06-02 Canon Inc Ｘ線露光方法と装置、並びにデバイス製造方法
JPH10284371A (ja) 1997-04-03 1998-10-23 Nikon Corp 露光方法及び装置
KR20010051336A (ko) * 1999-11-11 2001-06-25 히가시 데쓰로 기판처리장치 및 기판처리방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5771132A (en) * 1980-10-21 1982-05-01 Canon Inc Exposure controlling system
JPS6134252A (ja) 1984-07-20 1986-02-18 津田駒工業株式会社 織機における不良緯糸の自動引出方法と装置
JPH0555106A (ja) * 1991-08-28 1993-03-05 Canon Inc 露光量制御装置
JP2843895B2 (ja) * 1991-10-01 1999-01-06 キヤノン株式会社 露光装置
JPH09320938A (ja) * 1996-05-29 1997-12-12 Nikon Corp 投影露光装置
JP2005252161A (ja) * 2004-03-08 2005-09-15 Powerchip Semiconductor Corp フォトリソグラフィーシステム及び関連方法
JP5025250B2 (ja) * 2006-12-15 2012-09-12 キヤノン株式会社 露光装置及びデバイス製造方法
JP5173650B2 (ja) * 2008-07-29 2013-04-03 キヤノン株式会社 露光装置およびデバイス製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06120103A (ja) * 1992-10-07 1994-04-28 Canon Inc 露光装置
JPH07142305A (ja) * 1993-06-29 1995-06-02 Canon Inc Ｘ線露光方法と装置、並びにデバイス製造方法
JPH10284371A (ja) 1997-04-03 1998-10-23 Nikon Corp 露光方法及び装置
KR20010051336A (ko) * 1999-11-11 2001-06-25 히가시 데쓰로 기판처리장치 및 기판처리방법

Also Published As

Publication number Publication date
JP5100088B2 (ja) 2012-12-19
JP2008118062A (ja) 2008-05-22
KR20080041591A (ko) 2008-05-13
US7936446B2 (en) 2011-05-03
TW200832078A (en) 2008-08-01
TWI388937B (zh) 2013-03-11
US20080106721A1 (en) 2008-05-08

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