KR100817655B1 - 파면수차를 측정하는 측정장치 및 그것을 가지는 노광장치 - Google Patents

파면수차를 측정하는 측정장치 및 그것을 가지는 노광장치 Download PDF

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Publication number
KR100817655B1
KR100817655B1 KR1020060043736A KR20060043736A KR100817655B1 KR 100817655 B1 KR100817655 B1 KR 100817655B1 KR 1020060043736 A KR1020060043736 A KR 1020060043736A KR 20060043736 A KR20060043736 A KR 20060043736A KR 100817655 B1 KR100817655 B1 KR 100817655B1
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South Korea
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optical system
light
opening
mask
aberration
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KR20060119775A (ko
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카즈키 야마모토
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
KR1020060043736A 2005-05-17 2006-05-16 파면수차를 측정하는 측정장치 및 그것을 가지는 노광장치 Expired - Fee Related KR100817655B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005143922A JP2006324311A (ja) 2005-05-17 2005-05-17 波面収差測定装置及びそれを有する露光装置
JPJP-P-2005-00143922 2005-05-17

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020070135517A Division KR100817988B1 (ko) 2005-05-17 2007-12-21 파면수차를 측정하는 측정장치 및 그것을 가지는 노광장치,그리고 파면수차의 측정방법

Publications (2)

Publication Number Publication Date
KR20060119775A KR20060119775A (ko) 2006-11-24
KR100817655B1 true KR100817655B1 (ko) 2008-03-27

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KR1020060043736A Expired - Fee Related KR100817655B1 (ko) 2005-05-17 2006-05-16 파면수차를 측정하는 측정장치 및 그것을 가지는 노광장치
KR1020070135517A Expired - Fee Related KR100817988B1 (ko) 2005-05-17 2007-12-21 파면수차를 측정하는 측정장치 및 그것을 가지는 노광장치,그리고 파면수차의 측정방법

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KR1020070135517A Expired - Fee Related KR100817988B1 (ko) 2005-05-17 2007-12-21 파면수차를 측정하는 측정장치 및 그것을 가지는 노광장치,그리고 파면수차의 측정방법

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US (2) US7623247B2 (enExample)
EP (1) EP1724642A3 (enExample)
JP (1) JP2006324311A (enExample)
KR (2) KR100817655B1 (enExample)

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EP1704445A2 (de) * 2004-01-16 2006-09-27 Carl Zeiss SMT AG Vorrichtung und verfahren zur optischen vermessung eines optischen systems, messstrukturträger und mikrolithographie-projekti onsbelichtungsanlage
JP4666982B2 (ja) * 2004-09-02 2011-04-06 キヤノン株式会社 光学特性測定装置、露光装置及びデバイス製造方法
KR101332540B1 (ko) 2005-05-27 2013-11-22 칼 짜이스 에스엠테 게엠베하 광산란 디스크, 그 사용 및 파면 측정 장치
JP2007180152A (ja) * 2005-12-27 2007-07-12 Canon Inc 測定方法及び装置、露光装置、並びに、デバイス製造方法
JP2007335493A (ja) * 2006-06-13 2007-12-27 Canon Inc 測定方法及び装置、露光装置、並びに、デバイス製造方法
JP2008192855A (ja) * 2007-02-05 2008-08-21 Canon Inc 測定装置、露光装置及びデバイス製造方法
JP5063229B2 (ja) * 2007-07-12 2012-10-31 キヤノン株式会社 露光装置及びデバイス製造方法
JP2009210359A (ja) * 2008-03-03 2009-09-17 Canon Inc 評価方法、評価装置および露光装置
JP2009216454A (ja) * 2008-03-07 2009-09-24 Canon Inc 波面収差測定装置、波面収差測定方法、露光装置およびデバイス製造方法
JP5424697B2 (ja) * 2009-04-22 2014-02-26 キヤノン株式会社 トールボット干渉計、トールボット干渉計の調整方法、及び露光装置
JP5503193B2 (ja) * 2009-06-08 2014-05-28 キヤノン株式会社 波面収差の測定装置、露光装置及びデバイス製造方法
JP5538851B2 (ja) * 2009-12-09 2014-07-02 キヤノン株式会社 測定装置、露光装置及びデバイスの製造方法
CN102692820B (zh) * 2011-03-21 2014-12-17 上海微电子装备有限公司 一种测量投影物镜畸变的装置及方法
CN105424325B (zh) * 2015-12-24 2018-03-20 中国科学院上海光学精密机械研究所 点衍射干涉波像差测量仪及光学系统波像差的检测方法
CN105466668B (zh) * 2015-12-24 2018-01-12 中国科学院上海光学精密机械研究所 点衍射干涉波像差测量仪及光学系统波像差的检测方法
CN107144420B (zh) * 2017-04-26 2020-01-31 长沙青波光电科技有限公司 光学镜头像差检测装置及方法
WO2022171289A1 (en) * 2021-02-11 2022-08-18 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Method and system for characterizing a focusing optical element
CN116858496B (zh) * 2023-05-05 2024-08-13 中国科学院高能物理研究所 一种基于多刃边扫描的波前检测方法及装置

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JPH05283317A (ja) * 1992-03-31 1993-10-29 Canon Inc 照明装置及びそれを用いた投影露光装置
KR950030216A (ko) * 1994-04-22 1995-11-24 미타라이 하지메 투영노광장치 및 마이크로장치의 제조방법
JP2000097666A (ja) * 1998-09-22 2000-04-07 Nikon Corp 面形状計測用干渉計、波面収差測定機、前記干渉計及び前記波面収差測定機を用いた投影光学系の製造方法、及び前記干渉計の校正方法
KR20010034412A (ko) * 1998-05-19 2001-04-25 오노 시게오 수차측정장치와 측정방법 및 이 장치를 구비한투영노광장치와 이 방법을 이용한 디바이스 제조방법,노광방법
KR20020075432A (ko) * 2000-12-22 2002-10-04 가부시키가이샤 니콘 파면수차 측정장치, 파면수차 측정방법, 노광장치 및마이크로 디바이스의 제조방법
KR20040111530A (ko) * 2002-04-17 2004-12-31 캐논 가부시끼가이샤 레티클 및 광학특성 계측방법

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JP2538435B2 (ja) 1991-03-27 1996-09-25 理化学研究所 縞位相分布解析方法および縞位相分布解析装置
US6151122A (en) * 1995-02-21 2000-11-21 Nikon Corporation Inspection method and apparatus for projection optical systems
JPH1114322A (ja) 1997-06-19 1999-01-22 Canon Inc 電子モアレ測定方法及びそれを用いた測定装置
US6312373B1 (en) * 1998-09-22 2001-11-06 Nikon Corporation Method of manufacturing an optical system
US6307635B1 (en) * 1998-10-21 2001-10-23 The Regents Of The University Of California Phase-shifting point diffraction interferometer mask designs
JP2000146705A (ja) 1998-11-04 2000-05-26 Nikon Corp グレーティングシアリング干渉計を用いた位相分布の計測方法
US6111646A (en) * 1999-01-12 2000-08-29 Naulleau; Patrick Null test fourier domain alignment technique for phase-shifting point diffraction interferometer
US6573997B1 (en) * 2000-07-17 2003-06-03 The Regents Of California Hybrid shearing and phase-shifting point diffraction interferometer
JP2004037429A (ja) 2002-07-08 2004-02-05 Nikon Corp シアリング干渉計の校正方法、投影光学系の製造方法、投影光学系、及び投影露光装置
JP4266673B2 (ja) * 2003-03-05 2009-05-20 キヤノン株式会社 収差測定装置
JP2004269731A (ja) 2003-03-10 2004-09-30 Toyo Ink Mfg Co Ltd 平版印刷インキ
JP4408040B2 (ja) * 2003-11-28 2010-02-03 キヤノン株式会社 干渉を利用した測定方法及び装置、それを利用した露光方法及び装置、並びに、デバイス製造方法
JP4464166B2 (ja) * 2004-02-27 2010-05-19 キヤノン株式会社 測定装置を搭載した露光装置
JP2005311080A (ja) * 2004-04-21 2005-11-04 Canon Inc 測定装置、当該測定装置を有する露光装置
JP4095598B2 (ja) * 2004-09-16 2008-06-04 キヤノン株式会社 二次元波面収差の算出方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283317A (ja) * 1992-03-31 1993-10-29 Canon Inc 照明装置及びそれを用いた投影露光装置
KR950030216A (ko) * 1994-04-22 1995-11-24 미타라이 하지메 투영노광장치 및 마이크로장치의 제조방법
KR20010034412A (ko) * 1998-05-19 2001-04-25 오노 시게오 수차측정장치와 측정방법 및 이 장치를 구비한투영노광장치와 이 방법을 이용한 디바이스 제조방법,노광방법
JP2000097666A (ja) * 1998-09-22 2000-04-07 Nikon Corp 面形状計測用干渉計、波面収差測定機、前記干渉計及び前記波面収差測定機を用いた投影光学系の製造方法、及び前記干渉計の校正方法
KR20020075432A (ko) * 2000-12-22 2002-10-04 가부시키가이샤 니콘 파면수차 측정장치, 파면수차 측정방법, 노광장치 및마이크로 디바이스의 제조방법
KR20040111530A (ko) * 2002-04-17 2004-12-31 캐논 가부시끼가이샤 레티클 및 광학특성 계측방법

Also Published As

Publication number Publication date
KR20080005165A (ko) 2008-01-10
KR100817988B1 (ko) 2008-03-31
US7623247B2 (en) 2009-11-24
US20090185194A1 (en) 2009-07-23
EP1724642A2 (en) 2006-11-22
KR20060119775A (ko) 2006-11-24
US20060262323A1 (en) 2006-11-23
US7746479B2 (en) 2010-06-29
EP1724642A3 (en) 2007-08-22
JP2006324311A (ja) 2006-11-30

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