KR100799043B1 - 옥심 에스테르 화합물 및 이 화합물을 함유하는 광중합개시제 - Google Patents

옥심 에스테르 화합물 및 이 화합물을 함유하는 광중합개시제 Download PDF

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KR100799043B1
KR100799043B1 KR1020057023916A KR20057023916A KR100799043B1 KR 100799043 B1 KR100799043 B1 KR 100799043B1 KR 1020057023916 A KR1020057023916 A KR 1020057023916A KR 20057023916 A KR20057023916 A KR 20057023916A KR 100799043 B1 KR100799043 B1 KR 100799043B1
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alkyl group
atom
carbon atoms
group
compound
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KR20070044753A (ko
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미츠오 아쿠츠
다이스케 사와모토
야스노리 코자키
토시히코 무라이
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가부시키가이샤 아데카
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/10—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D421/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having selenium, tellurium, or halogen atoms as ring hetero atoms
    • C07D421/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having selenium, tellurium, or halogen atoms as ring hetero atoms containing two hetero rings
    • C07D421/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having selenium, tellurium, or halogen atoms as ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Indole Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Plural Heterocyclic Compounds (AREA)
KR1020057023916A 2004-08-20 2005-08-03 옥심 에스테르 화합물 및 이 화합물을 함유하는 광중합개시제 Expired - Lifetime KR100799043B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00241370 2004-08-20
JP2004241370 2004-08-20
JP2005148007 2005-05-20
JPJP-P-2005-00148007 2005-05-20
JP2005201128 2005-07-11
JPJP-P-2005-00201128 2005-07-11

Publications (2)

Publication Number Publication Date
KR20070044753A KR20070044753A (ko) 2007-04-30
KR100799043B1 true KR100799043B1 (ko) 2008-01-28

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KR1020057023916A Expired - Lifetime KR100799043B1 (ko) 2004-08-20 2005-08-03 옥심 에스테르 화합물 및 이 화합물을 함유하는 광중합개시제

Country Status (8)

Country Link
US (1) US7696257B2 (https=)
EP (1) EP1780209B1 (https=)
JP (1) JP3992725B2 (https=)
KR (1) KR100799043B1 (https=)
CN (1) CN1805955B (https=)
DE (1) DE602005019888D1 (https=)
TW (1) TW200621755A (https=)
WO (1) WO2006018973A1 (https=)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4948112B2 (ja) * 2006-10-13 2012-06-06 株式会社Ａｄｅｋａ オキシムエステル化合物及び該化合物を有効成分とする光重合開始剤
WO2008059670A1 (en) * 2006-11-15 2008-05-22 Taiyo Ink Mfg. Co., Ltd. Photocurable/thermosetting resin composition, cured object, and printed wiring board
US20090292039A1 (en) * 2006-12-27 2009-11-26 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
US8252512B2 (en) 2007-05-09 2012-08-28 Adeka Corporation Epoxy compound, alkali-developable resin composition, and alkali-developable photosensitive resin composition
US8911921B2 (en) 2007-05-11 2014-12-16 Ciba Corporation Oxime ester photoinitiators
JP5054456B2 (ja) * 2007-07-26 2012-10-24 株式会社Ａｄｅｋａ 重合性液晶化合物及びラジカル光重合開始剤を含有する重合性組成物
KR20100028020A (ko) 2007-08-01 2010-03-11 가부시키가이샤 아데카 알칼리 현상성 감광성 수지 조성물 및 β-디케톤 화합물
JP2009128419A (ja) * 2007-11-20 2009-06-11 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物および積層体
US8283000B2 (en) 2008-02-22 2012-10-09 Adeka Corporation Liquid crystal composition containing polymerizable compound and liquid crystal display using the liquid crystal composition
JP5058039B2 (ja) * 2008-03-18 2012-10-24 株式会社Ｄｎｐファインケミカル 着色層形成用感光性樹脂組成物
JP2009237294A (ja) * 2008-03-27 2009-10-15 The Inctec Inc ブラックマトリクス形成用感光性樹脂組成物
JP5507054B2 (ja) * 2008-03-28 2014-05-28 富士フイルム株式会社 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子
KR20110003312A (ko) 2008-04-01 2011-01-11 가부시키가이샤 아데카 3관능 (메타)아크릴레이트 화합물 및 상기 화합물을 함유하는 중합성 조성물
CN101918397B (zh) * 2008-04-10 2013-11-06 株式会社Lg化学 光活性化合物以及含有该光活性化合物的感光性树脂组合物
JP2009275166A (ja) * 2008-05-16 2009-11-26 Jsr Corp 液晶表示素子用シール剤及び液晶表示素子
KR101121038B1 (ko) * 2008-07-01 2012-03-15 주식회사 엘지화학 복수의 광개시제를 포함한 감광성 수지 조성물, 이를 이용한 투명 박막층 및 액정 표시 장치
JP5284735B2 (ja) 2008-09-18 2013-09-11 株式会社Ａｄｅｋａ 重合性光学活性イミド化合物及び該化合物を含有する重合性組成物
JP5448157B2 (ja) * 2009-03-13 2014-03-19 株式会社Ａｄｅｋａ 芳香族スルホニウム塩化合物
KR101403153B1 (ko) * 2009-03-16 2014-06-09 동우 화인켐 주식회사 단파장 레이저 노광 장치용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 액정 표시 장치
KR20100109860A (ko) * 2009-04-01 2010-10-11 도요 잉키 세이조 가부시끼가이샤 감광성 착색 조성물 및 컬러 필터
JP5422244B2 (ja) * 2009-04-01 2014-02-19 東洋インキＳｃホールディングス株式会社 感光性着色組成物およびカラーフィルタ
CN101525393B (zh) * 2009-04-02 2011-04-27 优缔精细化工（苏州）有限公司 一种肟酯光引发剂及其制备方法
JP5152868B2 (ja) * 2009-06-11 2013-02-27 日本化薬株式会社 可視光硬化性液晶シール剤及びそれを用いた液晶表示セル
KR101678028B1 (ko) * 2009-06-17 2016-11-21 토요잉크Sc홀딩스주식회사 옥심에스테르 화합물, 라디칼 중합개시제, 중합성 조성물, 네가티브형 레지스트 및 화상 패턴
EP2502973A4 (en) 2009-11-18 2014-07-23 Adeka Corp LIQUID CRYSTAL COMPOSITION COMPRISING A POLYMERIZABLE COMPOUND AND A LIQUID CRYSTAL DISPLAY ELEMENT COMPRISING THIS LIQUID CRYSTAL COMPOSITION
JP5946657B2 (ja) * 2011-03-08 2016-07-06 株式会社ダイセル フォトレジスト製造用溶剤または溶剤組成物、及びフォトレジスト製造用組成物
JP5821401B2 (ja) * 2011-08-19 2015-11-24 大日本印刷株式会社 光インプリント用感光性樹脂組成物、硬化物、レジスト基板及び半導体装置の製造方法
CN107652383A (zh) * 2011-10-20 2018-02-02 日立化成株式会社 感光性树脂组合物、感光性元件、抗蚀图形的形成方法以及印刷电路板的制造方法
EP2788325B1 (en) * 2011-12-07 2016-08-10 Basf Se Oxime ester photoinitiators
KR102013541B1 (ko) 2012-05-09 2019-08-22 바스프 에스이 옥심 에스테르 광개시제
JP6464764B2 (ja) * 2015-01-16 2019-02-06 Jsr株式会社 感放射線性着色組成物、スペーサー、その形成方法及び液晶表示素子
JP6621643B2 (ja) * 2015-10-22 2019-12-18 株式会社Adeka オキシムエステル化合物及び該化合物を含有する重合開始剤
KR101829998B1 (ko) * 2015-11-04 2018-02-19 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이를 이용한 차광성 스페이서
EP3246378B1 (en) 2016-05-17 2019-03-20 Merck Patent GmbH Polymerisable liquid crystal material and polymerised liquid crystal film
CN109689840B (zh) * 2016-09-07 2024-01-30 默克专利股份有限公司 液晶介质和光调制元件
CN109957046B (zh) * 2017-12-22 2020-07-03 常州强力先端电子材料有限公司 含氟芴肟酯类光引发剂、包含其的光固化组合物及其应用
CN108752239B (zh) * 2018-07-12 2021-03-19 维思普新材料（苏州）有限公司 肟酯化合物及其制造方法
TWI881096B (zh) 2020-03-30 2025-04-21 日商艾迪科股份有限公司 自由基聚合起始劑、組合物、硬化物及硬化物之製造方法
KR20230121723A (ko) 2020-12-17 2023-08-21 가부시키가이샤 아데카 화합물 및 조성물
KR20240035990A (ko) 2021-07-20 2024-03-19 가부시키가이샤 아데카 반도체용 막 형성 재료, 반도체용 부재 형성 재료, 반도체용 공정 부재 형성 재료, 하층막 형성 재료, 하층막 및 반도체 디바이스
KR20250091208A (ko) 2022-10-26 2025-06-20 가부시키가이샤 아데카 화합물, 조성물, 경화물, 경화물의 제조 방법 및 전자부품의 제조 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002100903A1 (en) * 2001-06-11 2002-12-19 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators having a combined structure
WO2004050653A2 (en) * 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180846A (en) * 1967-08-08 1970-02-11 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
FR2393345A1 (fr) * 1977-06-01 1978-12-29 Agfa Gevaert Nv Fabrication d'elements modifies sous forme d'images
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4590145A (en) * 1985-06-28 1986-05-20 Daicel Chemical Industries, Ltd. Photopolymerization initiator comprised of thioxanthones and oxime esters
SG77689A1 (en) 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
NL1016815C2 (nl) 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
JP2005202252A (ja) 2004-01-16 2005-07-28 Dainippon Printing Co Ltd 固体撮像素子カラーフィルター用感光性着色組成物、固体撮像素子カラーフィルター、固体撮像素子、及び固体撮像素子カラーフィルターの製造方法
JP4830310B2 (ja) * 2004-02-23 2011-12-07 三菱化学株式会社 オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター
WO2005080337A1 (ja) * 2004-02-23 2005-09-01 Mitsubishi Chemical Corporation オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター
WO2006018405A1 (en) * 2004-08-18 2006-02-23 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002100903A1 (en) * 2001-06-11 2002-12-19 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators having a combined structure
WO2004050653A2 (en) * 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups

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Publication number Publication date
CN1805955B (zh) 2011-08-31
EP1780209B1 (en) 2010-03-10
DE602005019888D1 (de) 2010-04-22
US7696257B2 (en) 2010-04-13
EP1780209A1 (en) 2007-05-02
WO2006018973A1 (ja) 2006-02-23
EP1780209A4 (en) 2009-06-03
TWI350835B (https=) 2011-10-21
KR20070044753A (ko) 2007-04-30
JP3992725B2 (ja) 2007-10-17
JPWO2006018973A1 (ja) 2008-05-08
US20070270522A1 (en) 2007-11-22
TW200621755A (en) 2006-07-01
CN1805955A (zh) 2006-07-19

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