KR100748069B1 - 이중 자기 상태의 자기 소자와 그 제작법 - Google Patents
이중 자기 상태의 자기 소자와 그 제작법 Download PDFInfo
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- KR100748069B1 KR100748069B1 KR1020000075640A KR20000075640A KR100748069B1 KR 100748069 B1 KR100748069 B1 KR 100748069B1 KR 1020000075640 A KR1020000075640 A KR 1020000075640A KR 20000075640 A KR20000075640 A KR 20000075640A KR 100748069 B1 KR100748069 B1 KR 100748069B1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3254—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
- H01F10/3272—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
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- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Power Engineering (AREA)
- Nanotechnology (AREA)
- Computer Hardware Design (AREA)
- Hall/Mr Elements (AREA)
- Semiconductor Memories (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Thin Magnetic Films (AREA)
- Magnetic Heads (AREA)
- Measuring Magnetic Variables (AREA)
Abstract
Description
Claims (4)
- 복수의 박막 층을 포함하는 자기 소자(10,10´, 50, 50´, 80)로서, 비트 엔드 정자기 자기 소거 필드가 제로 외부 필드 내에서 이중 자기 상태를 얻기 위해 전체 양 결합 구조(total positive coupling)를 소거하는, 복수의 박막 층을 포함하는 자기 소자.
- 자기 소자로서,특정 강도의 인가된 자계가 존재할 때 바람직한(preferred) 방향 내에 고정되는 자화를 갖고 두께1(t1)을 갖는 고정된 강자성 층(28)과, 두께2(t2)를 갖는 피닝된 강자성 층(24)과, 상기 고정된 강자성 층과 상기 피닝된 강자성 층 사이에 위치한 결합 중간층(26)을 포함하는, 제 1 전극(14)과;제 2 전극(18)으로서 충분히 인가된 자계가 존재할 때 자화가 자유롭게 회전하는 표면을 갖는 자유 강자성 층(30)을 포함하는 제 2 전극(18)과;상기 제 1 전극의 고정된 강자성 층과 상기 제 2 전극의 자유 강자성 층 사이에 위치한 스페이서 층(16)과;상기 제 1 및 제 2 전극과 상기 스페이서 층이 형성되는 기판(12)을 포함하며,상기 고정된 강자성 층의 두께(t1)는 상기 피닝된 강자성 층의 두께(t2)보다 커서, 그로 인해 상기 고정된 강자성 층과 상기 자유 강자성 층 사이의 양 결합을 소거하는,자기소자.
- 자기 소자로서,특정 강도를 지니는 것을 특징으로 하는 인가된 자계가 존재할 때 자기 모멘트가 바람직한 방향으로 피닝되는 피닝된 강자성 층(24)을 포함하는, 제 1 전극(14)과;충분히 인가된 자계가 존재할 때 자화가 자유롭게 회전하는 표면을 갖는 자유 강자성 층(30)을 포함하는 제 2 전극(18)과;상기 제 1 전극의 피닝된 강자성 층과 상기 제 2 전극의 자유 강자성 층 사이에 위치한 스페이서 층(16)과;상기 제 1 및 제 2 전극과 상기 스페이서 층이 형성되는 기판(12)을 포함하며,오프셋은 피닝된 강자기 층에서 자유 강자기 층까지의 자기 소거 필드를 감소시켜 그로 인해 상기 피닝된 강자성 층과 상기 자유 강자성 층 사이의 양 결합을 소거하는,자기 소자.
- 비트 엔드 정자기(magneto-static) 자기 소거 필드가 제로 외부 필드 내에 이중 자기 상태를 얻기 위해 전체 양 결합 구조를 소거하는, 복수의 박막 층을 제공하는 단계를 포함하는, 자기 소자 제작 방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/464,807 | 1999-12-17 | ||
US09/464,807 US6233172B1 (en) | 1999-12-17 | 1999-12-17 | Magnetic element with dual magnetic states and fabrication method thereof |
Publications (2)
Publication Number | Publication Date |
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KR20010062357A KR20010062357A (ko) | 2001-07-07 |
KR100748069B1 true KR100748069B1 (ko) | 2007-08-09 |
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Application Number | Title | Priority Date | Filing Date |
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KR1020000075640A KR100748069B1 (ko) | 1999-12-17 | 2000-12-12 | 이중 자기 상태의 자기 소자와 그 제작법 |
Country Status (7)
Country | Link |
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US (1) | US6233172B1 (ko) |
EP (1) | EP1109168B1 (ko) |
JP (1) | JP4969725B2 (ko) |
KR (1) | KR100748069B1 (ko) |
CN (2) | CN1171323C (ko) |
DE (1) | DE60013079T2 (ko) |
SG (1) | SG87195A1 (ko) |
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CN1171323C (zh) | 2004-10-13 |
CN1309301A (zh) | 2001-08-22 |
JP4969725B2 (ja) | 2012-07-04 |
SG87195A1 (en) | 2002-03-19 |
DE60013079D1 (de) | 2004-09-23 |
CN1591675B (zh) | 2011-11-09 |
EP1109168B1 (en) | 2004-08-18 |
US6233172B1 (en) | 2001-05-15 |
DE60013079T2 (de) | 2005-01-27 |
EP1109168A3 (en) | 2002-04-03 |
JP2001250999A (ja) | 2001-09-14 |
EP1109168A2 (en) | 2001-06-20 |
KR20010062357A (ko) | 2001-07-07 |
CN1591675A (zh) | 2005-03-09 |
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