KR100737035B1 - 기판상에 코팅을 도포하기 위한 모듈 시스템 및 진공모듈 - Google Patents

기판상에 코팅을 도포하기 위한 모듈 시스템 및 진공모듈 Download PDF

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Publication number
KR100737035B1
KR100737035B1 KR1020037000087A KR20037000087A KR100737035B1 KR 100737035 B1 KR100737035 B1 KR 100737035B1 KR 1020037000087 A KR1020037000087 A KR 1020037000087A KR 20037000087 A KR20037000087 A KR 20037000087A KR 100737035 B1 KR100737035 B1 KR 100737035B1
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KR
South Korea
Prior art keywords
substrate
opening
vacuum
module
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020037000087A
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English (en)
Korean (ko)
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KR20030024771A (ko
Inventor
울라드지미르 샤이리파우
미칼라이 레우추크
알리아크산드르 카킬로우
세르게이 마리쉐프
Original Assignee
울라드지미르 샤이리파우
미칼라이 레우추크
알리아크산드르 카킬로우
세르게이 마리쉐프
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Publication date
Application filed by 울라드지미르 샤이리파우, 미칼라이 레우추크, 알리아크산드르 카킬로우, 세르게이 마리쉐프 filed Critical 울라드지미르 샤이리파우
Publication of KR20030024771A publication Critical patent/KR20030024771A/ko
Application granted granted Critical
Publication of KR100737035B1 publication Critical patent/KR100737035B1/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/46—Machines having sequentially arranged operating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00—Apparatus and processes for manufacture of discharge tubes
    • H01J2209/01—Generalised techniques
    • H01J2209/012—Coating
    • H01J2209/015—Machines therefor

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
KR1020037000087A 2000-07-05 2001-05-22 기판상에 코팅을 도포하기 위한 모듈 시스템 및 진공모듈 Expired - Fee Related KR100737035B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EA200000807A EA003148B1 (ru) 2000-07-05 2000-07-05 Вакуумный модуль (его варианты) и система модулей для нанесения покрытий на подложку
EA200000807 2000-07-05
PCT/EA2001/000002 WO2002008484A2 (en) 2000-07-05 2001-05-22 Vacuum module for applying coatings

Publications (2)

Publication Number Publication Date
KR20030024771A KR20030024771A (ko) 2003-03-26
KR100737035B1 true KR100737035B1 (ko) 2007-07-09

Family

ID=8161557

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020037000087A Expired - Fee Related KR100737035B1 (ko) 2000-07-05 2001-05-22 기판상에 코팅을 도포하기 위한 모듈 시스템 및 진공모듈

Country Status (7)

Country Link
JP (1) JP4766821B2 (enExample)
KR (1) KR100737035B1 (enExample)
CN (1) CN100348773C (enExample)
AU (1) AU6896001A (enExample)
EA (1) EA003148B1 (enExample)
MY (1) MY137307A (enExample)
WO (1) WO2002008484A2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006526125A (ja) 2003-05-13 2006-11-16 アプライド　マテリアルズ　インコーポレイテッド 処理チャンバの開口を封止するための方法および装置
EA200501183A1 (ru) * 2005-07-18 2006-12-29 Владимир Яковлевич ШИРИПОВ Вакуумный кластер для нанесения покрытий на подложку (варианты)
EA200601327A1 (ru) * 2006-05-15 2007-12-28 Владимир Яковлевич ШИРИПОВ Способ нанесения пленок нитрида кремния в вакууме (варианты)
EA034967B1 (ru) 2018-05-04 2020-04-13 Общество С Ограниченной Ответственностью "Изовак Технологии" Технологическая линия для формирования тонкопленочных покрытий в вакууме (варианты)
CN110592550A (zh) * 2019-10-28 2019-12-20 上海映晓电子科技有限公司 一种磁控溅射和电子束蒸镀双腔镀膜装置及其使用方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000005188A (ko) * 1996-04-18 2000-01-25 니시무로 타이죠 음극선관의 제조방법및 그 장치

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2008156B (en) * 1977-11-19 1982-06-23 Hunt C J L Vacuum metallising of hollow articles
US5489369A (en) * 1993-10-25 1996-02-06 Viratec Thin Films, Inc. Method and apparatus for thin film coating an article

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000005188A (ko) * 1996-04-18 2000-01-25 니시무로 타이죠 음극선관의 제조방법및 그 장치

Also Published As

Publication number Publication date
JP2004504495A (ja) 2004-02-12
AU6896001A (en) 2002-02-05
WO2002008484A3 (en) 2002-07-04
CN1617947A (zh) 2005-05-18
JP4766821B2 (ja) 2011-09-07
CN100348773C (zh) 2007-11-14
EA003148B1 (ru) 2003-02-27
MY137307A (en) 2009-01-30
WO2002008484A2 (en) 2002-01-31
EA200000807A1 (ru) 2002-02-28
KR20030024771A (ko) 2003-03-26

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