CN100348773C - 用于向一种基片涂敷涂料的真空模块和模块系统 - Google Patents
用于向一种基片涂敷涂料的真空模块和模块系统 Download PDFInfo
- Publication number
- CN100348773C CN100348773C CNB018121780A CN01812178A CN100348773C CN 100348773 C CN100348773 C CN 100348773C CN B018121780 A CNB018121780 A CN B018121780A CN 01812178 A CN01812178 A CN 01812178A CN 100348773 C CN100348773 C CN 100348773C
- Authority
- CN
- China
- Prior art keywords
- substrate
- module
- opening
- vacuum chamber
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 244
- 238000000576 coating method Methods 0.000 title claims abstract description 57
- 238000012545 processing Methods 0.000 claims abstract description 40
- 238000007789 sealing Methods 0.000 claims abstract description 36
- 230000007246 mechanism Effects 0.000 claims abstract description 32
- 238000000151 deposition Methods 0.000 claims abstract description 27
- 230000008021 deposition Effects 0.000 claims abstract description 27
- 238000011282 treatment Methods 0.000 claims description 68
- 230000033001 locomotion Effects 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 20
- 238000004544 sputter deposition Methods 0.000 claims description 13
- 238000004140 cleaning Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 11
- 230000008569 process Effects 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 239000006200 vaporizer Substances 0.000 claims description 4
- 239000010409 thin film Substances 0.000 abstract description 5
- 238000001771 vacuum deposition Methods 0.000 abstract description 3
- 150000002500 ions Chemical class 0.000 description 21
- 239000011248 coating agent Substances 0.000 description 19
- 239000011521 glass Substances 0.000 description 19
- 239000007789 gas Substances 0.000 description 16
- 238000009792 diffusion process Methods 0.000 description 11
- 230000008878 coupling Effects 0.000 description 8
- 238000010168 coupling process Methods 0.000 description 8
- 238000005859 coupling reaction Methods 0.000 description 8
- 239000007888 film coating Substances 0.000 description 8
- 238000009501 film coating Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000005086 pumping Methods 0.000 description 7
- 101100112085 Arabidopsis thaliana CRT3 gene Proteins 0.000 description 6
- 101100141330 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) RNR4 gene Proteins 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 239000008246 gaseous mixture Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000000069 prophylactic effect Effects 0.000 description 2
- IWZSHWBGHQBIML-ZGGLMWTQSA-N (3S,8S,10R,13S,14S,17S)-17-isoquinolin-7-yl-N,N,10,13-tetramethyl-2,3,4,7,8,9,11,12,14,15,16,17-dodecahydro-1H-cyclopenta[a]phenanthren-3-amine Chemical compound CN(C)[C@H]1CC[C@]2(C)C3CC[C@@]4(C)[C@@H](CC[C@@H]4c4ccc5ccncc5c4)[C@@H]3CC=C2C1 IWZSHWBGHQBIML-ZGGLMWTQSA-N 0.000 description 1
- 244000287680 Garcinia dulcis Species 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000011221 initial treatment Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000012958 reprocessing Methods 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/46—Machines having sequentially arranged operating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
- H01J2209/01—Generalised techniques
- H01J2209/012—Coating
- H01J2209/015—Machines therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EA200000807 | 2000-07-05 | ||
| EA200000807A EA003148B1 (ru) | 2000-07-05 | 2000-07-05 | Вакуумный модуль (его варианты) и система модулей для нанесения покрытий на подложку |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1617947A CN1617947A (zh) | 2005-05-18 |
| CN100348773C true CN100348773C (zh) | 2007-11-14 |
Family
ID=8161557
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB018121780A Expired - Fee Related CN100348773C (zh) | 2000-07-05 | 2001-05-22 | 用于向一种基片涂敷涂料的真空模块和模块系统 |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JP4766821B2 (enExample) |
| KR (1) | KR100737035B1 (enExample) |
| CN (1) | CN100348773C (enExample) |
| AU (1) | AU6896001A (enExample) |
| EA (1) | EA003148B1 (enExample) |
| MY (1) | MY137307A (enExample) |
| WO (1) | WO2002008484A2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100914087B1 (ko) | 2003-05-13 | 2009-08-27 | 어플라이드 머티어리얼스, 인코포레이티드 | 처리 챔버의 개구를 밀봉하기 위한 방법 및 장치 |
| EA200501183A1 (ru) * | 2005-07-18 | 2006-12-29 | Владимир Яковлевич ШИРИПОВ | Вакуумный кластер для нанесения покрытий на подложку (варианты) |
| EA009303B1 (ru) * | 2006-05-15 | 2007-12-28 | Владимир Яковлевич ШИРИПОВ | Способ нанесения пленок нитрида кремния в вакууме (варианты) |
| EA034967B1 (ru) | 2018-05-04 | 2020-04-13 | Общество С Ограниченной Ответственностью "Изовак Технологии" | Технологическая линия для формирования тонкопленочных покрытий в вакууме (варианты) |
| CN110592550A (zh) * | 2019-10-28 | 2019-12-20 | 上海映晓电子科技有限公司 | 一种磁控溅射和电子束蒸镀双腔镀膜装置及其使用方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2008156A (en) * | 1977-11-19 | 1979-05-31 | Hunt C J L | Vacuum Metallising Hollow Bodies |
| US5489369A (en) * | 1993-10-25 | 1996-02-06 | Viratec Thin Films, Inc. | Method and apparatus for thin film coating an article |
| WO1997039160A1 (en) * | 1996-04-18 | 1997-10-23 | Kabushiki Kaisha Toshiba | Method of producing a cathode-ray tube and apparatus therefor |
-
2000
- 2000-07-05 EA EA200000807A patent/EA003148B1/ru not_active IP Right Cessation
-
2001
- 2001-05-22 KR KR1020037000087A patent/KR100737035B1/ko not_active Expired - Fee Related
- 2001-05-22 AU AU6896001A patent/AU6896001A/xx active Pending
- 2001-05-22 CN CNB018121780A patent/CN100348773C/zh not_active Expired - Fee Related
- 2001-05-22 JP JP2002513962A patent/JP4766821B2/ja not_active Expired - Fee Related
- 2001-05-22 WO PCT/EA2001/000002 patent/WO2002008484A2/en not_active Ceased
- 2001-07-03 MY MYPI20013177A patent/MY137307A/en unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2008156A (en) * | 1977-11-19 | 1979-05-31 | Hunt C J L | Vacuum Metallising Hollow Bodies |
| US5489369A (en) * | 1993-10-25 | 1996-02-06 | Viratec Thin Films, Inc. | Method and apparatus for thin film coating an article |
| WO1997039160A1 (en) * | 1996-04-18 | 1997-10-23 | Kabushiki Kaisha Toshiba | Method of producing a cathode-ray tube and apparatus therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| EA003148B1 (ru) | 2003-02-27 |
| JP2004504495A (ja) | 2004-02-12 |
| WO2002008484A3 (en) | 2002-07-04 |
| KR20030024771A (ko) | 2003-03-26 |
| WO2002008484A2 (en) | 2002-01-31 |
| MY137307A (en) | 2009-01-30 |
| KR100737035B1 (ko) | 2007-07-09 |
| AU6896001A (en) | 2002-02-05 |
| JP4766821B2 (ja) | 2011-09-07 |
| EA200000807A1 (ru) | 2002-02-28 |
| CN1617947A (zh) | 2005-05-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106488996B (zh) | 具有动靶的溅镀装置 | |
| JP6741594B2 (ja) | キャリアによって支持された基板上に一又は複数の層を堆積させるためのシステム、及び当該システムを使用する方法 | |
| CN105814231B (zh) | 用于有机材料的蒸发源、用于在真空腔室中沉积有机材料的沉积设备及蒸发有机材料的方法 | |
| CN1737190B (zh) | 磁控溅镀装置 | |
| KR20110052469A (ko) | 진공 증착 장치, 진공 증착 방법 및 유기 ｅｌ 표시 장치의 제조 방법 | |
| CN100348773C (zh) | 用于向一种基片涂敷涂料的真空模块和模块系统 | |
| US20210269912A1 (en) | Evaporation source for organic material, deposition apparatus for depositing organic materials in a vacuum chamber having an evaporation source for organic material, and method for evaporating organic material | |
| CN101565813B (zh) | MgO薄膜电子束蒸发制备方法及装置 | |
| EA034967B1 (ru) | Технологическая линия для формирования тонкопленочных покрытий в вакууме (варианты) | |
| US20090178919A1 (en) | Sputter coating device | |
| US20070137793A1 (en) | Processing apparatus | |
| KR20090108497A (ko) | 증착 장치 | |
| KR102206551B1 (ko) | 기판 처리 장치 | |
| KR101430657B1 (ko) | 원자층 증착장치 | |
| JP6833610B2 (ja) | 有機材料用の蒸発源、有機材料用の蒸発源を有する装置、有機材料用の蒸発源を含む蒸発堆積装置を有するシステム、及び有機材料用の蒸発源を操作するための方法 | |
| JP4661405B2 (ja) | 真空蒸着装置及び電気光学装置の製造方法 | |
| JP5270821B2 (ja) | 基板成膜用真空クラスタ（変形） | |
| RU2312170C2 (ru) | Устройство для нанесения многослойных оптических покрытий | |
| KR101229153B1 (ko) | 기판에 코팅을 피복하기 위한 진공 클러스터 | |
| CN109913830B (zh) | 一种多功能真空镀膜机 | |
| WO2025134565A1 (ja) | 開閉装置、成膜装置、成膜方法および電子デバイスの製造方法 | |
| KR101695388B1 (ko) | 인라인 화학기상증착시스템 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20071114 Termination date: 20160522 |