KR100654473B1 - 반도체 디바이스 - Google Patents
반도체 디바이스 Download PDFInfo
- Publication number
- KR100654473B1 KR100654473B1 KR1020017002427A KR20017002427A KR100654473B1 KR 100654473 B1 KR100654473 B1 KR 100654473B1 KR 1020017002427 A KR1020017002427 A KR 1020017002427A KR 20017002427 A KR20017002427 A KR 20017002427A KR 100654473 B1 KR100654473 B1 KR 100654473B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- insulating
- interconnect structure
- dielectric constant
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W44/00—Electrical arrangements for controlling or matching impedance
- H10W44/601—Capacitive arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W44/00—Electrical arrangements for controlling or matching impedance
- H10W44/20—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/075—Connecting or disconnecting of bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/531—Shapes of wire connectors
- H10W72/536—Shapes of wire connectors the connected ends being ball-shaped
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/951—Materials of bond pads
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/951—Materials of bond pads
- H10W72/952—Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP99202104.8 | 1999-06-29 | ||
| EP99202104 | 1999-06-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20010072980A KR20010072980A (ko) | 2001-07-31 |
| KR100654473B1 true KR100654473B1 (ko) | 2006-12-05 |
Family
ID=8240379
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020017002427A Expired - Fee Related KR100654473B1 (ko) | 1999-06-29 | 2000-06-26 | 반도체 디바이스 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6452272B1 (https=) |
| EP (1) | EP1118118A1 (https=) |
| JP (1) | JP2003503854A (https=) |
| KR (1) | KR100654473B1 (https=) |
| WO (1) | WO2001001485A2 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10109877A1 (de) * | 2001-03-01 | 2002-09-19 | Infineon Technologies Ag | Leiterbahnanordnung und Verfahren zur Herstellung einer Leiterbahnanordnung |
| US6962835B2 (en) * | 2003-02-07 | 2005-11-08 | Ziptronix, Inc. | Method for room temperature metal direct bonding |
| JP4389626B2 (ja) * | 2004-03-29 | 2009-12-24 | ソニー株式会社 | 固体撮像素子の製造方法 |
| JP2008113018A (ja) * | 2007-12-03 | 2008-05-15 | Sony Corp | 固体撮像素子とその製造方法、及び半導体集積回路装置とその製造方法 |
| US8981427B2 (en) | 2008-07-15 | 2015-03-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Polishing of small composite semiconductor materials |
| US8916425B2 (en) * | 2010-07-26 | 2014-12-23 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming microcrystalline semiconductor film and method for manufacturing semiconductor device |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4485553A (en) | 1983-06-27 | 1984-12-04 | Teletype Corporation | Method for manufacturing an integrated circuit device |
| JP2821830B2 (ja) | 1992-05-14 | 1998-11-05 | セイコーインスツルメンツ株式会社 | 半導体薄膜素子その応用装置および半導体薄膜素子の製造方法 |
| US5656830A (en) * | 1992-12-10 | 1997-08-12 | International Business Machines Corp. | Integrated circuit chip composite having a parylene coating |
| KR100389754B1 (ko) * | 1994-11-22 | 2003-10-17 | 코닌클리즈케 필립스 일렉트로닉스 엔.브이. | 반도체장치 |
| EP0770267B1 (en) * | 1995-05-10 | 2002-07-17 | Koninklijke Philips Electronics N.V. | Method of manufacturing a device, by which method a substrate with semiconductor element and conductor tracks is glued to a support body with metallization |
| US5654222A (en) * | 1995-05-17 | 1997-08-05 | Micron Technology, Inc. | Method for forming a capacitor with electrically interconnected construction |
| US5872393A (en) * | 1995-10-30 | 1999-02-16 | Matsushita Electric Industrial Co., Ltd. | RF semiconductor device and a method for manufacturing the same |
| DE19543540C1 (de) * | 1995-11-22 | 1996-11-21 | Siemens Ag | Vertikal integriertes Halbleiterbauelement mit zwei miteinander verbundenen Substraten und Herstellungsverfahren dafür |
| US5914508A (en) * | 1995-12-21 | 1999-06-22 | The Whitaker Corporation | Two layer hermetic-like coating process for on-wafer encapsulation of GaAs MMIC's |
| US5913144A (en) * | 1996-09-20 | 1999-06-15 | Sharp Microelectronics Technology, Inc. | Oxidized diffusion barrier surface for the adherence of copper and method for same |
| US6255731B1 (en) * | 1997-07-30 | 2001-07-03 | Canon Kabushiki Kaisha | SOI bonding structure |
| JP4538107B2 (ja) * | 1998-03-02 | 2010-09-08 | エヌエックスピー ビー ヴィ | 半導体素子及び金属化層を有する絶縁層が接着剤により取付られているガラス支持体を有する半導体装置 |
-
2000
- 2000-06-26 JP JP2001506611A patent/JP2003503854A/ja active Pending
- 2000-06-26 WO PCT/EP2000/005915 patent/WO2001001485A2/en not_active Ceased
- 2000-06-26 EP EP00943896A patent/EP1118118A1/en not_active Withdrawn
- 2000-06-26 US US09/763,841 patent/US6452272B1/en not_active Expired - Fee Related
- 2000-06-26 KR KR1020017002427A patent/KR100654473B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO2001001485A3 (en) | 2001-05-03 |
| JP2003503854A (ja) | 2003-01-28 |
| EP1118118A1 (en) | 2001-07-25 |
| KR20010072980A (ko) | 2001-07-31 |
| US6452272B1 (en) | 2002-09-17 |
| WO2001001485A2 (en) | 2001-01-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| A201 | Request for examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20091130 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20091130 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |