KR100614547B1 - 탄성 표면파 소자, 그것을 갖는 송신 필터와 수신 필터,및 이들을 갖는 듀플렉서 - Google Patents
탄성 표면파 소자, 그것을 갖는 송신 필터와 수신 필터,및 이들을 갖는 듀플렉서 Download PDFInfo
- Publication number
- KR100614547B1 KR100614547B1 KR1020030086259A KR20030086259A KR100614547B1 KR 100614547 B1 KR100614547 B1 KR 100614547B1 KR 1020030086259 A KR1020030086259 A KR 1020030086259A KR 20030086259 A KR20030086259 A KR 20030086259A KR 100614547 B1 KR100614547 B1 KR 100614547B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- acoustic wave
- surface acoustic
- saw
- thickness
- Prior art date
Links
- 238000010897 surface acoustic wave method Methods 0.000 title claims abstract description 88
- 239000000758 substrate Substances 0.000 claims abstract description 192
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 claims abstract description 38
- 229910052594 sapphire Inorganic materials 0.000 claims abstract description 29
- 239000010980 sapphire Substances 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims description 25
- 230000005540 biological transmission Effects 0.000 claims description 11
- 238000000605 extraction Methods 0.000 claims description 3
- 230000004044 response Effects 0.000 abstract description 16
- 230000001976 improved effect Effects 0.000 abstract description 12
- 230000008093 supporting effect Effects 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 230000008646 thermal stress Effects 0.000 description 15
- 238000004088 simulation Methods 0.000 description 14
- 239000000463 material Substances 0.000 description 13
- 230000008859 change Effects 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 230000008878 coupling Effects 0.000 description 6
- 238000010168 coupling process Methods 0.000 description 6
- 238000005859 coupling reaction Methods 0.000 description 6
- 229910052814 silicon oxide Inorganic materials 0.000 description 6
- 230000010287 polarization Effects 0.000 description 5
- 238000005304 joining Methods 0.000 description 4
- 238000003746 solid phase reaction Methods 0.000 description 4
- 230000035882 stress Effects 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000008602 contraction Effects 0.000 description 3
- 230000001737 promoting effect Effects 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000010671 solid-state reaction Methods 0.000 description 2
- 230000001413 cellular effect Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02834—Means for compensation or elimination of undesirable effects of temperature influence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02559—Characteristics of substrate, e.g. cutting angles of lithium niobate or lithium-tantalate substrates
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
Claims (5)
- 제1항에 있어서,상기 주 기판은, 추출각이 회전 Y 컷트판이고, 또한 탄성 표면파의 전파 방향을 X축으로 하고 있는 것을 특징으로 하는 탄성 표면파 소자.
- 제1항 또는 제2항에 기재된 상기 탄성 표면파 소자를 구비하여 이루어지는 것을 특징으로 하는 송신 필터.
- 제1항 또는 제2항에 기재된 상기 탄성 표면파 소자를 구비하여 이루어지는 것을 특징으로 하는 수신 필터.
- 제3항에 기재된 상기 송신 필터 및 제4항에 기재된 상기 수신 필터를 구비하여 이루어지는 것을 특징으로 하는 듀플렉서.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2002-00349749 | 2002-12-02 | ||
JP2002349749A JP2004186868A (ja) | 2002-12-02 | 2002-12-02 | 弾性表面波素子、それを有する送信フィルタ及び受信フィルタ、並びにそれらを有するデュプレクサ |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040048317A KR20040048317A (ko) | 2004-06-07 |
KR100614547B1 true KR100614547B1 (ko) | 2006-08-25 |
Family
ID=32708060
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020030086259A KR100614547B1 (ko) | 2002-12-02 | 2003-12-01 | 탄성 표면파 소자, 그것을 갖는 송신 필터와 수신 필터,및 이들을 갖는 듀플렉서 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6933810B2 (ko) |
JP (1) | JP2004186868A (ko) |
KR (1) | KR100614547B1 (ko) |
CN (1) | CN1505263A (ko) |
SG (1) | SG143939A1 (ko) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3929983B2 (ja) * | 2004-03-03 | 2007-06-13 | 富士通メディアデバイス株式会社 | 接合基板、弾性表面波素子および弾性表面波デバイス並びにその製造方法 |
US7068126B2 (en) * | 2004-03-04 | 2006-06-27 | Discera | Method and apparatus for frequency tuning of a micro-mechanical resonator |
JP4587732B2 (ja) * | 2004-07-28 | 2010-11-24 | 京セラ株式会社 | 弾性表面波装置 |
JP4747540B2 (ja) * | 2004-09-15 | 2011-08-17 | 日本電気株式会社 | 圧電トランス |
DE102004045181B4 (de) * | 2004-09-17 | 2016-02-04 | Epcos Ag | SAW-Bauelement mit reduziertem Temperaturgang und Verfahren zur Herstellung |
DE102005045372B4 (de) | 2005-09-22 | 2021-08-19 | Snaptrack, Inc. | Bauelement mit mindestens einem mit akustischen Wellen arbeitenden Filter |
JP4686342B2 (ja) | 2005-11-30 | 2011-05-25 | 株式会社日立メディアエレクトロニクス | 弾性表面波装置及びこれを搭載した通信端末。 |
CN101569100A (zh) | 2006-12-25 | 2009-10-28 | 株式会社村田制作所 | 弹性边界波装置 |
US20080228452A1 (en) * | 2007-01-15 | 2008-09-18 | Sangpil Yoon | Hybrid Finite Element Method for Simulating Temperature Effects on Surface Acoustic Waves |
JP4316632B2 (ja) | 2007-04-16 | 2009-08-19 | 富士通メディアデバイス株式会社 | 弾性表面波装置及び分波器 |
JP5180889B2 (ja) * | 2009-03-25 | 2013-04-10 | 日本碍子株式会社 | 複合基板、それを用いた弾性波デバイス及び複合基板の製法 |
WO2011034136A1 (ja) * | 2009-09-18 | 2011-03-24 | 住友電気工業株式会社 | 基板、基板の製造方法、sawデバイスおよびデバイス |
JP5549167B2 (ja) * | 2009-09-18 | 2014-07-16 | 住友電気工業株式会社 | Sawデバイス |
CN102549923B (zh) * | 2009-09-25 | 2014-10-22 | 株式会社村田制作所 | 弹性表面波装置 |
WO2012033125A1 (ja) | 2010-09-07 | 2012-03-15 | 住友電気工業株式会社 | 基板、基板の製造方法およびsawデバイス |
JP5588836B2 (ja) | 2010-11-12 | 2014-09-10 | 太陽誘電株式会社 | 弾性波デバイス |
JP2012182604A (ja) * | 2011-03-01 | 2012-09-20 | Panasonic Corp | 弾性波フィルタ部品 |
KR101514193B1 (ko) * | 2013-03-27 | 2015-04-21 | 엔지케이 인슐레이터 엘티디 | 복합 기판 및 탄성파 디바이스 |
FR3033462B1 (fr) | 2015-03-04 | 2018-03-30 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif a ondes elastiques de surface comprenant un film piezoelectrique monocristallin et un substrat cristallin, a faibles coefficients viscoelastiques |
JP6494462B2 (ja) * | 2015-07-29 | 2019-04-03 | 太陽誘電株式会社 | 弾性波デバイスおよびモジュール |
FR3042649B1 (fr) * | 2015-10-20 | 2019-06-21 | Soitec | Procede de fabrication d'une structure hybride |
JP6360847B2 (ja) * | 2016-03-18 | 2018-07-18 | 太陽誘電株式会社 | 弾性波デバイス |
FR3079053B1 (fr) * | 2018-03-16 | 2020-03-27 | Frec'n'sys | Substrats composites pour les dispositifs d'etiquette a ondes acoustiques de surface pour applications de rfid et de capteurs |
JP7530148B2 (ja) | 2019-01-30 | 2024-08-07 | 太陽誘電株式会社 | フィルタおよびマルチプレクサ |
JP7613695B2 (ja) * | 2019-09-16 | 2025-01-15 | 国立大学法人東北大学 | 弾性表面波デバイスとその製造方法、 |
KR20250011519A (ko) | 2023-07-14 | 2025-01-21 | (주)와이솔 | 스퓨리어스의 여진이 억제된 표면탄성파 소자 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS5177154A (ja) * | 1974-12-27 | 1976-07-03 | Mitsubishi Electric Corp | Danseihyomenhasochi |
US4006438A (en) * | 1975-08-18 | 1977-02-01 | Amp Incorporated | Electro-acoustic surface-wave filter device |
JP2516817B2 (ja) | 1989-09-14 | 1996-07-24 | 清水 郁子 | 分極反転層を有するLiTaO▲下3▼基板及びこれを用いたデバイス |
JPH0656592A (ja) * | 1992-08-14 | 1994-03-01 | Asahi Chem Ind Co Ltd | 圧電性LiTaO3薄膜 |
JPH10284762A (ja) * | 1995-02-16 | 1998-10-23 | Asahi Chem Ind Co Ltd | 表面弾性波を増幅するための積層構造及び増幅器 |
JPH09208399A (ja) | 1996-01-31 | 1997-08-12 | Kyocera Corp | 圧電基体及び弾性表面波装置 |
JP3880150B2 (ja) | 1997-06-02 | 2007-02-14 | 松下電器産業株式会社 | 弾性表面波素子 |
WO1998056109A1 (fr) * | 1997-06-02 | 1998-12-10 | Asahi Kasei Kogyo Kabushiki Kaisha | Dispositif a ondes de surface elastiques |
FR2788176B1 (fr) * | 1998-12-30 | 2001-05-25 | Thomson Csf | Dispositif a ondes acoustiques guidees dans une fine couche de materiau piezo-electrique collee par une colle moleculaire sur un substrat porteur et procede de fabrication |
JP3704017B2 (ja) * | 2000-03-28 | 2005-10-05 | ヤマハ株式会社 | 弾性表面波素子 |
US6767749B2 (en) * | 2002-04-22 | 2004-07-27 | The United States Of America As Represented By The Secretary Of The Navy | Method for making piezoelectric resonator and surface acoustic wave device using hydrogen implant layer splitting |
-
2002
- 2002-12-02 JP JP2002349749A patent/JP2004186868A/ja active Pending
-
2003
- 2003-11-28 SG SG200307414-3A patent/SG143939A1/en unknown
- 2003-12-01 KR KR1020030086259A patent/KR100614547B1/ko not_active IP Right Cessation
- 2003-12-01 US US10/724,577 patent/US6933810B2/en not_active Expired - Fee Related
- 2003-12-02 CN CNA200310117144A patent/CN1505263A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
US6933810B2 (en) | 2005-08-23 |
US20040135650A1 (en) | 2004-07-15 |
KR20040048317A (ko) | 2004-06-07 |
SG143939A1 (en) | 2008-07-29 |
CN1505263A (zh) | 2004-06-16 |
JP2004186868A (ja) | 2004-07-02 |
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