KR100610717B1 - 반도체 장치의 제조 방법 - Google Patents

반도체 장치의 제조 방법 Download PDF

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Publication number
KR100610717B1
KR100610717B1 KR1019990016707A KR19990016707A KR100610717B1 KR 100610717 B1 KR100610717 B1 KR 100610717B1 KR 1019990016707 A KR1019990016707 A KR 1019990016707A KR 19990016707 A KR19990016707 A KR 19990016707A KR 100610717 B1 KR100610717 B1 KR 100610717B1
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KR
South Korea
Prior art keywords
epitaxial layer
wafer alignment
semiconductor
alignment mark
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019990016707A
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English (en)
Korean (ko)
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KR19990088170A (ko
Inventor
하라다고우이찌
Original Assignee
소니 가부시끼 가이샤
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Filing date
Publication date
Application filed by 소니 가부시끼 가이샤 filed Critical 소니 가부시끼 가이샤
Publication of KR19990088170A publication Critical patent/KR19990088170A/ko
Application granted granted Critical
Publication of KR100610717B1 publication Critical patent/KR100610717B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00—Marks applied to devices, e.g. for alignment or identification
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00—Marks applied to devices, e.g. for alignment or identification
    • H10W46/501—Marks applied to devices, e.g. for alignment or identification for use before dicing

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Solid State Image Pick-Up Elements (AREA)
KR1019990016707A 1998-05-11 1999-05-11 반도체 장치의 제조 방법 Expired - Fee Related KR100610717B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP10126945A JPH11329923A (ja) 1998-05-11 1998-05-11 半導体装置の製造方法
JP1998-126945 1998-05-11

Publications (2)

Publication Number Publication Date
KR19990088170A KR19990088170A (ko) 1999-12-27
KR100610717B1 true KR100610717B1 (ko) 2006-08-09

Family

ID=14947792

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019990016707A Expired - Fee Related KR100610717B1 (ko) 1998-05-11 1999-05-11 반도체 장치의 제조 방법

Country Status (5)

Country Link
US (1) US6358814B1 (enExample)
EP (1) EP0961320A3 (enExample)
JP (1) JPH11329923A (enExample)
KR (1) KR100610717B1 (enExample)
TW (1) TW432708B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11329002B2 (en) 2017-08-21 2022-05-10 Sony Semiconductor Solutions Corporation Semiconductor device and fabrication method for semiconductor device

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6531374B2 (en) * 2001-08-10 2003-03-11 Taiwan Semiconductor Manufacturing Co., Ltd Overlay shift correction for the deposition of epitaxial silicon layer and post-epitaxial silicon layers in a semiconductor device
FR2869459B1 (fr) 2004-04-21 2006-08-04 Commissariat Energie Atomique Realignement entre niveaux apres une etape d'epitaxie.
CN113109997B (zh) * 2021-03-18 2022-08-26 上海信及光子集成技术有限公司 测量外延前后光刻套刻误差的方法及结构

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0291690A (ja) * 1988-09-28 1990-03-30 Toshiba Corp 拡大縮小表示方式
JPH05343319A (ja) * 1992-06-09 1993-12-24 Sumitomo Electric Ind Ltd 半導体装置の製造方法
US5294556A (en) * 1990-07-20 1994-03-15 Fujitsu Limited Method for fabricating an SOI device in alignment with a device region formed in a semiconductor substrate
JPH07130603A (ja) * 1993-06-24 1995-05-19 Hitachi Ltd 半導体装置の製造方法
JPH09181189A (ja) * 1995-12-25 1997-07-11 Toshiba Corp 半導体装置の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4632724A (en) * 1985-08-19 1986-12-30 International Business Machines Corporation Visibility enhancement of first order alignment marks
US4936930A (en) * 1988-01-06 1990-06-26 Siliconix Incorporated Method for improved alignment for semiconductor devices with buried layers
US5300797A (en) * 1992-03-31 1994-04-05 Sgs-Thomson Microelectronics, Inc. Coplanar twin-well integrated circuit structure
KR0170909B1 (ko) * 1995-09-27 1999-03-30 김주용 반도체 소자의 오버레이 검사방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0291690A (ja) * 1988-09-28 1990-03-30 Toshiba Corp 拡大縮小表示方式
US5294556A (en) * 1990-07-20 1994-03-15 Fujitsu Limited Method for fabricating an SOI device in alignment with a device region formed in a semiconductor substrate
JPH05343319A (ja) * 1992-06-09 1993-12-24 Sumitomo Electric Ind Ltd 半導体装置の製造方法
JPH07130603A (ja) * 1993-06-24 1995-05-19 Hitachi Ltd 半導体装置の製造方法
JPH09181189A (ja) * 1995-12-25 1997-07-11 Toshiba Corp 半導体装置の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11329002B2 (en) 2017-08-21 2022-05-10 Sony Semiconductor Solutions Corporation Semiconductor device and fabrication method for semiconductor device

Also Published As

Publication number Publication date
EP0961320A3 (en) 2001-01-17
TW432708B (en) 2001-05-01
US6358814B1 (en) 2002-03-19
EP0961320A2 (en) 1999-12-01
JPH11329923A (ja) 1999-11-30
KR19990088170A (ko) 1999-12-27

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