KR100579379B1 - 대체가능하고 스퍼터링가능한 고체 소스 재료를 가진 이온 소스 - Google Patents

대체가능하고 스퍼터링가능한 고체 소스 재료를 가진 이온 소스 Download PDF

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Publication number
KR100579379B1
KR100579379B1 KR1020010047375A KR20010047375A KR100579379B1 KR 100579379 B1 KR100579379 B1 KR 100579379B1 KR 1020010047375 A KR1020010047375 A KR 1020010047375A KR 20010047375 A KR20010047375 A KR 20010047375A KR 100579379 B1 KR100579379 B1 KR 100579379B1
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South Korea
Prior art keywords
reflective electrode
source
sputterable
ion
electrode
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Expired - Fee Related
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KR1020010047375A
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English (en)
Korean (ko)
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KR20020012515A (ko
Inventor
호스키토마스네일
홀링스워쓰토미데일
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액셀리스 테크놀로지스, 인크.
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/36—Gas-filled discharge tubes for cleaning surfaces while plating with ions of materials introduced into the discharge, e.g. introduced by evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/10—Duoplasmatrons ; Duopigatrons
    • H01J27/12—Duoplasmatrons ; Duopigatrons provided with an expansion cup

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020010047375A 2000-08-07 2001-08-07 대체가능하고 스퍼터링가능한 고체 소스 재료를 가진 이온 소스 Expired - Fee Related KR100579379B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/633,322 US6583544B1 (en) 2000-08-07 2000-08-07 Ion source having replaceable and sputterable solid source material
US09/633,322 2000-08-07

Publications (2)

Publication Number Publication Date
KR20020012515A KR20020012515A (ko) 2002-02-16
KR100579379B1 true KR100579379B1 (ko) 2006-05-12

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KR1020010047375A Expired - Fee Related KR100579379B1 (ko) 2000-08-07 2001-08-07 대체가능하고 스퍼터링가능한 고체 소스 재료를 가진 이온 소스

Country Status (5)

Country Link
US (2) US6583544B1 (enExample)
EP (1) EP1220271A3 (enExample)
JP (1) JP5212760B2 (enExample)
KR (1) KR100579379B1 (enExample)
TW (1) TW504759B (enExample)

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JP5822767B2 (ja) * 2012-03-22 2015-11-24 住友重機械イオンテクノロジー株式会社 イオン源装置及びイオンビーム生成方法
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Also Published As

Publication number Publication date
JP5212760B2 (ja) 2013-06-19
US6583544B1 (en) 2003-06-24
US20040000651A1 (en) 2004-01-01
US6768121B2 (en) 2004-07-27
TW504759B (en) 2002-10-01
KR20020012515A (ko) 2002-02-16
EP1220271A2 (en) 2002-07-03
JP2002117780A (ja) 2002-04-19
EP1220271A3 (en) 2003-11-26

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