KR100539403B1 - 광 조사기의 순환 공냉 시스템 - Google Patents
광 조사기의 순환 공냉 시스템 Download PDFInfo
- Publication number
- KR100539403B1 KR100539403B1 KR10-2001-0077315A KR20010077315A KR100539403B1 KR 100539403 B1 KR100539403 B1 KR 100539403B1 KR 20010077315 A KR20010077315 A KR 20010077315A KR 100539403 B1 KR100539403 B1 KR 100539403B1
- Authority
- KR
- South Korea
- Prior art keywords
- light irradiator
- cooling
- clean room
- air
- light
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
- F21V29/50—Cooling arrangements
- F21V29/70—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks
- F21V29/83—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks the elements having apertures, ducts or channels, e.g. heat radiation holes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
- F21V29/50—Cooling arrangements
- F21V29/502—Cooling arrangements characterised by the adaptation for cooling of specific components
- F21V29/503—Cooling arrangements characterised by the adaptation for cooling of specific components of light sources
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F7/00—Ventilation
- F24F7/04—Ventilation with ducting systems, e.g. by double walls; with natural circulation
- F24F7/06—Ventilation with ducting systems, e.g. by double walls; with natural circulation with forced air circulation, e.g. by fan positioning of a ventilator in or against a conduit
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
- Ventilation (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2000-00374473 | 2000-12-08 | ||
JP2000374473 | 2000-12-08 | ||
JPJP-P-2001-00188151 | 2001-06-21 | ||
JP2001188151A JP3846232B2 (ja) | 2000-12-08 | 2001-06-21 | 光照射器の循環空冷システム |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020046191A KR20020046191A (ko) | 2002-06-20 |
KR100539403B1 true KR100539403B1 (ko) | 2005-12-27 |
Family
ID=26605507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2001-0077315A KR100539403B1 (ko) | 2000-12-08 | 2001-12-07 | 광 조사기의 순환 공냉 시스템 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3846232B2 (ja) |
KR (1) | KR100539403B1 (ja) |
TW (1) | TW496945B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4811000B2 (ja) * | 2005-12-07 | 2011-11-09 | ウシオ電機株式会社 | 光照射装置 |
CH700039A1 (de) * | 2008-12-01 | 2010-06-15 | Uviterno Ag | Vorrichtung zum bestrahlen eines substrats |
JP5056991B1 (ja) * | 2012-02-02 | 2012-10-24 | ウシオ電機株式会社 | 偏光光照射装置 |
JP2013152433A (ja) * | 2012-11-30 | 2013-08-08 | Ushio Inc | 偏光光照射装置 |
CN105588085A (zh) * | 2014-10-23 | 2016-05-18 | 北京航天长征飞行器研究所 | 一种闭式风冷循环系统 |
CN107893981B (zh) * | 2017-11-14 | 2019-10-25 | 北京卫星环境工程研究所 | 太阳模拟器用风冷冷却系统 |
-
2001
- 2001-06-21 JP JP2001188151A patent/JP3846232B2/ja not_active Expired - Lifetime
- 2001-10-09 TW TW090124946A patent/TW496945B/zh not_active IP Right Cessation
- 2001-12-07 KR KR10-2001-0077315A patent/KR100539403B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
TW496945B (en) | 2002-08-01 |
JP3846232B2 (ja) | 2006-11-15 |
JP2002235942A (ja) | 2002-08-23 |
KR20020046191A (ko) | 2002-06-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4424296B2 (ja) | 紫外線照射装置 | |
TWI390552B (zh) | Excimer lamp device | |
JP3166065B2 (ja) | 処理装置及び処理方法 | |
CN105929604B (zh) | 偏振光照射装置 | |
KR100539403B1 (ko) | 광 조사기의 순환 공냉 시스템 | |
JPH1131647A (ja) | 投影露光装置 | |
JP4642066B2 (ja) | 紫外線照射装置 | |
US20090289552A1 (en) | Ultraviolet lamp system with cooling air filter | |
JP4452977B2 (ja) | 紫外線照射装置及びその気体放出方法 | |
TWI613491B (zh) | 光照射裝置 | |
JPH0523581A (ja) | 紫外線照射装置 | |
JP6512041B2 (ja) | 光配向装置 | |
KR200294158Y1 (ko) | 광조사 장비의 램프 하우스 시스템 | |
JP2003158057A (ja) | 大型基板に塗布されたレジストの硬化方法および装置 | |
JP2004080059A (ja) | 投影露光装置及び投影露光方法 | |
JP2001217216A (ja) | 紫外線照射方法及び装置 | |
JP2005345645A (ja) | 露光装置 | |
JP2000150551A (ja) | リードフレームの表面処理機構およびその方法 | |
JPH04262861A (ja) | リフロー装置 | |
KR101193419B1 (ko) | 반도체 노광 장치 | |
JP6459578B2 (ja) | 光処理装置および光処理方法 | |
KR20010051892A (ko) | 자외선 조사방법 및 장치 | |
JP2656232B2 (ja) | 処理装置 | |
JPH08309304A (ja) | 紫外線洗浄方法及びその装置 | |
WO2019017234A1 (ja) | 光照射装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20121130 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20131210 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20141205 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20151118 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20161123 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20171117 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20181115 Year of fee payment: 14 |