KR100526668B1 - 박막두께측정방법 및 장치 - Google Patents

박막두께측정방법 및 장치 Download PDF

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Publication number
KR100526668B1
KR100526668B1 KR10-2003-0001380A KR20030001380A KR100526668B1 KR 100526668 B1 KR100526668 B1 KR 100526668B1 KR 20030001380 A KR20030001380 A KR 20030001380A KR 100526668 B1 KR100526668 B1 KR 100526668B1
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KR
South Korea
Prior art keywords
substrate
thin film
current value
substrate current
electron beam
Prior art date
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Expired - Fee Related
Application number
KR10-2003-0001380A
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English (en)
Korean (ko)
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KR20030063129A (ko
Inventor
이타가키요스케
야마다게이조
우시키다케오
Original Assignee
파브 솔루션 가부시키가이샤
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Publication of KR20030063129A publication Critical patent/KR20030063129A/ko
Application granted granted Critical
Publication of KR100526668B1 publication Critical patent/KR100526668B1/ko
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2814—Measurement of surface topography
    • H01J2237/2815—Depth profile

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
KR10-2003-0001380A 2002-01-17 2003-01-09 박막두께측정방법 및 장치 Expired - Fee Related KR100526668B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2002-00009304 2002-01-17
JP2002009304A JP3953821B2 (ja) 2002-01-17 2002-01-17 膜厚測定方法および膜厚測定装置

Publications (2)

Publication Number Publication Date
KR20030063129A KR20030063129A (ko) 2003-07-28
KR100526668B1 true KR100526668B1 (ko) 2005-11-08

Family

ID=19191506

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2003-0001380A Expired - Fee Related KR100526668B1 (ko) 2002-01-17 2003-01-09 박막두께측정방법 및 장치

Country Status (4)

Country Link
US (1) US6683308B2 (enExample)
JP (1) JP3953821B2 (enExample)
KR (1) KR100526668B1 (enExample)
TW (1) TW580560B (enExample)

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JP3953821B2 (ja) * 2002-01-17 2007-08-08 ファブソリューション株式会社 膜厚測定方法および膜厚測定装置
JP3913555B2 (ja) * 2002-01-17 2007-05-09 ファブソリューション株式会社 膜厚測定方法および膜厚測定装置
JP4090303B2 (ja) * 2002-08-08 2008-05-28 株式会社日立ハイテクノロジーズ 電子ビーム計測用センサー及び電子ビーム計測方法
US7459913B2 (en) * 2004-08-13 2008-12-02 International Business Machines Corporation Methods for the determination of film continuity and growth modes in thin dielectric films
US7162133B2 (en) * 2004-08-20 2007-01-09 Agency For Science Technology And Research Method to trim and smooth high index contrast waveguide structures
CN100592028C (zh) * 2005-01-07 2010-02-24 精工电子纳米科技有限公司 薄膜样品测量方法和设备及薄膜样品制备方法和设备
JP2008034475A (ja) * 2006-07-26 2008-02-14 Renesas Technology Corp 半導体装置の製造方法
DK2251454T3 (da) 2009-05-13 2014-10-13 Sio2 Medical Products Inc Coating og inspektion af beholder
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
JP2011029271A (ja) * 2009-07-22 2011-02-10 Micronics Japan Co Ltd 薄膜特性測定装置及び方法、並びに、薄膜加工装置及び方法
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
JP5754296B2 (ja) * 2011-08-18 2015-07-29 Ｊｆｅスチール株式会社 膜厚均一性評価方法
JP5754297B2 (ja) * 2011-08-18 2015-07-29 Ｊｆｅスチール株式会社 膜厚均一性評価方法
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
AU2012318242A1 (en) 2011-11-11 2013-05-30 Sio2 Medical Products, Inc. Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
CA2890066C (en) 2012-11-01 2021-11-09 Sio2 Medical Products, Inc. Coating inspection method
WO2014078666A1 (en) 2012-11-16 2014-05-22 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
EP2925903B1 (en) 2012-11-30 2022-04-13 Si02 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
EP2961858B1 (en) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Coated syringe.
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
CN105392916B (zh) 2013-03-11 2019-03-08 Sio2医药产品公司 涂布包装材料
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
EP3693493A1 (en) 2014-03-28 2020-08-12 SiO2 Medical Products, Inc. Antistatic coatings for plastic vessels
US10203202B2 (en) * 2014-04-07 2019-02-12 John Weber Schultz Non-contact determination of coating thickness
KR101630798B1 (ko) * 2014-11-05 2016-06-15 한국표준과학연구원 코팅 두께 측정 장치 및 방법
US11077233B2 (en) 2015-08-18 2021-08-03 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
CN105470162B (zh) * 2016-01-08 2019-07-02 武汉新芯集成电路制造有限公司 一种侦测接触孔缺陷的方法
US11410830B1 (en) 2019-03-23 2022-08-09 Kla Corporation Defect inspection and review using transmissive current image of charged particle beam system
EP4099091B1 (en) 2021-06-02 2024-04-10 IMEC vzw Pattern height metrology using an e-beam system

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JPS639807A (ja) 1986-06-30 1988-01-16 Nec Corp 膜厚測定方法およびその装置
US5162240A (en) * 1989-06-16 1992-11-10 Hitachi, Ltd. Method and apparatus of fabricating electric circuit pattern on thick and thin film hybrid multilayer wiring substrate
JPH0817166B2 (ja) * 1991-04-27 1996-02-21 信越半導体株式会社 超薄膜ｓｏｉ基板の製造方法及び製造装置
JPH06273297A (ja) 1993-03-19 1994-09-30 Casio Comput Co Ltd イオンビームによるエッチング方法
JP3058394B2 (ja) 1994-06-23 2000-07-04 シャープ株式会社 透過電子顕微鏡用断面試料作成方法
JP3075535B2 (ja) * 1998-05-01 2000-08-14 キヤノン株式会社 電子放出素子、電子源及び画像形成装置の製造方法
JP3292159B2 (ja) 1998-12-10 2002-06-17 日本電気株式会社 膜厚測定装置および膜厚測定方法
JP3953821B2 (ja) * 2002-01-17 2007-08-08 ファブソリューション株式会社 膜厚測定方法および膜厚測定装置
JP3913555B2 (ja) * 2002-01-17 2007-05-09 ファブソリューション株式会社 膜厚測定方法および膜厚測定装置

Also Published As

Publication number Publication date
KR20030063129A (ko) 2003-07-28
US20030132381A1 (en) 2003-07-17
JP3953821B2 (ja) 2007-08-08
TW200302341A (en) 2003-08-01
JP2003214831A (ja) 2003-07-30
US6683308B2 (en) 2004-01-27
TW580560B (en) 2004-03-21

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