KR100514668B1 - 석영 유리 제조 장치 및 제조 방법 - Google Patents
석영 유리 제조 장치 및 제조 방법 Download PDFInfo
- Publication number
- KR100514668B1 KR100514668B1 KR1019980004386A KR19980004386A KR100514668B1 KR 100514668 B1 KR100514668 B1 KR 100514668B1 KR 1019980004386 A KR1019980004386 A KR 1019980004386A KR 19980004386 A KR19980004386 A KR 19980004386A KR 100514668 B1 KR100514668 B1 KR 100514668B1
- Authority
- KR
- South Korea
- Prior art keywords
- opening
- furnace
- quartz glass
- ingot
- target
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000009826 distribution Methods 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 12
- 238000006460 hydrolysis reaction Methods 0.000 claims description 5
- 238000005259 measurement Methods 0.000 claims description 4
- 239000000843 powder Substances 0.000 claims description 4
- 230000002194 synthesizing effect Effects 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 238000007599 discharging Methods 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 230000002349 favourable effect Effects 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 9
- 239000007789 gas Substances 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 206010040925 Skin striae Diseases 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 239000000567 combustion gas Substances 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000011435 rock Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000010436 fluorite Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1407—Deposition reactors therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/01205—Manufacture of preforms for drawing fibres or filaments starting from tubes, rods, fibres or filaments
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/60—Relationship between burner and deposit, e.g. position
- C03B2207/62—Distance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
Description
Claims (3)
- 저부에 개구부를 갖는 노와, 상기 개구부로부터 상기 노 내부에 대향하도록 배치된 잉곳 형성용 타겟과, 첨단부가 상기 타겟을 향하도록 배치된 석영 유리 합성용 버너와, 상기 개구부로부터 상기 노 내부에 유입된 공기를 노 외부로 방출시키는 배기계를 구비하여, 상기 노 내부에서 상기 타겟 상에 석영 유리의 잉곳을 형성하는 석영 유리의 제조 장치에 있어서,상기 개구부의 개구 면적을 변경시킬 수 있는 변경 기구와;상기 노 내부의 온도를 측정하는 온도 측정기와;상기 온도 측정기에 의한 측정 결과에 기초하여, 상기 개구부의 개구 면적을 변경시키도록 상기 변경 기구를 제어하는 제어계와; 그리고상기 타겟에 형성된 잉곳 헤드부의 지름 방향의 온도 분포에 따라, 상기 타겟을 이동 평면 상에서 상기 버너에 대해 상대적으로 평면 이동시키는 이동 기구를 구비하고,상기 개구부는 상기 타겟의 이동 범위에 적합한 형상을 이루는 것을 특징으로 하는 석영 유리 제조 장치.
- 노 내부에서 화염 가수 분해 반응을 수행하여 석영 유리를 제조하는 방법에 있어서,버너로부터 Si 함유 가스와, 지연성 가스와 가연성 가스를 혼합하여 분출하는 단계와;노의 개구부의 개구 면적을 제어하고, 상기 혼합되어 분출된 가스를 노 내에서 화염속에서 반응시켜 석영 유리 가루를 생성하는 단계와; 그리고상기 석영 유리 가루를 타겟 상에 퇴적시켜 유리화한 석영 덩어리를 획득하는 단계를 포함하는 것을 특징으로 하는 석영 유리 제조 방법.
- 제 4 항에 있어서,상기 노 본체의 개구부 개구 면적의 제어는 노 본체 내부의 온도 변화를 감소시키도록 제어함으로써 수행되는 것을 특징으로 하는 석영 유리 제조 방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04556597A JP3832008B2 (ja) | 1997-02-28 | 1997-02-28 | 石英ガラスの製造装置 |
JP45565/1997 | 1997-02-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19980071345A KR19980071345A (ko) | 1998-10-26 |
KR100514668B1 true KR100514668B1 (ko) | 2006-02-28 |
Family
ID=12722884
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019980004386A KR100514668B1 (ko) | 1997-02-28 | 1998-02-13 | 석영 유리 제조 장치 및 제조 방법 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6018964A (ko) |
EP (1) | EP0861812B1 (ko) |
JP (1) | JP3832008B2 (ko) |
KR (1) | KR100514668B1 (ko) |
DE (1) | DE69805877T2 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101553657B1 (ko) | 2013-09-27 | 2015-09-16 | (주) 디에스테크노 | 석영유리 잉곳 제조용 버너 이송장치 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6044664A (en) * | 1997-09-29 | 2000-04-04 | Nikon Corporation | Synthetic silica glass manufacturing apparatus |
JP3796561B2 (ja) * | 1999-04-21 | 2006-07-12 | 信越化学工業株式会社 | 合成石英ガラスの製造方法 |
JP2001010833A (ja) * | 1999-06-21 | 2001-01-16 | Nikon Corp | 石英ガラス部材 |
AU6321600A (en) * | 1999-08-12 | 2001-03-13 | Nikon Corporation | Method for preparation of synthetic vitreous silica and apparatus for heat treatment |
KR100326173B1 (ko) * | 1999-12-30 | 2002-02-27 | 윤종용 | 고순도 실리카 글래스 제조 공정의 열처리 제어 방법 |
KR100330233B1 (ko) * | 2000-01-11 | 2002-03-25 | 윤종용 | 솔-젤 공법에 의해 제조되는 실리카 글래스의 착색 방지방법 |
US6314766B1 (en) * | 2000-01-19 | 2001-11-13 | Corning Incorporated | Apparatus for minimizing air infiltration in the production of fused silica glass |
DE10058558C2 (de) * | 2000-11-24 | 2002-11-07 | Heraeus Quarzglas | Verfahren und Vorrichtung zur Herstellung eines Quarzglaskörpers |
DE202004021665U1 (de) | 2003-04-26 | 2009-11-26 | Schott Ag | Glaskörper aus dotiertem Quarzglas |
JP4569779B2 (ja) * | 2006-09-07 | 2010-10-27 | 信越化学工業株式会社 | 合成石英ガラスインゴット及び合成石英ガラス部材の製造方法 |
JP4668890B2 (ja) * | 2006-12-05 | 2011-04-13 | コバレントマテリアル徳山株式会社 | 合成シリカガラス製造装置、合成シリカガラス製造方法 |
CN101148311B (zh) * | 2007-09-04 | 2010-04-07 | 湖北菲利华石英玻璃股份有限公司 | 气炼连续熔制透明石英玻璃锭的熔制设备及熔制工艺 |
JP2009132549A (ja) * | 2007-11-29 | 2009-06-18 | Covalent Materials Tokuyama Corp | 合成石英ガラスの製造装置 |
EP2878582B1 (en) * | 2012-06-27 | 2018-09-26 | Nikon Corporation | SiO2-TiO2-BASED GLASS PRODUCTION METHOD, PRODUCTION METHOD FOR PLATE-SHAPED MEMBER COMPRISING SiO2-TiO2-BASED GLASS, AND SiO2-TiO2-BASED GLASS PRODUCTION DEVICE |
CN114702233B (zh) * | 2022-05-12 | 2023-12-22 | 江苏亨芯石英科技有限公司 | 一种石英沉积装置及方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60155538A (ja) * | 1984-01-26 | 1985-08-15 | Furukawa Electric Co Ltd:The | 光学用多孔質母材の製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54131034A (en) * | 1978-03-25 | 1979-10-11 | Fujitsu Ltd | Production of glass for light-transmitting fiber |
DE3036915C2 (de) * | 1979-10-09 | 1987-01-22 | Nippon Telegraph And Telephone Corp., Tokio/Tokyo | Verfahren und Vorrichtung zur Herstellung von Lichtleitfaserausgangsformen sowie deren Verwendung zum Ziehen von Lichtleitfasern |
JPS57100930A (en) * | 1980-12-12 | 1982-06-23 | Nippon Telegr & Teleph Corp <Ntt> | Preparation of base material for optical fiber |
JPS6026055B2 (ja) * | 1980-12-23 | 1985-06-21 | 東芝セラミツツクス株式会社 | 石英ガラスおよびその製造方法 |
JPS59164644A (ja) * | 1983-03-11 | 1984-09-17 | Denki Kagaku Kogyo Kk | 溶融石英インゴツトの製法 |
JPS62171939A (ja) * | 1986-01-27 | 1987-07-28 | Sumitomo Electric Ind Ltd | 多孔質光フアイバ母材の製造装置 |
JPH01257146A (ja) * | 1988-04-05 | 1989-10-13 | Japan Metals & Chem Co Ltd | 合成石英インゴット製造用保温炉 |
JPH04154639A (ja) * | 1990-10-17 | 1992-05-27 | Toshiba Ceramics Co Ltd | 石英ガラス製造装置 |
JP2814867B2 (ja) * | 1993-02-10 | 1998-10-27 | 株式会社ニコン | 石英ガラスの製造方法 |
JPH0717737A (ja) * | 1993-07-02 | 1995-01-20 | Showa Electric Wire & Cable Co Ltd | 光ファイバ母材の製造装置 |
US6087283A (en) * | 1995-01-06 | 2000-07-11 | Nikon Corporation | Silica glass for photolithography |
-
1997
- 1997-02-28 JP JP04556597A patent/JP3832008B2/ja not_active Expired - Lifetime
-
1998
- 1998-02-13 KR KR1019980004386A patent/KR100514668B1/ko not_active IP Right Cessation
- 1998-02-27 DE DE69805877T patent/DE69805877T2/de not_active Expired - Lifetime
- 1998-02-27 EP EP98103452A patent/EP0861812B1/en not_active Expired - Lifetime
- 1998-02-27 US US09/031,516 patent/US6018964A/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60155538A (ja) * | 1984-01-26 | 1985-08-15 | Furukawa Electric Co Ltd:The | 光学用多孔質母材の製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101553657B1 (ko) | 2013-09-27 | 2015-09-16 | (주) 디에스테크노 | 석영유리 잉곳 제조용 버너 이송장치 |
Also Published As
Publication number | Publication date |
---|---|
EP0861812A1 (en) | 1998-09-02 |
JPH10236837A (ja) | 1998-09-08 |
DE69805877D1 (de) | 2002-07-18 |
US6018964A (en) | 2000-02-01 |
DE69805877T2 (de) | 2002-12-19 |
KR19980071345A (ko) | 1998-10-26 |
JP3832008B2 (ja) | 2006-10-11 |
EP0861812B1 (en) | 2002-06-12 |
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