KR100446563B1 - 복합재료의 제조방법 및 그것에 의해 얻어지는 복합재료 - Google Patents

복합재료의 제조방법 및 그것에 의해 얻어지는 복합재료 Download PDF

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Publication number
KR100446563B1
KR100446563B1 KR10-2001-7013618A KR20017013618A KR100446563B1 KR 100446563 B1 KR100446563 B1 KR 100446563B1 KR 20017013618 A KR20017013618 A KR 20017013618A KR 100446563 B1 KR100446563 B1 KR 100446563B1
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KR
South Korea
Prior art keywords
composite material
aluminum
substrate
bulk body
base material
Prior art date
Application number
KR10-2001-7013618A
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English (en)
Korean (ko)
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KR20010113893A (ko
Inventor
쿠보타타카시
와타나베히로시
Original Assignee
미쓰이 긴조꾸 고교 가부시키가이샤
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Publication of KR20010113893A publication Critical patent/KR20010113893A/ko
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Publication of KR100446563B1 publication Critical patent/KR100446563B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0005—Separation of the coating from the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0688—Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR10-2001-7013618A 2000-03-13 2001-03-06 복합재료의 제조방법 및 그것에 의해 얻어지는 복합재료 KR100446563B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2000-00068049 2000-03-13
JPJP-P-2000-00068048 2000-03-13
JP2000068048 2000-03-13
JP2000068049 2000-03-13

Publications (2)

Publication Number Publication Date
KR20010113893A KR20010113893A (ko) 2001-12-28
KR100446563B1 true KR100446563B1 (ko) 2004-09-04

Family

ID=26587272

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2001-7013618A KR100446563B1 (ko) 2000-03-13 2001-03-06 복합재료의 제조방법 및 그것에 의해 얻어지는 복합재료

Country Status (6)

Country Link
US (1) US20030056928A1 (fr)
JP (1) JP4060595B2 (fr)
KR (1) KR100446563B1 (fr)
CN (1) CN1250766C (fr)
TW (1) TWI257431B (fr)
WO (1) WO2001068936A1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040084305A1 (en) * 2002-10-25 2004-05-06 Semiconductor Energy Laboratory Co., Ltd. Sputtering system and manufacturing method of thin film
US20060189132A1 (en) * 2003-04-16 2006-08-24 Bridgestone Corporation Method for forming porous thin film
US7255757B2 (en) 2003-12-22 2007-08-14 General Electric Company Nano particle-reinforced Mo alloys for x-ray targets and method to make
US20050133121A1 (en) * 2003-12-22 2005-06-23 General Electric Company Metallic alloy nanocomposite for high-temperature structural components and methods of making
JP2006080170A (ja) * 2004-09-08 2006-03-23 Hitachi Cable Ltd Ｃｎｔ入り配線材の製造方法およびスパッタリング用ターゲット材
US7632761B2 (en) * 2006-06-01 2009-12-15 Wayne State University Method of making thin film anatase titanium dioxide
KR101149408B1 (ko) * 2006-11-15 2012-06-01 삼성전자주식회사 연료 전지용 전극의 제조 방법 및 제조 장치
DE102007056678A1 (de) * 2007-11-24 2009-05-28 Bayerische Motoren Werke Aktiengesellschaft Verfahren zur Herstellung eines Bauteils aus einem Metallmatrix-Verbundwerkstoff
JP5117357B2 (ja) * 2008-11-26 2013-01-16 株式会社アルバック 永久磁石の製造方法
MY168701A (en) * 2012-03-15 2018-11-29 Jx Nippon Mining & Metals Corp Magnetic material sputtering target and manufacturing method thereof
JP6586618B2 (ja) * 2014-08-07 2019-10-09 国立大学法人豊橋技術科学大学 Ｄｌｃ膜形成方法及びｄｌｃ膜形成装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07216534A (ja) * 1994-01-27 1995-08-15 Riken Corp 耐摩耗性皮膜及びその製造方法

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Publication number Priority date Publication date Assignee Title
US4292079A (en) * 1978-10-16 1981-09-29 The International Nickel Co., Inc. High strength aluminum alloy and process
US4624705A (en) * 1986-04-04 1986-11-25 Inco Alloys International, Inc. Mechanical alloying
JPH01125921A (ja) * 1987-11-11 1989-05-18 Meidensha Corp 半導体化炭素薄膜の製造方法
US4834942A (en) * 1988-01-29 1989-05-30 The United States Of America As Represented By The Secretary Of The Navy Elevated temperature aluminum-titanium alloy by powder metallurgy process
US4832734A (en) * 1988-05-06 1989-05-23 Inco Alloys International, Inc. Hot working aluminum-base alloys
US5045278A (en) * 1989-11-09 1991-09-03 Allied-Signal Inc. Dual processing of aluminum base metal matrix composites
US5401587A (en) * 1990-03-27 1995-03-28 Kabushiki Kaisha Toyota Chuo Kenkyusho Anisotropic nanophase composite material and method of producing same
US5169461A (en) * 1990-11-19 1992-12-08 Inco Alloys International, Inc. High temperature aluminum-base alloy
US5171381A (en) * 1991-02-28 1992-12-15 Inco Alloys International, Inc. Intermediate temperature aluminum-base alloy
JPH0578197A (ja) * 1991-03-15 1993-03-30 Kyocera Corp ＴｉＯ２−ＳｎＯ２膜の製法
JP3221892B2 (ja) * 1991-09-20 2001-10-22 帝国ピストンリング株式会社 ピストンリング及びその製造法
JPH07207436A (ja) * 1994-01-24 1995-08-08 Sekisui Chem Co Ltd スパッタリング装置
JP3367269B2 (ja) * 1994-05-24 2003-01-14 株式会社豊田中央研究所 アルミニウム合金およびその製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07216534A (ja) * 1994-01-27 1995-08-15 Riken Corp 耐摩耗性皮膜及びその製造方法

Also Published As

Publication number Publication date
WO2001068936A1 (fr) 2001-09-20
JP4060595B2 (ja) 2008-03-12
CN1250766C (zh) 2006-04-12
TWI257431B (en) 2006-07-01
KR20010113893A (ko) 2001-12-28
US20030056928A1 (en) 2003-03-27
CN1362998A (zh) 2002-08-07

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