KR100431775B1 - 반도체웨이퍼세정장치및방법 - Google Patents

반도체웨이퍼세정장치및방법 Download PDF

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Publication number
KR100431775B1
KR100431775B1 KR1019960013246A KR19960013246A KR100431775B1 KR 100431775 B1 KR100431775 B1 KR 100431775B1 KR 1019960013246 A KR1019960013246 A KR 1019960013246A KR 19960013246 A KR19960013246 A KR 19960013246A KR 100431775 B1 KR100431775 B1 KR 100431775B1
Authority
KR
South Korea
Prior art keywords
cathode
chamber
anode
pair
cathode chamber
Prior art date
Application number
KR1019960013246A
Other languages
English (en)
Korean (ko)
Inventor
시게요시 네쯔
야스유끼 하라다
Original Assignee
가부시키가이샤 프레테크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 프레테크 filed Critical 가부시키가이샤 프레테크
Application granted granted Critical
Publication of KR100431775B1 publication Critical patent/KR100431775B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/4618—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/34—Treatment of water, waste water, or sewage with mechanical oscillations
    • C02F1/36—Treatment of water, waste water, or sewage with mechanical oscillations ultrasonic vibrations
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/4618—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
    • C02F2001/4619—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water only cathodic or alkaline water, e.g. for reducing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C02F2201/46105—Details relating to the electrolytic devices
    • C02F2201/4611—Fluid flow
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C02F2201/46105—Details relating to the electrolytic devices
    • C02F2201/46115—Electrolytic cell with membranes or diaphragms
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C02F2201/46105—Details relating to the electrolytic devices
    • C02F2201/46195—Cells containing solid electrolyte
KR1019960013246A 1995-04-28 1996-04-26 반도체웨이퍼세정장치및방법 KR100431775B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP10609495 1995-04-28
JP95-106094 1995-04-28
JP7292592A JP2832171B2 (ja) 1995-04-28 1995-11-10 半導体基板の洗浄装置および洗浄方法
JP95-292592 1995-11-10

Publications (1)

Publication Number Publication Date
KR100431775B1 true KR100431775B1 (ko) 2004-10-14

Family

ID=26446276

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960013246A KR100431775B1 (ko) 1995-04-28 1996-04-26 반도체웨이퍼세정장치및방법

Country Status (7)

Country Link
US (1) US5725753A (ja)
EP (1) EP0740329B1 (ja)
JP (1) JP2832171B2 (ja)
KR (1) KR100431775B1 (ja)
DE (1) DE69615603T2 (ja)
MY (1) MY117897A (ja)
TW (1) TW296457B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101330827B1 (ko) * 2011-11-10 2013-11-18 한국기계연구원 성에 형성 장치, 이를 포함하는 레이저 가공 시스템 및 이를 이용한 레이저 가공 방법

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JP2832173B2 (ja) * 1995-05-31 1998-12-02 信越半導体株式会社 半導体基板の洗浄装置および洗浄方法
JP3286539B2 (ja) * 1996-10-30 2002-05-27 信越半導体株式会社 洗浄装置および洗浄方法
JPH10286571A (ja) * 1997-04-16 1998-10-27 Permelec Electrode Ltd 酸性水及びアルカリ水製造用電解槽
WO1998056726A1 (en) * 1997-06-13 1998-12-17 Cfmt, Inc. Methods for treating semiconductor wafers
US6048466A (en) * 1997-08-20 2000-04-11 Fine Glass Technology Co., Ltd. Method of cleaning glass substrate for magnetic disk or semiconductor substrate
JPH11114510A (ja) * 1997-10-17 1999-04-27 Tadahiro Omi 温純水を用いた物品の洗浄方法
JP2001526460A (ja) * 1997-12-10 2001-12-18 シーエフエムテイ・インコーポレーテツド 電子部品製造の湿式加工法
JP3109471B2 (ja) * 1998-03-31 2000-11-13 日本電気株式会社 洗浄・乾燥装置及び半導体装置の製造ライン
US6146468A (en) * 1998-06-29 2000-11-14 Speedfam-Ipec Corporation Semiconductor wafer treatment
US6021791A (en) 1998-06-29 2000-02-08 Speedfam-Ipec Corporation Method and apparatus for immersion cleaning of semiconductor devices
US6328809B1 (en) 1998-10-09 2001-12-11 Scp Global Technologies, Inc. Vapor drying system and method
JP2000190208A (ja) * 1998-12-24 2000-07-11 Memc Kk 研磨用キャリアーの保管方法
US6261845B1 (en) 1999-02-25 2001-07-17 Cfmt, Inc. Methods and systems for determining chemical concentrations and controlling the processing of semiconductor substrates
US6379226B1 (en) 1999-12-08 2002-04-30 Memc Electronic Materials, Inc. Method for storing carrier for polishing wafer
US6488038B1 (en) * 2000-11-06 2002-12-03 Semitool, Inc. Method for cleaning semiconductor substrates
JP5140218B2 (ja) * 2001-09-14 2013-02-06 有限会社コヒーレントテクノロジー 表面洗浄・表面処理に適した帯電アノード水の製造用電解槽及びその製造法、並びに使用方法
US9908788B1 (en) 2001-09-26 2018-03-06 Wrt International Llc Radium removal from aqueous media using zeolite materials
US7108784B1 (en) 2001-09-26 2006-09-19 Wrt International Llc Apparatus for removal and destruction of ammonia from an aqueous medium
US7476311B2 (en) * 2001-09-26 2009-01-13 Wrt International Llc Arsenic removal from aqueous media using chemically treated zeolite materials
JP3988827B2 (ja) 2001-12-05 2007-10-10 オキュラス イノヴェイティヴ サイエンシズ、インコーポレイテッド 負および正の酸化還元電位（ｏｒｐ）水を生成するための方法および装置
US7105087B2 (en) * 2002-09-17 2006-09-12 Wrt International Llc Hexa-valent chromium removal from aqueous media using ferrous-form zeolite materials
US7390414B2 (en) * 2002-09-25 2008-06-24 Wrt International Llc Regeneration of chemically treated zeolite
US7326347B2 (en) * 2003-10-29 2008-02-05 Wrt International Llc Dynamic up-flow zeolite system and method
US9168318B2 (en) 2003-12-30 2015-10-27 Oculus Innovative Sciences, Inc. Oxidative reductive potential water solution and methods of using the same
US6998054B2 (en) * 2003-12-31 2006-02-14 The Boc Group, Inc. Selective fluoride and ammonia removal by chromatographic separation of wastewater
EP1863502B1 (en) 2005-03-23 2018-09-12 Sonoma Pharmaceuticals, Inc. Method of treating skin ulcers using oxidative reductive potential water solution
BRPI0610901B1 (pt) 2005-05-02 2019-04-16 Oculus Innovative Sciences, Inc. Uso de uma solução aquosa de potencial oxi-redutivo (orp).
US20070215552A1 (en) * 2005-09-16 2007-09-20 Wrt International Llc. Systems and methods for removal of contaminates from an aqueous media in the absence of modified nitrate levels
US7520987B1 (en) 2005-11-15 2009-04-21 Wrt International Llc System and apparatus for purging absorptive materials used in the removal of contaminates from an aqueous medium
WO2007085021A2 (en) 2006-01-20 2007-07-26 Oculus Innovative Sciences, Inc. Methods of treating or preventing peritonitis with oxidative reductive potential water solution
US7891046B2 (en) 2006-02-10 2011-02-22 Tennant Company Apparatus for generating sparged, electrochemically activated liquid
US8025786B2 (en) 2006-02-10 2011-09-27 Tennant Company Method of generating sparged, electrochemically activated liquid
US8007654B2 (en) 2006-02-10 2011-08-30 Tennant Company Electrochemically activated anolyte and catholyte liquid
US8046867B2 (en) 2006-02-10 2011-11-01 Tennant Company Mobile surface cleaner having a sparging device
US8025787B2 (en) 2006-02-10 2011-09-27 Tennant Company Method and apparatus for generating, applying and neutralizing an electrochemically activated liquid
US8012340B2 (en) 2006-02-10 2011-09-06 Tennant Company Method for generating electrochemically activated cleaning liquid
US8016996B2 (en) 2006-02-10 2011-09-13 Tennant Company Method of producing a sparged cleaning liquid onboard a mobile surface cleaner
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US7851277B2 (en) 2006-12-05 2010-12-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of manufacturing same
US20080218709A1 (en) * 2007-03-07 2008-09-11 Asml Netherlands B.V. Removal of deposition on an element of a lithographic apparatus
EP2207631A2 (en) 2007-10-04 2010-07-21 Tennant Company Method and apparatus for neutralizing electrochemically activated liquids
US8485140B2 (en) 2008-06-05 2013-07-16 Global Patent Investment Group, LLC Fuel combustion method and system
BRPI0914208A2 (pt) 2008-06-19 2015-11-03 Tennant Co célula de eletrólise, e, método
CA2729031A1 (en) 2008-06-19 2009-12-23 Tennant Company Electrolysis de-scaling method with constant output
US8562748B1 (en) * 2009-01-30 2013-10-22 WD Media, LLC Multiple cleaning processes in a single tank
US8163093B1 (en) 2009-02-11 2012-04-24 Wd Media, Inc. Cleaning operations with dwell time
BRPI1011886B1 (pt) 2009-06-15 2022-05-03 Invekra, S.A.P.I De C.V Solução antimicrobiana de baixo ph
US8906166B2 (en) * 2012-11-20 2014-12-09 Nicholas Glen Littleton Process and apparatus for performing forced immersion oscillatory cleaning
CN104934344A (zh) * 2014-03-19 2015-09-23 百利通亚陶科技股份有限公司 半导体清洗装置及方法
DE102016109771B4 (de) 2016-05-27 2020-09-10 Brooks Automation (Germany) Gmbh Verfahren zum Reinigen einer Kunststoffoberfläche
JP6729632B2 (ja) 2018-05-29 2020-07-22 信越半導体株式会社 シリコンウェーハの洗浄方法
TWI692049B (zh) * 2018-08-16 2020-04-21 江德明 晶圓表面檢測前處理裝置及應用其之晶圓表面檢測設備
CN110642340B (zh) * 2019-09-30 2021-06-11 河海大学 一种循环过流式电助臭氧水处理设备及利用其处理水的方法
CN113506726B (zh) * 2021-09-13 2021-12-31 广州粤芯半导体技术有限公司 晶圆清洗方法及半导体器件的制造方法

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JPS5866334A (ja) * 1981-10-16 1983-04-20 Toshiba Corp 半導体基板の処理装置
JPH01255226A (ja) * 1988-04-04 1989-10-12 Matsushita Electric Ind Co Ltd 基板洗浄装置
EP0605882B1 (en) * 1993-01-08 1996-12-11 Nec Corporation Method and apparatus for wet treatment of solid surfaces
JPH06275592A (ja) * 1993-03-23 1994-09-30 Sanyo Electric Co Ltd 半導体基板の処理方法および処置装置
JP2830733B2 (ja) * 1994-03-25 1998-12-02 日本電気株式会社 電解水生成方法および電解水生成機構

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101330827B1 (ko) * 2011-11-10 2013-11-18 한국기계연구원 성에 형성 장치, 이를 포함하는 레이저 가공 시스템 및 이를 이용한 레이저 가공 방법

Also Published As

Publication number Publication date
EP0740329A1 (en) 1996-10-30
JPH0917765A (ja) 1997-01-17
US5725753A (en) 1998-03-10
JP2832171B2 (ja) 1998-12-02
EP0740329A8 (en) 2001-08-29
TW296457B (ja) 1997-01-21
EP0740329B1 (en) 2001-10-04
DE69615603T2 (de) 2002-08-01
MY117897A (en) 2004-08-30
DE69615603D1 (de) 2001-11-08

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