KR100375364B1 - 양성형감광성음이온전착도료조성물및그를사용한패턴형성방법 - Google Patents

양성형감광성음이온전착도료조성물및그를사용한패턴형성방법 Download PDF

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Publication number
KR100375364B1
KR100375364B1 KR1019950008912A KR19950008912A KR100375364B1 KR 100375364 B1 KR100375364 B1 KR 100375364B1 KR 1019950008912 A KR1019950008912 A KR 1019950008912A KR 19950008912 A KR19950008912 A KR 19950008912A KR 100375364 B1 KR100375364 B1 KR 100375364B1
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KR
South Korea
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composition
resin
weight
compound
group
Prior art date
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Expired - Fee Related
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KR1019950008912A
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English (en)
Korean (ko)
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KR950032522A (ko
Inventor
다께조에고오지
나까이노보루
세꼬겐지
Original Assignee
간사이 페인트 가부시키가이샤
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Publication of KR950032522A publication Critical patent/KR950032522A/ko
Application granted granted Critical
Publication of KR100375364B1 publication Critical patent/KR100375364B1/ko
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
KR1019950008912A 1994-04-15 1995-04-15 양성형감광성음이온전착도료조성물및그를사용한패턴형성방법 Expired - Fee Related KR100375364B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP94-101479 1994-04-15
JP6101479A JPH07278471A (ja) 1994-04-15 1994-04-15 ポジ型感光性アニオン電着塗料組成物及びそれを用いるパターンの形成方法

Publications (2)

Publication Number Publication Date
KR950032522A KR950032522A (ko) 1995-12-22
KR100375364B1 true KR100375364B1 (ko) 2003-08-21

Family

ID=14301862

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950008912A Expired - Fee Related KR100375364B1 (ko) 1994-04-15 1995-04-15 양성형감광성음이온전착도료조성물및그를사용한패턴형성방법

Country Status (4)

Country Link
US (1) US5529882A (cg-RX-API-DMAC10.html)
JP (1) JPH07278471A (cg-RX-API-DMAC10.html)
KR (1) KR100375364B1 (cg-RX-API-DMAC10.html)
TW (1) TW284861B (cg-RX-API-DMAC10.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5375825B2 (ja) * 2008-07-29 2013-12-25 東亞合成株式会社 導電性高分子のパターン形成方法及び基板の製造方法
JP4302178B1 (ja) * 2008-11-07 2009-07-22 ハニー化成株式会社 ポジ型感光性アニオン電着塗料用組成物
KR101413078B1 (ko) * 2011-12-30 2014-07-02 제일모직 주식회사 포지티브형 감광성 수지 조성물
TWI683182B (zh) 2017-04-07 2020-01-21 日商昭和電工股份有限公司 感光性樹脂組成物及輻射線微影構造物之製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61206293A (ja) * 1985-03-08 1986-09-12 日本ペイント株式会社 回路板の製造方法
JPH07119374B2 (ja) * 1987-11-06 1995-12-20 関西ペイント株式会社 ポジ型感光性カチオン電着塗料組成物
EP0321618B1 (en) * 1987-12-22 1993-02-17 Daicel Chemical Industries, Ltd. Photosensitive hardenable compositions
JP2585070B2 (ja) * 1988-08-02 1997-02-26 日本ペイント株式会社 画像形成方法
JP2804579B2 (ja) * 1989-02-14 1998-09-30 関西ペイント株式会社 ポジ型感光性電着塗料組成物及びこれを用いた回路板の製造方法
JPH03100074A (ja) * 1989-09-14 1991-04-25 Hitachi Chem Co Ltd ポジ型感光性アニオン電着塗料樹脂組成物
JPH03100073A (ja) * 1989-09-14 1991-04-25 Hitachi Chem Co Ltd ポジ型感光性電着塗料樹脂組成物
US5362597A (en) * 1991-05-30 1994-11-08 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester

Also Published As

Publication number Publication date
TW284861B (cg-RX-API-DMAC10.html) 1996-09-01
KR950032522A (ko) 1995-12-22
JPH07278471A (ja) 1995-10-24
US5529882A (en) 1996-06-25

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