KR100344334B1 - 플라즈마 발생장치 - Google Patents
플라즈마 발생장치 Download PDFInfo
- Publication number
- KR100344334B1 KR100344334B1 KR1020007015080A KR20007015080A KR100344334B1 KR 100344334 B1 KR100344334 B1 KR 100344334B1 KR 1020007015080 A KR1020007015080 A KR 1020007015080A KR 20007015080 A KR20007015080 A KR 20007015080A KR 100344334 B1 KR100344334 B1 KR 100344334B1
- Authority
- KR
- South Korea
- Prior art keywords
- plasma
- substrate
- cathode
- coating
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Paints Or Removers (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/994,381 | 1992-12-21 | ||
| US07/994,381 US5298587A (en) | 1992-12-21 | 1992-12-21 | Protective film for articles and method |
| PCT/US1993/009527 WO1994008574A1 (en) | 1992-10-13 | 1993-10-12 | Treatment of cachexia and inhibition of il-6 activity |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950702547A Division KR100299403B1 (ko) | 1992-12-21 | 1993-10-05 | 물품보호막및이를제공하는방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR100344334B1 true KR100344334B1 (ko) | 2002-07-22 |
Family
ID=25540605
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950702547A Expired - Lifetime KR100299403B1 (ko) | 1992-12-21 | 1993-10-05 | 물품보호막및이를제공하는방법 |
| KR1020007015079A Expired - Lifetime KR100360579B1 (ko) | 1992-12-21 | 1993-10-05 | 규소-탄소 중합체가 접착된 표면을 갖는 기판 적층물 |
| KR1020007015080A Expired - Lifetime KR100344334B1 (ko) | 1992-12-21 | 1993-10-05 | 플라즈마 발생장치 |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950702547A Expired - Lifetime KR100299403B1 (ko) | 1992-12-21 | 1993-10-05 | 물품보호막및이를제공하는방법 |
| KR1020007015079A Expired - Lifetime KR100360579B1 (ko) | 1992-12-21 | 1993-10-05 | 규소-탄소 중합체가 접착된 표면을 갖는 기판 적층물 |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US5298587A (enExample) |
| EP (1) | EP0674722B1 (enExample) |
| JP (1) | JP3488458B2 (enExample) |
| KR (3) | KR100299403B1 (enExample) |
| CA (1) | CA2147486C (enExample) |
| DE (1) | DE69318424T2 (enExample) |
| MX (1) | MX9306910A (enExample) |
| TW (2) | TW375536B (enExample) |
| WO (1) | WO1994014998A1 (enExample) |
Families Citing this family (125)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5567661A (en) * | 1993-08-26 | 1996-10-22 | Fujitsu Limited | Formation of planarized insulating film by plasma-enhanced CVD of organic silicon compound |
| US5677051A (en) * | 1993-11-30 | 1997-10-14 | Tdk Corporation | Magnetic recording medium having a specified plasma polymerized hydrogen containing carbon film and lubricant |
| EP0693975B2 (en) * | 1994-02-16 | 2003-07-30 | The Coca-Cola Company | Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization |
| US6149982A (en) * | 1994-02-16 | 2000-11-21 | The Coca-Cola Company | Method of forming a coating on an inner surface |
| US5487920A (en) * | 1994-04-19 | 1996-01-30 | The Boc Group, Inc. | Process for plasma-enhanced chemical vapor deposition of anti-fog and anti-scratch coatings onto various substrates |
| DE69607619T2 (de) * | 1995-06-22 | 2000-11-16 | Grant Rheal Cool | Oberflächenmodifikation von polymeren und kohlenstoffhaltigen materialen |
| EP0752483A1 (de) * | 1995-06-28 | 1997-01-08 | ANTEC Angewandte Neue Technologien GmbH | Verfahren zur Beschichtung von Gegenständen aus Metall oder Kunststoff |
| JPH11513713A (ja) * | 1995-10-13 | 1999-11-24 | ザ ダウ ケミカル カンパニー | コートされたプラスチック基材 |
| US5783452A (en) * | 1996-02-02 | 1998-07-21 | University Of Washington | Covered microchannels and the microfabrication thereof |
| AUPN820396A0 (en) * | 1996-02-21 | 1996-03-14 | Commonwealth Scientific And Industrial Research Organisation | Method for reducing crazing in a plastics material |
| US6514573B2 (en) * | 1996-02-21 | 2003-02-04 | Commonwealth Scientific And Industrial Research Organisation | Method for reducing crazing in a plastics material |
| US5993598A (en) * | 1996-07-30 | 1999-11-30 | The Dow Chemical Company | Magnetron |
| US5900284A (en) * | 1996-07-30 | 1999-05-04 | The Dow Chemical Company | Plasma generating device and method |
| US5989998A (en) | 1996-08-29 | 1999-11-23 | Matsushita Electric Industrial Co., Ltd. | Method of forming interlayer insulating film |
| FR2756292B1 (fr) * | 1996-11-26 | 1998-12-24 | Saint Gobain Vitrage | Procede de preparation d'une feuille en matiere plastique, cette feuille et vitrage la comportant |
| US6110544A (en) | 1997-06-26 | 2000-08-29 | General Electric Company | Protective coating by high rate arc plasma deposition |
| WO1999004911A1 (en) * | 1997-07-28 | 1999-02-04 | Massachusetts Institute Of Technology | Pyrolytic chemical vapor deposition of silicone films |
| US6203898B1 (en) * | 1997-08-29 | 2001-03-20 | 3M Innovatave Properties Company | Article comprising a substrate having a silicone coating |
| US6055929A (en) * | 1997-09-24 | 2000-05-02 | The Dow Chemical Company | Magnetron |
| AU9586198A (en) | 1997-10-01 | 1999-04-23 | Dow Chemical Company, The | Dual face shower head electrode for a magnetron plasma generating apparatu |
| US6660656B2 (en) * | 1998-02-11 | 2003-12-09 | Applied Materials Inc. | Plasma processes for depositing low dielectric constant films |
| US6287990B1 (en) | 1998-02-11 | 2001-09-11 | Applied Materials, Inc. | CVD plasma assisted low dielectric constant films |
| US6627532B1 (en) * | 1998-02-11 | 2003-09-30 | Applied Materials, Inc. | Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition |
| US6303523B2 (en) | 1998-02-11 | 2001-10-16 | Applied Materials, Inc. | Plasma processes for depositing low dielectric constant films |
| US6593247B1 (en) | 1998-02-11 | 2003-07-15 | Applied Materials, Inc. | Method of depositing low k films using an oxidizing plasma |
| US6054379A (en) * | 1998-02-11 | 2000-04-25 | Applied Materials, Inc. | Method of depositing a low k dielectric with organo silane |
| US6147009A (en) * | 1998-06-29 | 2000-11-14 | International Business Machines Corporation | Hydrogenated oxidized silicon carbon material |
| US6245690B1 (en) * | 1998-11-04 | 2001-06-12 | Applied Materials, Inc. | Method of improving moisture resistance of low dielectric constant films |
| DE19901834A1 (de) * | 1999-01-19 | 2000-07-20 | Leybold Systems Gmbh | Verfahren zum Beschichten von Substraten aus Kunststoff |
| US6520650B2 (en) | 1999-02-08 | 2003-02-18 | Valeo Sylvania L.C.C. | Lamp reflector with a barrier coating of a plasma polymer |
| US6517341B1 (en) * | 1999-02-26 | 2003-02-11 | General Electric Company | Method to prevent recession loss of silica and silicon-containing materials in combustion gas environments |
| US6261694B1 (en) | 1999-03-17 | 2001-07-17 | General Electric Company | Infrared reflecting coatings |
| US6420032B1 (en) | 1999-03-17 | 2002-07-16 | General Electric Company | Adhesion layer for metal oxide UV filters |
| US6517687B1 (en) | 1999-03-17 | 2003-02-11 | General Electric Company | Ultraviolet filters with enhanced weatherability and method of making |
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-
1992
- 1992-12-21 US US07/994,381 patent/US5298587A/en not_active Expired - Lifetime
-
1993
- 1993-08-27 US US08/112,723 patent/US5320875A/en not_active Expired - Lifetime
- 1993-10-05 JP JP51512394A patent/JP3488458B2/ja not_active Expired - Lifetime
- 1993-10-05 KR KR1019950702547A patent/KR100299403B1/ko not_active Expired - Lifetime
- 1993-10-05 EP EP19930923783 patent/EP0674722B1/en not_active Expired - Lifetime
- 1993-10-05 KR KR1020007015079A patent/KR100360579B1/ko not_active Expired - Lifetime
- 1993-10-05 DE DE69318424T patent/DE69318424T2/de not_active Expired - Lifetime
- 1993-10-05 CA CA 2147486 patent/CA2147486C/en not_active Expired - Lifetime
- 1993-10-05 WO PCT/US1993/009528 patent/WO1994014998A1/en not_active Ceased
- 1993-10-05 KR KR1020007015080A patent/KR100344334B1/ko not_active Expired - Lifetime
- 1993-11-05 TW TW085111463A patent/TW375536B/zh not_active IP Right Cessation
- 1993-11-05 MX MX9306910A patent/MX9306910A/es unknown
- 1993-11-05 TW TW82109289A patent/TW296394B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08505186A (ja) | 1996-06-04 |
| KR950704535A (ko) | 1995-11-20 |
| US5320875A (en) | 1994-06-14 |
| JP3488458B2 (ja) | 2004-01-19 |
| MX9306910A (es) | 1994-06-30 |
| EP0674722B1 (en) | 1998-05-06 |
| KR100299403B1 (ko) | 2001-11-22 |
| TW375536B (en) | 1999-12-01 |
| US5298587A (en) | 1994-03-29 |
| TW296394B (enExample) | 1997-01-21 |
| DE69318424D1 (de) | 1998-06-10 |
| CA2147486C (en) | 2005-06-28 |
| WO1994014998A1 (en) | 1994-07-07 |
| KR100360579B1 (ko) | 2002-11-13 |
| CA2147486A1 (en) | 1994-07-07 |
| DE69318424T2 (de) | 1998-12-17 |
| EP0674722A1 (en) | 1995-10-04 |
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