KR100279067B1 - 화학증착용알루미늄화합물및그제조방법 - Google Patents
화학증착용알루미늄화합물및그제조방법 Download PDFInfo
- Publication number
- KR100279067B1 KR100279067B1 KR19980014522A KR19980014522A KR100279067B1 KR 100279067 B1 KR100279067 B1 KR 100279067B1 KR 19980014522 A KR19980014522 A KR 19980014522A KR 19980014522 A KR19980014522 A KR 19980014522A KR 100279067 B1 KR100279067 B1 KR 100279067B1
- Authority
- KR
- South Korea
- Prior art keywords
- formula
- organometallic complex
- methyl
- compound
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 53
- -1 aluminum compound Chemical class 0.000 title claims abstract description 46
- 238000005229 chemical vapour deposition Methods 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 150000001875 compounds Chemical class 0.000 claims abstract description 90
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 51
- 239000002243 precursor Substances 0.000 claims abstract description 47
- 239000010409 thin film Substances 0.000 claims abstract description 40
- 238000000151 deposition Methods 0.000 claims abstract description 39
- 238000000034 method Methods 0.000 claims abstract description 33
- 239000000126 substance Substances 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 16
- RWRDLPDLKQPQOW-UHFFFAOYSA-N tetrahydropyrrole Natural products C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 claims abstract description 9
- 125000002524 organometallic group Chemical group 0.000 claims abstract 16
- 239000001257 hydrogen Substances 0.000 claims description 28
- 229910052739 hydrogen Inorganic materials 0.000 claims description 28
- 230000008021 deposition Effects 0.000 claims description 27
- 125000000217 alkyl group Chemical group 0.000 claims description 25
- 238000006243 chemical reaction Methods 0.000 claims description 24
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 claims description 22
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 17
- 239000002879 Lewis base Substances 0.000 claims description 16
- 150000007527 lewis bases Chemical class 0.000 claims description 16
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims description 14
- 150000002431 hydrogen Chemical class 0.000 claims description 12
- 150000007523 nucleic acids Chemical class 0.000 claims description 8
- 102000039446 nucleic acids Human genes 0.000 claims description 8
- 108020004707 nucleic acids Proteins 0.000 claims description 8
- HTLZVHNRZJPSMI-UHFFFAOYSA-N N-ethylpiperidine Chemical compound CCN1CCCCC1 HTLZVHNRZJPSMI-UHFFFAOYSA-N 0.000 claims description 7
- 239000012280 lithium aluminium hydride Substances 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 7
- 239000000843 powder Substances 0.000 claims description 6
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 239000011812 mixed powder Substances 0.000 claims description 3
- 150000002894 organic compounds Chemical class 0.000 claims description 3
- 239000000725 suspension Substances 0.000 claims description 3
- 229910010082 LiAlH Inorganic materials 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 16
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 7
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 claims 1
- PXHHIBMOFPCBJQ-UHFFFAOYSA-N 1,2-dimethylpyrrolidine Chemical compound CC1CCCN1C PXHHIBMOFPCBJQ-UHFFFAOYSA-N 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 abstract description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 7
- 229910052710 silicon Inorganic materials 0.000 abstract description 7
- 239000010703 silicon Substances 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 6
- NQRYJNQNLNOLGT-UHFFFAOYSA-N tetrahydropyridine hydrochloride Natural products C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 abstract description 3
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Natural products C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 abstract description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 abstract 2
- 229930192474 thiophene Natural products 0.000 abstract 1
- IBBLKSWSCDAPIF-UHFFFAOYSA-N thiopyran Chemical compound S1C=CC=C=C1 IBBLKSWSCDAPIF-UHFFFAOYSA-N 0.000 abstract 1
- AVFZOVWCLRSYKC-UHFFFAOYSA-N 1-methylpyrrolidine Chemical compound CN1CCCC1 AVFZOVWCLRSYKC-UHFFFAOYSA-N 0.000 description 22
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 22
- 239000007788 liquid Substances 0.000 description 20
- 238000000427 thin-film deposition Methods 0.000 description 16
- RXYPXQSKLGGKOL-UHFFFAOYSA-N 1,4-dimethylpiperazine Chemical compound CN1CCN(C)CC1 RXYPXQSKLGGKOL-UHFFFAOYSA-N 0.000 description 13
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 13
- 230000008569 process Effects 0.000 description 12
- 238000011161 development Methods 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 8
- 238000005137 deposition process Methods 0.000 description 8
- TUTOKIOKAWTABR-UHFFFAOYSA-N dimethylalumane Chemical compound C[AlH]C TUTOKIOKAWTABR-UHFFFAOYSA-N 0.000 description 8
- 239000000706 filtrate Substances 0.000 description 7
- 239000012535 impurity Substances 0.000 description 7
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 7
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- MCULRUJILOGHCJ-UHFFFAOYSA-N triisobutylaluminium Chemical class CC(C)C[Al](CC(C)C)CC(C)C MCULRUJILOGHCJ-UHFFFAOYSA-N 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 125000005234 alkyl aluminium group Chemical group 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000002360 explosive Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- JSHASCFKOSDFHY-UHFFFAOYSA-N 1-butylpyrrolidine Chemical compound CCCCN1CCCC1 JSHASCFKOSDFHY-UHFFFAOYSA-N 0.000 description 2
- HVCNXQOWACZAFN-UHFFFAOYSA-N 4-ethylmorpholine Chemical compound CCN1CCOCC1 HVCNXQOWACZAFN-UHFFFAOYSA-N 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical compound [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000005587 bubbling Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 1
- MSCCPZYVXDLPCT-UHFFFAOYSA-N CN1CCCC1.[P] Chemical compound CN1CCCC1.[P] MSCCPZYVXDLPCT-UHFFFAOYSA-N 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- 101150065749 Churc1 gene Proteins 0.000 description 1
- 235000013175 Crataegus laevigata Nutrition 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- 102100038239 Protein Churchill Human genes 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- GLUUGHFHXGJENI-UHFFFAOYSA-N diethylenediamine Natural products C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000012705 liquid precursor Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000011165 process development Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000007736 thin film deposition technique Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
- C23C16/20—Deposition of aluminium only
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/06—Aluminium compounds
- C07F5/069—Aluminium compounds without C-aluminium linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR19980014522A KR100279067B1 (ko) | 1998-04-23 | 1998-04-23 | 화학증착용알루미늄화합물및그제조방법 |
| US09/274,258 US6143357A (en) | 1998-04-23 | 1999-03-22 | Aluminum complex derivatives for chemical vacuum evaporation and the method of producing the same |
| TW088105809A TW562800B (en) | 1998-04-23 | 1999-04-13 | Aluminum complex derivatives for chemical vacuum evaporation and the method of producing the same |
| SG9901666A SG83121A1 (en) | 1998-04-23 | 1999-04-13 | Aluminium complex derivatives for chemical vacuum evaporation and the method of producing the same |
| DE69932560T DE69932560T2 (de) | 1998-04-23 | 1999-04-14 | Aluminiumkomplexderivate zur chemischen Vakuumverdampfung und Verfahren zu deren Herstellung |
| EP99302890A EP0952156B1 (en) | 1998-04-23 | 1999-04-14 | Aluminium complex derivatives for chemical vacuum evaporation and the method of producing the same |
| JP11656799A JP4198820B2 (ja) | 1998-04-23 | 1999-04-23 | 化学蒸着のためのアルミニウム錯体誘導体およびその製造方法 |
| US09/596,115 US6399772B1 (en) | 1998-04-23 | 2000-06-16 | Aluminum complex derivatives for chemical vacuum evaporation and the method of producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR19980014522A KR100279067B1 (ko) | 1998-04-23 | 1998-04-23 | 화학증착용알루미늄화합물및그제조방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR19990080919A KR19990080919A (ko) | 1999-11-15 |
| KR100279067B1 true KR100279067B1 (ko) | 2001-01-15 |
Family
ID=36915015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR19980014522A Expired - Lifetime KR100279067B1 (ko) | 1998-04-23 | 1998-04-23 | 화학증착용알루미늄화합물및그제조방법 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US6143357A (https=) |
| EP (1) | EP0952156B1 (https=) |
| JP (1) | JP4198820B2 (https=) |
| KR (1) | KR100279067B1 (https=) |
| DE (1) | DE69932560T2 (https=) |
| SG (1) | SG83121A1 (https=) |
| TW (1) | TW562800B (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100316760B1 (ko) * | 1999-06-11 | 2001-12-12 | 신현국 | 알루미나 박막의 화학 증착용 전구체 화합물 및 이의 제조방법 |
| KR100756403B1 (ko) | 2006-05-18 | 2007-09-10 | (주)디엔에프 | 알루미늄 박막의 화학증착용 전구체 화합물의 제조방법 |
| KR101364425B1 (ko) * | 2005-01-18 | 2014-02-17 | 프랙스에어 테크놀로지, 인코포레이티드 | 유기금속 화합물의 제조 방법 |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7223823B2 (en) * | 2002-06-06 | 2007-05-29 | Exxon Mobil Chemical Patents Inc. | Catalyst system and process |
| US7199072B2 (en) * | 2002-12-31 | 2007-04-03 | Univation Technologies, Llc | Process of producing a supported mixed catalyst system and polyolefins therefrom |
| WO2006077840A1 (ja) * | 2005-01-19 | 2006-07-27 | Jsr Corporation | トレンチ埋め込み方法 |
| US7348445B2 (en) * | 2005-02-14 | 2008-03-25 | Praxair Technology, Inc. | Organoaluminum precursor compounds |
| KR100724084B1 (ko) * | 2005-11-16 | 2007-06-04 | 주식회사 유피케미칼 | 디알킬아미도디하이드로알루미늄 화합물을 이용한 박막증착방법 |
| KR100829472B1 (ko) * | 2006-05-18 | 2008-05-16 | (주)디엔에프 | 알루미늄 박막의 화학증착용 전구체 화합물 및 이의제조방법 |
| US8142847B2 (en) * | 2007-07-13 | 2012-03-27 | Rohm And Haas Electronic Materials Llc | Precursor compositions and methods |
| JP4962311B2 (ja) * | 2007-12-27 | 2012-06-27 | セイコーエプソン株式会社 | 電子回路装置および電子機器 |
| JP2010241698A (ja) * | 2009-04-01 | 2010-10-28 | Air Water Inc | アミンアランの精製方法 |
| US20110206844A1 (en) | 2010-02-24 | 2011-08-25 | Jacob Grant Wiles | Chromium-free passivation of vapor deposited aluminum surfaces |
| WO2013011974A1 (ja) * | 2011-07-21 | 2013-01-24 | Jsr株式会社 | 金属体を備える基体の製造方法 |
| US9255324B2 (en) * | 2012-08-15 | 2016-02-09 | Up Chemical Co., Ltd. | Aluminum precursor composition |
| US9994954B2 (en) * | 2013-07-26 | 2018-06-12 | Versum Materials Us, Llc | Volatile dihydropyrazinly and dihydropyrazine metal complexes |
| CN111855723B (zh) * | 2020-06-11 | 2023-11-14 | 宁夏大学 | 一种粗大铝胞状晶组织形貌的直接三维显示方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB905985A (en) | 1959-02-24 | 1962-09-19 | Ethyl Corp | Preparing metal-alumino hydrides |
| JPS57188026A (en) | 1981-05-14 | 1982-11-18 | Minolta Camera Co Ltd | Driving device for photographing lens of automatic focusing camera |
| US4923717A (en) * | 1989-03-17 | 1990-05-08 | Regents Of The University Of Minnesota | Process for the chemical vapor deposition of aluminum |
| JP2721023B2 (ja) * | 1989-09-26 | 1998-03-04 | キヤノン株式会社 | 堆積膜形成法 |
| US5113025A (en) * | 1989-10-02 | 1992-05-12 | Ethyl Corporation | Selective reducing agents |
| US5178911A (en) * | 1989-11-30 | 1993-01-12 | The President And Fellows Of Harvard College | Process for chemical vapor deposition of main group metal nitrides |
| DE69120446T2 (de) * | 1990-02-19 | 1996-11-14 | Canon Kk | Verfahren zum Herstellen von abgeschiedener Metallschicht, die Aluminium als Hauptkomponente enthält, mit Anwendung von Alkylaluminiumhydrid |
| US5136046A (en) * | 1990-09-28 | 1992-08-04 | Ethyl Corporation | Preparation of amine alanes |
| US5191099A (en) * | 1991-09-05 | 1993-03-02 | Regents Of The University Of Minnesota | Chemical vapor deposition of aluminum films using dimethylethylamine alane |
| US5900279A (en) | 1995-11-20 | 1999-05-04 | Tri Chemical Laboratory Inc. | Processes for the chemical vapor deposition and solvent used for the processes |
-
1998
- 1998-04-23 KR KR19980014522A patent/KR100279067B1/ko not_active Expired - Lifetime
-
1999
- 1999-03-22 US US09/274,258 patent/US6143357A/en not_active Expired - Lifetime
- 1999-04-13 SG SG9901666A patent/SG83121A1/en unknown
- 1999-04-13 TW TW088105809A patent/TW562800B/zh not_active IP Right Cessation
- 1999-04-14 EP EP99302890A patent/EP0952156B1/en not_active Expired - Lifetime
- 1999-04-14 DE DE69932560T patent/DE69932560T2/de not_active Expired - Fee Related
- 1999-04-23 JP JP11656799A patent/JP4198820B2/ja not_active Expired - Fee Related
-
2000
- 2000-06-16 US US09/596,115 patent/US6399772B1/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100316760B1 (ko) * | 1999-06-11 | 2001-12-12 | 신현국 | 알루미나 박막의 화학 증착용 전구체 화합물 및 이의 제조방법 |
| KR101364425B1 (ko) * | 2005-01-18 | 2014-02-17 | 프랙스에어 테크놀로지, 인코포레이티드 | 유기금속 화합물의 제조 방법 |
| KR100756403B1 (ko) | 2006-05-18 | 2007-09-10 | (주)디엔에프 | 알루미늄 박막의 화학증착용 전구체 화합물의 제조방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000026474A (ja) | 2000-01-25 |
| EP0952156A3 (en) | 2000-12-20 |
| JP4198820B2 (ja) | 2008-12-17 |
| DE69932560D1 (de) | 2006-09-14 |
| SG83121A1 (en) | 2001-09-18 |
| KR19990080919A (ko) | 1999-11-15 |
| EP0952156B1 (en) | 2006-08-02 |
| EP0952156A2 (en) | 1999-10-27 |
| TW562800B (en) | 2003-11-21 |
| DE69932560T2 (de) | 2007-10-18 |
| US6143357A (en) | 2000-11-07 |
| US6399772B1 (en) | 2002-06-04 |
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