KR100274558B1 - 웨이퍼 번인 및 검사 시스템 - Google Patents

웨이퍼 번인 및 검사 시스템 Download PDF

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Publication number
KR100274558B1
KR100274558B1 KR1019920000267A KR920000267A KR100274558B1 KR 100274558 B1 KR100274558 B1 KR 100274558B1 KR 1019920000267 A KR1019920000267 A KR 1019920000267A KR 920000267 A KR920000267 A KR 920000267A KR 100274558 B1 KR100274558 B1 KR 100274558B1
Authority
KR
South Korea
Prior art keywords
wafer
semiconductor
layer
conductors
conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019920000267A
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English (en)
Korean (ko)
Other versions
KR920015499A (ko
Inventor
엠. 츄 안소니
Original Assignee
윌리엄 비. 켐플러
텍사스 인스트루먼츠 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 윌리엄 비. 켐플러, 텍사스 인스트루먼츠 인코포레이티드 filed Critical 윌리엄 비. 켐플러
Publication of KR920015499A publication Critical patent/KR920015499A/ko
Application granted granted Critical
Publication of KR100274558B1 publication Critical patent/KR100274558B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851—Testing of integrated circuits [IC]
    • G01R31/2855—Environmental, reliability or burn-in testing
    • G01R31/2856—Internal circuit aspects, e.g. built-in test features; Test chips; Measuring material aspects, e.g. electro migration [EM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851—Testing of integrated circuits [IC]
    • G01R31/2855—Environmental, reliability or burn-in testing
    • G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
    • G01R31/2863—Contacting devices, e.g. sockets, burn-in boards or mounting fixtures

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
KR1019920000267A 1991-01-11 1992-01-10 웨이퍼 번인 및 검사 시스템 Expired - Fee Related KR100274558B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US64019891A 1991-01-11 1991-01-11
US640,198 1991-01-11
US650,198 1991-01-11

Publications (2)

Publication Number Publication Date
KR920015499A KR920015499A (ko) 1992-08-27
KR100274558B1 true KR100274558B1 (ko) 2001-01-15

Family

ID=24567262

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920000267A Expired - Fee Related KR100274558B1 (ko) 1991-01-11 1992-01-10 웨이퍼 번인 및 검사 시스템

Country Status (5)

Country Link
US (3) US5307010A (enExample)
EP (1) EP0494782B1 (enExample)
KR (1) KR100274558B1 (enExample)
DE (1) DE69219165T2 (enExample)
TW (1) TW207587B (enExample)

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US5399505A (en) * 1993-07-23 1995-03-21 Motorola, Inc. Method and apparatus for performing wafer level testing of integrated circuit dice
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US5991214A (en) * 1996-06-14 1999-11-23 Micron Technology, Inc. Circuit and method for varying a period of an internal control signal during a test mode
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AU4149897A (en) * 1996-08-12 1998-03-06 Intercell Corporation Memory module assembly using partially defective chips
JPH10135756A (ja) * 1996-10-31 1998-05-22 Mitsumi Electric Co Ltd 回路体における回路特性の調整方法
US5859442A (en) * 1996-12-03 1999-01-12 Micron Technology, Inc. Circuit and method for configuring a redundant bond pad for probing a semiconductor
CA2290396A1 (en) * 1997-05-23 1998-11-26 Samuel W. Beal A system and method for packaging integrated circuits
US6175161B1 (en) 1998-05-22 2001-01-16 Alpine Microsystems, Inc. System and method for packaging integrated circuits
US6233185B1 (en) 1997-08-21 2001-05-15 Micron Technology, Inc. Wafer level burn-in of memory integrated circuits
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US5952843A (en) * 1998-03-24 1999-09-14 Vinh; Nguyen T. Variable contact pressure probe
US6303988B1 (en) 1998-04-22 2001-10-16 Packard Hughes Interconnect Company Wafer scale burn-in socket
CN1219217C (zh) * 1998-11-02 2005-09-14 Atg试验体系两合公司 印刷电路板测试器
US6233184B1 (en) 1998-11-13 2001-05-15 International Business Machines Corporation Structures for wafer level test and burn-in
US6262388B1 (en) 1998-12-21 2001-07-17 Micron Electronics, Inc. Laser marking station with enclosure and method of operation
US6417484B1 (en) 1998-12-21 2002-07-09 Micron Electronics, Inc. Laser marking system for dice carried in trays and method of operation
US6348742B1 (en) * 1999-01-25 2002-02-19 Clear Logic, Inc. Sacrificial bond pads for laser configured integrated circuits
US6214180B1 (en) 1999-02-25 2001-04-10 International Business Machines Corporation Method for shorting pin grid array pins for plating
US6261852B1 (en) * 1999-04-19 2001-07-17 Taiwan Semiconductor Manufacturing Company Check abnormal contact and via holes by electroplating method
US6337576B1 (en) 1999-07-19 2002-01-08 Alpine Microsystems, Inc. Wafer-level burn-in
DE19936321C2 (de) * 1999-08-02 2003-12-24 Infineon Technologies Ag Anordnung und Verfahren zum Testen einer Vielzahl von Halbleiterchips auf Waferebene
JP2001135597A (ja) * 1999-08-26 2001-05-18 Fujitsu Ltd 半導体装置の製造方法
US7132841B1 (en) * 2000-06-06 2006-11-07 International Business Machines Corporation Carrier for test, burn-in, and first level packaging
US6603323B1 (en) * 2000-07-10 2003-08-05 Formfactor, Inc. Closed-grid bus architecture for wafer interconnect structure
US6528760B1 (en) 2000-07-14 2003-03-04 Micron Technology, Inc. Apparatus and method using rotational indexing for laser marking IC packages carried in trays
US6524881B1 (en) * 2000-08-25 2003-02-25 Micron Technology, Inc. Method and apparatus for marking a bare semiconductor die
JP2002303653A (ja) * 2001-01-30 2002-10-18 Hitachi Ltd 半導体集積回路装置
JP4248761B2 (ja) * 2001-04-27 2009-04-02 新光電気工業株式会社 半導体パッケージ及びその製造方法並びに半導体装置
US6861859B1 (en) * 2001-10-22 2005-03-01 Electroglas, Inc. Testing circuits on substrates
DE10152086B4 (de) 2001-10-23 2007-03-22 Infineon Technologies Ag Verfahren zum Testen einer Mehrzahl von Bauelementen auf einem Wafer mit einer gemeinsamen Datenleitung und einer gemeinsamen Versorgungsleitung
US6844218B2 (en) * 2001-12-27 2005-01-18 Texas Instruments Incorporated Semiconductor wafer with grouped integrated circuit die having inter-die connections for group testing
US6756244B2 (en) * 2002-01-29 2004-06-29 Hewlett-Packard Development Company, L.P. Interconnect structure
US7169685B2 (en) 2002-02-25 2007-01-30 Micron Technology, Inc. Wafer back side coating to balance stress from passivation layer on front of wafer and be used as die attach adhesive
US7579681B2 (en) * 2002-06-11 2009-08-25 Micron Technology, Inc. Super high density module with integrated wafer level packages
KR100496862B1 (ko) * 2002-10-01 2005-06-22 삼성전자주식회사 멀티칩패키지의 테스트 장치 및 방법
US7180318B1 (en) * 2004-10-15 2007-02-20 Xilinx, Inc. Multi-pitch test probe assembly for testing semiconductor dies having contact pads
US20070111340A1 (en) * 2005-11-15 2007-05-17 Credence Systems Corporation Method for in-line testing of semiconductor wafers
US7852094B2 (en) * 2006-12-06 2010-12-14 Formfactor, Inc. Sharing resources in a system for testing semiconductor devices
US7462038B2 (en) * 2007-02-20 2008-12-09 Qimonda Ag Interconnection structure and method of manufacturing the same
WO2010032350A1 (ja) * 2008-09-17 2010-03-25 パナソニック株式会社 半導体装置及びその製造方法
US10261123B2 (en) * 2017-08-24 2019-04-16 Micron Technology, Inc. Semiconductor device structures for burn-in testing and methods thereof

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Also Published As

Publication number Publication date
EP0494782A1 (en) 1992-07-15
DE69219165T2 (de) 1997-08-07
KR920015499A (ko) 1992-08-27
US5532614A (en) 1996-07-02
TW207587B (enExample) 1993-06-11
US5444366A (en) 1995-08-22
EP0494782B1 (en) 1997-04-23
DE69219165D1 (de) 1997-05-28
US5307010A (en) 1994-04-26

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