KR100261533B1 - 노치부위치 맞춤기구 - Google Patents

노치부위치 맞춤기구 Download PDF

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Publication number
KR100261533B1
KR100261533B1 KR1019940037943A KR19940037943A KR100261533B1 KR 100261533 B1 KR100261533 B1 KR 100261533B1 KR 1019940037943 A KR1019940037943 A KR 1019940037943A KR 19940037943 A KR19940037943 A KR 19940037943A KR 100261533 B1 KR100261533 B1 KR 100261533B1
Authority
KR
South Korea
Prior art keywords
rotating body
aligned
cassette
wafer
rotating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1019940037943A
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English (en)
Korean (ko)
Other versions
KR950021344A (ko
Inventor
아사노다카노부
Original Assignee
마쓰바 구니유키
도오교오에레구토론도오호쿠가부시끼가이샤
히가시 데쓰로
동경 엘렉트론주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 마쓰바 구니유키, 도오교오에레구토론도오호쿠가부시끼가이샤, 히가시 데쓰로, 동경 엘렉트론주식회사 filed Critical 마쓰바 구니유키
Publication of KR950021344A publication Critical patent/KR950021344A/ko
Application granted granted Critical
Publication of KR100261533B1 publication Critical patent/KR100261533B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S269/00—Work holders
    • Y10S269/903—Work holder for electrical circuit assemblages or wiring systems
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/136—Associated with semiconductor wafer handling including wafer orienting means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y10S414/138—Wafers positioned vertically within cassette

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1019940037943A 1993-12-28 1994-12-28 노치부위치 맞춤기구 Expired - Lifetime KR100261533B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP93-352038 1993-12-28
JP35203893 1993-12-28

Publications (2)

Publication Number Publication Date
KR950021344A KR950021344A (ko) 1995-07-26
KR100261533B1 true KR100261533B1 (ko) 2000-08-01

Family

ID=18421360

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940037943A Expired - Lifetime KR100261533B1 (ko) 1993-12-28 1994-12-28 노치부위치 맞춤기구

Country Status (3)

Country Link
US (1) US5533243A (enExample)
KR (1) KR100261533B1 (enExample)
TW (1) TW275708B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100697661B1 (ko) * 2005-07-13 2007-03-20 세메스 주식회사 노치 정렬 장치 및 노치 정렬방법
KR101986066B1 (ko) * 2019-01-18 2019-06-04 (주)에스아이티에스 메인베이스 제조장치

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5700297A (en) * 1992-08-28 1997-12-23 Ipec Precision, Inc. Apparatus for providing consistent, non-jamming registration of notched semiconductor wafers
US6003185A (en) * 1994-07-15 1999-12-21 Ontrak Systems, Inc. Hesitation free roller
DE19545881C2 (de) * 1995-12-08 1999-09-23 Ibm Halte- und Abstandsveränderungsvorrichtung
US5980195A (en) * 1996-04-24 1999-11-09 Tokyo Electron, Ltd. Positioning apparatus for substrates to be processed
US8028978B2 (en) * 1996-07-15 2011-10-04 Semitool, Inc. Wafer handling system
US5862560A (en) * 1996-08-29 1999-01-26 Ontrak Systems, Inc. Roller with treading and system including the same
TW353772B (en) * 1996-09-09 1999-03-01 Tokyo Electron Ltd Workpiece relaying apparatus
US5853284A (en) * 1996-09-24 1998-12-29 Kaijo Corporation Notched wafer aligning apparatus
KR100265757B1 (ko) * 1997-05-09 2000-09-15 윤종용 반도체 제조장비의 웨이퍼 오탑재 방지센서
JP3610426B2 (ja) * 1998-06-04 2005-01-12 東京エレクトロン株式会社 基板姿勢制御装置
US6270307B1 (en) 1999-01-25 2001-08-07 Chartered Semiconductor Manufacturing Company Method for aligning wafers in a cassette
KR100546294B1 (ko) * 1999-07-26 2006-01-26 삼성전자주식회사 웨이퍼 정렬용 롤러 구조체
US6393337B1 (en) * 2000-01-13 2002-05-21 Applied Materials, Inc. Method and apparatus for orienting substrates
KR100364601B1 (ko) * 2000-09-19 2002-12-16 삼성전자 주식회사 웨이퍼 플랫존 얼라이너
CH713466B1 (de) * 2001-07-12 2018-08-15 Murata Machinery Ltd Vorrichtung und Verfahren zum harmonisierten Positionieren von Waferscheiben.
KR100454822B1 (ko) * 2001-12-22 2004-11-05 동부전자 주식회사 웨이퍼 로딩장치
US6916147B2 (en) * 2002-10-25 2005-07-12 Applied Materials, Inc. Substrate storage cassette with substrate alignment feature
WO2005055312A1 (ja) * 2003-12-04 2005-06-16 Hirata Corporation 基板位置決めシステム
EP1840242B1 (de) * 2006-03-29 2011-06-29 Applied Materials GmbH & Co. KG Vakuumtransportvorrichtung mit beweglicher Führungsschiene
CN100550149C (zh) * 2006-05-10 2009-10-14 东莞宏威数码机械有限公司 一种适于制造两种尺寸光盘的冷却装置及其调节方法
JP4849227B2 (ja) * 2006-07-31 2012-01-11 株式会社ダイフク 荷位置ずれ自動矯正装置
DE102006052908B4 (de) * 2006-11-08 2008-12-04 Deutsche Solar Ag Wafer-Auffang-Vorrichtung
US7836570B2 (en) * 2006-12-21 2010-11-23 Terronics Development Company Fixture assembly and methods related thereto
US9218990B2 (en) * 2011-10-07 2015-12-22 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for holding a plurality of substrates for processing
US8932945B2 (en) * 2012-07-09 2015-01-13 Taiwan Semiconductor Manufacturing Company, Ltd. Wafer alignment system and method
US20160114985A1 (en) * 2014-05-29 2016-04-28 Retractable Technologies, Inc. Needle Bevel Orienting Device
TWI569351B (zh) * 2015-04-30 2017-02-01 環球晶圓股份有限公司 晶圓旋轉裝置
US11721570B2 (en) * 2020-07-23 2023-08-08 Sanwa Engineering Corp. Wafer notch leveling device
TWI799990B (zh) * 2021-09-15 2023-04-21 國立清華大學 晶圓缺角自動對齊裝置
CN115810571A (zh) * 2021-09-15 2023-03-17 叶维彰 晶圆缺角自动对齐装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4662811A (en) * 1983-07-25 1987-05-05 Hayden Thomas J Method and apparatus for orienting semiconductor wafers
US4570058A (en) * 1983-10-03 1986-02-11 At&T Technologies, Inc. Method and apparatus for automatically handling and identifying semiconductor wafers
JPS61214445A (ja) * 1985-03-19 1986-09-24 Fujitsu Ltd ウエ−ハの位置合わせ機構
JPS62104049A (ja) * 1985-10-30 1987-05-14 Mitsubishi Electric Corp ベ−キング炉装置
JPS62115738A (ja) * 1985-11-15 1987-05-27 Dainippon Screen Mfg Co Ltd 半導体ウエハの整列方法および装置
JPH0638448B2 (ja) * 1987-03-03 1994-05-18 東京エレクトロン東北株式会社 オリフラ合わせ方法及びその装置
US4813840A (en) * 1987-08-11 1989-03-21 Applied Materials, Inc. Method of aligning wafers and device therefor
JPH01309348A (ja) * 1988-02-29 1989-12-13 Tel Sagami Ltd ウエハ支持装置
JPS63265444A (ja) * 1988-03-19 1988-11-01 Tokyo Electron Ltd 拡散方法
US4970772A (en) * 1989-12-05 1990-11-20 Sulzer Brothers Limited Wafer alignment fixture
JP2856843B2 (ja) * 1990-05-28 1999-02-10 東京エレクトロン株式会社 ウェハ整列装置およびウェハ整列方法
US5183378A (en) * 1990-03-20 1993-02-02 Tokyo Electron Sagami Limited Wafer counter having device for aligning wafers
JP2963950B2 (ja) * 1990-10-11 1999-10-18 東京エレクトロン株式会社 半導体製造装置
US5205028A (en) * 1991-04-01 1993-04-27 Silicon Technology Corporation Wafer alignment fixture for wafers having notches and/or flats
JPH05259264A (ja) * 1992-03-11 1993-10-08 Fujitsu Ltd 半導体ウェーハ整列装置
US5383759A (en) * 1993-08-20 1995-01-24 Lin; Gaille Low particle wafer automatic flat aligner

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100697661B1 (ko) * 2005-07-13 2007-03-20 세메스 주식회사 노치 정렬 장치 및 노치 정렬방법
KR101986066B1 (ko) * 2019-01-18 2019-06-04 (주)에스아이티에스 메인베이스 제조장치

Also Published As

Publication number Publication date
US5533243A (en) 1996-07-09
KR950021344A (ko) 1995-07-26
TW275708B (enExample) 1996-05-11

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